• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제40회 동계학술대회 초록집
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• pp.185-185
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• 2011

ZnTe semiconductor is very attractive materials for optoelectronic devices in the visible green spectral region because of it has direct bandgap of 2.26 eV. The prototypes of ZnTe light emitting diodes (LEDs) have been reported [1], showing that their green emission peak closely matches the most sensitive region of the human eye. Another application to photovoltaics proved that ZnTe is useful for the production of high-efficiency multi-junction solar cells [2,3]. By using the pulse laser deposition system, ZnTe thin films were deposited on ZnO thin layer, which is grown on (0001) Al2O3substrates. To produce the plasma plume from an ablated ZnO and ZnTe target, a pulsed (10 Hz) YGA:Nd laser with energy density of 95 mJ/$cm^2$ and wavelength of 266 nm by a nonlinear fourth harmonic generator was used. The laser spot focused on the surface of the ZnO and ZnTe target by using an optical lens was approximately 1 mm2. The base pressure of the chamber was kept at a pressure around $10^{-6}$ Torr by using a turbo molecular pump. The oxygen gas flow was controlled around 3 sccm by using a mass flow controller system. During the ZnTe deposition, the substrate temperature was $400^{\circ}C$ and the ambient gas pressure was $10^{-2}$ Torr. The structural properties of the samples were analyzed by XRD measurement. The optical properties were investigated by using the photoluminescence spectra obtained with a 325 nm wavelength He-Cd laser. The film surface and carrier concentration were analyzed by an atomic force microscope and Hall measurement system.

• 한국재료학회지
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• 제22권4호
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• pp.180-184
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• 2012

Nanostructures of ZnO, such as nanowires, nanorods, nanorings, and nanobelts have been actively studied and applied in electronic or optical devices owing to the increased surface to volume ratio and quantum confinement that they provide. ZnO seed layer (about 40 nm thick) was deposited on Si(100) substrate by RF magnetron sputtering with power of 60 W for 5 min. ZnO nanorods were grown on ZnO seed layer/Si(100) substrate at $95^{\circ}C$ for 5 hr by hydrothermal method with concentrations of $Zn(NO_3)_2{\cdot}6H_2O$ [ZNH] and $(CH_2)_6N_4$ [HMT] precursors ranging from 0.02M to 0.1M. We observed the microstructure, crystal structure, and photoluminescence of the nanorods. The ZnO nanorods grew with hexahedron shape to the c-axis at (002), and increased their diameter and length with the increase of precursor concentration. In 0.06 M and 0.08 M precursors, the mean aspect ratio values of ZnO nanorods were 6.8 and 6.5; also, ZnO nanorods had good crystal quality. Near band edge emission (NBE) and a deep level emission (DLE) were observed in all ZnO nanorod samples. The highest peak of NBE and the lower DLE appeared in 0.06 M precursor; however, the highest peak of DLE and the lower peak of NBE appeared in the 0.02 M precursor. It is possible to explain these phenomena as results of the better crystal quality and homogeneous shape of the nanorods in the precursor solution of 0.06 M, and as resulting from the bed crystal quality and the formation of Zn vacancies in the nanorods due to the lack of $Zn^{++}$ in the 0.02 M precursor.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 하계학술대회 논문집
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• pp.327-327
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• 2009

ZnO with a large band gap (~3.37 eV) and exciton binding energy (~60 meV), is suitable for optoelectronic applications such as ultraviolet (UV) light emitting diodes (LEDs) and detectors. However, the ZnO-based p-n homojunction is not readily available because it is difficult to fabricate reproducible p-type ZnO with high hall concentration and mobility. In order to solve this problem, there have been numerous attempts to develop p-n heterojunction LEDs with ZnO as the n-type layer. The n-ZnO/p-GaN heterostructure is a good candidate for ZnO-based heterojunction LEDs because of their similar physical properties and the reproducible availability of p-type GaN. Especially, the reduced lattice mismatch (~1.8 %) and similar crystal structure result in the advantage of acquiring high performance LED devices. In particular, a number of ZnO films show UV band-edge emission with visible deep-level emission, which is originated from point defects such as oxygen vacancy, oxygen interstitial, zinc interstitial[1]. Thus, defect-related peak positions can be controlled by variation of growth or annealing conditions. In this work, the undoped ZnO film was grown on the p-GaN:Mg film using RF magnetron sputtering method. The undoped ZnO/p-GaN:Mg heterojunctions were annealed in a horizontal tube furnace. The annealing process was performed at $800^{\circ}C$ during 30 to 90 min in air ambient to observe the variation of the defect states in the ZnO film. Photoluminescence measurements were performed in order to confirm the deep-level position of the ZnO film. As a result, the deep-level emission showed orange-red color in the as-deposited film, while the defect-related peak positions of annealed films were shifted to greenish side as increasing annealing time. Furthermore, the electrical resistivity of the ZnO film was decreased after annealing process. The I-V characteristic of the LEDs showed nonlinear and rectifying behavior. The room-temperature electroluminescence (EL) was observed under forward bias. The EL showed a weak white and strong yellowish emission colors (~575 nm) in the undoped ZnO/p-GaN:Mg heterojunctions before and after annealing process, respectively.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2005년도 제28회 학술발표회 초록집
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• pp.139-139
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• 2005

