• 한국광학회지
• /
• 제7권2호
• /
• pp.167-173
• /
• 1996

본 논문에서 STN LCD의 구동전압에 따른 응답특성을 조사하였다. 네 가지 STN 액정 셀로써 여러 인가전압에 대한 스위칭 시간을 측정하였다. 또한 해석식으로 설명이 안되는 바이어스 전압의 스위칭 시간에 대한 영향을 실험을 통해 알아보았다. 그리고 수치해석적 방법으로 수한 계산결과와 비교하므로써, 계산결과가 바이어스 전압에 따른 실험결과와 비교적 잘 일치함을 알 수 있었다.

• 조명전기설비학회논문지
• /
• 제28권9호
• /
• pp.45-51
• /
• 2014

This work carried out for the effective synthesis characteristics of graphene nanowall film by controlling the electric field in a RF plasma CVD process. For that, the bipolar bias voltage was applied to the substrate such as Si and glass materials for the best chemical reaction of positive and negative charges existing in the plasma. For supplying the seed formation sites on substrate and removing the oxidation layer on the substrate surface, the electron bombardment into substrates was performed by a positive few voltage in hydrogen plasma. After that, hydrocarbon film, which is not a graphene nanowall, was deposited on substrates under a negative bias voltage with hydrogen and methane gases. At this step, the film on substrates could not easily identify due to its transparent characteristics. However, the transparent film was easily changed into graphene nanowall by the final hydrogen plasma treatment process. The resultant raman spectra shows the existence of significant large 2D peaks corresponding to the graphene.

• 한국정보디스플레이학회:학술대회논문집
• /
• 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
• /
• pp.728-731
• /
• 2009

A negative waveform having inverted polarity of conventional waveform during reset and sustain periods was proposed to improve the driving characteristics. In order to control the negative wall-charge distribution, a positive bias on the scan electrode was applied during reset period. Compared to 0 V scan-bias condition, at 8 V scan-bias the formative time lag was improved about 23.95 % and the average time lag was improved about 14.91 %. All experiments were performed with the 42-inch PDP module in XGA resolution.

• 한국전기전자재료학회논문지
• /
• 제25권6호
• /
• pp.409-413
• /
• 2012

In this study, a substrate-bias assisted 2-step pulse programming method is proposed for realizing 4-bit/1-cell operation of the SONOS memory. The programming voltage and time are considerably reduced by this programming method than a gate-bias assisted 2-step pulse programming method and CHEI method. It is confirmed that the difference of 4-states in the threshold voltage is maintained to more than 0.5 V at least for 10-year for the multi-level characteristics.

• 공업화학
• /
• 제17권3호
• /
• pp.327-330
• /
• 2006

Si nanodot 배열을 형성하기 위하여 $NbO_{x}$ nanopillar를 건식식각 공정의 식각마스크로써 이용하기 위한 가능성이 조사되었다. $NbO_{x}$ nanopillar는 Al과 Nb의 양극산화 공정을 이용하여 준비되었다. $NbO_{x}$ nanopillar의 식각속도와 식각프로파일은 고밀도 플라즈마를 이용한 반응성 이온 식각법에 의해서 식각가스의 농도와 coil rf power, 그리고 dc bias voltage를 각각 변화시키면서 조사 되었다. $Cl_{2}$ 가스의 농도가 증가할수록 $NbO_{x}$ nanopillar의 식각속도는 감소하였고 coil rf power와 dc bias voltage의 증가는 식각속도의 상승을 초래했다. 선택된 식각조건에서 식각시간을 변화하여 $NbO_{x}$ nanopillar의 식각특성 및 식각메커니즘이 조사되었다.

• 한국자기학회지
• /
• 제8권5호
• /
• pp.288-294
• /
• 1998

기판/Ta/NiFe/Cu/NiFe/FeMn/Ta 스핀밸브에서 Ta 성막 후에 자유층 NiFe 스퍼터 증착시 가해진 기판 바이어스 전압에 의해 야기된 Ta/NiFe 계면에서의 원자섞임이 자기저항에 미치는 영향에 대해 조사하였다. 최대 자기 저항비 (MR ratio)를 나타내는 자유층의 적정두께는 바이어스 전압이 증가함에 따라 증가하였다. 이러한 현상의 원인은 바이러스 전압이 증가함에 따라 Ta과 NiFe의 원자섞임으로 계면에 있는 NiFe층 일부가 약한 강자성 또는 상자성화되어 스핀 비의존 산란을 하는 원자섞임층의 두께가 증가하였기 때문이다. 원자섞임층의 존재는 전기저항 변화와 자화량 변화로부터 증명하였다. 또 본 실험에서 비록 NiFe 증착시 기판 바이어스 전압이 변화더라도 최대 자기저항비를 갖는 최적 "유효" 자유층 두께는 기판 바이어스 전압에 무관하게 일정하였다.관하게 일정하였다.

