• 한국산업보건학회지
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• 제15권3호
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• pp.277-281
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• 2005

Air-line mask is an important personal protective equipment for workers working under hazardous surroundings in which a fixed ventilation system is difficult to be installed. If the air-line mask make loud noise, works wearing the mask may be faced with health problems such as noise induced hearing loss(NIHL). The purpose of this study is to introduce a low noisy technology for workers using air-line mask. A traditional type air-line has been improved to an advanced air-line mask with lesser noise. In the mask, air suppling conduits consists of multi tubes are placed inside of the front of the safety helmet. The noise level reduced from 80dB(A) to less than 80dB(A) when measured by KS A 0701 method at Center for Safety Inspection, Testing and Certification for KOSHA. It is suitable for related regulation[Article 35 of the Industrial Safety and Health Act(Test of Personal Protective Equipment)]. While workers working in noise level of over 90dB(A), they may expose to 82dB(A) or less when they wear the advanced masks. This type masks can be an alternative for works suffering from loud noise generated by traditional air-line masks.

• 한국산업보건학회지
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• 제32권2호
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• pp.111-115
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• 2022

Objectives: The purpose of this study is to verify whether droplet-induced propagation, the main route of infectious diseases such as COVID-19, can occur in semiconductor FAB (Fabrication), based on research results on general droplet propagation. Methods: Through data surveys droplet propagation was modeled through simulation and experimental case analysis according to general (without mask) and mask-wearing conditions, and the risk of droplet propagation was inferred by reflecting semiconductor FAB operation conditions (air current, air conditioning system, humidity, filter conditions). Results: Based on the results investigated to predict the possibility of spreading infectious diseases in semiconductor FAB, the total amount of droplet propagation (concentration), propagation distance, and virus life in FAB were inferred by reflecting the management parameter of semiconductor FAB. Conclusions: The total amount(concentration) of droplet propagation in the semiconductor fab is most affected by the presence or absence of wearing a mask and the line air dilution rate has some influence. when worn it spreads within 0.35~1m, and since the humidity is constant the virus can survive in the air for up to 3 hours. as a result the semiconductor fab is judged to be and effective space to block virus propagation due to the special environmental condition of a clean room.

• Medical Lasers
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• 제8권2호
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• pp.43-49
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• 2019

The plume produced by vaporizing tissue with a laser contains a variety of contaminants called laser-generated air pollutants (LGACs). LGACs consist of a mixture of toxic gas components, biomicroparticles, dead and living cells, and viruses. Toxic odors and thick smoke from surgical incisions and the coagulation of tissues can irritate eyes and airways, as well as cause bronchial and pulmonary congestion. Because of the potential risk of the smoke, it is advisable to appropriately remove it from the surgical site. We recommend using a smoke evacuator to remove the smoke. Suction nozzles should be placed as close as possible to the surgical site in a range of 2 cm or less. In-line filters should be used between the inlet and outlet of the surgical site. All air filtration devices should be capable of removing particles below 0.1 microns in size. The filter pack should be handled according to infection control procedures in the operating room. The laser mask can be an auxiliary protective device if it is properly worn. Some smoke inhaled under the nose wrap or over the side of the mask will not be filtered. As in electrosurgical operations, a suitable mask should be worn while smoke is present.

• 한국인쇄학회지
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• 제26권1호
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• pp.73-85
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• 2008

We have manufactured a photoresist which has excellent dispersity and good applying property due to 330cps of viscosity for environment-friendly and economical maskless screen plate making. And the photoresist applied on the screen stretched was exposed without mask by beam projector with CRT light source. Then it was developed by air spray with $1.7kgf/cm^2$ of injection pressure. The pencil hardness and solvent resistance of curing photoresist film were worse than those of conventional photoresist film and the maximum resolution of line image formed by maskless screen plate making was 0.5 mm since the exposure system for maskless plate making has weak light intensity and the diffusion of light. But we could obtain maskless screen plate which has sharp edges of line image and confirm a possibility of dry development process by air spray method.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2008년도 추계학술대회A
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• pp.1806-1809
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• 2008

Study that form micro pattern by direct ink jet printing method is getting attention recently. Direct ink jet printing spout fine droplet including nano metal particle by force or air pressure. There is reason which ink jet printing method is profitable especially in a various micro-patterning technology. It can embody patterns directly without complex process such as mask manufacture or screen-printing for existent lithography. In this study, research of a technology that ejects fine droplet form of Pico liter and forms metal micro pattern was carried with inkjet head of piezoelectricity drive system. Droplet established pattern while ejecting consecutively and move on the surface at the fixed speed. Patterns formed in ink are mixed with organic solvent and polymer that act as binder. So added thermal hardening process after evaporate organic solvent at isothermal after printing. I executed high frequency special quality estimation of CPW transmission line to confirm electrical property of manufactured circuit board. We tried a large area printing to confirm application possibility of an ink jet technology.

