• Title/Summary/Keyword: c-distance

Search Result 2,418, Processing Time 0.036 seconds

Performance Analysis of Distance-based Location Registration Scheme Considering Terminating Call (착신호를 고려한 거리기준 위치등록 방법의 성능분석)

  • Lim, Seog-Ku;Jang, Hee-Seon;Cho, Kee-Seong
    • The KIPS Transactions:PartC
    • /
    • v.10C no.1
    • /
    • pp.103-110
    • /
    • 2003
  • In this paper, we propose and evaluate the performance distance-based registration considering call arrival. We propose the mobility model, which can be used to analyze the performance of proposed registration schemes. Numerical results show that zone-based registration needs less number of registration than distance-based registration. On the other hand, the registration load of the distance-based registration is equally distributed to all cells in a location area. However, the registration load of the distance-based registration considering cail arrival is similar to that of zone-based registration and equally distributed to all cells in a location area. Therefore, the proposed scheme can be effectively used restricted radio resources.

Reactive ion Etching Characteristics of 3C-SiC Grown on Si(100) Wafers (Si(100) 기판위에 성장된 3C-SiC의 RIE 특성)

  • Jung, Soo-Yong;Woo, Hyung-Soon;Jin, Dong-Woo;Chung, Gwiy-Sang
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2003.07b
    • /
    • pp.892-895
    • /
    • 2003
  • This paper describes on RIE(Reactive Ion Etching) characteristics of 3C-SiC(Silicon Carbide) grown on Si(100) wafers. During RIE of 3C-SiC films in this work, $CHF_3$ gas is used to form of polymer as a side wall for excellent anisotropy etching. From this process, etch rates are obtained a $60{\sim}980{\AA}/min$ by various conditions such as $CHF_3$ gas flux, $O_2$ addition ratio, RF power and electrode distance. Also, approximately $40^{\circ}$ mesa structures are successfully formed at 100 mTorr $CHF_3$ gas flow ratio, 200 W RF power and 30 mm electrode distance. Moreover, vertical side wall is fabricated by anisotropy etching with 50% $O_2$ addition ratio and 25 mm electrode distance. Therefore, RIE of 3C-SiC films using $CHF_3$ could be applicable as fabrication process technology for high-temperature 3C-SiC MEMS applications.

  • PDF

Cone-beam Computed Tomography Measurement of the Position of the Inferior Alveolar Nerve Canal in Mandibular Prognathism

  • Yun, Sung-Hun;Park, Ji-Young;Ko, Young-Kyung;Park, Je-Uk;Pyo, Sung-Woon
    • Journal of the Korean Association of Oral and Maxillofacial Surgeons
    • /
    • v.35 no.1
    • /
    • pp.26-30
    • /
    • 2009
  • Background and Objectives: To determine the anatomic position of the inferior alveolar nerve (IAN) canal in patients with mandibular prognathism using the cone-beam CT (CBCT). Materials and Methods: Fifty rami from 25 patients were evaluated. The images were taken by i-CAT and reconstructed 3-dimensionally using the Simplant 11 program. The linear distances between the IAN canal to the buccal cortex (a, $a^{\dag}$ and $a^{\ddag}$), from the IAN canal to the alveolar crest (b and $b^{\dag}$) and the anterior margin ($b^{\ddag}$) and finally the buccal cortical thickness (c, $c^{\dag}$ and $c^{\ddag}$) were measured at three reference planes (VP, OP and HP). Results: On the left side, the average distance of a, b and c were 7.12, 15.96 and 3.60 mm on the VP plane, respectively. On the OP, the distance of $a^{\dag}$, $b^{\dag}$ and $c^{\dag}$ was 6.11, 8.83 and 2.63 mm. For the HP, the distance of $a^{\ddag}$, $b^{\ddag}$ and $c^{\ddag}$ was 4.84, 10.11 and 2.30 mm. On the right side, the distance of a, b and c, on the VP, was 7.10, 16.13 and 3.42 mm, respectively. On the OP, the distance of $a^{\dag}$, $b^{\dag}$ and $c^{\dag}$ was 4.77, 8.75 and 2.68 mm. On the HP, the distance of $a^{\dag}$, $b^{\dag}$ and $c^{\ddag}$ was 4.55, 9.84 and 2.38 mm. Regarding the difference between genders, the distance in male's was longer than female's on the VP (p=0.019), and was thicker in males than females on the HP (p=0.002). Conclusion: The CBCT data provided accurate information about the location and course of the IAN.

