• Title/Summary/Keyword: Zero-thickness layer

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An integral quasi-3D computational model for the hygro-thermal wave propagation of imperfect FGM sandwich plates

  • Abdelouahed Tounsi;Saeed I. Tahir;Mohammed A. Al-Osta;Trinh Do-Van;Fouad Bourada;Abdelmoumen Anis Bousahla;Abdeldjebbar Tounsi
    • Computers and Concrete
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    • v.32 no.1
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    • pp.61-74
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    • 2023
  • This article investigates the wave propagation analysis of the imperfect functionally graded (FG) sandwich plates based on a novel simple four-variable integral quasi-3D higher-order shear deformation theory (HSDT). The thickness stretching effect is considered in the transverse displacement component. The presented formulation ensures a parabolic variation of the transverse shear stresses with zero-stresses at the top and the bottom surfaces without requiring any shear correction factors. The studied sandwich plates can be used in several sectors as areas of aircraft, construction, naval/marine, aerospace and wind energy systems, the sandwich structure is composed from three layers (two FG face sheets and isotropic core). The material properties in the FG faces sheet are computed according to a modified power law function with considering the porosity which may appear during the manufacturing process in the form of micro-voids in the layer body. The Hamilton principle is utilized to determine the four governing differential equations for wave propagation in FG plates which is reduced in terms of computation time and cost compared to the other conventional quasi-3D models. An eigenvalue equation is formulated for the analytical solution using a generalized displacements' solution form for wave propagation. The effects of porosity, temperature, moisture concentration, core thickness, and the material exponent on the plates' dispersion relations are examined by considering the thickness stretching influence.

H-Polarized Scattering by a Resistive Strip Grating with the Tapered Resistivity Over a Grounded Dielectric Plane : from Finite at One Strip-Edge to Zero at the Other Strip-Edge (접지된 유전체 평면위의 변하는 저항율을 갖는 저항띠 격자구조에 의한 H-분극 산란 : 한쪽 모서리에서 유한하고 다른쪽 모서리로 가면서 0인 경우)

  • Yoon, Uei-Joong
    • Journal of Advanced Navigation Technology
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    • v.15 no.4
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    • pp.543-548
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    • 2011
  • In this paper, H-polarized electromagnetic scattering problems by a resistive strip grating over a grounded dielectric plane according to the strip width and grating period, the relative permittivity and thickness of a dielectric layer, and incident angles of a TE (transverse electric) plane wave are analyzed by applying the FGMM (Fourier-Galerkin Moment Method). The tapered resistivity of resistive strips in this paper varies from finite resistivity at one edge to zero resistivity at the other edge, then the induced surface current density on the resistive strip is expanded in a series of Jacobi polynomials of the order ${\alpha}=1$, ${\beta}=0$ as a kind of orthogonal polynomials. The numerical results of the normalized reflected power show in good agreement with those of existing papers.

Fabrication of a Thermopneumatic Valveless Micropump with Multi-Stacked PDMS Layers

  • Jeong, Ok-Chan;Jeong, Dae-Jung;Yang, Sang-Sik
    • KIEE International Transactions on Electrophysics and Applications
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    • v.4C no.4
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    • pp.137-141
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    • 2004
  • In this paper, a thermopneumatic PMDS (polydimethlysiloxane) micropump with nozzle/diffuser elements is presented. The micropump is composed of nozzle/diffuser elements as dynamic valves, an actuator consisting of a circular PDMS diaphragm and a Cr/Au heater on a glass substrate. Four PDMS layers are used for fabrication of an actuator chamber, actuator diaphragm by a spin coating process, spacer layer, and nozzle/diffuser by the SU-8 molding process. The radius and thickness of the actuator diaphragm is 2 mm and 30 ${\mu}{\textrm}{m}$, respectively. The length and the conical angle of the nozzle/diffuser elements are 3.5 mm and 20$^{\circ}$, respectively. The actuator diaphragm is driven by the air cavity pressure variation caused by ohmic heating and natural cooling. The flow rate of the micropump in the frequency domain is measured for various duty cycles of the square wave input voltage. When the square wave input voltage of 5 V DC is applied to the heater, the maximum flow rate of the micropump is 44.6 ${mu}ell$/min at 100 Hz with a duty ratio of 80% under the zero pressure difference.

Evaluation of Chromatic-Dispersion-Dependent Four-Wave-Mixing Efficiency in Hydrogenated Amorphous Silicon Waveguides

  • Kim, Dong Wook;Jeong, Heung Sun;Jeon, Sang Chul;Park, Sang Hyun;Yoo, Dong Eun;Kim, Ki Nam;An, Shin Mo;Lee, El-Hang;Kim, Kyong Hon
    • Journal of the Optical Society of Korea
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    • v.17 no.5
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    • pp.433-440
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    • 2013
  • We present an experimental and numerical study of spectral profiles of effective group indices of hydrogenated amorphous silicon (a-Si:H) waveguides and of their chromatic-dispersion effect on the four-wave-mixing (FWM) signal generation. The a-Si:H waveguides of 220-nm thickness and three different widths of 400, 450 and 500 nm were fabricated by using the conventional CMOS device processes on a $2-{\mu}m$ thick $SiO_2$ bottom layer deposited on 8-inch Si wafers. Mach-Zehnder interferometers (MZIs) were formed with the a-Si:H waveguides, and used for precise measurement of the effective group indices and thus for determination of the spectral profile of the waveguides' chromatic dispersion. The wavelength ranges for the FWM-signal generation were about 45, 75 and 55 nm for the 400-, 450- and 500-nm-wide waveguides, respectively, at the pump wavelength of 1532 nm. A widest wavelength range for the efficient FWM process was observed with the 450-nm-wide waveguide having a zero-dispersion near the pump wavelength.

