• Title/Summary/Keyword: available Si

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CharacteristicProperties of Low-k Thin Film Deposited by Sputtering (스퍼터링에 의한 Low-k 박막의 특성)

  • Oh, Teresa
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.13 no.7
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    • pp.3160-3164
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    • 2012
  • To obtain available process at low temperature, SiOC thin film was prepared with various flow rates by using the rf magnetron sputtering, and AZO thin film was also deposited on SiOC film by rf magnetron sputtering system. The optical electrical properties of the SiOC film and SiOC/AZO were analyzed by the uv visible spectrometer and PL spectra. SiOC film on n type Si showed various type emission according to the deposition condition. The SiOC film showed the blue shift with increasing the thickness in PL spectra. AZO/SiOC/Si film had a broad emission characteristic, which is enhanced the efficiency in solar cell.

Fabrication of SiC-TiC Composites via Mechanochemical Synthesis

  • Park, Heon-Jin;Lee, Ki-Min;Kim, Hyung-Jong;Lee, June-Gunn
    • Journal of the Korean Ceramic Society
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    • v.38 no.4
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    • pp.314-318
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    • 2001
  • SiC-TiC composites have been fabricated by using a mechanochemical processing of a mixture of Si, Ti, and C at room temperature and subsequent hot pressing. TiC powders have been obtained by the mechanochemical processing of a mixture of Ti and C whereas SiC powders has not been obtained from a mixture of Si and C. By using the exothermic reaction between Ti and C, SiC-TiC powder could be obtained from the mixture of Si, Ti, and C using the mechanochemical processing for more than 12h. The X-ray diffraction analysis has shown that the powder subjected to the mechanochemical processing consisted of the particles having crystallite size below 10nm. Fully densified SiC-TiC composites have been obtained by hot-pressing of the powder at 1850$\^{C}$ for 3h and it has shown comparable mechanical properties to those of the SiC-TiC composites prepared from the commercially available SiC and TiC powders. Flexural strength of 560 MPa and fracture toughness of 4.8 MP$.$am$\_$1/2/ have been shown for the SiC-TiC composites with composition corresponding to 0.75:0.25:1 mole ratio of Si:Ti:C.

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siMacro: A Fast and Easy Data Processing Tool for Cell-Based Genomewide siRNA Screens

  • Singh, Nitin Kumar;Seo, Bo Yeun;Vidyasagar, Mathukumalli;White, Michael A.;Kim, Hyun Seok
    • Genomics & Informatics
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    • v.11 no.1
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    • pp.55-57
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    • 2013
  • Growing numbers of studies employ cell line-based systematic short interfering RNA (siRNA) screens to study gene functions and to identify drug targets. As multiple sources of variations that are unique to siRNA screens exist, there is a growing demand for a computational tool that generates normalized values and standardized scores. However, only a few tools have been available so far with limited usability. Here, we present siMacro, a fast and easy-to-use Microsoft Office Excel-based tool with a graphic user interface, designed to process single-condition or two-condition synthetic screen datasets. siMacro normalizes position and batch effects, censors outlier samples, and calculates Z-scores and robust Z-scores, with a spreadsheet output of >120,000 samples in under 1 minute.

Characterization of $Si_{1-x}Ge_x$ alloy by Spectroscopic ellisometry ($Si_{1-x}Ge_x$ 박막의 Spectroscopic ellisometry 분석)

  • Eo, Yoon-Pil;Hwang, Seok-Hee;Tae, Heung-Sik;Whang, Ki-Woong
    • Proceedings of the KIEE Conference
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    • 1994.11a
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    • pp.240-242
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    • 1994
  • Spectroscopic ellipsometry(SE) was employed to characterize the Si/$Si_{1-x}Ge_x$ heterostructure. The dielectric function spectrum of $Si_{1-x}Ge_x$ at an arbitrary x value in the spectral range of $1.5{\sim}4.5\;eV$ was computed by EMA (effective medium approximation) model using the available optical constants measured at a number of fixed x values of Ge composition. The thickness and the Ge composition of $Si_{1-x}Ge_x$ measured by SE was compared with those measured by RBS. DC bias effect on the $E_2$ peak of dielectric function spectra was studied.

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A Study on Stabilized CdS-CdSe Red Stain part III, Application of $ZrSiO_4-Cd(SxSe_{1-x})$ Stain to Ceramic Body (안정화 CdS-CdSe계 채료에 관한 연구 제3보 $ZrSiO_4-Cd(SxSe_{1-x})$채료의 응용연구)

  • 이종근;김종옥
    • Journal of the Korean Ceramic Society
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    • v.24 no.2
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    • pp.155-160
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    • 1987
  • The investigation includes the application of $ZrSiO_4-Cd(SxSe_{1-x})$stain to ceramic body. The currently developed stain was compared to the commercially available stain in applying to ceremic glaze. Two stains (currently developed and commecially available) were mixed with frits and applied to ceramic tiles. The tiles were fired at 850 to 120$0^{\circ}C$ and tested by colorimeter in X.Y.Z. axis of the wavelength ranging from 580nm to 650nm. Applicability 18 stains to ceramic body was investigated by ISCC-NBS of Munsell color nomenclature. $ZrSiO_4-Cd(SxSe_{1-x})$stain is as good as V and Pr series stain in mixing composition of frits 9 to 1. It maintains red color at 100$0^{\circ}C$ in the mixture of frits, and shows as the strong acid resistance stain.

