• Title/Summary/Keyword: annealing effects

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Reduction of the residual stress of various oxide films for MEMS structure fabrication (MEMS 공정을 위한 여러 종류의 산화막의 잔류응력 제거 공정)

  • Yi, Sang-Woo;Kim, Sung-Un;Lee, Sang-Woo;Kim, Jong-Pal;Park, Sang-Jun;Lee, Sang-Chul;Cho, Dong-Il
    • Journal of Sensor Science and Technology
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    • v.8 no.3
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    • pp.265-273
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    • 1999
  • Various oxide films are commonly used as a sacrificial layer or etch mask in the fabrication of microelectromechanical systems (MEMS). Large residual strain of these oxide films causes the wafer to bow, which can have detrimental effects on photolithography and other ensuing processes. This paper investigates the residual strain of tetraethoxysilane (TEOS), low temperature oxide (LTO), 7 wt% and 10 wt% phosphosilicate glass (PSG). Euler beams and a bent-beam strain sensor are used to measure the residual strain. A poly silicon layer is used as the sacrificial layer, which is selectively etched away by $XeF_2$. First, the residual strain of as-deposited films is measured, which is quite large. The residual strain of the films is also measured after annealing them not only at $500^{\circ}C$, $600^{\circ}C$, $700^{\circ}$ and $800^{\circ}C$ in $N_2$ environment for 1 hour but also at the conditions for depositing a $2\;{\mu}m$ thick polysilicon at $585^{\circ}C$ and $625^{\circ}C$. Our results show that the 7 wt% PSG is best suited as the sacrificial layer for $2\;{\mu}$ thick polysilicon processes.

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Studies on the Interfacial Reaction between electroplated Eutectic Pb/Sn Flip-Chip Solder Bump and UBM(Under Bump Metallurgy) (전해 도금법을 이용한 공정 납-주석 플립 칩 솔더 범프와 UBM(Under Bump Metallurgy) 계면반응에 관한 연구)

  • Jang, Se-Yeong;Baek, Gyeong-Ok
    • Korean Journal of Materials Research
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    • v.9 no.3
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    • pp.288-294
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    • 1999
  • In the flip chip interconnection using solder bump, the Under Bump Metallurgy (UBM) is required to perform multiple functions in its conversion of an aluminum bond pad to a solderable surface. In this study, various UBM systems such as $Al 1\mu\textrm{m} / Ti 0.2\mu\textrm{m} / Cu 5\mu\textrm{m}, Al 1\mu\textrm{m} / Ti 0.2\mu\textrm{m} / Cu 1\mu\textrm{m}, al 1\mu\textrm{m}/Ni 0.2\mu\textrm{m} / Cu 1\mu\textrm{m} and Al 1\mu\textrm{m}/Pd 0.2\mu\textrm{m} / Cu 1\mu\textrm{m}$ for flip chip interconnection using the low melting point eutectic 63Sn-37Pb solder were investigated and compared to their metallurgical properties. $100\mu\textrm{m}$ size bumps were prepared for using an electroplating process. The effects of the number of reflows and aging time on the growth of intermetallic compounds(IMC) were investigated. $Cu_6Sn_5$ and $Cu_3Sn$ IMC were abserved after aging treatment in the UBM system with thick coper $(Al 1\mu\textrm{m}/Ti 0.2\mu\textrm{m}/Cu 5\mu\textrm{m})$. However only the $Cu_6Sn_5$ was detected in the UBM system with $1\mu\textrm{m}$ thick copper even after 2 reflow and 7 day aging at $150^{\circ}C$. Complete Cu consumption by Cu-Sn IMC growth gives rise to a direct contact between solder inner layer such as Ti, Ni and Pd, and hence to possibly cause reactions between two of them. In this study, however, only for the Pd case, IMC of PdSn. was observed by Cu consumption. UBM interfacial reactions with s이der affected the adhesion strength ot s이der balls after s이der reflow and annealing treatment.

