• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.213-213
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• 2012

It has been known that quantum confinement effect of CdSe nanocrystal was observed by increasing the number of deposition cycle using successive ionic layer adsorption and reaction (SILAR) method. Here, we report on thermally-induced quantum confinement effect of CdSe at the given cycle number using spin-coating technology. A cation precursor solution containing $0.3\;M\;Cd(NO_3)_2{\cdot}4H_2O$ is spun onto a $TiO_2$ nanoparticulate film, which is followed by spinning an anion precursor solution containing $0.3\;M\;Na_2\;SeSO_3$ to complete one cycle. The cycle is repeated up to 10 cycles, where the spin-coated $TiO_2$ film at each cycle is heated at temperature ranging from $100^{\circ}C$ to $250^{\circ}C$. The CdSe-sensitized $TiO_2$ nanostructured film is contacted with polysulfide redox electrolyte to construct photoelectrochemical solar cell. Photovoltaic performance is significantly dependent on the heat-treatment temperature. Incident photon-to-current conversion efficiency (IPCE) increases with increasing temperature, where the onset of the absorption increases from 600 nm for the $100^{\circ}C$- to 700 nm for the $150^{\circ}C$- and to 800 nm for the $200^{\circ}C$- and the $250^{\circ}C$-heat treatment. This is an indicative of quantum size effect. According to Tauc plot, the band gap energy decreases from 2.09 eV to 1.93 eV and to 1.76 eV as the temperature increases from $100^{\circ}C$ to $150^{\circ}C$ and to $200^{\circ}C$ (also $250^{\circ}C$), respectively. In addition, the size of CdSe increases gradually from 4.4 nm to 12.8 nm as the temperature increases from $100^{\circ}C$ to $250^{\circ}C$. From the differential thermogravimetric analysis, the increased size in CdSe by increasing the temperature at the same deposition condition is found to be attributed to the increase in energy for crystallization with $dH=240cal/^{\circ}C$. Due to the thermally induced quantum confinement effect, the conversion efficiency is substantially improved from 0.48% to 1.8% with increasing the heat-treatment temperature from $100^{\circ}C$ to $200^{\circ}C$.

• 한국재료학회지
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• 제22권5호
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• pp.259-273
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• 2012

Chalcogenide-based semiconductors, such as $CuInSe_2$, $CuGaSe_2$, Cu(In,Ga)$Se_2$ (CIGS), and CdTe have attracted considerable interest as efficient materials in thin film solar cells (TFSCs). Currently, CIGS and CdTe TFSCs have demonstrated the highest power conversion efficiency (PCE) of over 11% in module production. However, commercialized CIGS and CdTe TFSCs have some limitations due to the scarcity of In, Ga, and Te and the environmental issues associated with Cd and Se. Recently, kesterite CZTS, which is one of the In- and Ga- free absorber materials, has been attracted considerable attention as a new candidate for use as an absorber material in thin film solar cells. The CZTS-based absorber material has outstanding characteristics such as band gap energy of 1.0 eV to 1.5 eV, high absorption coefficient on the order of $10^4cm^{-1}$, and high theoretical conversion efficiency of 32.2% in thin film solar cells. Despite these promising characteristics, research into CZTS-based thin film solar cells is still incomprehensive and related reports are quite few compared to those for CIGS thin film solar cells, which show high efficiency of over 20%. The recent development of kesterite-based CZTS thin film solar cells is summarized in this work. The new challenges for enhanced performance in CZTS thin films are examined and prospective issues are addressed as well.

• 공업화학
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• 제28권5호
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• pp.547-553
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• 2017

본 연구는 $TiO_2$ 골격에 Pd을 삽입시켰을 때 나타나는 광 촉매 성능의 차이에 초점을 두고, $TiO_2$와 x mol% $Pd-TiO_2$(x = 0.25, 0.5, 0.75 그리고 1.0)의 5가지 촉매를 제안하였다. 전형적인 졸-겔 방법을 사용하여 촉매를 합성하고 각 촉매의 페놀 광 분해 성능을 평가하였다. XRD, TEM, SEM/EDS, UV/Vis 분광법, 광 발광 분광법 등을 이용하여 촉매의 물리화학적 특성을 확인하였고, 광 발광 분광법 및 광 전류 측정으로 광학적 특성을 확인하였다. Pd 이온을 첨가하면 촉매의 밴드 갭이 감소하고, 광 생성된 전자와 정공 사이의 전하 분리가 쉽게 발생한다. 결과적으로, 0.75 mol% $Pd-TiO_2$ 촉매상의 페놀 광 분해 성능은 순수한 $TiO_2$보다 3배 더 높았는데, 이는 광 촉매 반응 중에 Pd 이온이 전자캡쳐 역할을 하여 일어난 결과로 여겨진다.