• 한국항공우주학회지
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• 제50권3호
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• pp.157-164
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• 2022

본 논문에서는 무인기의 경로 계획을 위한 산악 지형, 레이더 그리고 방공망 등을 3차원 환경으로 구현하고, Sampling 기반의 경로 계획 알고리즘인 PRM 알고리즘을 사용하여 경로 계획 및 재계획을 수행하는 방안에 대해 서술한다. 기존의 PRM 알고리즘의 경우 생성된 노드 사이에 장애물 존재 여부를 확인하기 위한 계산이 노드 간 1:1로 이루어지고 연속적으로 수행되어 노드 수나 노드를 연결하는 거리에 계산량이 크게 영향을 받는다. 이러한 부분을 개선하기 위해 제안하는 LineGridMask 기법을 통해 장애물 존재 여부 확인 방식을 단순화하고, 병렬화를 통해 경로 계획의 계산 시간을 감소시킨다. 마지막으로 기존 PRM 알고리즘과의 성능을 비교한 결과, 경로 계획에서는 최대 88%, 재계획의 경우 최대 94%까지 계산 시간이 감소하였음을 확인하였다.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2003년도 춘계학술대회 논문집
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• pp.620-623
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• 2003

The material processing by using ultrashort pulse laser, in recently, is actively applying into the micro machining and nano-machining technology since ultrashort pulse has so faster than the time which the electrons energy absorbing photon energy is transmitted to surrounding lattice-phonon that it has many advantages in point of machining. The micro machining of metallic thin film on the plain glass is widely used in the fields such as mask repairing for semiconductor, fabrication of photonic crystal, MEMS devices and data storage devices. Therefore, it is important to secure the machining technology of the sub-micron size. In this research, we set up the machining system by using ultrashort pulse laser and conduct on the Cr 200nm thin film ablation experiments of spot and line with the variables such as energy, pulse number, speed, and so on. And we observed the characteristics of surrounding heat-affected zone and by-products appeared in critical energy density and higher energy density through SEM, and also examined the machining features between in He gas atmosphere which make pulse change minimized by nonlinear effect and in the air. Finally, the pit size of 0.8${\mu}{\textrm}{m}$ diameter and the line width of 1${\mu}{\textrm}{m}$ could be obtained.

• 한국인쇄학회지
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• 제26권2호
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• pp.55-64
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• 2008

We designed a UV-LED exposure system which has 365nm dominant wavelength due to the environment-friendly and economical maskless screen plate making. And the photoresist applied on the screen stretched was exposed without mask by beam projector with UV-LED light source. Then it was developed by air spray with $1.7\;kgf/cm^2$ of injection pressure. The pencil hardness and solvent resistance of curing photoresist film were excellent as those of conventional photoresist film and the maximum resolution of line image formed by maskless screen plate making. was $100{\mu}m$, so we could establish the possibility of environment-friendly maskless screen plate making technology. But the sharpness of the patterns were ${\pm}40{\mu}m$ since the exposure system for maskless plate making has weak light intensity and the diffusion of light.

• Asian Journal of Atmospheric Environment
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• 제5권1호
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• pp.8-20
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• 2011

Atmospheric visibility is one of the indicators used to evaluate the status of air quality. Based on a conceptual definition of visibility as the maximum distance at which the outline of the selected target can be recognized, an image analysis technique is introduced here and an algorithm is developed for visibility monitoring. Although there are various measurement techniques, ranging from bulk and precise instruments to naked eye observation techniques, each has their own limitations. In this study, a series of image analysis techniques were introduced and examined for in-situ application. An imaging system was built up using a digital camera and was installed on the study sites in Incheon and Seoul separately. Visual range was also monitored by using a dual technology visibility sensor in Incheon and transmissometer in Seoul simultaneously. The Sobel mask filter was applied to detect the edge lines of objects by extracting the high frequency from the digital image. The root mean square (RMS) index of variation among the pixels in the image was substantially correlated with the visual ranges in Incheon and Seoul with correlations of $R^2$=0.88 and $R^2$=0.71, respectively. The regression line equations between the visual range and the RMS index in Incheon and Seoul were VR=$2.36e^{0.46{\times}(RMS)}$ and VR=$3.18e^{0.15{\times}(RMS)}$, respectively. It was also confirmed that the fine particles ($PM_{2.5}$) have more impacts to the impairment of visibility than coarse particles.

• 한국입자에어로졸학회지
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• 제18권2호
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• pp.23-35
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• 2022

Recently, passengers using public transport are concerned about the effects of COVID-19 and fine dust. Therefore, from February 2020 to February 2021, we investigated whether SARS-CoV-2 RNA was detected even after disinfection in 55 public transportation places visited by confirmed patients in Seoul. 34 air samples and 702 object surface samples were collected and tested with RT-PCR, one surface sample was positive. In addition, preemptive investigations were conducted in 22 subway trains that passengers were being on board at that time. 1,018 preemptive tests were performed, and all were negative. Although PM-2.5 is dangerous in itself, it can be a potential carrier of viruses. It seemed that a solution was needed as one line continuously exceeded the criteria of PM-2.5. Through this study, it is judged that cluster infection in public transportation can be prevented if efforts to reduce the concentration of fine dust, appropriate disinfection management, and personal disinfection such as wearing a mask in public transportations.