• 제목/요약/키워드: XY Linear Motion Stage

검색결과 12건 처리시간 0.033초

평면 XY 공기정압 스테이지의 운동특성 분석 (Analysis on the motion characteristics of surface XY aerostatic stage)

  • 황주호;박천홍;이찬홍;김승우
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2003년도 춘계학술대회 논문집
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    • pp.359-362
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    • 2003
  • The aerostatic stage. which is used in semiconductor process, is demanded higher velocity and more precise accuracy for higher productivity and integrated performance. So, in the case of XY stage, H type structure, which is designed two co-linear axis of guide-way, driving force in one surface, has advantage of velocity and accuracy compared to conventional tacked type XY stage. To analyze characteristics of H type aerostatic stage, H type aerostatic surface XY stage is made, which is driven by linear motor and detected position with precise optical linear scale. And, analyze characteristics of motion error, effect of angular motion on positioning accuracy error and effect of simultaneous control on variation of velocity.

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스캐닝 방식 XY 스테이지의 운동오차 분석 (The Analysis of Motion Error in Scanning Type XY Stage)

  • 황주호;박천홍;이찬홍;김동익;김승우
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2004년도 추계학술대회 논문집
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    • pp.1380-1383
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    • 2004
  • The scanning type XY stage is frequently used these days as precision positioning system in equipment for semiconductor or display element. It is requested higher velocity and more precise accuracy for higher productivity and measuring performance. The position accuracy of general stage is primarily affected by the geometric errors caused by parasitic motion of stage, misalignments such as perpendicular error, and thermal expansion of structure. In the case of scanning type stage, H type frame is usually used as base stage which is driven by two actuators such as linear motor. In the point view of scanning process, the stage is used in moving motion. Therefore, dynamic variation is added as significant position error source with other parasitic motion error. Because the scanning axis is driven by two actuators with two position detectors, 2 dimensional position errors have different characteristic compared to general tacked type XY stage. In this study 2D position error of scanning stage is analyzed by 1D heterodyne interferometer calibrator, which can measure 1D linear position error, straightness error, yaw error and pitch error, and perpendicular error. The 2D position error is evaluated by diagonal measurement (ISO230-6). The yaw error and perpendicular error are compensated on the base stage of scanning axis. And, the horizontal straightness error is compensated by cross axis compensation. And, dynamic motion error in scanning motion is analyzed.

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원자현미경용 XY 스캐너의 아베 오차 최소화를 위한 최적 설계 및 원자 현미경의 측정 불확도 평가 (Optimal design of a flexure hinge-based XY AFM scanner for minimizing Abbe errors and the evaluation of measuring uncertainty of AFM system)

  • 김동민;이동연;권대갑
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2005년도 춘계학술대회 논문집
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    • pp.1438-1441
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    • 2005
  • To establish of standard technique of nano-length measurement in 2D plane, new AFM system has been designed. In this system, measurement uncertainty is dominantly affected by the Abbe error of XY scanning stage. No linear stage is perfectly straight; in other words, every scanning stage is subject to tilting, pitch and yaw motion. In this paper, an AFM system with minimum offset of XY sensing is designed. And XY scanning stage is designed to minimize rotation angle because Abbe errors occur through the multiply of offset and rotation angle. To minimize the rotation angle optimal design has performed by maximizing the stiffness ratio of motion direction to the parasitic motion direction of each stage. This paper describes the design scheme of full AFM system, especially about XY stage. Full range of fabricated XY scanner is $100um\times{100um}$. And tilting, pitch and yaw motion are measured by autocollimator to evaluate the performance of XY stage. Using this AFM system, 3um pitch specimen was measured. As a result, the uncertainty of total system has been evaluated.

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XY 선형 모션 스테이지 시스템의 반발력 보상 기구와 제어 (Mechanism and Control of Reaction Force Compensation of XY Linear Motion Stage System)

  • 조규중;최동수;안형준
    • 대한기계학회논문집A
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    • 제35권6호
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    • pp.599-607
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    • 2011
  • 본 논문에서는 별도의 외부 격리 구조물이나 추가 모터가 필요 없는 XY 선형 모션 스테이지를 위한 반발력 보상 시스템을 개발하였다. 개발된 시스템은 이동 가능한 마그넷 트랙, 스프링, 추가 질량을 포함한 자체 반발력 보상 구조를 가지고 있으며 이송용 모터 코일과 마그넷 트랙의 상대 위치를 검출할 수 있는 전용 센서를 개발하여 고정밀 추력 및 위치를 제어에 적용하였다. 먼저 반발력 보상 시스템을 모델링하고 모의 시험을 통해 이동 거리, 가속도, 하중, 허용 가능한 장비 크기와 같은 설계 요소를 최적화 하였다. 반발력 보상 시스템이 구비된 XY 모션 스테이지를 제작하였으며, 해당 시스템의 성능을 실험적으로 검증하였다. 실험결과 10m/$s^2$ 가감속 시에 85%의 반발력이 반발력 보상 시스템에 의해 흡수되었다.