• 한국재료학회지
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• 제18권6호
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• pp.339-346
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• 2008

Single-crystal $ZnIn_2S_4$ layers were grown on a thoroughly etched semi-insulating GaAs (100) substrate at $450^{\circ}C$ with a hot wall epitaxy (HWE) system by evaporating a $ZnIn_2S_4$ source at $610^{\circ}C$. The crystalline structures of the single-crystal thin films were investigated via the photoluminescence (PL) and Double-crystal X-ray rocking curve (DCRC). The temperature dependence of the energy band gap of the $ZnIn_2S_4$ obtained from the absorption spectra was well described by Varshni's relationship, $E_g(T)=2.9514\;eV-(7.24{\times}10^{-4}\;eV/K)T2/(T＋489K)$. After the as-grown $ZnIn_2S_4$ single-crystal thin films was annealed in Zn-, S-, and In-atmospheres, the origin-of-point defects of the $ZnIn_2S_4$ single-crystal thin films were investigated via the photoluminescence (PL) at 10 K. The native defects of $V_{Zn}$, $V_S$, $Zn_{int}$, and $S_{int}$ obtained from the PL measurements were classified as donor or acceptor types. Additionally, it was concluded that a heat treatment in an S-atmosphere converted $ZnIn_2S_4$ single crystal thin films into optical p-type films. Moreover, it was confirmed that In in $ZnIn_2S_4$/GaAs did not form a native defects, as In in $ZnIn_2S_4$ single-crystal thin films existed in the form of stable bonds.

• 한국재료학회:학술대회논문집
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• 한국재료학회 2012년도 춘계학술발표대회
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• pp.65-65
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• 2012

Copper zinc tin sulfide ($Cu_2ZnSnS_4$, CZTS) is a very promising material as a low cost absorber alternative to other chalcopyrite-type semiconductors based on Ga or In because of the abundant and economical elements. In addition, CZTS has a band-gap energy of 1.4~1.5eV and large absorption coefficient over ${\sim}10^4cm^{-1}$, which is similar to those of $Cu(In,Ga)Se_2$(CIGS) regarded as one of the most successful absorber materials for high efficient solar cell. Most previous works on the fabrication of CZTS thin films were based on the vacuum deposition such as thermal evaporation and RF magnetron sputtering. Although the vacuum deposition has been widely adopted, it is quite expensive and complicated. In this regard, the solution processes such as sol-gel method, nanocrystal dispersion and hybrid slurry method have been developed for easy and cost-effective fabrication of CZTS film. Among these methods, the hybrid slurry method is favorable to make high crystalline and dense absorber layer. However, this method has the demerit using the toxic and explosive hydrazine solvent, which has severe limitation for common use. With these considerations, it is highly desirable to develop a robust, easily scalable and relatively safe solution-based process for the fabrication of a high quality CZTS absorber layer. Here, we demonstrate the fabrication of a high quality CZTS absorber layer with a thickness of 1.5~2.0 ${\mu}m$ and micrometer-scaled grains using two different non-vacuum approaches. The first solution-processing approach includes air-stable non-toxic solvent-based inks in which the commercially available precursor nanoparticles are dispersed in ethanol. Our readily achievable air-stable precursor ink, without the involvement of complex particle synthesis, high toxic solvents, or organic additives, facilitates a convenient method to fabricate a high quality CZTS absorber layer with uniform surface composition and across the film depth when annealed at $530^{\circ}C$. The conversion efficiency and fill factor for the non-toxic ink based solar cells are 5.14% and 52.8%, respectively. The other method is based on the nanocrystal dispersions that are a key ingredient in the deposition of thermally annealed absorber layers. We report a facile synthetic method to produce phase-pure CZTS nanocrystals capped with less toxic and more easily removable ligands. The resulting CZTS nanoparticle dispersion enables us to fabricate uniform, crack-free absorber layer onto Mo-coated soda-lime glass at $500^{\circ}C$, which exhibits a robust and reproducible photovoltaic response. Our simple and less-toxic approach for the fabrication of CZTS layer, reported here, will be the first step in realizing the low-cost solution-processed CZTS solar cell with high efficiency.