A study on the c-axis Orientation of ZnO Thin Films as a funtion of inter targets distance (타겟간 거리 변화에 따른 ZnO박막의 c-축 배향성에 관한 연구)

  • 성하윤;금민종;손인환;김경환
    • Journal of the Korean institute of surface engineering
    • /
    • v.33 no.4
    • /
    • pp.229-232
    • /
    • 2000
  • C-axis oriented zinc oxide thin films were deposited on glass substrate by reactive Facing Targets Sputtering (FTS) system. The characteristics of zinc oxide thin films on power, inter targets distance, and substrate temperature were investigated by XRD(x-ray diffractometer), alphastep (Tencor) analyses. The Facing Targets Sputtering system can deposit thin film in plasma-free situation and change the deposition condition in wide range. The excellently c-axis oriented zinc oxide thin films were obtained at sputter pressure 1mTorr, sputtering current 0.4A, substrate temperature $300^{\circ}C$, inter targets distance 100mm. In the conditions, the rocking curve of zinc oxide thin films deposited on ZnO/Glass was $3.9^{\circ}$.

  • PDF

Efficient Test Wrapper Design in SoC (SoC 내의 효율적인 Test Wrapper 설계)

  • Jung, Jun-Mo
    • Journal of the Korea Academia-Industrial cooperation Society
    • /
    • v.10 no.6
    • /
    • pp.1191-1195
    • /
    • 2009
  • We present the efficient test wrapper design methodology considering the layout distance of scan chain. To test the scan chains in SoC, the scan chains must be assigned to external TAM(Test Access Mechanism) lines. The scan chains in IP were placed and routed without any timing violation at normal mode. However, in test mode, the scan chains have the additional layout distance after TAM line assignment, which can cause the timing violation of flip-flops in scan chains. This paper proposes a new test wrapper design considering layout distance of scan chains with timing violation free.

Effect of Optical Panal Distances on the Growth Rate of Chlorella vulgaris in a Photobioreactor (도광판의 간격이 Chlorella vulgaris 증식에 미치는 영향)

  • Choi, H.J.;Lee, S.M.;Yu, S.W.
    • Journal of Korean Society of Environmental Engineers
    • /
    • v.36 no.3
    • /
    • pp.214-220
    • /
    • 2014
  • The aim of this study is to optimize the efficiency of a photobiorector on the growth rate of Chlorella vulgaris (C. vulgaris) by varying distance of optical panel (OP). The round shaped C. vulgaris (FC-16) having the size of $3-8{\mu}m$ is employed in this study. The cells of C. vulgaris are cultured in the Jaworski's Medium with deionized water at $22^{\circ}C$ for 15 days. The OP is placed at four different distances i.e., at 225 mm distance (Run 1), 150 mm distance (Run 2), 112.5 mm distance (Run 3) and 90 mm distance (Run 4) having a LED (Light Emitting Diode) source. The diffuse rate is achieved to 86%, 90%, 92% and 94% for Run 1, Run 2 Run 3 and Run 4, respectively. A narrower distance of OP caused to effectively to increase the efficiency of diffuse light rate. For mass cultivation of this biomass, medium is changed according to distance of OP after attaining a maximum biomass concentration; Run 1 in 8 days, Run 2 in 6 days, Run 3 in 4 days and Run 4 in 3 days. In addition, the amount of maximum biomass rate for Run 4 was reached 3 times higher than that of Run1. However, growth rate, chlorophyll per cell, cell volume and doubling time are found to be Run 3 and Run 4 higher than that of Run 1 and Run 2 samples. However, Run 3 and Run 4 are having a slight difference in all these measurements. These findings suggest that in terms of economic consideration and efficiency towards simultaneous mass cultivation of biomass, Run 3 was found to be more effective than other samples.

Effect of Deposition Parameters on TiN by Plasma Assisted Chemical Vapor Deposition(III) -Influence of r.f. power and electrode distance on the Tin deposition- (플라즈마 화학증착법에서 증착변수가 TiN 증착에 미치는 영향(III) -r.f. power 및 전극간 거리를 중심으로-)

  • Kim, C.H.;Shin, Y.S.;Kim, M.I.
    • Journal of the Korean Society for Heat Treatment
    • /
    • v.3 no.1
    • /
    • pp.1-7
    • /
    • 1990
  • To investigate the influence of r.f. power and electrode distance on the TiN deposition, TiN films were deposited onto STC3, STD11 steel and Si-wafer from gas mixtures of $TiC_4/N_2/H_2$ using the radio frequency plasma assisted chemical vapor deposition. The crystallinity of TiN film could be improved by the increase of r.f. power and the decrease of electrode distance. The TiN coated layer contains chlorine, its content were decreased with increasing r.f. power as well as decreasing electrode distance. And the thickness of deposited TiN was largely affected by r.f. power and electrode distance. The hardness of deposited TiN reached a maximum value of about Hv 2,000.

