• Transactions on Electrical and Electronic Materials
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• v.3 no.2
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• pp.10-15
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• 2002

In this paper, the electrical characteristics of fabricated p+-n junction diode are demonstrated and interpreted with different theoretical calculations. Dopants distribution by boron ion implantation on silicon wafer were simulated with TRIM-code and ICECaEM simulator. In order to make electrical activation of implanted carriers, thermal annealing treatments are carried out by RTP method for 1min. at $1000^{circ}C$ under inert $N_2$ gas condition. In this case, profiles of dopants distribution before and after heat treatments in the substrate are observed from computer simulations. In the I-V characteristics of fabricated diodes, an analytical description method of a new triangular junction model is demonstrated and the results with calculated triangular junction are compared with measured data and theoretical calculated results of abrupt junction. Forward voltage drop with new triangular junction model is lower than the case of abrupt junction model. In the C-V characteristics of diode, the calculated data are compared with the measured data. Another I-V characteristics of diodes are measured after proton implantation in electrical isolation method instead of conventional etching method. From the measured data, the turn-on characteristics after proton implantation is more improved than before proton implantation. Also the C-V characteristics of diode are compared with the measured data before proton implantation. From the results of measured data, reasonable deviations are showed. But the C-V characteristics of diode after proton implantation are deviated greatly from the calculated data because of leakage currents in defect regions and layer shift of depletion by proton implantation.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.152-152
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• 2011

Silicon 기반의 환경에서 연구 및 제조되는 전자소자는 반도체의 기술이 발전함에 따라 chip 선폭의 크기가 30 nm에서 20 nm, 그리고 그 이하의 크기로 점점 더 작아지는 요구에 직면하고 있다. 탄소나노 구조와 나노와이어 기술이 Silicon을 대신할 다음세대 기술로 주목받고 있다. 많은 연구결과들 중에서 III-V CMOS가 가장 빠른 접근 방법이라 예상한다. III-V족 물질을 이용하면 electron 보다 수십 배 이상의 이동도를 얻을 수 있으나 p-type의 구조를 구현하는 것이 해결해야 할 문제이다. p-type 3-5 족 화합물을 이용하여 에너지 밴드 갭의 변화를 가능하게 한다면 hole의 이동도를 크게 향상시킬 수 있어 silicon 기반의 p-type 소자보다 2~3배 더 빠른 소자의 구현이 가능하다. 3-5족 화합물 반도체의 성장 기술이 많이 진보되어 이를 이용하여 고속 소자를 구현한다면 시기적으로 더욱 빨리 다가올 것이라 예측한다. 에너지 밴드갭의 변화와 격자 부정합을 고려하여 SI InP 기판에 GaSb 물질을 채널로 사용한 p-type 2-dimensional hole gas (2DHG) 소자를 구현하였다. 관찰된 소자 구조의 박막 상태의 특징을 보이며 10 um ${\times}$ 10 um AFM 측정결과 1 nm 이하의 표면 거칠기를 가지며 상온에서의 hole 이동도는 약 650 cm2/Vs이고 sheet carrier density는 $5{\times}1012$ /cm2의 결과를 확인하였다. 실험결과 InP 기판위에 채널로 사용된 GaSb 박막을 올리는데 있어 가장 중요한 것은 Phosphorus, Arsenic, 그리고 Antimony 물질의 양과 이들의 변화시간의 조절이다. 본 발표에서 Semi-insulating InP 기판위에 electron이 아닌 hole을 반송자로 이용한 차세대 고속 전자소자를 구현하고자 하여 MBE (Molecular Beam Epitaxy)로 p-type 소자를 구현하여 실험하였다. 아울러 더욱 빠른 소자의 구현을 위하여 세계의 유수 그룹들의 연구 결과들과 앞으로 예상되는 고속 소자에 대해서 비교와 함께 많은 기술에 대해 논의하고자 한다.

