• Title/Summary/Keyword: ZnO

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Synthesis of Zn-intermediate from alkali agents and its transformation to ZnO crystallinity (알칼리 침전제에 의해 제조된 아연 중간생성물 및 산화아연 결정화)

  • Jang, Dae-Hwan;Kim, Bo-Ram;Kim, Dae-Weon
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.31 no.6
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    • pp.270-275
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    • 2021
  • ZnO was synthesized according to the transformation behavior and crystallization conditions of Zn-intermediate obtained by zinc sulfate as a precursor and NaOH, Na2CO3 as a alkali agents. For ZnO crystallization, Zn4(OH)6SO4·H2O and Zn5(OH)6(CO3)2·H2O as a Zn-intermediate were calcined at 400℃ and 800℃ for 1 h, respectively, based on decomposition temperature from TGA. Zn4(OH)6SO4·H2O was confirmed to have mixed Zn4(OH)6SO4·H2O and ZnO at 400℃, and was completely thermally decomposed at 800℃ to form ZnO phase. The prepared Zn5(OH)6(CO3)2·H2O as a Zn-intermediate by the reaction with Na2CO3 was transformed to a complete ZnO crystallization over 400℃. Nano-sized ZnO can be synthesized at a relatively lower calcination temperature through the reaction with Na2CO3.

Synthesis of ZnO nanoparticles and their photocatalytic activity under UV light

  • Nam, Sang-Hun;Kim, Myeong-Hwa;Bu, Jin-Hyo
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.423-423
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    • 2011
  • Zinc oxide is metal oxide semiconductor with the 3.37 eV bandgap energy. Zinc oxide is very attractive materials for many application fields. Zinc Oxide has many advantages such as high conductivity and good transmittance in visible region. Also it is cheaper than other semiconductor materials such as indium tin oxide (ITO). Therefore, ZnO is alternative material for ITO. ZnO is attracting attention for its application to transparent conductive oxide (TCO) films, surface acoustic wave (SAW), films bulk acoustic resonator (FBAR), piezoelectric materials, gas-sensing, solar cells and photocatalyst. In this study, we synthesized ZnO nanoparticles and defined their physical and chemical properties. Also we studied about the application of ZnO nanoparticles as a photocatalyst and try to find a enhancement photocatalytic activity of ZnO nanorticles.. We synthesized ZnO nanoparticles using spray-pyrolysis method and defined the physical and optical properties of ZnO nanoparticles in experiment I. When the ZnO are exposed to UV light, reduction and oxidation (REDOX) reaction will occur on the ZnO surface and generate O2- and OH radicals. These powerful oxidizing agents are proven to be effective in decomposition of the harmful organic materials and convert them into CO2 and H2O. Therefore, we investigated that the photocatalytic activity was increased through the surface modification of synthesized ZnO nanoparticles. In experiment II, we studied on the stability of ZnO nanoparticles in water. It is well known that ZnO is unstable in water in comparison with TiO2. Zn(OH)2 was formed at the ZnO surface and ZnO become inactive as a photocatalyst when ZnO is present in the solution. Therefore, we prepared synthesized ZnO nanoparticles that were immersed in the water and dried in the oven. After that, we measured photocatalytic activities of prepared samples and find the cause of their photocatalytic activity changes.

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Morphological Change and Luminescence Properties of ZnO Crystals Synthesized by Thermal Evaporation of a Mixture of Zn and Cu Powder (Zn과 Cu 혼합 분말의 열 증발에 의하여 생성된 ZnO 결정의 형상 변화 및 발광 특성)

  • Lee, Geun-Hyoung
    • Korean Journal of Materials Research
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    • v.28 no.10
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    • pp.578-582
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    • 2018
  • ZnO crystals with different morphologies are synthesized through thermal evaporation of the mixture of Zn and Cu powder in air at atmospheric pressure. ZnO crystals with wire shape are synthesized when the process is performed at $1,000^{\circ}C$, while tetrapod-shaped ZnO crystals begin to form at $1,100^{\circ}C$. The wire-shaped ZnO crystals form even at $1,000^{\circ}C$, indicating that Cu acts as a reducing agent. As the temperature increases to $1,200^{\circ}C$, a large quantity of tetrapod-shaped ZnO crystals form and their size also increases. In addition to the tetrapods, rod-shaped ZnO crystals are observed. The atomic ratio of Zn and O in the ZnO crystals is approximately 1:1 with an increasing process temperature from $1,000^{\circ}C$ to $1,200^{\circ}C$. For the ZnO crystals synthesized at $1,000^{\circ}C$, no luminescence spectrum is observed. A weak visible luminescence is detected for the ZnO crystals prepared at $1,100^{\circ}C$. Ultraviolet and visible luminescence peaks with strong intensities are observed in the luminescence spectrum of the ZnO crystals formed at $1,200^{\circ}C$.

