• Title/Summary/Keyword: ZnO Piezoelectric Thin Film

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Sensitivity Improvement and Operating Characteristics Analysis of the Pressure Sensitive Field Effect Transistor(PSFET) Using Highly-Oriented ZnO Piezoelectric Thin Film

  • Lee, Jeong-Chul;Cho, Byung-Woog;Kim, Chang-Soo;Nam, Ki-Hong;Kwon, Dae-Hyuk;Sohn, Byung-Ki
    • Journal of Sensor Science and Technology
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    • v.6 no.3
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    • pp.180-187
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    • 1997
  • We demonstrate the improvement of sensitivity and analysis of operating characteristics of the piezoelectric pressure sensor using ZnO piezoelectric thin film and FET(field effect transistor) for sensing applied pressure and transforming the pressure into electrical signals, respectively. The sensitivity of the PSFET(pressure sensitive field effect transistor) was improved by using highly-oriented ZnO film perpendicular to the substrate surface and the operating characteristics was investigated by monitoring output voltage with time in various static pressure levels.

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Characteristics of Air-Gap Type FBARs Using ZnO Piezoelectric Thin Film With Varying Dimension of Sacrificial and Piezoelectric layer (희생층과 압전층의 면적변화에 따른 ZnO 압전박막을 이용한 Air-gap Type FBAR의 특성)

  • 고성용;장철영;최현철;이정희;이용현
    • Proceedings of the IEEK Conference
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    • 2001.06b
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    • pp.17-20
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    • 2001
  • In this paper, film bulk acoustic resonator(FBAR) with an air-gap is fabricated by removing ZnO sacrificial layer and its characteristics as a various dimension of ZnO sacrificial and piezoelectric layer is evaluated. The center frequency of the FBAR device with the ZnO film is about 1.9 GHz. Because of mass-loading effect, a dimension of sacrificial layer and piezoelectrc layer affect frequency response such as center frequency, insertion loss, band separation, attenuation and so on.

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ZnO thin films used in the piezoelectric layer of FBAR devices were deposited by 2-step methods using ALD equipment (FBAR 소자의 압전층으로 사용되는 ZnO 박막의 증착시 ALD틀 이용한 2-step 법 적용에 관한 연구)

  • Lee, Soon-Bum;Park, Sung-Hyun;Lee, Neung-Heon;Shin, Young-Hwa
    • Proceedings of the KIEE Conference
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    • 2006.07c
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    • pp.1651-1652
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    • 2006
  • In this study, the 2-step methode by ALD equipment was used to improve the characteristics of ZnO thin films used in a piezoelectric layer when the FBAR devices of a SMR type are fabricated. The Height of formed buffer layer was $400{\AA}$ and ZnO thin film of $13600{\AA}$ was deposited by RF sputter on the buffer layer. When ZnO thin films are deposited, deposition conditions such as pressure, injection time of source and purge time were changed variously. The characteristics of piezoelectric layer such as a crystal orientation and micro-structure of deposited ZnO thin films were studied by SEM, AFM and XRD.

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Fabrication and Properties of ZnSnO3 Piezoelectric Films Deposited by a Pulsed Laser Deposition (Pulsed Laser Deposition 방법으로 증착된 ZnSnO3 압전 박막의 성장과 특성 평가)

  • Park, Byeong-Ju;Yoon, Soon-Gil
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.27 no.1
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    • pp.18-21
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    • 2014
  • Because the Pb-based piezoelectric materials showed problems such as an environmental pollution. lead-free $O_3$ materials were studied in the present study. The $O_3$ thin films were deposited at $640^{\circ}C$ on $Pt/Ti/SiO_2$ substrate by pulsed laser deposition (PLD) and were annealed for 5 min at $750^{\circ}C$ using rapid thermal annealing (RTA) in nitrogen atmosphere. Samples annealed at $750^{\circ}C$ showed a smooth morphology and an improvement of the dielectric and leakage properties, as compared with as-grown samples. However, electrical properties of the $O_3$ thin films obtained in the present study should be improved for piezoelectric applications.

Influence of the Substrate Temperature on the Characterization of ZnO Thin Films (기판온도가 ZnO 박막의 특성에 미치는 영향)

  • Joung, Yang-Hee;Kwon, Oh-Kyung;Kang, Seong-Jun
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.10 no.12
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    • pp.2251-2257
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    • 2006
  • We fabricated ZnO thin film successfully by using RF magnetron sputtering and investigated its potential for being utilized as the key material of piezoelectric device with the characterization of ZnO thin film such as such as crystallinity, surface morphology, c-axis orientation, film density. In thin study, $Ar/O_2$ gas ratio is fixed 70/30, RF power 125W, working pressure 8mTorr, distance between substrate and target 70mm, but the substrate temperature is varied from room temperature to $400^{\circ}C$. The relative intensity ($I_{(002)}/I_{(100)}$) or (002) peak in ZnO thin film deposited at $300^{\circ}$ was exhibited as 94%, then its FWHM was $0.571^{\circ}C$. Also, from the surface morphology evaluated by SEM and AFM, the film deposited at $300^{\circ}C$ showed uniform particle shape and excellent surface roughness of 4.08 m. The tendency of ZnO thin film density was exhibited to be denser with increasing substrate temperature but slightly decreased at near $400^{\circ}C$.