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Multilevel acceleration of scattering-source iterations with application to electron transport

  • Drumm, Clif;Fan, Wesley
    • Nuclear Engineering and Technology
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    • v.49 no.6
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    • pp.1114-1124
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    • 2017
  • Acceleration/preconditioning strategies available in the SCEPTRE radiation transport code are described. A flexible transport synthetic acceleration (TSA) algorithm that uses a low-order discrete-ordinates ($S_N$) or spherical-harmonics ($P_N$) solve to accelerate convergence of a high-order $S_N$ source-iteration (SI) solve is described. Convergence of the low-order solves can be further accelerated by applying off-the-shelf incomplete-factorization or algebraic-multigrid methods. Also available is an algorithm that uses a generalized minimum residual (GMRES) iterative method rather than SI for convergence, using a parallel sweep-based solver to build up a Krylov subspace. TSA has been applied as a preconditioner to accelerate the convergence of the GMRES iterations. The methods are applied to several problems involving electron transport and problems with artificial cross sections with large scattering ratios. These methods were compared and evaluated by considering material discontinuities and scattering anisotropy. Observed accelerations obtained are highly problem dependent, but speedup factors around 10 have been observed in typical applications.

Surface Passivation Schemes for High-Efficiency c-Si Solar Cells - A Review

  • Balaji, Nagarajan;Hussain, Shahzada Qamar;Park, Cheolmin;Raja, Jayapal;Yi, Junsin;Jeyakumar, R.
    • Transactions on Electrical and Electronic Materials
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    • v.16 no.5
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    • pp.227-233
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    • 2015
  • To reduce the cost of solar electricity, the crystalline-silicon (c-Si) photovoltaic industry is moving toward the use of thinner wafers (100 μm to 200 μm) to achieve a high efficiency. In this field, it is imperative to achieve an effective passivation method to reduce the electronic losses at the c-Si interface. In this article, we review the most promising surface passivation schemes that are available for high-efficiency solar cells.

GaN E-HEMT for the next era of power conversion

  • Bailley, Charles
    • Proceedings of the KIPE Conference
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    • 2017.07a
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    • pp.564-576
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    • 2017
  • ${\cdot}$ GaN E-HEMT provides superior performance vs. Si MOSFET or IGBT, and also superior performance vs. SiC, below ~1200V ${\cdot}$ GaN E-HEMT is replacing Si MOSFET and IGBT in major application segments, and Industry Adoption will accelerate ${\cdot}$ Technology advances in GaN E-HEMT have made high-current true Normally-Off devices available in current ranges from 7A to 250A ${\cdot}$ While GaN has improved Properties vs. SiC or Si, different types of GaN devices offer different levels of performance or robustness ${\cdot}$ JEDEC Industrial-Grade Qualification of GaN E-HEMTs has been achieved, and Automotive Qualification is in progress.

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UV pumped three color phosphor blend White emitting LEDs

  • Choi, Kyoung-Jae;Park, Joung-Kyu;Kim, Kyung-Nam;Kim, Chang-Hae;Kim, Ho-Kun
    • 한국정보디스플레이학회:학술대회논문집
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    • 2005.07b
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    • pp.1338-1342
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    • 2005
  • We have synthesized an $Eu^{2+}$-activated $Sr_3MgSi_2O_8$ blue phosphor and $Ba_2SiO_4$ green phosphor and $Ba^{2+}$ co-doped $Sr_3SiO_5$ red phosphor investigated an attempt to develop white LEDs by combining it with a GaN blue LED $chip(\lambda_{em}=405 nm)$. Three distinct emission bands from the GaN-based LED and the $(Sr_3MgSi_2O_8:Eu\; +\; Ba_2SiO_4:Eu\; +\; Ba^{2+}\; co-doped\; Sr_3SiO_5:Eu)$ phosphor are clearly observed at 460nm, 520 nm and at around 600 nm, respectively. These three emission bands combine to give a spectrum that appears white to the naked eye. Our results show that GaN (405 nm chip)-based $(Sr_3MgSi_2O_8:Eu\; +\; Ba_2SiO_4:Eu\; +\; Ba^{2+}\; co-doped\; Sr_3SiO_5:Eu) exhibits a better luminous efficiency than that of the industrially available product InGaN (460 nm chip)-based YAG:Ce.

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Initial Reaction of Zn Precursors with Si (001) Surface for ZnO Thin-Film Growth (ZnO 박막 성장을 위한 Zn 전구체와 Si (001) 표면과의 초기 반응)

  • Kim, Dae-Hee;Lee, Ga-Won;Kim, Yeong-Cheol
    • Korean Journal of Materials Research
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    • v.20 no.9
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    • pp.463-466
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    • 2010
  • We studied the initial reaction mechanism of Zn precursors, namely, di-methylzinc ($Zn(CH_3)_2$, DMZ) and diethylzinc ($Zn(C_2H_5)_2$, DEZ), for zinc oxide thin-film growth on a Si (001) surface using density functional theory. We calculated the migration and reaction energy barriers for DMZ and DEZ on a fully hydroxylized Si (001) surface. The Zn atom of DMZ or DEZ was adsorbed on an O atom of a hydroxyl (-OH) due to the lone pair electrons of the O atom on the Si (001) surface. The adsorbed DMZ or DEZ migrated to all available surface sites, and rotated on the O atom with low energy barriers in the range of 0.00-0.13 eV. We considered the DMZ or DEZ reaction at all available surface sites. The rotated and migrated DMZs reacted with the nearest -OH to produce a uni-methylzinc ($-ZnCH_3$, UMZ) group and methane ($CH_4$) with energy barriers in the range of 0.53-0.78 eV. In the case of the DEZs, smaller energy barriers in the range of 0.21-0.35 eV were needed for its reaction to produce a uni-ethylzinc ($-ZnC_2H_5$, UEZ) group and ethane ($C_2H_6$). Therefore, DEZ is preferred to DMZ due to its lower energy barrier for the surface reaction.