• 태양에너지
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• 제12권3호
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• pp.10-20
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• 1992

본 실험에서는 산업폐수, 가정폐수, 지하수 등에 오염되는 유독성 유기물 처리를 위한 태양반응시스템의 개발을 목적으로 batch형 광분해 반응시스템을 구성하여 수처리 분해 실험을 실시하였다. 실험실 규모의 batch형 반응기를 구성하여 수질 개선용 광화학 반응 활용의 기술적 타당성을 확보하고자 하였으며 다음과 같은 결론을 얻을수 있었다. (1) $TiO_2$ anatase, $TiO_2$ rutile 그리고 $V_2O_5$를 대상으로 광촉매 선정을 위한 실험결과, 본 실험조건에서는 band gap energy가 약 3.2 eV인 $TiO_2$ anatase가 유해 유기물 TCE의 가장 높은 분해율을 나타내었다. $TiO_2$ anatase의 결정구조는 XRD 관찰에 의하여 확인할 수 있었으며, BET-$N_2$ 측정결과 단위무게당 표면적은 약 7.748 $m^2/g$ 이었다. (2) $TiO_2$ anatase의 투입량이 많을수록 TCE분해율도 증가하였다. 그러나 투입량이 0.1 wt% 이상이 될 경우 분해율의 증진은 아주 미미하여서 0.1 wt%의 $TiO_2$ anatase 양을 slurry batch 형 시스템 실험에 최선으로 채택하였다. (3) $H_2O_2$의 양이 TCE 분해율에 미치는 영향을 조사한 결과 적정량은 약 0.06 volume%임을 알 수 있었다. 이는 적정량의 $H_2O_2$는 OH radical의 형성을 촉진시키지만 과량의 존재시에는 오히려 OH radical과 반응하여 이를 소모하는 역효과를 나타내기 때문이다. (4) 광반응기의 head space를 변화시키면서 산소양의 TCE 분해율에 미치는 영향을 관찰한 결과 TCE 분해반응식의 이론적 stoichiometry로나 실험적으로나 산소양이 아주 중요한 변수임을 알수 있었다.

• 한국전자파학회논문지
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• 제27권12호
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• pp.1059-1068
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• 2016

본 논문에서는 프린트 다이폴의 지향성 증가와 동시에 부엽 레벨을 억제하는 기능을 가진 저속파 구조를 제안하고 구성 설계변수의 변화에 따른 전기적 특성의 변화를 알아보고자 한다. 유전체 기판과 도체 막대의 배열로 구성된 프린트 형태의 저속파 구조는 프린트 다이폴 안테나의 여기 방향에 위치하며 안테나의 방사 패턴 및 세기에 영향을 미친다. 이 도체 막대로 된 기생소자는 좁은 간격을 가지고 일정하게 배열되며 소자의 길이는 점차 줄어드는 형상을 가진다. 따라서 본 연구에서는 저속파 구조에서 방사 성능에 영향을 줄 수 있는 변수로 기생소자 배열 간격, 소자 길이, 소자 길이의 테이퍼 각도가 고려되며, 변수들의 변화에 따른 전기장 세기 및 위상 분포가 관찰 및 분석된다. 이를 기반으로 방사패턴이 분석이 되며, 고지향성 특성을 위한 저속파 구조의 기생소자 배열 방안이 제공된다. 제안된 안테나는 Wifi 대역(5.15~5.85 GHz)에서 동작하도록 설계되며, 안테나의 이득을 극대화하고 부엽을 억제하도록 저속파 기생소자의 설계변수가 최적화된다. 제작된 안테나의 시뮬레이션 및 측정 결과 넓은 대역폭 특성을 나타내며, 높은 효율과 이득, 낮은 부엽 레벨을 갖는 것을 확인할 수 있다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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• pp.241-241
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• 2008

