• Proceedings of the KIEE Conference
• /
• 1994.07b
• /
• pp.1301-1304
• /
• 1994

ZnO transparent conducting oxide thin films have been prepared by Pyrosol deposition method. The effect of the Al doping with varying Al/Zn mole ratio and the post-deposition heat treatment on the electrical resistivity and optical transmittance of the prepared films have been investigated. From the experimental results, the ZnO:Al thin films with resistivity as low as $3{\times}10^{-3}{\Omega}cm$ and transmittance as high as 80% can be obtained by Al doping. Also We have found the annealing of the as-deposited ZnO film in vacuum leads to a substantial reduction in resistivity without affecting the optical transmittance and crystallographic orientation. However, the annealing effect of ZnO:Al thin films is smaller than ZnO films with respect to reduction in resistivity.

• Korean Journal of Materials Research
• /
• v.23 no.5
• /
• pp.255-259
• /
• 2013

An effect of thermal annealing on activating phosphorus (P) atoms in ZnO nanorods (NR) grown using a hydrothermal process was investigated. $NH_4H_2PO_4$ used as a dopant source reacted with $Zn^{2+}$ ions and $Zn_3(PO_4)_2$ sediment was produced in the solution. The fact that most of the input P elements are concentrated in the $Zn_3(PO_4)_2$ sediment was confirmed using an energy dispersive spectrometer (EDS). After the hydrothermal process, ZnO NRs were synthesized and their PL peaks were exhibited at 405 and 500 nm because P atoms diffused to the ZnO crystal from the $Zn_3(PO_4)_2$ particles. The solubility of the $Zn_3(PO_4)_2$ initially formed sediment varied with the concentration of $NH_4OH$. Before annealing, both the structural and the optical properties of the P-doped ZnO NR were changed by the variation of P doping concentration, which affected the ZnO lattice parameters. At low doping concentration of phosphorus in ZnO crystal, it was determined that a phosphorus atom substituted for a Zn site and interacted with two $V_{Zn}$, resulting in a $P_{Zn}-2V_{Zn}$ complex, which is responsible for p-type conduction. After annealing, a shift of the PL peak was found to have occurred due to the unstable P doping state at high concentration of P, whereas at low concentration there was little shift of PL peak due to the stable P doping state.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2013.02a
• /
• pp.471-471
• /
• 2013

Highly stable and high performance amorphous oxide semiconductor thin film transistors (TFTs) were fabricated using 4-mercaptophenol (4MP) doped ZnO by atomic layer deposition (ALD). The 4 MP concentration in ZnO films were varied from 1.7% to 5.6% by controlling Zn: 4MP pulses. The carrier concentrations in ZnO thin films were controlled from $1.017{\times}10^{20}$/$cm^3$ to $2,903{\times}10^{14}$/$cm^3$ with appropriate amount of 4MP doping. The 4.8% 4MP doped ZnO TFT revealed good device mobility performance of $8.4cm^2V-1s-1$ and on/off current ratio of $10^6$. Such 4MP doped ZnO TFTs were stable under ambient conditions for 12 months without any apparent degradation in their electrical properties. Our result suggests that 4 MP doping can be useful technique to produce more reliable oxide semiconductor TFT.

• Korean Journal of Materials Research
• /
• v.20 no.7
• /
• pp.351-355
• /
• 2010

Transparent conducting aluminum-doped ZnO thin films were deposited using a sol-gel process. In this study, the important deposition parameters were investigated thoroughly to determine the appropriate procedures to grow large area thin films with low resistivity and high transparency at low cost for device applications. The doping concentration of aluminum was adjusted in a range from 1 to 4 mol% by controlling the precursor concentration. The annealing temperatures for the pre-heat treatment and post-heat treatment was $250^{\circ}C$ and 400-$600^{\circ}C$, respectively. The SEM images show that Al doped and undoped ZnO films were quite uniform and compact. The XRD pattern shows that the Al doped ZnO film has poorer crystallinity than the undoped films. The crystal quality of Al doped ZnO films was improved with an increase of the annealing temperature to $600^{\circ}C$. Although the structure of the aluminum doped ZnO films did not have a preferred orientation along the (002) plane, these films had high transmittance (> 87%) in the visible region. The absorption edge was observed at approximately 370 nm, and the absorption wavelength showed a blue-shift with increasing doping concentration. The ZnO films annealed at $500^{\circ}C$ showed the lowest resistivity at 1 mol% Al doping.