  • PDF

New Proof of Minimum Distance for Binary Cyclic Codes with $d_{min}$=5 (최소거리가 5인 이진 순회부호의 최소거리에 관한 새로운 증명)

  • 노종선
    • The Journal of Korean Institute of Communications and Information Sciences
    • /
    • v.25 no.10A
    • /
    • pp.1576-1581
    • /
    • 2000
  • We investigated into the minimum distance of a primitive binary cyclic code C with a generator polynomial g(x)=$m_1(x)m_{d}(x)$. It is known that the necessary and sufficient condition for C to have minimum distance five is the fact that \ulcorner is an APN power function. In this paper we derived the new proof of minimum distance for the primitive binary cyclic codes with minimum distance five.

  • PDF

The Impact of Emotion on Focused Attention in a Flanker Task (수반자극과제에서 정서가 초점주의에 미치는 영향)

  • Park, Tae-Jin;Park, Sun-Hee
    • Korean Journal of Cognitive Science
    • /
    • v.22 no.4
    • /
    • pp.385-404
    • /
    • 2011
  • We examined how emotional background stimuli influence focused attention in a flanker task. An IAPS picture was presented for 1,000ms in advance, then a target and two flanker letters were presented against the IAPS picture for 200ms(Experiment 1). The flanking stimuli were simultaneously presented on the left and right sides of the target stimulus with distance of $0.5^{\circ}C$, $1^{\circ}C$, or $1.5^{\circ}C$ visual angle. We investigated the flanker compatibility effect that identification of target would be faster when they were flanked by identical(compatible) stimuli than when they were flanked by different(incompatible) stimuli. Results of Experiment 1 revealed that the flanker compatibility effect depended not only on the distance of flankers but also on the valence of a background IAPS pictures. Positive and neutral pictures showed distance effect that the flanker compatibility effect was decreased as the farther the distance was, while negative pictures showed no di stance effect. Positive and neutral pictures showed compatibility effects at all distance conditions, but negative pictures didn't showed compatibility effect at $1.5^{\circ}C$ distance condition. In Experiment 2, the SOA(Stimulus Onset Asynchrony) between the picture and the stimuli of flanker task was manipulated. The flanking stimuli were presented simultaneously on the left and right sides of the target stimulus with a distance of either $0.5^{\circ}C$ or $1.5^{\circ}C$ visual angle. The results of Experiment 2 showed that flanker compatibility effect depends on SOA. At long SOA(2800ms), negative pictures showed no distance effect, but positive or neutral pictures did. All valence conditions of background pictures showed compatibility effects at $0.5^{\circ}C$ distance condition, but didn't showed compatibility effect at $1.5^{\circ}C$ distance condition. At short SOA(100ms), all valence conditions of background pictures showed distance effect, and showed compatibility effects with the exception of negative background pictures at $1.5^{\circ}C$ distance condition. These findings suggest that the scope of visual attention becomes narrower when viewing negative emotional stimuli and becomes broadened when viewing positive emotional stimuli. The narrowed scope of attention in negative emotion lasts longer, while the broaden scope of attention in positive emotion lasts shorter.

  • PDF

A Comparision of the Radiation dose by Distance and the Direction according to a Tube Position of the C-arm Unit (C-arm의 Tube 위치에 따른 거리 및 방향별 피폭선량 비교)

  • Kim, Jin-Su;Woo, Bong-Cheol;Kim, Sung-Jin;Lee, Kwan-Sup;Ha, Dong-Yoon
    • Korean Journal of Digital Imaging in Medicine
    • /
    • v.11 no.1
    • /
    • pp.21-26
    • /
    • 2009
  • In operation room, the use of the C-arm unit is increasing. So, the radiation dose of the person who work in operation room was even more increased than before. Thus, this study is shown the measurement of expose dose and the way for decrease of the radiation dose by using the C-arm unit. The experiment was performed with the C-arm unit and used a phantom which is similar to tissue of the human body and fluoro-glass dosimeter for dose measurement. The expose dose were measured by the tube position(over tube, under tube) of the C-arm unit, distance(50, 100$\sim$200cm), direction(I, II, III, IV), runtime(1min, 3min), wearing of the apron. The radiation dose was decreased twice and three times at under tube rather than over tube. The I direction was measured 20$\sim$30% more than the others. The biggest expose dose is 50cm from center on distance. The expose dose is decreased to far from center. In case of Wearing of the apron, the radiation dose was decreased 60$\sim$90% by the distance. But there weren't change of the radiation dose by C-arm tube position. In present, by increasing the usage of the C-arm unit, the radiation dose is inevitable. So, this study recommends us to use the under tube of the C-arm unit. Also, Wearing of the apron is required for minimum of the radiation exposure.

  • PDF