• Title/Summary/Keyword: Y$\u{o}$ju

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Study of the Etched ZnO Thin Film Surface in the $BCl_{3}/Ar/Cl_{2}$ Plasma ($Cl_{2}/BCl_{3}$/Ar 플라즈마에 의해 식각된 ZnO 박막 표면의 연구)

  • U, Jong-Chang;Ha, Tae-Gyeong;Wi, Jae-Hyeong;Ju, Yeong-Hui;Eom, Du-Seung;Kim, Dong-Pyo;Kim, Chang-Il
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2009.05a
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    • pp.264-265
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    • 2009

  • 본 연구에서 유도결합 플라즈마 식각 장치외 $BCl_3/Ar/Cl_2$ 가스 혼합비를 이용하여 ZnO 박막을 식각 하였을 때, 식각 된 ZnO 박막의 표면 반응에 관하여 관찰하였다. ZnO 박막의 식각 실험 조건은 RF 전력 700 W, 직류바이어스 전압 - 150 V, 공정 압력 15 mTorr로 고정하였고, $Cl_2/(Cl_2+BCl_3+Ar)$ 가스 혼합비를 변경하면서 식각 실험을 수행하였다. $Cl_2$ 가스가 3 sccm 일 때, ZnO 박막의 식각속도는 53 nm/min으로 가장 높았으며, 이때 ZnO 박막에 대한 $SiO_2$의 선택비는 0.89 이었다. 식각된 ZnO 박막의 표면은 XRD (X-ray diffraction)와 AFM(atomic force microscopy)를 이용하여 결정상의 변화와 표면의 거칠기를 분석하였다. AFM 분석 결과에서 Ar, $BCl_3$와 $Cl_2$ 플라즈마를 이용하여 식각된 시료의 표면 거칠기 근 값이 식각전의 시료나 $BCl_3/Ar/Cl_2$ 플라즈마로 식각된 시료보다 큰 것을 확인하였다. 이는 식각된 시료에서의 Zn 양의 감소나 비휘발성 식각 잔류물에 의한 영향으로 판단된다. SIMS(secondary ion mass spectrometery) 분석을 통해 검증 하였다.

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A Study of Surface Electromyography Measurement of Orbicularis oris motion in Healthy People (정상인의 구륜근 운동 시 표면근전도(SEMG) 측정연구)

  • Kim, Ju Yong;Kim, Bo Hyun;Kim, Hye Bin;Yook, Tae Han;Kim, Jong Uk
    • Journal of Acupuncture Research
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    • v.33 no.4
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    • pp.93-100
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    • 2016

  • Objectives : To find an acupuncture point where more exact Surface Electromyography(SEMG) measurement can be drown, through the study of measurement of orbicularis oris. Methods : Of healthy people from 19 to 40 years of age, who did not fall under exclusion criteria (22 males and 22 females), were selected as subjects, after relaxation for 10 minutes, and they were told how to pronounce 'O' and 'U' with their lips puckered. The SEMG figures were measured with attaching disposable electrode on acupuncture point of right-and-left Hwaryo(LI19) and 1 cun away from Seungjang(CV24) on both sides when the subjects pronounced 'O' and 'U'. Results : The average value was highest on left 1 cun away from Seungjang(CV24) in pronouncing 'O' and 'U', and the average SEMG value was higher in the order of right 1 cun away from Seungjang(CV24), right Hwaryo(LI19), left Hwaryo(LI19). Average of the lower orbicularis oris is statistically higher than that of the upper orbicularis oris, which has significant meaning. However, there was no significant difference when compared by pronunciation. Average of percentage mark of differences of right-and-left measured value of each pronunciation and each acupuncture point : Pronounced 'O' and the upper part of orbicularis oris: $16.76{\pm}11.29%$, pronounced 'O' and the lower part of orbicularis oris: $22.41{\pm}12.92%$, pronounced 'U' and the upper part of orbicularis oris: $17.10{\pm}9.89%$, pronounced 'U' and the lower part of orbicularis oris : $19.20{\pm}10.82%$. Conclusion : The difference of pronunciation will not affect the results in SEMG measurement. In addition, the average of the lower orbicularis oris is statistically and significantly higher than that of the upper orbicularis oris.

  • https://doi.org/10.13045/acupunct.2016057 인용 PDF KSCI