• Journal of the Korean Crystal Growth and Crystal Technology
• /
• v.31 no.2
• /
• pp.73-77
• /
• 2021

Ga-doped ZnO thin films by RF magnetron sputtering process were synthesized according to the deposition conditions of O2 and Ar atmosphere gases, and rapid heat treatment (RTA) was performed at 600℃ in an N2 atmosphere. The thickness of the deposited ZnO : Ga thin film was measured, the crystal phase was investigated by XRD pattern analysis, and the microstructure of the thin film was observed by FE-SEM and AFM images. The intensity of the (002) plane of the X-ray diffraction pattern showed a significant difference depending on the deposition conditions of the thin films formed by O2 and Ar atmosphere gas types. In the case of a single thin f ilm doped with Ga under O2 conditions, a strong diffraction peak was observed. Under O2 and Ar conditions, in the case of a multilayer thin film with Ga doping, only a peak on the (002) plane with a somewhat weak intensity was shown. In the FE-SEM image, it was observed that the grain size of the surface of the thin film slightly increased as the thickness increased. In the case of a multilayer thin film with Ga doping under O2 and Ar atmosphere conditions, the specific resistance was 6.4 × 10-4 Ω·cm. In the case of a single thin film with Ga doping under O2 atmosphere conditions, the resistance of the thin film decreased. The resistance decreased as the thickness of the Ga-doped ZnO thin film increased to 2 ㎛, showing relatively a low specific resistance of 1.0 × 10-3 Ω·cm.

• Journal of Powder Materials
• /
• v.30 no.6
• /
• pp.509-515
• /
• 2023

Lead-free perovskite ceramics, which have excellent energy storage capabilities, are attracting attention owing to their high power density and rapid charge-discharge speed. Given that the energy-storage properties of perovskite ceramic capacitors are significantly improved by doping with various elements, modifying their chemical compositions is a fundamental strategy. This study investigated the effect of Zn doping on the microstructure and energy storage performance of potassium sodium niobate (KNN)-based ceramics. Two types of powders and their corresponding ceramics with compositions of (1-x)(K,Na)NbO₃-xBi(Ni_2/3Ta_1/3)O₃ (KNN-BNT) and (1-x)(K,Na)NbO₃-xBi(Ni_1/3Zn_1/3Ta_1/3)O₃ (KNN-BNZT) were prepared via solid-state reactions. The results indicate that Zn doping retards grain growth, resulting in smaller grain sizes in Zn-doped KNN-BNZT than in KNN-BNT ceramics. Moreover, the Zn-doped KNN-BNZT ceramics exhibited superior energy storage density and efficiency across all x values. Notably, 0.9KNN-0.1BNZT ceramics demonstrate an energy storage density and efficiency of 0.24 J/cm³ and 96%, respectively. These ceramics also exhibited excellent temperature and frequency stability. This study provides valuable insights into the design of KNN-based ceramic capacitors with enhanced energy storage capabilities through doping strategies.

