• 한국신재생에너지학회:학술대회논문집
• /
• 한국신재생에너지학회 2011년도 추계학술대회 초록집
• /
• pp.64.1-64.1
• /
• 2011

다중접합 태양전지는 흡수대역이 다른 juntion으로 구성되어, 각각의 태양전지 간의 전류정합(current matching)이 효율 향상에 중요하다. 본 실험에서는 Top cell에 i-a-Si:H(Thinckness:100nm), Middle cell에는 i-a-SiGe:H(Thickness:800nm)을 적용하였고, bottom cell에는 i-${\mu}c$-Si:H(Thickness:1800nm), 수광부의 p-layer에 에 SiOx을 이용하여 triple juntion amorphous silicon solar cell(삼중접합태양전지)을 구현하였다. 이를 최적화 시키기 위해 ASA simulation을 이용하여 각 Cell의 intrinsic layer의 밴드갭을 가변하였다. 가변 결과 i-a-Si:H : 1.85 eV, i-a-SiGe:H: 1.6 eV, i-${\mu}c$-Si:H: 1.4 eV에서 태양전지 효율 14.5 %을 기록 하였다. 본 연구를 통해 Triple juntion cell에서의 intrinsic layer의 밴드갭 최적화를 구현해 볼 수 있었다.

• 대한기계학회:학술대회논문집
• /
• 대한기계학회 2001년도 춘계학술대회논문집A
• /
• pp.298-303
• /
• 2001

The critical thickness of an epitaxial film on a substrate in electronic or optoelectronic devices is studied on the basis of equilibrium dislocation analysis. Two geometric models, a single dislocation and an array of dislocations in heteroepitaxial system, are considered respectively to calculate the misfit dislocation formation energy. The isotropic linearly elastic stress fields for the models are obtained by means of complex potential method combined with alternating technique, and are used for calculating the formation energies. As a result, the effect of elastic mismatch between film and substrate on critical thickness is presented and $Si_xGe_{1-x}/Si$ epitaxial structure is analyzed to predict the critical thickness with varying germanium concentration.

• 대한전자공학회:학술대회논문집
• /
• 대한전자공학회 2004년도 하계종합학술대회 논문집(2)
• /
• pp.465-468
• /
• 2004

In this paper, we describe the design and implementation of the new current-current negative feedback (CCNF) voltage-controlled oscillator (VCO), which suppresses 1/f induced low-frequency noise. By means of the CCNF, the high-frequency noise as well as the low-frequency noise is prevented from being converted into phase noise. The proposed CCNF VCO shows 11-dB reduction in phase noise at 10 kHz offset, compared with the conventional differential VCO. The phase noise of the proposed VCO is -87 dBc/Hz at 10 kHz offset frequency from 5.5-GHz carrier. The proposed VCO consumes 14.0 mA at 2.0 V supply voltage, and shows single-ended output power of -12.0 dBm.

• 전자공학회논문지A
• /
• 제32A권2호
• /
• pp.66-72
• /
• 1995

Using the Si/SiGe layer grown by solid source molecular beam epitaxy(SSMBE) on the LOCOS-patterned wafers, an emitter-base self-aligned hterojunction biplar transistor(HBT) with the polysilicon-emitter and the silicon germanium(SiGe) base has been fabricated. Trech isolation process, planarization process using a chemical-mechanical poliching, and the selectively implanted collector(SIC) process were performed. A titanium disilicide (TiSi$_{2}$), as a base electrode, was used to reduce an extrinsic base resistance. To prevent the strain relaxation of the SiGe epitaxial layer, low temperature (820${^\circ}C$) annealing process was applied for the emitter-base junction formation and the dopant activation in the arsenic-implanted polysilicon. For the self-aligned Si/SiGe HBT of 0.9${\times}3.8{\mu}m^{2}$ emitter size, a cut-off requency (f$_{T}$) of 17GHz, a maximum oscillation frequency (f$_{max}$) of 10GHz, a current gian (h$_{FE}$) of 140, and an emitter-collector breakdown voltage (BV$_{CEO}$) of 3.2V have been typically achieved.

• E2M - 전기 전자와 첨단 소재
• /
• 제10권2호
• /
• pp.113-118
• /
• 1997

For the amorphous F $e_{78}$ $B_{13}$S $i_{9-x}$G $e_{x}$ alloy, thermal analysis and measurements of the magnetic properties were carried out. As the content of Ge increased, the crystallization temperature was decreased and the Curie temperature was increased, and the tendencies were almost linear. The core loss of the amorphous alloy for x=1.7, field annealed at optimized condition, was 0.057 W/kg(l.0T, 60Hz), which was about 30% lower than that of no Ge added amorphous alloy (basic composition). Such a low core loss characteristics was thought to be caused by the lower coercive force and good squareness of B-H loop of the alloy.y.y.

• Bulletin of the Korean Chemical Society
• /
• 제23권6호
• /
• pp.845-851
• /
• 2002

The synthesis of the intramolecular donor - stabilized silyl and germyl complexes of the type ($Cab^c.p) MMe_2X$ (2a:M=Si, X=Cl;2b;M= Ge, X=Cl;2e;M=Si,X=H) was achieved by the reaction of $LiCab^c,p$ (1) with $Me_2SiClX$ and $Me_2GeCl_2$ respectively. The intramolecular M←P interacion in 2a-2c is provided by $^1H$, $13^C.$, $31^P$ and $29^Si$ NMR spectroscopy. The salt elimination reactions of dichlorotetramethyldisilane and -digermane with 1 afforded the $bis(\sigma-carboranylphosphino)disilane$ and disgermane [$(Cab^C.P)MMe_2]_2(4a;M$ = Si;4b: M=Ge). The oxidative addition reaction of 4a-4b with $pd_2(dba)_3CHCl_3afforded$ the bis(silyl)-and bis(germyl)-palladium complexes. The chloro-bridged dipalladium complexes were obtained by the reaction of 2a-2b with $pd_2(dba)_3CHCl_3$ The crystal structures of 5a and 7b were determined by X-ray structural studies.