Macrofore formation in silicon and other semiconductors using electrochemical etching processes has been, in the last years, a subject of great attention of both theory and practice. Its first reason of concern is new areas of macropore silicone applications arising from microelectromechanical systems processing (MEMS), membrane techniques, solar cells, sensors, photonic crystals, and new technologies like a silicon-on-nothing (SON) technology. Its formation mechanism with a rich variety of controllable microstructures and their many potential applications have been studied extensively recently. Porous silicon is formed by anodic etching of crystalline silicon in hydrofluoric acid. During the etching process holes are required to enable the dissolution of the silicon anode. For p-type silicon, holes are the majority charge carriers, therefore porous silicon can be formed under the action of a positive bias on the silicon anode. For n-type silicon, holes to dissolve silicon is supplied by illuminating n-type silicon with above-band-gap light which allows sufficient generation of holes. To make a desired three-dimensional nano- or micro-structures, pre-structuring the masked surface in KOH solution to form a periodic array of etch pits before electrochemical etching. Due to enhanced electric field, the holes are efficiently collected at the pore tips for etching. The depletion of holes in the space charge region prevents silicon dissolution at the sidewalls, enabling anisotropic etching for the trenches. This is correct theoretical explanation for n-type Si etching. However, there are a few experimental repors in p-type silicon, while a number of theoretical models have been worked out to explain experimental dependence observed. To perform ordered macrofore formaion for p-type silicon, various kinds of mask patterns to make initial KOH etch pits were used. In order to understand the roles played by the kinds of etching solution in the formation of pillar arrays, we have undertaken a systematic study of the solvent effects in mixtures of HF, N-dimethylformamide (DMF), iso-propanol, and mixtures of HF with water on the macrofore structure formation on monocrystalline p-type silicon with a resistivity varying between 10 ~ 0.01 $\Omega$ cm. The etching solution including the iso-propanol produced a best three dimensional pillar structures. The experimental results are discussed on the base of Lehmann's comprehensive model based on SCR width.

• 대한전자공학회논문지SD
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• 제47권2호
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• pp.15-20
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• 2010

본 연구에서는 RF magnetron sputtering법으로 기판온도 $200^{\circ}C$에서 공정 압력 (5~20 mTorr)과 산소 가스비 (0~3%)를 변화시켜가며 PES 플라스틱 기판 위에 AZO (Al:3wt%) 박막을 제작하여 광학적 및 전기적 특성을 조사하였다. XRD 측정을 통해 공정 조건에 관계없이 모든 AZO박막이 c 축으로 우선 성장함을 확인할 수 있었다. 박막의 표면을 AFM 으로 조사한 결과, 표면 거칠기 값은 공정압력 5 mTorr, 산소 가스비 3%에서 제작한 박막에서 가장 낮은 값 (3.49 nm) 을 나타내었다. 모든 AZO 박막이 가시광 영역에서 80% 정도의 투과율을 보였으며, 공정 압력과 산소 가스비가 감소할수록 에너지 밴드갭이 증가하는 Burstein-Moss 효과를 관찰할 수 있었다. Hall 측정 결과, 공정 압력 5 mTorr와 산소 가스비 0%에서 제작한 AZO 박막에서 가장 높은 캐리어 농도 $2.63\;{\times}\;10^{20}\;cm^{-3}$ 값과 가장 낮은 비저항 $4.35\;{\times}\;10^{-3}\;{\Omega}cm$ 값을 나타내었다.

• 전기전자학회논문지
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• 제19권4호
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• pp.491-499
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• 2015

Silicon Carbide(SiC)는 높은 열전도도와 넓은 밴드갭 에너지로 인해 고온과 고전압 소자로 사용하는데 큰 장점을 가지고 있는 물질이다. SiC를 이용하여 전력반도체소자를 제작할 경우, 소자가 목표 전압을 충분히 견딜 수 있도록 Edge Termination 기법을 적용하여야한다. Edge Termination 기법에는 여러 가지 방안이 제안되어왔는데, SiC 소자에 가장 적합한 기법은 Junction Termination Extension (JTE)이다. 본 논문에서는 각 JTE 구조별 도핑 농도와 Passivation Oxide Charge 변화에 따른 항복전압의 변화를 살펴보았다. 결과적으로 Single Zone JTE (SZ-JTE)는 1D 시뮬레이션 값의 98.24%, Double Zone JTE (DZ-JTE)는 99.02%, Multiple-Floating-Zone JTE (MFZ-JTE)는 98.98%, Space-Modulated JTE (SM-JTE)는 99.22%의 최대 항복전압을 나타내었고, JTE 도핑 농도 변화에 따른 최대 항복전압의 민감도는 MFZ-JTE가 가장 낮은 반면 SZ-JTE가 가장 높았다. 또한 Passivation Oxide 층의 전하로 인해 소자의 항복전압의 변화를 살펴보았는데, 이에 대한 민감도 역시 MFZ-JTE가 가장 낮았으며 SZ-JTE가 가장 높았다. 결과적으로 본 논문에서는, 짧은 JTE 길이에서 높은 도핑 농도를 필요로 하는 MFZ-JTE보다 DZ-JTE와 SM-JTE가 실제 소자 설계에 있어 가장 효과적인 JTE 기법으로 분석되었다.