• Korean Journal of Materials Research
• /
• v.14 no.5
• /
• pp.328-333
• /
• 2004

Transparent ZnO:Al conductor films for the optoelectronic devices were deposited by using the capacitively coupled DC magnetron sputtering method. The effect of Al doping concentration and discharge power on the electrical and optical properties of the films was studied. The film resistivity of $8.5${\times}$10^{-4}$ $\Omega$-cm was obtained at the discharge power of 40 W with the ZnO target doped with 2 wt% $Al_2$$_O3$. The transmittance of the 840 nm thick film was 91.7% in the visible waves. Increasing doping concentration of 3 wt% $Al_2$$O_3$ in ZnO target results in significant decrease of film resistivity, which may be due to the formation of $Al_2$$O_3$ particles in the as-deposited ZnO:Al film and the reduced ZnO grain sizes. Increasing DC power from 40 to 60 W increases deposition rate by more than 50%, but can induce high defect density in the film, resulting in higher film resistivity.

• 한국신재생에너지학회:학술대회논문집
• /
• 2009.11a
• /
• pp.359-359
• /
• 2009

투명전도 산화막 재료로 널리 사용되고 있는 ITO는 전기적 및 광학적 특성이 우수한 장점이 있으나, ITO의 주 재료인 인듐은 매장량이 적어서 가격이 고가인 단점이 있어 대체 재료의 개발이 시급한 상황이다. ITO 대체 TCO로 가장 유력한 후보인 Al doped ZnO(AZO)는 가시광을 투과하는 성질을 가지고 있고, 저온 공정이 가능하다는 장점뿐만 아니라 수소 분위기의 안정성 및 가격이 싸다는 장점이 있다. 본 연구에서는 양이온 금속원소(Al)과 음이온 할로겐 원소(F) 및 수소(H)를 co-doping한 ZnO 박막을 rf 마그네트론 스퍼터를 이용하여 증착한 뒤 도핑량과 진공중에서의 열처리에 따른 전기적 및 광학적 특성에 대해 고찰하였다. Al과 H를 co-doping한 ZnO의 박막의 경우 Al의 농도가 낮은 TCO박막이 전기적 특서에서 더 큰 향상을 보였으며, 동일한 F 함량에서는 H 함량이 늘어날수록 캐리어의 증가해 TCO박막의 전기적 특성이 향상되는 것으로 나타났다. 그러나 진공중의 열처리에 따른 F와 H의 거동은 반대로 나타났다. 이 연구를 통해서 $36.2cm^2$/Vs의 높은 홀 이동도와 $2.9{\times}10^{-4}{\Omega}cm$의 낮은 비저항을 가지는 ZnO계 박막의 제조가 가능하였다.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2013.08a
• /
• pp.204.1-204.1
• /
• 2013

Fluorine, the radius of which is close to that of oxygen, could be an appropriate anion doping candidate. A lower lattice distortion could be expected for F doping, compared with Al, Ga, and In doping. F-doped ZnO (FZO) and undoped ZnO nanorods were grown onto glass substrate by the hydrothemal method. The doping level in the solution, designated by F/Zn atomic ratio of was varied from 0.0 to 10.0 in 2.0 steps. To investigate the effects of the structure and optical properties of FZO nanorods were investigated using X-ray diffraction, UV-visible spectroscopy and photoluminescence (PL). For the PL spectra, the maximum peak position of NBE moves to higher energy, from 0 to 4 at.%. As the doping concentration increases, the maximum peak position of NBE gradually moves to lover energy, from 4 to 10 at.%.

• Korean Journal of Materials Research
• /
• v.16 no.1
• /
• pp.58-62
• /
• 2006

Effects of doping concentration and annealing atmosphere on the luminescent properties of $Er^{3+}$ doped ZnO phosphor powders were investigated. Photoluminescence (PL) spectra of ZnO:Er exhibit an orange emission band at around 575 nm, while those of pure ZnO show a green emission at 520 nm. Emission difference between ZnO:Er and pure ZnO is attributed to the energy transfer of Er ions in ZnO. The highest PL intensity is obtained by doping 1 mol% Er to ZnO. Luminescent properties of ZnO:Er phosphors annealed at $N_2$+vacuum atmosphere are superior to those annealed at $N_2$ atmosphere.