• 한국진공학회지
• /
• 제22권4호
• /
• pp.193-197
• /
• 2013

본 연구에서는 sol-gel법을 이용해 제작된 $VO_2$ 박막의 광전변환 특성을 연구하기 위해 광 조사 유무에 의해 생성되는 전류를 bias voltage에 따라 온도별로 측정하였다. 그 결과, 광 조사 유무에 따라 박막에서 생성되는 전류가 변화되는 것을 알 수 있었으며, bias voltage가 증가할수록 전류가 일정하게 늘어나는 것을 알 수 있었다. 특히, 광에 의해 생성되는 전류는 $VO_2$에서의 MIT 온도보다 낮은 $50^{\circ}C$에서 최대였다. 이러한 결과는 $VO_2$에서 photo-voltaic 효과가 발생함을 의미하며, 따라서 $VO_2$ 박막을 광전변환 소자로 응용할 수 있을 것으로 기대된다.

• 한국재료학회지
• /
• 제12권6호
• /
• pp.431-435
• /
• 2002

The dark current and photocurrent(PC) spectrum of Mg-doped GaN thin film were investigated with various bias voltages and temperatures. At high temperature and small bias, the dark current is dominated by holes thermally activated from an acceptor level Al located at about 0.16 eV above the valence band maximum $(E_v)$, The PC peak originates from the electron transition from deep level A2 located at about 0.34 eV above the $E_v$ to the conduction band minimum $(E_ C)$. However, at a large bias voltage, holes thermally activated from A2 to Al experience the field-in-duces tunneling to form one-dimensional defect band at Al, which determines the dark current. The PC peak associated with the transition from Al to $E_ C$ is also observed at large bias voltages owing to the extended recombination lifetime of holes by the tunneling. In the near infrared region, a strong PC peak at 1.20 eV appears due to the hole transition from deep donor/acceptor level to the valence band.

• 조명전기설비학회논문지
• /
• 제29권4호
• /
• pp.11-17
• /
• 2015

While most switching devices are based on PN junctions, a single layer can realize a switching device in the case of vanadium dioxide($VO_2$) thin films. In this paper, bidirectional current triggering(switching) is demonstrated in a two-terminal planar device based on a $VO_2$ thin film by illuminating the film with an infrared laser at 1550nm. To begin with, a two-terminal planar device, which had a $30{\mu}m$-wide $VO_2$ conducting layer and an electrode separation of $10{\mu}m$, was fabricated. A specific bias voltage range for stable bidirectional laser triggering was experimentally obtained by measuring the current-voltage characteristics of the fabricated device in a current-controlled mode. Then, by constructing a test circuit composed of the device, a standard resistor, and a DC voltage source, connected in series, the transient response of laser-triggered current and its response time were investigated with a DC bias voltage, included in the above specific bias voltage range, applied to the device. In the test circuit with a DC voltage source of 3.35V and a $10{\Omega}$ resistor, bidirectional laser triggering could be realized with a maximum on-state current of 15mA and a switching contrast of ~78.95.

• Transactions on Electrical and Electronic Materials
• /
• 제14권4호
• /
• pp.177-181
• /
• 2013

In this paper, silicon solar cells are analyzed regarding power conversion efficiency by changed capacitance in the depletion region. For the capacitance control in the depletion region of silicon solar cell was applied for 10, 20, 40, 80, 160 and 320 Hz frequency band character and alternating current(AC) voltage with square wave of 0.2~1.4 V. Academically, symmetry formation of positive and negative change of the p-n junction is similar to the physical effect of capacitance. According to the experiment result, because input of square wave with alternating current(AC) voltage could be observed to changed capacitance effect by indirectly method through non-linear power conversion (Voltage-Current) output. In addition, when input alternating current(AC) voltage in the silicon solar cell, changed capacitance of depletion region with the forward bias condition and reverse bias condition gave a direct effect to the charge mobility.