평면형 구조와 Halbach 자석배열 선형모터를 이용한 리니어 XY 스테이지의 설계 (Design of Linear XY Stage using Planar Configuration and Linear Motors with Halbach Magnet Array)

  • 김기현;이문구
    • 한국생산제조학회지
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    • 제19권4호
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    • pp.553-561
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    • 2010
  • In flat panel display or semiconductor industries, they install the equipments with fine line width and high throughput for fabrication and inspection. The equipments are required to have the linear stage which can position the work-piece with high speed, fine resolution on wide range of motion. In this paper, a precision planar linear XY stage is proposed. The stage has a symmetric planar window configuration and is guided by air-bearings on granite plate. The symmetric planar window configuration makes the stage has robustness against dynamic and thermal disturbances. The air-bearings let the stage move smooth on straight guide bar and flat granite surface. The stage is actuated by linear motor with Halbach magnet array (HMA). HMA generates more confined magnetic flux than conventional array. The linear motors are optimized by using sequential quadratic programming (SQP) with the several constraints that are thermal dissipation, required power, force ripple and so on. The planar linear XY stage with the symmetric planar configuration and the linear motors is implemented and then the performance such as force ripple, resolution and stroke are evaluated.

XY 스캐너의 아베 오차 최소화를 위한 최적 설계 및 나노 정밀도의 원자 현미경 피치 측정 불확도 평가 (Optimal design of a flexure hinge-based XY AFM scanner for minimizing Abbe errors and the evaluation of pitch measuring uncertainty of a nano-accuracy AFM system)

  • 김동민;이동연;권대갑
    • 한국정밀공학회지
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    • 제23권6호
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    • pp.96-103
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    • 2006
  • To establish of standard technique of nano-length measurement in 2D plane, new AFM system has been designed. In the long range (about several tens of ${\mu}m$), measurement uncertainty is dominantly affected by the Abbe error of XY scanning stage. No linear stage is perfectly straight; in other words, every scanning stage is subject to tilting, pitch and yaw motion. In this paper, an AFM system with minimum offset of XY sensing is designed. And XY scanning stage is designed to minimize rotation angle because Abbe errors occur through the multiply of offset and rotation angle. To minimize the rotation angle optimal design has performed by maximizing the stiffness ratio of motion direction to the parasitic motion direction of each stage. This paper describes the design scheme of full AFM system, especially about XY stage. Full range of fabricated XY scanner is $100{\mu}m\times100{\mu}m$. And tilting, pitch and yaw motion are measured by autocollimator to evaluate the performance of XY stage. As a result, XY scanner can have good performance. Using this AFM system, 3um pitch specimen was measured. The uncertainty of total system has been evaluated. X and Y direction performance is different. X-direction measuring performance is better. So to evaluate only ID pitch length, X-direction scanning is preferable. Its expanded uncertainty(k=2) is $\sqrt{(3.96)^2+(4.10\times10^{-5}{\times}p)^2}$ measured length in nm.

상호 간섭이 최소화된 고속 원자현미경용 XY 스캐너 제작 (An XY scanner with minimized coupling motions for the high speed AFM)

  • 박종규;문원규
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2005년도 춘계학술대회 논문집
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    • pp.653-656
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    • 2005
  • This paper introduces design, fabrication and experiment process of a novel scanner for the high speed AFM(Atomic Force Microscope). A proper design modification is proposed through analyses on the dynamic characteristics of the existing linear motion stages using a dynamic analysis program, Recurdyn. Since the scanning speed of each direction is allowed to be different, the linear motion stage for the high-speed scanner of AFM can be so designed to have different resonance frequencies for the modes with one dominant displacement in the desired directions. One way to achieve this objective is to use one-direction flexure mechanism for each direction and to mount one stage for fast motion on the other stage for slow motion. This unsymmetrical configuration separates the frequencies of the two vibration modes with one dominant displacement in each desired direction, hence, the coupling between the motions in the two directions. In addition, a pair of actuators is used for each axis to decrease the cross talks in the two motions and gives a force large enough to actuate the slow motion stage, which carries the fast motion stage. After these design modifications, a novel scanner with scanning speed higher than 10 Hz can be achieved to realize undistorted images in the high speed AFM.