• 한국재료학회지
• /
• 제5권6호
• /
• pp.690-698
• /
• 1995

Oxidized Si wafer 위에 반응가스로 Si $H_4$과 Ge $H_4$을 사용하여 RTCVD(rapid thermal chemical vapor deposition)법으로 증착온도 450~5$50^{\circ}C$에서 다결정 S $i_{1-x}$G $e_{x}$ 박막을 증착하였다. 증착된 S $i_{1-x}$, G $e_{x}$ 박막은 증착온도와 Ge $H_4$Si $H_4$입력비 변화에 따른 Ge몰분율 변화와 증착속도에 대해 고찰하였으며, XRD와 AFM(atomic force microscopy)등을 이용하여 결정상과 표면거칠기 등을 조사하였다. 실험결과, 다결정 S $i_{1-x}$G $e_{x}$ 박막은 32~37 Kcal/mole의 활성화에너지 값을 가졌으며 증착속도는 증착온도와 입력비 중가에 따라 증가하였다. 또한 조성분석으로부터 입력비 감소와 증착온도 증가에 따라 Ge몰분율이 감소함을 알 수 있었다. 증착된 S $i_{1-x}$G $e_{x}$ 박막은 450, 475$^{\circ}C$에서 임력비가 0.05일때 비정질 형태로 존재하였으며 그 이외의 실험영역에서는 다결정 형태로 존재하였다. 기존의 다결정 Si 중착온도($600^{\circ}C$이상)와 비교하여 Ge $H_4$을 첨가함으로써 비교적 낮은온도(5$50^{\circ}C$이하) 영역에서 다결정 S $i_{1-x}$G $e_{x}$ 박막을 얻을 수 있었다. 또한 증착층의 표면거칠기를 측정한 결과, 증착온도와 입력비가 증가함에 따라 표면 거칠기( $R_{i}$ )가 증가함을 알 수 있었다.을 알 수 있었다.

• Journal of electromagnetic engineering and science
• /
• 제15권1호
• /
• pp.59-61
• /
• 2015

A wideband H-band detector operating near 300 GHz has been developed based on SiGe HBT technology. The detector consists of an on-chip antenna and a HBT differential pair for square-law detection. It showed responsivity of more than 1,700 V/W and noise equivalent power (NEP) smaller than $180pW/Hz^{0.5}$ for the measured frequency range of 250-350 GHz. The maximum responsivity and the minimum NEP were 5,155 V/W and $57pW/Hz^{0.5}$, respectively; both were obtained at 330 GHz with DC power dissipation at 9.1 W.

• Nuclear Engineering and Technology
• /
• 제5권1호
• /
• pp.38-43
• /
• 1973

A $X_4$형분자인 C $H_4$, Si $H_4$, Ge $H_4$, C $F_4$, Si $F_4$ 및 Ge $F_4$의 양자 또는 불소원자핵의 spin과 분자의 회전사이의 상호작용의 크기를 나타내는 spin-rotation constant $c_{av}$ 를 분자선자기공명방법에 의하여 실험적으로 결정하였다. 강자장근사에 의한 Hamiltonian 은 W $m_{I}$ $m_{J}$=- $g_{I}$ $m_{I}$H- $g_{J}$ $m_{J}$H- $C_{av}$ $m_{I}$ $m_{J}$로 주어지며, $c_{av}$ 는 C tensor의 trace의 3분지 1이 된다. 원자핵자기공오곡선은 v=- $g_{I}$H- $c_{av}$ $m_{J}$로 주어지는 여러개의 회전광공오선의 중첩으로 이룩되며, 전체곡선은 Gauss곡선으로 근사하여 $c_{av}$ 값을 구하였다. 회전공오선은 v= $g_{J}$H- $C_{av}$ $m_{I}$로 주어지며, $m_{I}$는 0, $\pm$1, $\pm$2의 값을 갖는다. $c_{av}$ 의 크기는 인접하는 두 회전공오곡선사이의 진동수치로서도 구할수 있다. 본실험에서 원자핵공오과 회전공오 공히 이용되였다. $c_{av}$ 의 부호는 분자선자기공오실험에서 쓰이는 방법으로서, 양자화되여서 불균일자장에서 분리된 분자선을 진행하는 방향의 좌측 또는 우측에서 부분적으로 차단하면서, 공오곡선의 변화를 보는것으로, 결정된 부호 와 $c_{av}$ 의 크기는 다음과 같다. C $H_4$; -10.3$\pm$0.4kHz Si $H_4$; +3.71$\pm$0.08kHz / Ge $H_4$; +3.79$\pm$0.13kHz C $F_4$; -6.81$\pm$0.08kHz / Si $F_4$; -2.46$\pm$0.06kHz Ge $F_4$; -1.84$\pm$0.04kHz

• 한국정보디스플레이학회:학술대회논문집
• /
• 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
• /
• pp.1028-1031
• /
• 2009

High quality poly-SiGe thin films were prepared on 6-inch substrates using Reactive-thermal CVD with $Si_2H_6$ and $GeF_4$ around at $500^{\circ}C$ directly. Its thickness uniformity was ~ 3% on the entire substrate area. N-channel mobility of ~30 nm thick bottom-gate TFTs exceeded 20 $cm^2$/Vs without any further crystallization.