• Title/Summary/Keyword: binary phase mask

Search Result 23, Processing Time 0.029 seconds

Optical Proximity Correction using Sub-resolution Assist Feature in Extreme Ultraviolet Lithography (극자외선 리소그라피에서의 Sub-resolution assist feature를 이용한 근접효과보정)

  • Kim, Jung Sik;Hong, Seongchul;Jang, Yong Ju;Ahn, Jinho
    • Journal of the Semiconductor & Display Technology
    • /
    • v.15 no.3
    • /
    • pp.1-5
    • /
    • 2016
  • In order to apply sub-resolution assist feature (SRAF) in extreme ultraviolet lithography, the maximum non-printing SRAF width and lithography process margin needs to be improved. Through simulation, we confirmed that the maximum SRAF width of 6% attenuated phase shift mask (PSM) is large compared to conventional binary intensity mask. The increase in SRAF width is due to dark region's reflectivity of PSM which consequently improves the process window. Furthermore, the critical dimension error caused by variation of SRAF width and center position is reduced by lower change in diffraction amplitude. Therefore, we speculate that the margin of SRAF application will be improved by using PSM.

Visual Cryptography Based on an Interferometric Encryption Technique

  • Lee, Sang-Su;Na, Jung-Chan;Sohn, Sung-Won;Park, Chee-Hang;Seo, Dong-Hoan;Kim, Soo-Joong
    • ETRI Journal
    • /
    • v.24 no.5
    • /
    • pp.373-380
    • /
    • 2002
  • This paper presents a new method for a visual cryptography scheme that uses phase masks and an interferometer. To encrypt a binary image, we divided it into an arbitrary number of slides and encrypted them using an XOR process with a random key or keys. The phase mask for each encrypted image was fabricated nuder the proposed phase-assignment rule. For decryption, phase masks were placed on any path of the Mach-Zehnder interferometer. Through optical experiments, we confirmed that a secret binary image that was sliced could be recovered by the proposed method.

  • PDF

Study the Feasibility of Optical Lithography for critical Lyers of 0.12$\mu\textrm{m}$ (0.12$\mu\textrm{m}$설계규칙을 갖는 DRAM 셀 주용 레이어의 OPC 및 PSM)

  • 박기천;오용호;임성우;고춘수;이재철
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.14 no.1
    • /
    • pp.6-11
    • /
    • 2001
  • We studied the feasibility of optical lithography for the critical layers of 0.12${\mu}{\textrm}{m}$ DRAM assuming ArF excimer laser as a light source. To enhance the fidelity of aerial image and process margin, Phase shift mask (PSM) patterns as well as binary mask patterns are corrected with in-house developed Optical Proximity Correction (OPC) software. As the result, w found that the aerial image of critical layers of DRAM cell with 0.12${\mu}{\textrm}{m}$ design rule could not be reproduced with binary masks. But if we use PSM or optical proximity corrected PSM, the fidelity of aerial image ,resolution and process margin are so much enhanced that they could be processed with optical lithography.

  • PDF

An X-masking Scheme for Logic Built-In Self-Test Using a Phase-Shifting Network (위상천이 네트워크를 사용한 X-마스크 기법)

  • Song, Dong-Sup;Kang, Sung-Ho
    • Journal of the Institute of Electronics Engineers of Korea SD
    • /
    • v.44 no.2
    • /
    • pp.127-138
    • /
    • 2007
  • In this paper, we propose a new X-masking scheme for utilizing logic built-in self-test The new scheme exploits the phase-shifting network which is based on the shift-and-add property of maximum length pseudorandom binary sequences(m-sequences). The phase-shifting network generates mask-patterns to multiple scan chains by appropriately shifting the m-sequence of an LFSR. The number of shifts required to generate each scan chain mask pattern can be dynamically reconfigured during a test session. An iterative simulation procedure to synthesize the phase-shifting network is proposed. Because the number of candidates for phase-shifting that can generate a scan chain mask pattern are very large, the proposed X-masking scheme reduce the hardware overhead efficiently. Experimental results demonstrate that the proposed X-masking technique requires less storage and hardware overhead with the conventional methods.

Interferometric Image Encryption and Decryption using Binary Phase Hologram (이진 위상 홀로그램을 이용한 간섭성 영상 암호화 및 복원)

  • 김종윤;김정우
    • The Journal of the Korea Contents Association
    • /
    • v.2 no.3
    • /
    • pp.80-86
    • /
    • 2002
  • In this paper, we propose the new optical security technique using two phase holograms based on interferometer. The encoded random phase image does not have any information on the original image. Without Hewing the key mask, one cannot decode the encrypted image and regenerate the original image. And the use of two phase only images in the proposed security system leads to maximum optical efficiency (100% in theory). Also they cannot be detected by an intensity detector such as a CCD camera. Computer simulations and optical experiments show performance of the proposed methods.