Experimental Study on the Three-Dimensional Topology of Hairpin Packet Structures in Turbulent Boundary Layers (난류경계층의 3차원 헤어핀 다발구조에 대한 실험적 연구)

  • Kwon, Seong-Hun;Yoon, Sang-Youl;Kim, Kyung-Chun
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.28 no.7
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    • pp.834-841
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    • 2004
  • Experimental study on the three-dimensional topology of hairpin packet structures in turbulent boundary layers were carried out. Two different Reynolds number based on momentum thickness, Re$\sub$$\theta$/=514 and 934 were generated in a blowing type wind tunnel under the condition of zero pressure gradient. Simultaneous measurements of velocity fields at a wall-normal plane and wall-parallel plane by a plane PIV and a Stereo-PIV systems. The two Nd:Yag laser systems and three CCD cameras were synchronized to obtain instantaneous velocity fields at the same time. To avoid optical noise at the crossing line by the two laser light sheets, a new optical arrangement using polarization was applied. The obtained velocity fields show the existence of hairpin packet structure vividly and the idealized hairpin vortex signature is confirmed by experiment. Two counter-rotating vortex pair which reflects the cutting plane of hairpin legs are found both side of a strong streaky structure when the wall-normal plane cuts the hairpin head.

Effects of Oxygen on Preparation of TiO2 Thin Films by MOCVD (MOCVD법에 의한 TiO2 박막의 제조에 미치는 산소의 영향)

  • Yu, Seong-Uk;Park, Byeong-Ok;Jo, Sang-Hui
    • Korean Journal of Crystallography
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    • v.6 no.2
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    • pp.111-117
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    • 1995
  • TiO2 thin films were prepared on a (100)silicon wafer using a chemical vapor deposition(CVD) method. The deposition experiments were performed using the TTIP in the deposition temperature ransing from 200 content. The deposition rate of TiO2 was increased with the substrate temperature and the oxygen content. The thickness of the deposited thin film and the compositional analysis of this thin films with theoxygen content were measured using Ellipsometry, SEM and ESCA, respectively. The deposited thin film was composed of a bilayer, external TiO2 and internal Ti. Carbon as a residual impurity was found to remain when zero sccm O2 was purged into a reaction chamber and the composition of the deposited thin film was found to change Ti into TiO in a deeper layer. However, when 600sccm O2 was supplied to a reaction chamber, it has been found to reside less carbon content than without O2. Finally, in the condition of 1200sccm O2, no impurity level of carbon was observed and a deeper layer consisted of the Ti composite, even though the deposited surface was composed of TiO2.

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Crustal Structure of the Korean Peninsula By Travel Time Inversion of Local Earthquakes

  • Song, Seok-Gu;Lee, Gi-Hwa
    • Journal of the Korean Geophysical Society
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    • v.4 no.1
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    • pp.21-33
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    • 2001
  • Simultaneous inversion of first-arrivals of local earthquakes recorded by the Korea Meteorological Administration(KMA) seismograph network from 1991 to 1998 is made to derive 1D crustal velocity structure of the Korean peninsula. Twenty-nine events with 178 observations are used in the inversion. Average crustal P-wave velocity turns out to be about 6.3 km/sec, and crustal thickness and upper mantle P-wave velocity are estimated as 33 km and 7.9 km/sec, respectively. Results of inversion indicate the possibility of the low velocity layer in the lower crust. Joint inversion is applied to estimate hypocenters, station delays, and velocities simultaneously. Relative station corrections for 11 stations range from zero to about 1.2 sec. Analysis of the synthetic data shows that estimates of hypocenter locations and station corrections as well as averaged crustal structure are reliable for the given data set..