• Economic and Environmental Geology
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• v.24 no.2
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• pp.151-165
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• 1991

The Au-Ag deposits of the Euiseong area occurred in quartz veins which filled fissures in Cretaceous sedimentary and volcanic rocks. These ore veins can be classified in two types of deposits based on metallic mineral assemblages as follow: a pyrite type gold-silver deposit (Hoedong mine), characterized by Cu sulfides with Au-Ag alloy, and a Sb-rich silver deposit (Keumdongdo mine), characterized by base metal with Ag-bearing sulfosalts. Mineralogic and fluid inclusion evidences suggest that the ore minerals of these deposits was deposited from initial high temperatures (near $350^{\circ}C$) to later lower temperatures ($200^{\circ}C$) with moderate salinity fluids ranging from 5.8 to 3.8 eq. wt. % NaCl. The gold-silver mineralization of the Hoedong mine occurred at temperatures between 300 and $200^{\circ}C$ from fluids with log $f_{s_2}$ of -10 ~ -16 atm. The antimony - silver mineralization of the Keumdongdo mine were deposited at the higher temperatures (350 to $250^{\circ}C$) and $f_{S_2}$ (-10 ~ -13 atm) than gold mineralization of the Hoedong mine. The calculated log f02 of fluids at $250^{\circ}C$ in two deposits are -32 to -34 atm and -36.5 to -38.5 atm, respectively. Boiling evidences indicate that the ore mineralization of the Hoedong mine occurred at more shallow depth (0.5km) than that (1km) of the Keumdongdo mine. The above differences of depositional environments between two deposits caused the compositional changes of ore minerals such as electrum and sphalerite.

• Journal of the Korean Ceramic Society
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• v.32 no.12
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• pp.1323-1330
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• 1995

The effects of various additives on the microstructures of sintered ZnO varistors were examined. Bi2O3, Sb2O3 and Cr2O3 were added to ZnO step by step to identify the effect of each component. The specimens were prepared by sintering at 110$0^{\circ}C$ and 120$0^{\circ}C$ in ambient atmosphere. In ZnO-Bi2O3-Sb2O3 ternary system, decrease of averge grain size due to antimony oxide addition depends on sintering temperature as well as Bi2O3 content. When Sb2O3 was partly or completely replaced by Cr2O3, grain size was further reduced. A significant amount of pyrochlore phase which was not transformed to spinel and Bi2O3-rich liquid phase seemed to remain during sintering at 110$0^{\circ}C$. Unlike ZnO-Bi2O3-Sb2O3 system, the $\alpha$-spinel phase containing significant amount of Cr did not transform to pyrochlore during furnace cooling. Fine spinel particles around 1${\mu}{\textrm}{m}$ size were ovserved within ZnO grains and grain boundaries, which were believed to be responsible for grain-growth inhibition in ZnO-Bi2O3-Sb2O3.

• Journal of the Korean Chemical Society
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• v.55 no.1
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• pp.81-85
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• 2011

$V_{0.9}Sb_{0.1}O_x$ systems, bulk and deposited on different supports (five types of $\gamma$-aluminas, $\alpha$-alumina, silica-alumina, silica gel, magnesium oxide), have been tested in the oxidative dehydrogenation (ODH) of iso-butane. Catalytic performance of VSb oxides has shown to be highly dependent on the support and the nature of the support decreasing in a series: $\gamma$-$Al_2O_3$ > $\alpha$-$Al_2O_3$ > Si-Al-O > $SiO_2$ $\approx$ MgO $\gg$ unsupported. Variation of the V-Sb-O-loading in the studied range of coverage (0.5-2 theoretical monolayer) only slightly influences the catalysts' activity and selectivity. The best catalytic performance of $\gamma$-alumina-supported $V_{0.9}Sb_{0.1}O_x$ systems can be explained by the optimal surface interaction between support and supported components resulting in the formation of well-spread amorphous active $VO_x$-component with vanadium in a high oxidation state.

• Korean Journal of Materials Research
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• v.19 no.12
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• pp.649-656
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• 2009

Inorganic oxide colloids dispersed in alcohol were applied to a stainless steel substrate to produce oxide coatings for the purpose of minimizing emissive thermal transfer. The microstructure, roughness, infrared emissive energy, and surface heat loss of the coated substrate were observed with a variation of the nano oxide sol and coating method. It was found that the indium tin oxide, antimony tin oxide, magnesium oxide, silica, titania sol coatings may reduce surface heat loss of the stainless steel at 300${\circ}C$. It was possible to suppress thermal oxidation of the substrate with the oxide sol coatings during an accelerated thermal durability test at 600${\circ}C$. The silica sol coating was most effective to suppress thermal oxidation at 600${\circ}C$, so that it is useful to prevent the increase of radiative surface heat loss as a heating element. Therefore, the inorganic oxide sol coatings may be applied to improve energy efficiency of the substrate as the heating element.