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Quality Characteristics of Cookies with Resistant Starches (저항전분을 첨가하여 제조한 쿠키의 품질 특성)

  • Kim, Jae-Suk;Shin, Mal-Shick
    • Korean journal of food and cookery science
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    • v.22 no.5 s.95
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    • pp.659-665
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    • 2006
  • The effects of resistant starches on the quality characteristics of cookies were investigated by the physicochemical, instrumental and sensory properties of RS-added flours and cookies. Retrograded RS3 by autoclaving-cooling cycle and cross-linked RS4 after annealing treatment were used. The protein content of RS-added flour decreased, but the ash content of RS4-added flour increased slightly with increasing RS content. The RS levels of wheat flour, RS3- and RS4-added flours were 7.0%, 9.6-13.4% and 11.5-17.9%, respectively. The swelling powers of RS-added flours at 80$^{\circ}C$ decreased, but the solubility of RS3-added flour increased by 2-3 fold compared to that of control flour. Initial pasting temperature increased, but peak, holding, and final viscosities decreased with increasing RS content. The retrogradation degree of RS-added flours was lowered, because of the decreased consistency and breakdown viscosity. The yellowness of RS3-added flour increased with increasing RS3 content which induced browning reaction during baking. On the sensory test, RS-added cookies were significantly different in shape, color and overall quality (p<0.05), and their texture also affected. Overall quality was higher in peanut cookies than in AACC standard cookies and RS addition (up to 30%, w/w), regardless of the RS type, improved the cookie quality.

Evaluation of 12nm Ti Layer for Low Temperature Cu-Cu Bonding (저온 Cu-Cu본딩을 위한 12nm 티타늄 박막 특성 분석)

  • Park, Seungmin;Kim, Yoonho;Kim, Sarah Eunkyung
    • Journal of the Microelectronics and Packaging Society
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    • v.28 no.3
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    • pp.9-15
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    • 2021
  • Miniaturization of semiconductor devices has recently faced a physical limitation. To overcome this, 3D packaging in which semiconductor devices are vertically stacked has been actively developed. 3D packaging requires three unit processes of TSV, wafer grinding, and bonding, and among these, copper bonding is becoming very important for high performance and fine-pitch in 3D packaging. In this study, the effects of Ti nanolayer on the antioxidation of copper surface and low-temperature Cu bonding was investigated. The diffusion rate of Ti into Cu is faster than Cu into Ti in the temperature ranging from room temperature to 200℃, which shows that the titanium nanolayer can be effective for low-temperature copper bonding. The 12nm-thick titanium layer was uniformly deposited on the copper surface, and the surface roughness (Rq) was lowered from 4.1 nm to 3.2 nm. Cu bonding using Ti nanolayer was carried out at 200℃ for 1 hour, and then annealing at the same temperature and time. The average shear strength measured after bonding was 13.2 MPa.

Effects of Brush Coating of Ag Nanowire Solution and Annealing using Plasma Process for Flexible Electronic Devices (유연 전자소자용 금속 전극 제조를 위한 Ag Nanowire 용액의 Brush 코팅 및 플라즈마 공정을 이용한 어닐링)

  • Kyoung-Bo Kim
    • Journal of Industrial Convergence
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    • v.21 no.3
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    • pp.189-194
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    • 2023
  • Recently, various studies on flexible electronic devices have been performed. In this study, the potential of Ag nanowires was evaluated as a material to replace the ITO transparent conductive film. Ag nanomaterials were formed on the glass by a novel brush coating method and an argon plasma evaporation method based on atmospheric pressure plasma. First, the Ag solution is coated on the glass with a brush, and the remaining solvent is removed with atmospheric plasma. During this process of solvent evaporation, a sound is generated by the reaction between the atmospheric plasma and the solvent. Therefore, the remaining amount of the solvent can be confirmed. In order to observe optical properties and electrical results such as reflectance, transmittance, and absorbance according to the number of coatings of the film, the results were analyzed by coating up to 5 times. For the purpose of investigating the interaction of light with Ag nanowires, reflectance and transmittance were measured while changing the wavelength of light from 200 nm to 800 nm. In the case of absorbance, the trend of increasing light absorption of the Ag nanowires according to the coating was clearly confirmed. The electrical properties showed a great change from the time of coating more than 4 times, and in particular, the resistance value was lower than kΩ/cm2 when the coating was applied 5 times. Based on these optical and electrical results, we plan to verify the possibility of a transparent conductive film by applying it to electronic devices in the future.