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New Ruthenium Complexes for Semiconductor Device Using Atomic Layer Deposition

  • Jung, Eun Ae;Han, Jeong Hwan;Park, Bo Keun;Jeon, Dong Ju;Kim, Chang Gyoun;Chung, Taek-Mo
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.363-363
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    • 2014
  • Ruthenium (Ru) has attractive material properties due to its promising characteristics such as a low resistivity ($7.1{\mu}{\Omega}{\cdot}cm$ in the bulk), a high work function of 4.7 eV, and feasibility for the dry etch process. These properties make Ru films appropriate for various applications in the state-of-art semiconductor device technologies. Thus, it has been widely investigated as an electrode for capacitor in the dynamic random access memory (DRAM), a metal gate for metal-oxide semiconductor field effect transistor (MOSFET), and a seed layer for Cu metallization. Due to the continuous shrinkage of microelectronic devices, better deposition processes for Ru thin films are critically required with excellent step coverages in high aspect ratio (AR) structures. In these respects, atomic layer deposition (ALD) is a viable solution for preparing Ru thin films because it enables atomic-scale control of the film thickness with excellent conformality. A recent investigation reported that the nucleation of ALD-Ru film was enhanced considerably by using a zero-valent metallorganic precursor, compared to the utilization of precursors with higher metal valences. In this study, we will present our research results on the synthesis and characterization of novel ruthenium complexes. The ruthenium compounds were easy synthesized by the reaction of ruthenium halide with appropriate organic ligands in protic solvent, and characterized by NMR, elemental analysis and thermogravimetric analysis. The molecular structures of the complexes were studied by single crystal diffraction. ALD of Ru film was demonstrated using the new Ru metallorganic precursor and O2 as the Ru source and reactant, respectively, at the deposition temperatures of $300-350^{\circ}C$. Self-limited reaction behavior was observed as increasing Ru precursor and O2 pulse time, suggesting that newly developed Ru precursor is applicable for ALD process. Detailed discussions on the chemical and structural properties of Ru thin films as well as its growth behavior using new Ru precursor will be also presented.

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Surface Characteristics of Type II Anodized Ti-6Al-4V Alloy for Biomedical Applications

  • Lee, Su-Won;Jeong, Tae-Gon;Yang, Jae-Ung;Jeong, Jae-Yeong;Park, Gwang-Min;Jeong, Yong-Hun
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2017.05a
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    • pp.77-77
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    • 2017
  • Titanium and its alloys offer attractive properties in a variety of applications. These are widely used for the field of biomedical implants because of its good biocompatibility and high corrosion resistance. Titanium anodizing is often used in the metal finishing of products, especially those can be used in the medical devices with dense oxide surface. Based on SAE/AMS (Society of Automotive Engineers/Aerospace Material Specification) 2488D, it has the specification for industrial titanium anodizing that have three different types of titanium anodization as following: Type I is used as a coating for elevated temperature forming; Type II is used as an anti-galling coating without additional lubrication or as a pre-treatment for improving adherence of film lubricants; Type III is used as a treatment to produce a spectrum of surface colours on titanium. In this study, we have focused on Type II anodization for the medical (dental and orthopedic) application, the anodized surface was modified with gray color under alkaline electrolyte. The surface characteristics were analyzed with Focused Ion Beam (FIB), Scanning Electron Microscopy (SEM), surface roughness, Vickers hardness, three point bending test, biocompatibility, and corrosion (potentiodynamic) test. The Ti-6Al-4V alloy was used for specimen, the anodizing procedure was conducted in alkaline solution (NaOH based, pH>13). Applied voltage was range between 20 V to 40 V until the ampere to be zero. As results, the surface characteristics of anodic oxide layer were analyzed with SEM, the dissecting layer was fabricated with FIB method prior to analyze surface. The surface roughness was measured by arithmetic mean deviation of the roughness profile (Ra). The Vickers hardness was obtained with Vickers hardness tester, indentation was repeated for 5 times on each sample, and the three point bending property was verified by yield load values. In order to determine the corrosion resistance for the corrosion rate, the potentiodynamic test was performed for each specimen. The biological safety assessment was analyzed by cytotoxic and pyrogen test. Through FIB feature of anodic surfaces, the thickness of oxide layer was 1.1 um. The surface roughness, Vickers hardness, bending yield, and corrosion resistance of the anodized specimen were shown higher value than those of non-treated specimen. Also we could verify that there was no significant issues from cytotoxicity and pyrogen test.

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Characteristics of 23 MV Photon Beam from a Mevatron KD 8067 Dual Energy Linear Accelerator (Mevatron KD 8067 선형가속기의 23 MV 광자선의 특성)

  • Kim, Ok-Bae;Choi, Tae-Jin;Kim, Young-Hoon
    • Radiation Oncology Journal
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    • v.8 no.1
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    • pp.115-124
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    • 1990
  • The characteristics of 23 MV photon beam have been presented with respect to clinical parameters of central axis depth dose, tissue-maxi mum ratios, scatter-maximum ratios, surface dose and scatter correction factors. The nominal accelerating potential was found to be $18.5\pm0.5$ MV on the central axis. The half-value layer (HVL) of this photon beam was measured with narrow beam geometry from central axis, and it has been showed the thickness of $24.5\;g/cm^2$. The tissue-maximum ratio values have been determined from measured percentage depth dose data. In our experimental dosimetry, the surface dose of maximum showed only $9.6\%$ of maximum dose at $10\times10\;cm^2$, 100 cm SSD, without blocking tray in. The TMR'S of $0\times0$ field size have been determined to get average $2.3\%$ uncertainties from three different methodis; are zero effective attenuation coefficient, non-ilnear least square fit of TMR's data and effective linear attenuation coefficient from the HVL of 23 MV photon beams of dual energy linear accelerator.

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