• Journal of the Korean Electrochemical Society
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• v.8 no.3
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• pp.130-134
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• 2005

To the best knowledge, the formation and characterization of InSb nanowires have not been reported yet in spite of its good characteristics as a III-V compound semiconductor. The nanowire arrays were potentiostatically electrodeposited in a mixing solution of indium chloride, antimony chloride, citric acid, and potassium citrate according to our previous work on the electrodeposition of the stoichiometric InSb films. The electrical properties of nanowire arrays were measured by semiconductor parameter analyzer, and the microstructural analysis of the nanowires was conducted by employing XRD. Our experimental results indicate that the InSb nanowires have a highly preferred orientation of (220) direction and also exhibit electrical characteristics of n-type semiconductors which we, however, similar to semi-metals mainly due to their narrow band-gap and high electron mobility.

• Journal of Sensor Science and Technology
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• v.15 no.4
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• pp.237-244
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• 2006

Atomic force microscope (AFM) has become a common tool for the structural and physical studies of biological macromolecules, mainly because it provides the ability to perform experiments with samples in a buffer solution. In this study, structure of proteins and nucleic acids has been studied in their physiological environment that allows native intermolecular complexes to be formed. Cr and Au were deposited on p-Si (100) substrate by thermal evaporation method in sequence with the thickness of $200{\AA}$ and $500{\AA}$, respectively, since Au is adequate for immobilizing biomolecules by forming a self-assembled monolayer (SAM) with semiconductor-based biosensors. The SAM, streptavidin and biotin interacted each other with their specific binding energy and their adsorption was analyzed using the Bio-AFM both in a solution and under air environment. A silicon nitride tip was used as a contact tip of Bio-AFM measurement in a solution and an antimony doped silicon tip as a tapping tip under air environment. Actual morphology could also be obtained by 3-dimensional AFM images. The length and agglomerate size of biomolecules was measured in stages. Furthermore, $R_{a}$ (average of surface roughness) and $R_{ms}$ (mean square of surface roughness) and surface density for the adsorbed surface were also calculated from the AFM image.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.11a
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• pp.511-511
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• 2007

Low-emissivity (low-e) coatings with visible transparency have attracted increased interest m reducing heat radiation loss through window panes from ecological and sustainable aspects. $TiO_2$-silver transparent thin films for low-e have good properties for UV and IR blocking as well as photocatalyst compared to that with commercial UV blocking films such as fluorine doped oxide (FTO), antimony doped tin oxide (ATO), etc. In this study, transparent $TiO_2$-silver thin films were prepared by successive ink-jet printing of commercial nano silver and $TiO_2$ sol. The $TiO_2$ sol, as ink for ink-jet printing, were synthesized by hydrothermal process in the autoclave externally pressurized with $N_2$ gas of 200 bar at $120^{\circ}C$ for 10 hrs. The synthesized $TiO_2$ sols were all formed with brookite phase and their particle size was several to 30 nm. At first nano sized silver sol was coated on glass substrate, after that $TiO_2$ sol was coated by ink-jet printing. With increasing coating thickness of $TiO_2$-silver multilayer by repeated ink-jet coating, the absorbance of UV region (under 400nm) and IR region (over 700nm) also increase reasonably, compared to that with commercial UV blocking films.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.11a
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• pp.335-335
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• 2007

본 연구에서는 RF Magnetron Sputtering 법으로 94:6 wt%의 비율로 Sb가 첨가된 $SnO_2$ 타겟을 사용하여 실온에서 ATO(Antimony doped Tin Oxide) 박막을 증착하고, 열처리가 ATO 박막의 구조적, 전기적, 광학적 특성에 미치는 효과를 연구하고자 하였다. ATO 박막의 두께는 약 200 nm로 증착하였으며, 실험 조건으로는 Ar 유량을 100 seem, 진공도는 1, 5, 10 mTorr로 변화시켰으며 스퍼터링 파워는 100, 150, 200, 250 W로 조절하였다. 증착되어진 박막은 vacuum 상태에서 300, $600^{\circ}C$의 온도에서 열처리를 수행하였으며 결과적으로 스퍼터링 파워가 증가함에 따라 비저항이 감소하였고, 250 W의 파워와 10 mTorr의 공정압력 조건에서 $600^{\circ}C$로 열처리한 ATO 박막은 $5{\times}10^{-3}{\Omega}-cm$의 저항률과 85.3%의 높은 투과도를 가지는 우수한 투명 전도막을 얻을 수 있었다.