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Optimal Design and Control of xy${\theta}$ Fine Stage in Lithography System  

김동민 (한국과학기술원 기계공학부)
김기현 (한국과학기술원 기계공학부)
이성규 (한국과학기술원 기계공학부)
권대갑 (한국과학기술원 기계공학부)
Publication Information
Journal of the Korean Society for Precision Engineering / v.19, no.12, 2002 , pp. 163-170 More about this Journal
Abstract
The quality of a precision product, in general, relies on the accuracy and precision of its manufacturing and inspection process. In many cases, the level of precision in the manufacturing and inspection system is also dependent on the positioning capability of tool with respect to the work piece in the process. Recently the positioning accuracy level has reached to the level of submicron and long range of motion is required. For example, for 1 GDARM lithography, 20nm accuracy and 300mm stroke needs. This paper refers to the lithography stage especially to fine stage. In this study, for long stroke and high accuracy, the dual servo system is proposed. For the coarse actuator, LDM (Linear DC Motor) is used and for fine one VCM is used. In this study, we propose the new structure of VCM for the fine actuator. It is 3 axis precision positioning stage for an aligner system. After we perform the optimal design of the stage to obtain the maximum force, which is related to the acceleration of the stage to accomplish throughput of product. And we controlled this fine stage with TDC. So we obtained 50nm resolution. So later more works will be done to obtain better accuracy.
Keywords
xy${\theta}$ fine stage; lithography; dual servo; VCM; optimal design; force maximization; TDC control;
Citations & Related Records
Times Cited By KSCI : 1  (Citation Analysis)
연도 인용수 순위
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