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.439-439
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• 2012

ZnO 나노로드는 큰 밴드갭 에너지(~3.37 eV)와 60 meV의 높은 엑시톤 결합 에너지(exciton binding energy)를 갖고 있으며, 우수한 전기적, 광학적 특성을 지닌 1차원 나노구조의 금속산화물로서 태양전지 및 광전소자 널리 응용되고 있다. 이러한 ZnO 나노로드를 성장하는 방법 중에 전기화학증착법(electrochemical deposition method)은 전도성 물질위에 증착된 시드층(seed layer)을 성장용액에 담그어 전압을 인가하여 만들기 때문에 기존의 수열합성법(hydrothermal method), 졸-겔 법(sol-gel method)보다 비교적 간단한 공정과정으로 저온에서 빠르게 물질을 성장시킬 수 있는 장점이 있다. 한편, 디스플레이 산업에서 ITO (indium tin oxide)는 투명 전도성 산화물(transparent conductive oxide)로써 가시광 파장영역에서 높은 투과율과 전도성을 가지며, 액정디스플레이, LED (Light emitting diode), 태양전지 등의 다양한 소자에 투명전극 재료로 쓰이고 있다. 또한 최근 ITO를 유연한 PET (polyethylene terephthalate) 기판 위에 증착은 얇고, 가볍고, 휘어지기 쉬워 휴대하기 편하기 때문에 차세대 광전자소자 응용에 가능성이 크다. 본 연구에서는 ZnO 나노로드를 ITO/PET 기판위에 전기화학증착법으로 성장하여, 구조적 및 광학적 특성을 분석하였다. 시드층을 형성하기 위해 RF 마그네트론 스퍼터를 이용하여 ~20 nm 두께의 ZnO 박막을 증착시킨 후, zinc nitrate와 hexamethylenetetramine이 포함된 수용액에 시료를 담그어 전압을 인가하였다. 용액의 농도와 인가전압을 조절하여 여러 가지 성장조건에 대한 ZnO 나노로드의 구조적, 광학적 특성을 비교하였다. 성장된 시료의 형태와 결정성을 조사하기 위해, field-emission scanning electron microscope (FE-SEM), X-ray diffraction (XRD)을 사용하였으며, UV-vis-NIS spectrophotometer, photoluminescence (PL) 측정장비를 사용하여 광학적 특성을 분석하였다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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• pp.200.2-200.2
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• 2013

Yttrium (Y)이 도핑 된 ZnO 나노 구조물을 수열합성법으로 제작하였다. 먼저 졸겔법으로 SiO2/Si 기판 위에 seed layer (Y-doped ZnO ; Y0.02Zn0.98O)를 제작하였으며 5번의 코팅을 진행하여 박막의 두께는 약 180 nm로 측정이 되었다. 그 후 진공 분위기에서 RTA를 이용하여 $500^{\circ}C$에서 3분간 열처리가 진행되었다. 이어서 수열합성법으로 mole 농도를 0.5~1.0 M 범위에서 변화시키며 YZO 시료를 제작하였다. X-ray diffraction (XRD)을 통해서 Y2O3 또는 결함과 관련된 피크는 관찰이 되지 않았으며, 모든 구조물에서 압축응력이 존재하는 알 수 있었으며, field emission scanning electron microscope (FESEM)에서 나노 구조물의 크기와 형태는 수열합성법의 mole 농도에 많은 영향을 받는 것으로 나타났다. Hall effect 측정을 통해서 모든 구조물은 n-type 전도 특성을 가지는 것으로 나타났다. 또한 광학적 특성인 photoluminescence (PL)에서는 수열합성법의 화학식을 고려할 때 Zn가 rich한 상태에서는 Zn interstitial로 존재하는 것으로 나타났고, mole 농도가 높아 질수록 free exciton에 의한 재결합인 UV emission이 우세하게 나타났다.

