• Korean Chemical Engineering Research
• /
• 제56권4호
• /
• pp.585-591
• /
• 2018

미세액적 유동반응기 공정에서 제조된 나노구조 $SiO_2:Zn$ 원환형 입자의 특성을 밴드갭 에너지와 표면 반응성의 관점에서 고찰하였다. $SiO_2:Zn$ 원환형 입자를 단일 공정에서 연속적이며 합리적인 생산 효율로 첨가제인 THAM (tris(hydroxymethyl)-aminomethane)과 도핑되는 $Zn^{2+}$ 이온의 농도 변화에 따라 성공적으로 제조할 수 있었다. 그리고 $Zn^{2+}$ 이온의 도핑은 $Si^{4+}$ 이온의 conduction band 보다 에너지 레벨이 낮은 $Zn^{2+}$ 이온의 acceptor level을 형성함으로써 $SiO_2:Zn$ 원환형 입자의 밴드갭 에너지를 줄일 수 있었다. 또한, 입자의 원환형 구조는 $SiO_2:Zn$ 입자의 밴드갭 에너지를 감소시키는데 기여하였다. 따라서 $Zn^{2+}$ 이온이 도핑된 $SiO_2:Zn$ 원환형 입자는 표면에 SiO-H의 형성과 산소 결함의 생성으로 표면 반응성을 증대시킬 것으로 사료되었다.

• 한국진공학회지
• /
• 제20권2호
• /
• pp.135-140
• /
• 2011

Be을 도핑한 p형 GaSb:Be 에피층의 광여기 발광(PL) 스펙트럼(20 K)의 도핑밀도에 따른 변화를 조사하여, Be 억셉터의 근원을 분석하였다. 도핑을 증가시키면 PL 피크가 고에너지로 변위하고 반치폭은 줄어드는 경향을 보이다가, 밀도가 ${\sim}10^{17}cm^{-3}$ 이상에서 피크 에너지는 오히려 저에너지로 변위하고 반치폭이 늘어나는 현상을 관측하였다. 3개 피크로 분리한 PL 스펙트럼의 적분 PL 강도 변화를 통하여, 도핑 증가에 따라 $Be[Be_{Ga}]$ 준위(0.794 eV)는 감소하는 반면 진성결함에 기인한 $A[Ga_{Sb}]$ 피크(0.778 eV)와 함께 Be과 A 사이에 위치하는 새로운 $Be^*$ 준위(0.787 eV)가 증가하기 때문으로 분석되었다. 이것은 Be을 도핑한 p-GaSb:Be 에피층에는 Be 얕은준위(${\Delta}E=16meV$)와 Be과 A 결함준위가 결합한 $Be^*[Ga_{Sb}-Be_{Ga}]$의 복합준위(${\Delta}E=23meV$)가 공존하기 때문으로 논의하였으며, ${\sim}10^{17}cm^{-3}$ 이상 도핑할 경우에는 Be 준위가 다소 감소할 수 있음을 보였다.

• 한국재료학회지
• /
• 제21권12호
• /
• pp.639-643
• /
• 2011

Zinc oxide as an optoelectronic device material was studied to utilize its wide band gap of 3.37 eV and high exciton biding energy of 60 meV. Using anti-site nitrogen to generate p-type zinc oxide has shown a deep acceptor level and low solubility. To increase the nitrogen solubility in zinc oxide, group 13 elements (aluminum, gallium, and indium) was co-added to nitrogen. The effect of aluminum on nitrogen solubility in a $3{\times}3{\times}2$ zinc oxide super cell containing 72 atoms was investigated using density functional theory with hybrid functionals of Heyd, Scuseria, and Ernzerhof (HSE). Aluminum and nitrogen were substituted for zinc and oxygen sites in the super cell, respectively. The band gap of the undoped super cell was calculated to be 3.36 eV from the density of states, and was in good agreement with the experimentally obtained value. Formation energies of a nitrogen molecule and nitric oxide in the zinc oxide super cell in zinc-rich conditions were lower than those in oxygen-rich conditions. When the number of nitrogen molecules near the aluminum increased from one to four in the super cell, their formation energies decreased to approach the valence band maximum to some degree. However, the acceptor level of nitrogen in zinc oxide with the co-incorporation of aluminum was still deep.

• 한국재료학회지
• /
• 제8권6호
• /
• pp.526-531
• /
• 1998

HVPE(hydride vapor phase epitaxy)법으로 (111) $MgAl_2O_4$기판 위에 $10~240\mu{m}$두께의 GaN를 성장하고, GaN의 두께에 따 광학적 성질을 조사하였다. $MgAl_2O_4$기판 위에 성장된 GaN의 PL 특성은 결정성장온도에서 기판으로부터 Mg이 out-diffusion하여 auto-doping 됨으로써 불순물이 첨가된 GaN의 PL 특성을 나타내었다. 10K의 온도데서 측정된 PL 스펙트럼은 자유여기자와 속박여기자의 재결합천이에 의한 피크들과 불순물과 관련된 도너-억셉터 쌍 사이의 재결합 및 이의 포논 복제에 의한 발광으로 구성되었으며, 깊은 준위로부터의 발광은 나타나지 않았다. 중성 도너에 속박된 여기자 발광 에너지와 라만 $E_2$모드 주파수는 GaN의 두께가 증가함에 따라 지수 함수적으로 감소하였으며, GaN 내의 잔류 응력에 대하여 라만 E2 모드 주파수는$\Delta$$\omega$=3.93$\sigma$($cm^{-1}$/GPa)의 관계로 변화하였다.