Enhancement of Exchange Coupling Field and Thermal Stability by an Ultra-thin Mn Inserted layer on NiFe/[FeMn/Mn]80/NiFe Multilayers (NiFe/[FeMn/Mn]80/NiFe 다층박막에서 극-초박막 Mn 삽입에 의한 교환결합세기와 열적 안정성 향상)

  • Kim, Bo-Kyung;Lee, Jin-Yong;Ham, Sang-Hee;Lee, Sang-Suk;Hwang, Do-Guwn
    • Journal of the Korean Magnetics Society
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    • v.13 no.2
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    • pp.53-58
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    • 2003
  • Annealing effects of exchange bias fields ($H_{2ex}$(top), $H_{lex}$ (bottom)) on composite type NiFe/[FeMn/Mn]$_{80}$/NiFe multilayers have been studied. Three samples with ultra-thin Mn inserted layers on glass/Ta(50 $\AA$)/NiFe(150 $\AA$)/[F $e_{53}$M $n_{47}$(1.25 $\AA$)/Mn(0 $\AA$, 0.11 $\AA$, 0.3 $\AA$)]$_{80}$/NiFe(90 $\AA$)/Ta(50 $\AA$) were prepared by ion beam sputtering. The average x-ray diffraction peak ratios NiFe(111) of FeMn (111) fcc textures for the Mn inserted total thicknesses of 0 $\AA$, 9 $\AA$, and 24 $\AA$ were about 0.65, 0.90, and 1.5, respectively. For the sample without Mn inserted layer, the $H_{2ex}$ of 260 Oe up to 300 $^{\circ}C$ disappeared at 350 $^{\circ}C$. For two multilayer samples with ultra-thin Mn layers of 0.11 $\AA$ and 0.3 $\AA$, the $H_{2exs}$ of 310 Oe and 180 Oe up to 300 $^{\circ}C$ endured of 215 Oe and 180 Oe at 350 $^{\circ}C$, respectively. The $H_{ex}$ (bottom)s of three samples decreased from 100 Oe to 70 Oe up to 250 $^{\circ}C$, while these values increased beyond 300 $^{\circ}C$. This observation can be attributed to less diffusive path of Mn atoms in bottom NiFe than top NiFe layer. The top and bottom coercive fields slightly varied about 5 Oe∼10 Oe. From these results, we could obtain the enhancement of exchange coupling intensity and thermal stability by an ultra-thin Mn inserted layer on NiFe/[FeMn/Mn]$_{80}$/NiFe Multilayers.

Analysis of Magnetic Isotropy Property using Magnetoresistance Curve of CoFe/Cu/CoFe/PtMn Multilayer Film (CoFe/Cu/CoFe/PtMn 다층박막의 자기저항 곡선을 이용한 자기 등방성 특성 분석)

  • Choi, Jong-Gu;Kim, Su-Hee;Choi, Sang-Heon;Lee, Sang-Suk;Rhee, Jang-Roh
    • Journal of the Korean Magnetics Society
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    • v.27 no.4
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    • pp.123-128
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    • 2017
  • The magnetic isotropy property from the magnetoresistance (MR) curve and magnetization (MH) loop for the PtMn based spin valve (SV) multilayer films fabricated with different the bottom structure after post-annealing treatment was investigated. The exchange biased coupling field ($H_{ex}$), coercivity ($H_c$), and MR ratio of Glass/Ta(10 nm)/CoFe(6 nm)/Cu(2.5 nm)/CoFe(3 nm)/Ta(4 nm) SV multilayer film without antiferromagnetic PtMn layer are 0 Oe, 25 Oe, and 3.3 %, respectively. MR curve for the Glass/Ta(10 nm)/CoFe(6 nm)/Cu(2.5 nm)/CoFe(3 nm)/PtMn(6 nm)/Ta(4 nm) SV multilayer film showed $H_{ex}=2Oe$, $H_c=316Oe$, and MR (%) = 4.4 % with one butterfly MR curve having by the effect of antiferromagnetic PtMn layer. MR curve for the dualtype Glass/Ta(10 nm)/CoFe(6 nm)/Cu(2.5 nm)/CoFe(3 nm)/PtMn(6 nm)/CoFe(3 nm)/Cu(2.5 nm)/CoFe(6 nm)/Ta(4 nm) SV multilayer film showed $H_c=37.5Oe$ and 386 Oe, MR = 3.5 % and 6.5 % with two butterfly MR curves and square-like hysteresis MH loops. The anisotropy property in CoFe spin valve-PtMn multilayer is neglected by the effects of a very small value of $H_{ex}$ and a very slightly shape magnetic anisotropy. This result is possible to explain the effect of magnetization configuration spin array of the bottom SV film and the top SV film of PtMn layer.