Effects of ZnO Buffer Layer Thickness on the Crystallinity and Photoluminescence Properties of Rf Magnetron Sputter-deposited ZnO Thin Films (rf 마그네트런 스퍼터링법으로 Si 기판위에 증착한 ZnO 박막의 결정성과 photoluminescence 특성에 대한 Zn 완충층 두께의 영향)

  • Cho, Y.J.;Park, An-Na;Lee, Chong-Mu
    • Korean Journal of Materials Research
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    • v.16 no.7
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    • pp.445-448
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    • 2006
  • Highly c-axis oriented ZnO thin films were grown on Si(100)substrates with Zn buffer layers. Effects of the Zn buffer layer thickness on the structural and optical qualities of ZnO thin films were investigated using X-ray diffraction (XRD), photoluminescence (PL) and Atomic force microscopy (AFM) analysis techniques. It was confirmed that the quality of a ZnO thin film deposited by rf magnetron sputtering was substantially improved by using a Zn buffer layer. The highest ZnO film quality was obtained with a Zn buffer layer 110 nm thick. The surface roughness of the ZnO thin film increases as the Zn buffer layer thickness increases.

Thin Film Transistor Characteristics with ZnO Channel Grown by RF Magnetron Sputtering (RF Magnetron Sputtering으로 증착된 ZnO의 증착 특성과 이를 이용한 Thin Film Transistor특성)

  • Kim, Young-Woong;Choi, Duck-Kyun
    • Journal of the Microelectronics and Packaging Society
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    • v.14 no.3
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    • pp.15-20
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    • 2007
  • Low temperature processed ZnO-TFTs on glass below $270^{\circ}C$ for plastic substrate applications were fabricated and their electrical properties were investigated. Films in ZnO-TFTs with bottom gate configuration were made by RF magnetron sputtering system except for $SiO_2$ gate oxide deposited by ICP-CVD. ZnO channel films were grown on glass with various Ar and $O_2$ flow ratios. All of the fabricated ZnO-TFTs showed perfectly the enhancement mode operation, a high optical transmittance of above 80% in visible ranges of the spectrum. In the ZnO-TFTs with pure Ar process, the field effect mobility, threshold voltage, and on/off ratio were measured to be $1.2\;cm^2/Vs$, 8.5 V, and $5{\times}10^5$, respectively. These characteristic values are much higher than those of the ZnO-TFTs of which ZnO channel layers were processed with additional $O_2$ gas. In addition, ZnO-TFT with pure Af process showed smaller swing voltage of 1.86v/decade compared to those with $Ar+O_2$ process.

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Fabrication of ZnO Nanowires by Green Technology (녹색기술을 이용하여 제작된 ZnO 나노선)

  • Lee, Geun-Hyoung
    • Korean Journal of Metals and Materials
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    • v.50 no.3
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    • pp.233-236
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    • 2012
  • ZnO nanowires were fabricated through thermal evaporation of Zn or ZnS powder using solar energy. The Zn or ZnS powder was heated and evaporated by sunlight. The sunlight was concentrated on the Zn or ZnS powder by a converging lens and then the Zn or ZnS powder was evaporated and oxidized in air. After oxidation, ZnO nanowires were fabricated in the focal point. Strong ultraviolet emission, which corresponds to the near band-edge emission, was observed from the ZnO nanowires synthesized using Zn powder as a source material. Meanwhile, green emission, related to intrinsic defects such as oxygen vacancies, prevailed for the ZnO nanowires fabricated using ZnS powder. No catalysts were used in the fabrication of the ZnO nanowires, which suggested the ZnO nanowires were grown by a vapor-solid mechanism.

