Characteristics of ZnO Thin Films of FBAR using ALD and RF Magnetron Sputtering (ALD와 RF 마그네트론 스퍼터링을 이용한 FBAR 소자의 ZnO 박막증착 및 특성)
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- Journal of the Korean Institute of Electrical and Electronic Material Engineers
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- v.18 no.2
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- pp.164-168
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- 2005