Quality Changes of Fresh-Cut Leafy and Condiment Vegetables during Refrigerated Storage (신선편이 엽채류 및 조미채소류의 냉장저장 중 품질변화)

  • Kim, Su-Jin;Sun, Shih-Hui;Kim, Gi-Chang;Kim, Haeng-Ran;Yoon, Ki-Sun
    • Journal of the Korean Society of Food Science and Nutrition
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    • v.40 no.8
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    • pp.1141-1149
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    • 2011
  • The objective of this study was to analyze quality changes during storage of fresh-cut produce (leafy vegetables and condiment vegetables) as a function of packaging and storage temperature. Fresh-cut produce was washed using a three step cleaning process and was packed in vacuum packaging (green onion, hot pepper, onion, baechu) and perforated film packaging (buchu and perilla leaf). The effects of packaging method and storage temperature on quality of fresh-cut produce were determined by analyzing total plate counts, E. coli, coliform groups, moisture content, pH, Aw, surface color, and exterior quality during storage at 4 and 10$^{\circ}C$. According to the results, surface color change and microbial growth were delayed during storage at 4$^{\circ}C$. Additionally, E. coli was not detected during storage. Generally, moisture content decreased in the perforated film packaging. Changes in surface quality such as skin browning, softening of tissue and chlorosis at 4$^{\circ}C$ were inhibited, whereas rapid vacuum annealing and changes in color and flavor were observed in the sample stored at 10$^{\circ}C$. The result indicated that overall quality of the fresh-cut produce at 4$^{\circ}C$ was well maintained. The perforation in packing materials did not significantly increase the number of microorganisms on buchu and perilla leaf. The proper packaging methods and temperature may beneficial effect on microbial safety, quality and thus result in longer shelf-life fresh-cut vegetables during distribution.

Ti-Getter Effects on Magnetic Properties of Ti0.96Co0.02Fe0.02O2 (Ti-Getter가 Ti0.96Co0.02Fe0.02O2의 자기적 특성에 미치는 영향)

  • Nam, H.D.;Kim, S.J.;Baek, J.K.;Lee, S.R.;Park, Cheol-Su;Kim, E.C.
    • Journal of the Korean Magnetics Society
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    • v.18 no.3
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    • pp.109-114
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    • 2008
  • The samples were synthesized by using a solid state reaction. The X-ray diffraction pattern for $Ti_{0.96}Co_{0.02}Fe_{0.02}O_2$ showed a pure rutile phase with tetragonal structure, Mixtures of the proper proportions of the elements sealed in evacuated quartz ampoule were heated at $870{\sim}930^{\circ}C$ for one day and then slowly cooled down to room temperature at a rate of $10^{\circ}C$/h. In order to obtain single phase material, it was necessary to grind the sample after the first firing and to press the powders into pellets before annealing them for a second time in evacuated and sealed quartz ampoule. Magnetic properties have been investigated using the vibrating sample magnetometer (VSM). Room temperature magnetic hysteresis (M-H) curve showed an obvious ferromagnetic behavior and the magnetic moment per Fe atom under the applied of 0.8 T was estimated to be about $1.5\;{\mu}_B$/CoFe. But the magnetic moment per Fe atom under the applied of 0.8 T was estimated to be about $0.02\;{\mu}_B$/CoFe without Ti-getter. Size of particles is about $1\;{\mu}m$ using the transmission electron microscope (TEM). The ingredients of sample are distributed irregular in particles. Only Fe get shown on the surface of particles.