Microstructure of ZnO Thin Films Deposited by PECVD using Diethylzine (Diethylzinc를 사용하여 PECVD로 증착한 ZnO 박막의 미세 구조 분석)

  • 김영진;김형준
    • Korean Journal of Crystallography
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    • v.4 no.2
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    • pp.92-99
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    • 1993
  • ZnO thin films were depositsd by Plasma enhanced CVD (PUW) using Diethylzinc and N2O gas, and micro-structue of ZnO thin films were investigated ZnO thin films composed of micro-crystallites was deposited at the substrate of loot. However, highly c-axis oriented ZnO thin films were deposited on the glass substrates above 200℃. TEM analysis revealed that an epitaxial (002) ZnO thin film was deposited on c-plane sapphire substrate at the substrate temperature of 350℃, and More patterns showing partial dislocation were observed at the grain boundary.

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Growth and structural properties of ZnO co-doped Er :$ LiNbO_3$ thin films by liquid phase epitaxy method (LPE법에 의한 ZnO co-doped Er :$ LiNbO_3$, 박막의 성장 및 구조적 특성)

  • 심장보;전원남;윤석규;윤대호
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.12 no.1
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    • pp.27-30
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    • 2002
  • ZnO co-doped Er:$LiNbO_3$ single crystal thin films have been grown on $LiNbO_3$ (001) substrate by liquid phase epitaxy (LPE) method. The melts of ZnO co-doped Er:$LiNbO_3$ was fixed $Er_2O_3$, concentration (1 mol%) and different ZnO concentrations 3 and 5 mol%. The crystallinity of ZnO co-doped Er :$LiNbO_3$ films became better than the $LiNbO_3$ substrate. At ZnO 5 mol% concentration, the surface of ZnO co-doped Er:$LiNbO_3$ film is affected by compressive stress along both the perpendicular and the parallel direction. Also the surface of ZnO 3 mol% co-doped Er:$LiNbO_3$film is smoother than the original $LiNbO_3$ substrate surface.

The Characteristics of Multi-layer Structure LED with MgxZn1-xO Thin Films (MgxZn1-xO를 활용한 Multi-layer 구조 LED 특성에 관한 연구)

  • Son, Ji-Hoon;Kim, Sang-Hyun;Jang, Nak-Won;Kim, Hong-Seong
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.25 no.10
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    • pp.811-816
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    • 2012
  • The effect of co-sputtering condition on the structural properties of $Mg_xZn_{1-x}O$ thin films grown by RF magnetron co-sputtering system was investigated for manufacturing ZnO/MgZnO structure LED. $Mg_xZn_{1-x}O$ thin films were grown with ZnO and MgO target varying RF power. Structural properties were investigated by X-ray diffraction (XRD) and Energy dispersive spectroscopy (EDS). The ZnO thin films have sufficient crystallinity on the high RF power. As RF power of ZnO target increased, the contents of MgO in the $Mg_xZn_{1-x}O$ film decreased. LED was manufactured using ZnO/MgZnO multi-layer on p-GaN/$Al_2O_3$ substrate. Threshold voltage of multi-layer LED was appeared at 8 V, and it was luminesced at wave length of 550 nm.

Electrical and optical properties of ZnO:Al transparent conductive films with thermal treatments (ZnO:Al 투명도전막의 열처리에 따른 전기적 및 광학적 특성)

  • Ma, Tae Young;Park, Ki Cheol
    • Journal of IKEEE
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    • v.24 no.2
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    • pp.435-440
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    • 2020
  • ZnO:Al films with about 500 nm thick were prepared by RF magnetron sputtering. The ZnO:Al films were annealed at 100 ℃, 200 ℃, 300 ℃, and 400 ℃ for 10 h, respectively. The resistivity, carrier concentration, and mobility variation of ZnO:Al films with heat treatments were measured. The causes of the resistivity variation of ZnO:Al films with heat treatments were investigated by utilizing the results of x-ray diffraction and field emission scanning electron microscope. The energy band gap, Urbach energy, and refractive index were obtained from the transmittance of ZnO:Al films. The change in electrical properties of the ZnO:Al film was explained in relation to the optical properties.