• 대한전기학회:학술대회논문집
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• 대한전기학회 1988년도 추계학술대회 논문집 학회본부
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• pp.363-367
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• 1988

A simple analytical model for the lateral channel electric field in gate - offset structured Lightly Doped Drain MOSFET has been developed. The model's results agree well with two dimensional device simulations. Due to its simplicity, our model gives a better understanding of the mechanisms involved in reducing the electric field in the LDD MOSFET. The model shows clearly the dependencies of the lateral channel electric field as function of drain and gate bias conditions and process, design parameters. Advantages of analytical model over costly 2-D device simulations is to identify the effects of various parameters, such as oxide thickness, junction depth, gate / drain bias, the length and doping concentration of the lightly doped region, on the peak electric field that causes hot - electron phenomena, individually. We are able to find the optimum doping concentration of LDD minimizing the peak electric field and hot - electron effects.

• 한국진공학회지
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• 제12권S1호
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• pp.36-39
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• 2003

Field-domain dynamics and current self-oscillations are theoretically studied in quantum-well (QW) negative-effective-mass (NEM) $p^{+}pp^{+}$ diodes when the electric field is applied along the direction of the well. The origin of current self-oscillations is the formation and traveling of electric-field domains in the p-base. We have accurately considered the scattering contributions from carrier-impurity, carrier-acoustic phonon, and carrier-optic phonon. It's indicated that, both the applied bias and the doping concentration largely influence the current patterns and self-oscillating frequencies, which lie in the THz range for the NEM $p^{+}pp^{+}$ diode with a submicrometer p-base. The complicated field-domain dynamics is presented with the applied bias as the controlling parameter.

• 대한전기학회논문지
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• 제38권6호
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• pp.401-415
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• 1989

A simple but accurate analytical model for the lateral channel electric field in gate-offset structured Lightly Doped Drain MOSFET has been developed. Our model assumes Gaussian doping profile, rather than simple uniform doping, for the lightly doped region and our model can be applied to LDD structures where the junction depth of LDD is not identical to the heavily doped drain. The validity of our model has been proved by comparing our analytical results with two dimensional device simulations. Due to its simplicity, our model gives a better understanding of the mechanisms involved in reducing the electric field in the LDD MOSFET. The model shows clearly the dependencies of the lateral channel electric field on the drain and gate bias conditions and process, design parameters. Advantages of our analytical model over costly 2-D device simulations is to identify the effects of various parameters, such as oxide thickness, junction depth, gate/drain bias, the length and doping concentration of the lightly doped region, on the peak electric field that causes hot-electron pohenomena, individually. Our model can also find the optimum doping concentration of LDD which minimizes the peak electric field and hot-electron effects.

• 한국산업보건학회지
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• 제19권2호
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• pp.96-101
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• 2009

The purpose of this study was to conduct the field validation of alternative method(ETM method) by using non-carcinogenic, and less toxic solvents than NIOSH (National Institute for Occupational Safety and Health) analytical method 5524 for measuring the airborne metalworking fluids in workplaces. We carried out the field validation test by using the exposure chamber, guaranteeing the air sampling homogeneously in a machining environment. The ETM mixed solvent presented the complete solubility of MWFs used in test field. Based on the field test data, the bias of the ETM method from reference method, NIOSH analytical method 5524, was from -7.0% to 5.1%. The overall uncertainty of the ETM nethod was 21.6%, which satisfied the NIOSH criteria for the sampling and analytical criteria.

• 한국결정성장학회지
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• 제6권3호
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• pp.406-414
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• 1996

본 연구에서는 금속타겟을 이용한 반응성 스퍼터링법을 이용하여 PZT 박막 증착후 냉각시 산소분압에 따른 박막의 상형성 거동 및 전기적 특성에 미치는 영향을 고찰하였다. 냉각시 산소분압의 감소에 따라 박막 표면의 휘발에 기인하여 표면거칠기는 증가하였고 입성장은 거의 일어나지 않았다. 산소분압이 증가할수록 각형비가 보다 우수한 hysteresis 특성을 얻을 수 있었고 산소분압이 감소함에 따라 remanent polarization과 retained polarization이 감소하였으며, 항전계의 감소가 관찰되었다. 산소분압에 따른 유전율-전압 특성 측정에서 산소분입이 감소함에 따라 internal bias field의 증가가 관찰되었으며, 유전율도 조금씩 감소하였다. Field accelerated retention 시험결과 냉각시 산소분압이 감소함에 따라 nonswitched polarization의 증가가 관찰되었고 bias time이 증가함에 따라 nonswitched polarization이 감소하였다.