A Study on the frequency characteristic of ZnO Piezoelectric transducers (ZnO 압전변환기의 주파수특성에 관한 연구)

  • 정규원;이종덕;정광천;박상만;송준태
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1996.05a
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    • pp.189-192
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    • 1996
  • In this paper ZnO Piezoelectric transducers were fabricated as follows, counter electrode (pt 99.9%) was deposited on the sapphire substrates by DC sputter method, and then piezoelectric layer (ZnO 99.999%) was deposited on the counter electrode according to the sputtering parameters, and then top electrode (pt 99.9%) was deposited on the piezoelectric layer by Electron Beam Gun Evaporator. Structural characteristic of deposited ZnO thin film was measured by XRD, SEM. Also, Frequency characteristic of ZnO transducer was analyzed theoretically and practically for input frequencies.

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A Feasibility Study of Nano-grained ZnO Piezoelectric Thin Film Fabrication

  • Zhang, Ruirui;Lee, Eun-Ju;Yoon, Gi-Wan
    • Journal of information and communication convergence engineering
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    • v.7 no.4
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    • pp.530-534
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    • 2009
  • C-axis-oriented ZnO thin films were successfully deposited on p-Si (100) in an RF magnetron sputtering system. Deposition conditions such as deposition power, working pressure, and oxygen gas ratio $O_2/(O_2+Ar)$ were varied. Crystalline structures of the deposited ZnO films were investigated by a scanning electron microscope (SEM) technique. Results show that the deposition parameters can have a strong impact on the preferred orientations and grain sizes of the deposited ZnO films.

Preparation of ZnO thin film for SAW filter (SAW Filter용 ZnO 박막의 제작)

  • Seong, H.Y.;Yang, J.S.;Keum, M.J.;Son, I.H.;Kim, K.H.
    • Proceedings of the KIEE Conference
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    • 2000.11c
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    • pp.509-510
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    • 2000
  • Piezoelectric ZnO thin films were deposited on slide glass by Facing Targets Sputtering(FTS). The Facing Targets Sputtering system can deposit thin film in plasma-free situation and change the deposition condition in wide range. The characteristics of zinc oxide thin films on power, working pressure, and substrate temperature were investigated by XRD (x-ray diffractometer), alpha-step (Tencor) and SEM (Scanning Electron Microscopy) analyses. In the results, we suggest that FTS system is very suitable to preparing high quality ZnO thin films with good c-axis orientation.

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Cryogenic Behavior of Perovskite Materials

  • Paik, D.S.;Shin, H.Y.;Yoon, S.J.;Kim, H.J.;Park, C.Y.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1999.05a
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    • pp.126-129
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    • 1999
  • Dielectric and piezoelectric properties of perovskite materials such as La modified $Pb(Zr,Ti)O_3$ ceramics and $Pb(Zn_{1/3}Nb_{2/3})O_3-PbTiO_3$ single crystals were investigated for cryogenic capacitor and actuator applications. Enhanced extrinsic contributions resulted in piezoelectric coefficient (d33) as high as 250 pC/N at 30 K, superior to that of PZT ($d_{33}$ ~ 100 pC/N). This cryogenic property enhancement was associated with retuning the MPB (or cryogenic temperatures. PZN-PT single crystals exhibited dramatic property improvements such as $d_{33}$ > 500 pC/N at 30 K as a result of an engineered domain state.

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The Effect on Acoustic Band Characteristics of ZnO Piezoelectric Transducer according to Thickness of Counter Electrode Layers (하부전극층의 두께가 ZnO 압전변환기의 음향대역특성에 미치는 영향)

  • Park, Gi-Yub;Lee, Jong-Deok;Park, Soon-Tae
    • Journal of the Institute of Electronics Engineers of Korea TE
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    • v.37 no.1
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    • pp.18-26
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    • 2000
  • In this paper, piezoelectric transducer was theoretically analyzed to fabricate high frequency piezoelectric transducer with broadband characteristics. Piezoelectric transducer have been fabricated with 3.825${\mu}m$ ZnO film on Pt/Sapphire(0001), and its appilicability of transducer was confirmed with analyzing theoretical and experimental frequency characteristic. The resonance frequency was detected at the frequency of 827.47MHz corresponding to the half-wavelength frequency of ZnO thin film. Insertion loss was almost -50dB. The minimum insertion loss agrees with simulation analysis.

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