• 공업화학
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• 제20권5호
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• pp.565-569
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• 2009

녹색과 청색의 나노 형광체 합성에 있어서 입자 형상 및 입자 크기의 변화를 알아보기 위해 액상법으로 진행하였으며, 이를 바탕으로 최종적으로 녹색 형광체의 경우 약 80 nm를, 그리고 청색 형광체의 경우 약 60 nm급의 나노 형광체 분말 합성이 가능하였다. 합성된 두 가지의 $Zn_2SiO_4$ : Mn 녹색 형광체와 BAM : Eu의 청색 나노 형광체 분말의 특성 평가를 비교하였으며, 그 결과 PL 특성면에서 녹색 형광체인 $Zn_2SiO_4$ : Mn이 BAM : Eu의 청색 형광체 대비 높은 형광성을 보여주었다.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2012년도 춘계학술발표회 논문집
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• pp.349-350
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• 2012

Porous silicon (PS) was prepared by electrochemical anodization. Ultra-thin zinc oxide (ZnO) capping layers were deposited on the PS by plasma-assisted molecular beam epitaxy (PA-MBE). The effects of the ZnO capping layers on the properties of the as-prepared PS were investigated using scanning electron microscopy (SEM) and photoluminescence (PL). The as-prepared PS has circular pores over the entire surface. Its structure is similar to a sponge where the quantum confinement effect (QCE) plays a fundamental role. It was found that the dominant red emission of the porous silicon was tuned to white light emission by simple deposition of the ultra-thin ZnO capping layers. Specifically, the intensity of white light emission was observed to be enhanced by increasing the growth time from 1 to 3 min.

• 한국재료학회지
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• 제20권5호
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• pp.262-266
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• 2010

ZnO nanostructures were grown on an Au seed layer by a hydrothermal method. The Au seed layer was deposited by ion sputter on a Si (100) substrate, and then the ZnO nanostructures were grown with different precursor concentrations ranging from 0.01 M to 0.3M at $150^{\circ}C$ and different growth temperatures ranging from $100^{\circ}C$ to $250^{\circ}C$ with 0.3 M of precursor concentration. FE-SEM (field-emission scanning electron microscopy), XRD (X-ray diffraction), and PL (photoluminescence) were carried out to investigate the structural and optical properties of the ZnO nanostructures. The different morphologies are shown with different growth conditions by FE-SEM images. The density of the ZnO nanostructures changed significantly as the growth conditions changed. The density increased as the precursor concentration increased. The ZnO nanostructures are barely grown at $100^{\circ}C$ and the ZnO nanostructure grown at $150^{\circ}C$ has the highest density. The XRD pattern shows the ZnO (100), ZnO (002), ZnO (101) peaks, which indicated the ZnO structure has a wurtzite structure. The higher intensity and lower FWHM (full width at half maximum) of the ZnO peaks were observed at a growth temperature of $150^{\circ}C$, which indicated higher crystal quality. A near band edge emission (NBE) and a deep level emission (DLE) were observed at the PL spectra and the intensity of the DLE increased as the density of the ZnO nanostructures increased.

• Korean Chemical Engineering Research
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• 제40권6호
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• pp.752-756
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• 2002

PDP(Plasma Display Panel)용 녹색 형광체인 $Zn_2SiO_4:Mn$ 형광체의 제조에 있어 콜로이드 분무 열분해법을 도입하고, $Zn_2SiO_4$ wellimite 결정의 $Si^{4+}$ 자리를 치환하는 $Gd^{3+}/Li^+$ 부활성제를 첨가하여 형광체의 발광특성을 향상시키고자 하였다. 14 nm 크기의 fumed silica 입자를 규소 전구체로 도입한 콜로이드 분무열분해법에 의해서 제조되어진 $Zn_2SiO_4:Mn$ 입자는 응집이 없는 구형의 형상, 작은 입자 크기 및 좁은 입도 분포를 가졌다. $Gd^{3+}/Li^+$ 함량은 $Zn_2SiO_4:Mn$ 형광체 입자의 발광특성에 영향을 끼쳤으며, 적정한 함량의 $Gd^{3+}/Li^+$ 부활성제를 첨가함으로써 진공 자외선하에서 형광체의 발광휘도를 향상시키고, 잔광시간을 크게 줄일 수 있었다. 분무 열분해법에 의한 $Gd^{3+}/Li^+$이 코도핑된 $Zn_2SiO_4:Mn$ 형광체 입자의 제조에 있어서 후열처리 온도는 형광체의 발광특성을 결정짓는 주요한 인자이다. 0.1 mol%의 $Gd^{3+}/Li^+$ 부활제를 포함하고 $1,145^{\circ}C$ 온도에서 소결된 $Zn_2SiO_4:Mn$ 형광체 입자는 상업용 형광체에 비해 5% 높은 발광 휘도과 5.7 ms의 잔광시간을 가졌다.