• 한국자기학회지
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• 제12권4호
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• pp.132-136
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• 2002

유리기관 위에 이온 빔 증착(ion beam deposition ; IBD)법으로 제작한 버퍼층(buffer layer) Si의 두께에 따른 ［NiFe/FeMn/NiFe］3층박막의 결정성과 교환결합세기(exchange bias field ; H$_{ex}$)를 조사하였다. 버퍼층 Si는 NiFe층을 fcc(111)로 매우 우세하게 초기에 결정성장 시켰다. Si/NiFe 위의 증착된 FeMn층은 ${\gamma}$-fcc(111)구조로 성장함에 따라 안정되고 큰 H$_{ex}$를 가졌고, 버퍼 110 Oe로 거의 일정하였으며, 상부 FeMn/NiFe 이중구조의 H$_{ex}$는 300 Oe까지 증가하였다. 버퍼층이 Ta일 경우와 비교해서 Si일 때 H$_{ex}$와 결정성이 향상되었다.이 향상되었다.

• Journal of Magnetics
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• 제6권1호
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• pp.36-41
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• 2001

A micromagnetic model and a single-domain model simulation programs were used to analyze the sensitivity of a $20\mu m\times 60\mu m \times 1000{\AA}$ permalloy strip as a magnetoresistance sensor with bias fields of various directions and magnitudes. The micromagnetic model agrees with the measured sensitivity data better than the single-domain model. The data show the highest peak sensitivity with the bias field at 90$^{\circ}$to the current. The peak sensitivity decreases and the peak broadens as the bias angle decreases. The simulation using the micromagnetic model shows that a bias angle smaller than 90$^{\circ}$eads to magnetization patterns which are free from closure domains or vertices over a wider range of bias fields.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2003년도 춘계학술대회 논문집 초전도 자성체 연구회
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• pp.101-104
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• 2003

The maximum coercive force of SmCo thin film was obtained at the Sm=28.2% and dc bias field was generated to CoZrNb, soft magnetic thin film, deposited on the SmCo thin film. DC field point having the maximum permeability for CoZrNb was shifted to higher dc field. DC field strength increased as the length of easy direction of magnetization decreased and 60Oe was measured for $3mm{\times}0.5mm$ sample.

• 한국세라믹학회지
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• 제39권2호
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• pp.171-177
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• 2002

본 연구에서는 DC bias가 인가된 유도결합형 플라즈마 열선 화학기상증착법을 이용하여 580$^{\circ}C$의 저온에서 탄소나노튜브를 수직 배향시켰다. 성장된 탄소나노튜브의 기판으로는 강화유리 위에 촉매층으로 Ni과 전도층으로 Cr을 300/200 ${\AA}$(Ni/Cr) 증착된 것으로 R-F magnetron sputtering을 이용하여 제작하였다. 성장 시 RF power와 DC bias power는 150W와 80W이며 텅스텐 필라멘트 power는 7∼8 A로 인가하였다. 성장된 탄소나노튜브는 속이 비어 있는 다중벽으로 이루어 졌으며 성장된 탄소나노튜브 끝단에는 금속 촉매로 보이는 Ni이 존재하는 것을 알 수 있었다. 탄소나노튜브는 흑연화도가 우수하며 그에 따라 탄소나노튜브의 전계 방출 특성도 우수하게 평가되었다. 성장된 탄소나노튜브의 구동 전압은 약 3 V/${\mu}m$이었다.

• Journal of Advanced Marine Engineering and Technology
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• 제32권8호
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• pp.1263-1268
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• 2008

In this paper, the low noise power amplifier for GaAs FET ATF-10136 is designed and fabricated with active bias circuit and self bias circuit. To supply most suitable voltage and current, active bias circuit is designed. Active biasing offers the advantage that variations in the pinch-off voltage($V_p$) and saturated drain current($I_{DSS}$) will not necessitate a change in either the source or drain resistor value for a given bias condition. The active bias network automatically sets a gate-source voltage($V_{gs}$) for the desired drain voltage and drain current. Using resistive decoupling circuits, a signal at low frequency is dissipated by a resistor. This design method increases the stability of the LNA, suitable for input stage matching and gate source bias. The LNA is fabricated on FR-4 substrate with active and self bias circuit, and integrated in aluminum housing. As a results, the characteristics of the active and self bias circuit LNA implemented more than 13 dB and 14 dB in gain, lower than 1 dB and 1.1 dB in noise figure, 1.7 and 1.8 input VSWR at normalized frequency $1.4{\sim}1.6$, respectively.