  • PDF

Image encryption using phase-based virtual image and interferometer

  • Seo, Dong-Hoan;Shin, Chang-Mok;Kim, Jong-Yun;Bae, Jang-Keun;Kim, Jeong-Woo;Kim, Soo-Joong
    • Proceedings of the IEEK Conference
    • /
    • 2002.07a
    • /
    • pp.631-634
    • /
    • 2002
  • In this paper, we propose an improved optical security system using three phase-encoded images and the principle of interference. This optical system based on a Mach-Zehnder interferometer consists of one phase-encoded virtual image to be encrypted and two phase-encoded images, encrypting image and decrypting image, where every pixel in the three images has a phase value of '0' and '$\pi$'. The proposed encryption is performed by the multiplication of an encrypting image and a phase-encoded virtual image which dose not contain any information from the decrypted image. Therefore, even if the unauthorized users steal and analyze the encrypted image, they cannot reconstruct the required image. This virtual image protects the original image from counterfeiting and unauthorized access.. The decryption of the original image is simply performed by interfering between a reference wave and a direct pixel-to-pixel mapping image of the encrypted image with a decrypting image. Both computer simulations and optical experiments confirmed the effectiveness of the proposed optical technique for optical security applications.

  • PDF

Hierarchical Image Encryption System Using Orthogonal Method (직교성을 이용한 계층적 영상 암호화)

  • Kim, Nam-Jin;Seo, Dong-Hoan;Lee, Sung-Geun;Shin, Chang-Mok;Cho, Kyu-Bo;Kim, Soo-Joong
    • Korean Journal of Optics and Photonics
    • /
    • v.17 no.3
    • /
    • pp.231-239
    • /
    • 2006
  • In recent years, a hierarchical security architecture has been widely studied because it can efficiently protect information by allowing an authorized user access to the level of information. However, the conventional hierarchical decryption methods require several decryption keys for the high level information. In this paper, we propose a hierarchical image encryption using random phase masks and Walsh code having orthogonal characteristics. To decrypt the hierarchical level images by only one decryption key, we combine Walsh code into the hierarchical level system. For encryption process, we first perform a Fourier transform for the multiplication results of the original image and the random phase mask, and then expand the transformed pattern to be the same size and shape of Walsh code. The expanded pattern is finally encrypted by multiplying with the Walsh code image and the binary phase mask. We generate several encryption images as the same encryption process. The reconstruction image is detected on a CCD plane by a despread process and Fourier transform for the multiplication result of encryption image and hierarchical decryption keys which are generated by Walsh code and binary random phase image. Computer simulations demonstrate that the proposed technique can decrypt hierarchical information by using only one level decryption key image and it has a good robustness to the data loss such as random cropping.

Design and analysis of two-dimensional binary phase masks for the fabrication of two-and three-dimensional periodic structures (2차원 및 3차원의 주기적인 구조 제작을 위한 2차원 이진 위상마스크의 설계와 분석)

  • 김남식;원영희;고근하;조두진
    • Korean Journal of Optics and Photonics
    • /
    • v.12 no.1
    • /
    • pp.17-24
    • /
    • 2001
  • Two-dimensional binary-phase diffraction gratings which can be employed to fabricate two- and three-dimensional periodic structures are designed and analyzed using rigorous coupled-wave analysis. These gratings serve as phase-masks which generate several diffracted waves from a normally incident beam and thus can produce a periodic interference pattern in space via nearfield holography. The properties of the diffracted beams can be controlled by varying the polarization and wavelength of the incident beam, surface-profile, groove depth and duty cycle of the mask. For the two-dimensional structure, optimum results can be obtained when the diffraction efficiency of the zero-order beam is minimized while that of the first-order maximized. On the other hand, when the diffraction efficiency of the zero-order is appreciable or even greater than other orders, we can obtain a variety of three-dimensional interference patterns which may be used to fabricate photonic crystals of tetragonal-body-centered and hexagonal structures in a submicron scale. scale.

  • PDF

An automatic mask alignment system using moire sensors

  • Furuhashi, Hideo;Uchida, Yoshiyuki;Ohashi, Asao;Watanabe, Shigeo;Yamada, Jun
    • 제어로봇시스템학회:학술대회논문집
    • /
    • 1993.10b
    • /
    • pp.545-549
    • /
    • 1993
  • an alignment system in the X-and Y-directions an X-Y-.theta. stage driven by piezoelectric actuators is presented. A pair of quadruple gratings and a quadruple photo-detector are used. The difference between the two 0-th order moire signals in reflection with a relative spatial phase of 180.deg. is used in each direction to control the alignment of the X-Y-.theta. stage. The stage is aligned at the position where the difference is zero. The quadruple gratings are 10 mm * 10 mm, and of a binary square-type with a 1/2 duty cycle. Their pitches are 16 .mu.m. Alignment accuracy of .+-.20nm was obtained in this system.

  • PDF

Optical Security System Using Phase Mask and Interferometer (위상 카드와 간섭계를 이용한 광학적 보안 시스템)

  • Kim, Jong-Yun;Kim, Gi-Jeong;Park, Se-Jun;Kim, Cheol-Su;Bae, Jang-Geun;Kim, Jeong-U;Kim, Su-Jung
    • Journal of the Institute of Electronics Engineers of Korea SD
    • /
    • v.38 no.1
    • /
    • pp.37-43
    • /
    • 2001
  • In this paper, we propose a new optical security technique using two phase masks based on interferometer. A binary random phase image is used as a reference image and the encrypted image is generated according to the phase difference between the reference image and the original image. If there is no phase difference of a same pixel position in two phase masks, interference intensity of the pixel has minimum value and if phase difference of a same pixel position in two phase masks is $\pi$, its interference intensity has maximum value. We can decrypt the original image by putting two phase masks on each of the two optical paths of the Mach-Zehnder interferometer. Computer simulation and the optical experiments show a good performance of the proposed optical security system.

  • PDF