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리소그라피 장비에서 xy${\theta}$미세구동기의 최적 설계 및 제어 (Optimal Design and Control of xy${\theta}$ Fine Stage in Lithography System)

  • 김동민;김기현;이성규;권대갑
    • 한국정밀공학회지
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    • 제19권12호
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    • pp.163-170
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    • 2002
  • The quality of a precision product, in general, relies on the accuracy and precision of its manufacturing and inspection process. In many cases, the level of precision in the manufacturing and inspection system is also dependent on the positioning capability of tool with respect to the work piece in the process. Recently the positioning accuracy level has reached to the level of submicron and long range of motion is required. For example, for 1 GDARM lithography, 20nm accuracy and 300mm stroke needs. This paper refers to the lithography stage especially to fine stage. In this study, for long stroke and high accuracy, the dual servo system is proposed. For the coarse actuator, LDM (Linear DC Motor) is used and for fine one VCM is used. In this study, we propose the new structure of VCM for the fine actuator. It is 3 axis precision positioning stage for an aligner system. After we perform the optimal design of the stage to obtain the maximum force, which is related to the acceleration of the stage to accomplish throughput of product. And we controlled this fine stage with TDC. So we obtained 50nm resolution. So later more works will be done to obtain better accuracy.

요 모션 갠트리 제어 시 공기베어링 스테이지의 리플 보상 (Ripple Compensation of Air Bearing Stage upon Gantry Control of Yaw motion)

  • 안다훈;이학준
    • 한국산학기술학회논문지
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    • 제21권11호
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    • pp.554-560
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    • 2020
  • 평판 디스플레이 제조 공정에서 대상물의 위치 결정을 위해 고정밀 평면 모션 스테이지를 사용한다. 이 유형의 스테이지는 일반적으로 마찰이 없는 선형 모터와 에어 베어링을 사용하며, 고정밀 위치 센서로 레이저 간섭계를 사용한다. 스테이지의 불가피한 기생 운동에 의해 야기되는 요 모션 오차는 위치 결정 대상체의 향 변화를 의미하므로, 스테이지의 성능과 공정 정밀도 향상을 위해 요 모션 오차의 실시간 동적 보정은 매우 중요하다. 요 모션 오차 보상에는 갠트리 제어가 일반적이며, 이 방법을 공기베어링 가이드를 사용하는 스테이지에 적용하기 위해서 회전 모션을 허용하는 유연기구가 스테이지에 적용된다. 본 논문은 공기베어링과 유연기구를 갖춘 H형 XY 스테이지의 정속 구동 성능을 개선하는 방법을 제안한다. 유연기구를 포함한 스테이지의 갠트리 제어 시 선형 모터로부터 발생하는 상호 리플의 발생 원인을 분석하고, 이러한 상호 리플을 보상하는 방안으로 적응 학습 제어를 제시한다. 제시 방안의 검증을 위해 시뮬레이션을 수행하여, 보상 제어를 통해 속도 리플이 약 22 % 수준으로 감소함을 확인하였다. 그리고 요 모션 오차가 발생하는 스테이지 상태를 가정하여 리플 저감 효과를 검증하였다.

리니어모터를 이용한 고속 저중심 스테이지의 개발과 정밀도 향상 (Development for Scanning Type Stage Driven by Linear Motors)

  • 송창규;김정식;김경호;박천홍
    • 한국공작기계학회:학술대회논문집
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    • 한국공작기계학회 2004년도 춘계학술대회 논문집
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    • pp.445-448
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    • 2004
  • Linear motor is very rapidly substituted for rotary motor and ball screw for precision positioning applications because of its characteristics such as high speed, no backlash and simplicities. A precision positioning system which is composed of linear motion(LM) guide and linear motor is widely used since it has easy controllable property but this system has low accuracy problem caused by friction of the LM guide. In this study, a scanning type XY stage is manufactured and some experiments is performed to improve the accuracy of the stage.

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