• Transactions on Electrical and Electronic Materials
• /
• 제15권5호
• /
• pp.262-264
• /
• 2014

Pristine ZnO, 3 wt.% Ga-doped (3GZO) and 3 wt.% Ag-doped (3SZO) ZnO nanowires (NWs) were grown using the hot-walled pulse laser deposition (HW-PLD) technique. The doping of Ga and Ag in ZnO NWs was observed by analyzing the optical and chemical properties. We optimized the synthesis conditions, including processing temperature, time, gas flow, and distance between target and substrate for the growth of pristine and doped ZnO NWs. The diameter and length of pristine and doped ZnO NWs were controlled under 200 nm and several ${\mu}m$, respectively. Low temperature photoluminescence (PL) was performed to observe the optical property of doped NWs. We clearly observed the shift of the near band edge (NBE) emission by using low temperature PL. In the case of 3GZO and 3SZO NWs, the center photon energy of the NBE emissions shifted to low energy direction using the Burstein Moss effect. A strong donor-bound exciton peak was found in 3 GZO NWs, while an acceptor-bound exciton peak was found in 3SZO NWs. X-ray photoelectron spectroscopy (XPS) also indicated that the shift of binding energy was mainly attributed to the interaction between the metal ion and ZnO NWs.

• 한국전기전자재료학회논문지
• /
• 제19권7호
• /
• pp.611-617
• /
• 2006

We report the preparation of N doped, p-type ZnO films by post-annealing in $NH_3$ ambient. The properties were examined by XRD, Hall-effect measurement, PL, and SIMS. ZnO films showed better crystallinity and electron concentration of $10^{15}-10^{17}/cm^3$ with post-annealing in $NH_3$ ambient. These films were converted to p-type ZnO by activation thermal annealing process at $800^{\circ}C$ under $N_2$ ambient. The electrical properties of the p-type ZnO showed a hole concentration of $1.06\times10^{16}/cm^3$, a mobility of $15.8cm^2/V{\cdot}s$, and a resistivity of $40.18\Omega{\cdot}cm$. The N doped ZnO films showed a strong photoluminescence peak at 3.306 eV at 13 K, which is closely related to neutral acceptor bound excitons of the p-type ZnO:N. In the SIMS spectra, the incorporation of nitrogen was confirmed.

• The Korean Journal of Ceramics
• /
• 제6권1호
• /
• pp.43-46
• /
• 2000

$H_4Nb_6/O_{17}$/CdS nanocomposites which intercalated CdS particles, less than 0.8nm thickness, in the interlayer of $H_4Nb_6/O_{17}$ were prepared by the successive ion exchange reactions of $H_4Nb_6/O_{17}$ with $Cd^{2+}$ and $C_3H_7NH_3_+$, followed by the reaction with $H_2S$ gas. $H_4Nb_6/O_{17}$/CdS photocatalytically reduced $NO_3$￣ to $NO_2$￣ and $NH_3$in the presence of sacrificial hole acceptor such as methanol under visible light irradiation (wavelength>400nm), although unsupported CdS showed no noticeable photocatalytic activity for $NO_3$￣ reduction. The catalytic activity of $H_4Nb_6/O_{17}$/CdS greatly enhanced with co-doping of Pt particles in the interlayer.

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2005년도 추계학술대회 논문집 Vol.18
• /
• pp.33-34
• /
• 2005

In this study, in odor to develop low temperature sintering multilayer piezoelectric actuator and ultrasonic vibrator, PMN-PNN-PZT ceramics were fabricated using $Li_2CO_3$ and $Na_2CO_3$ as sintering aids and their piezoelectric and dielectric characteristics were investigated according to the addition of dopant CuO and $Fe_2O_3$, respectively. The CuO added PMN-PNN-PZT ceramics improved mechanical quality factor Qm due to the acceptor doping effect. And also, $Fe_2O_3$ reacted as softner in this composition system in addition to the increase of grain size and sinterability. Taking into consideration electromechanical coupling factor kp of 0.62, dielectric constant $\varepsilon_r$, of 1275, Piezoelectric $d_{33}$ constant of 377[pC/N] and mechanical quality factor Qm of 975, it was concluded that the ceramics with the $Fe_2O_3$, added composition sintered at 900[$^{\circ}C$] were best for the multilayer piezoelectric actuator and ultrasonic vibrator application.

• 대한화학회지
• /
• 제40권3호
• /
• pp.167-172
• /
• 1996

GaN 단결정 박막은 halide vapor phase epitaxy(HVPE)방법을 사용하여 사파이어 기판위에 헤케로에피탁시하게 성장시켰다. 이렇게 제조된 박막은 n형 전동성을 갖는다. 아연(Zn)을 받개 불순물로 도핑시켜 절연형 GaN 박막을 만들었는데 2.64과 2.43eV의 청색영역에서 발광 피크를 가졌다. 본 연구에의해 GaN 박막은 MIS(metal-insulator-semiconductor) 접합구조로 제작이 가능함을 시사하였고, 이종접합형 발광소자 개발에 기초자료가 될 것으로 전망된다.

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
• /
• pp.419-420
• /
• 2008

In this study, high quality (Al,N)-codoped p-type ZnO thin films were obtained by DC magnetron sputtering. The film on buffer layer grown in 80% $N_2$ ambient shows highest hole concentration of $2.93\times10^{17}cm^{-3}$. The films show hole concentration in the range of $1.5\times10^{15}$ to $2.93\times10^{17}cm^{-3}$, resistivity of 131.2 to 2.864 $\Omega$cm, mobility of 3.99 to 31.6 $cm^2V^{-1}s^{-1}$. The films on Si show easier p-doping in ZnO than those on buffer layer. The film on Si shows the highest quality of optical photoluminescence (PL) characteristics. The donor energy level $(E_d)$ of (Al,N)-codoped ZnO films is about 50 meV and acceptor energy level $(E_a)$ is in the range of 63 to 71 meV. It will help to improve p-type ZnO films.