• 제목/요약/키워드: XPS (X-ray Photoelectron Spectroscopy)

검색결과 1,003건 처리시간 0.028초

화학적 산처리가 중기공 탄소체의 수소저장거동에 미치는 영향 (Effect of Acid Treatments on Hydrogen Storage Behaviors of Ordered Mesoporous Carbons)

  • 이슬이;박수진
    • 한국신재생에너지학회:학술대회논문집
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    • 한국신재생에너지학회 2010년도 춘계학술대회 초록집
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    • pp.229.1-229.1
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    • 2010
  • We investigated the effect of chemical acid treatments on hydrogen storage behaviors of the ordered mesoporous carbons (MCs). The surface functional groups and specific elements of the MCs were characterized with Fourier Transform Infrared (FT-IR) spectrometry and X-ray photoelectron spectroscopy (XPS). Also, the changes in the surface functional groups of the MCs were quantitatively detected by Boehm's titration method. The structural properties of the MCs were investigated using X-ray diffraction (XRD). The hydrogen adsorption capacity of the MCs was evaluated by means of adsorption isotherms at 77 K/1 bar. The formation of surface functional groups by the acidic treatments could influence on the hydrogen storage capacity of the MCs.

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XPS STUDY ON DNA DAMAGE BY LOW-ENERGY ELECTRON IRRADIATION

  • Noh, Hyung-Ah;Cho, Hyuck
    • Journal of Radiation Protection and Research
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    • 제36권4호
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    • pp.190-194
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    • 2011
  • After the first report that electrons with sub-ionization energy of DNA could cause single strand breaks or double strand breaks to DNA, there have been various studies to investigate the mechanisms of DNA damage by low-energy electrons. In this paper, we examined the possibility of using X-ray photoelectron spectroscopy (XPS) to analyze the dissociation patterns of the molecular bonds by electron irradiation on DNA thin films and tried to establish the method as a general tool for studying the radiation damage of biomolecules by low energ yelectrons. For the experiment, pBR322 plasmid DNA solution was formed into the films on tantalum plates by lyophilization and was irradiated by 5-eV electrons. Un-irradiated and irradiated DNA films were compared and analyzed using the XPS technique.

XPS 분석에 의한 AZO 박막의 전기전도 메커니즘 해석 (Electric conduction mechanism Analysis of AW Thin Films using XPS Measurement)

  • 진은미;김경민;박춘배
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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    • pp.446-447
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    • 2007
  • Aluminisum-doped zinc oxide (AZO) films are attractive materials as transparent conductive electrode because they are inexpensive, nontoxic and abundant element compared with indium tin oxide (ITO). In our paper, AZO films have been deposited on glass (coming 1737) substrates by RF magnetron sputtering. The AZO film was post-annealed at $600^{\circ}C$, $800^{\circ}C$ for 2 hr with $N_2$ atmosphere, respectively. We investigated that the electric properties and qualitative analysis of AZO films, which measured using the methods of Hall effect, X-ray photoelectron spectroscopy (XPS).

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Interface formation between tris-(8-hydroxyquinoline) aluminum and room temperature stable electride: C12A7:$e^-$

  • Kim, Ki-Beom;Kikuchi, Maiko;Miyakawa, Masashi;Yanagi, Hiroshi;Kamiya, Toshio;Hirano, Masahiro;Hosono, Hideo
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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    • pp.235-238
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    • 2006
  • Interface formation between $12CaO{\cdot}7Al_2O_3(C12A7:e^-)$ and Alq3 was investigated using in-situ ultra-violet photoelectron spectroscopy (UPS) and X-ray photoelectron spectroscopy (XPS). The work function and vacuum level shift of $C12A7:e^-$ were change by different surface treatment from 2.6eV to 4.2eV. Also vacuum level shift $(\Delta)$ at the interface were from +0.3eV to -0.3eV.

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Effect of Oxygen Binding Energy on the Stability of Indium-Gallium-Zinc-Oxide Thin-Film Transistors

  • Cheong, Woo-Seok;Park, Jonghyurk;Shin, Jae-Heon
    • ETRI Journal
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    • 제34권6호
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    • pp.966-969
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    • 2012
  • From a practical viewpoint, the topic of electrical stability in oxide thin-film transistors (TFTs) has attracted strong interest from researchers. Positive bias stress and constant current stress tests on indium-gallium-zinc-oxide (IGZO)-TFTs have revealed that an IGZO-TFT with a larger Ga portion has stronger stability, which is closely related with the strong binding of O atoms, as determined from an X-ray photoelectron spectroscopy analysis.

플라즈마 처리에 따른 언더필과 기판 사이의 접착 강도에 관한 연구 (Effect of Plasma Treatment on Adhesion Strength between Underfill and Substrate)

  • 노보인;정승부
    • 대한용접접합학회:학술대회논문집
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    • 대한용접접합학회 2006년도 춘계 학술대회 개요집
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    • pp.13-15
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    • 2006
  • The effects of plasma treatment on the surfaces of the FR-4 (Flame Resistant-4) and copper substrates are investigated in terms of X-ray photoelectron spectroscopy (XPS), contact angle, and atomic force microscopy (AFM). The adhesion strengths of the underfills/FR-4 substrate and underfills/copper substrate are also studied. As experimental results, the plasma treatments of FR-4 and copper substrate surfaces yield several oxygen complexes in hydrophilic surfaces, which can play an important role in increasing the surface polarity, wettability, and adhesion characteristics of the underfills/substrates.

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LP-Thermal MOCVD 방법을 이용한 $SnO_2$ 박막의 증착 시간에 따른 특성 (The Characteristic of $SnO_2$ Thin Films Grown by LP-Thermal MOCVD)

  • 정진
    • 통합자연과학논문집
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    • 제1권1호
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    • pp.54-57
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    • 2008
  • This report examines the variation on structural properties of $SnO_2$ thin films. TEM studies shows some of the interfaces to be atomically faceted. Secondary X-ray photoelectron Spectroscopy Analysis(XPS) depth profiles show that films have a uniform composition along the depth.

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리튬금속 음극/전해질 계면반응에 미치는 전해질 농도의 영향 (Electrolyte-Concentration Effects on Interfacial Reactions Between Lithium Negative Electrode and Electrolyte)

  • 서희영;정순기
    • 한국산학기술학회:학술대회논문집
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    • 한국산학기술학회 2007년도 추계학술발표논문집
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    • pp.353-355
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    • 2007
  • 본 논문에서는 리튬금속을 음극으로 하는 반전지에 여러 농도의 전해질을 사용하여 그에 따른 충/방전 효율과, 음극 표면을 관찰하는 것에 의해 전해질 농도가 음극/전해질 계면반응에 어떠한 영향을 끼치는지 알아보았다. 또한 X-ray Photoelectron Spectroscopy(XPS)를 사용하여 표면에 생성되는 물질의 조성과 구조를 해석하였다.

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Electrochemical Reactions of $C_{60}$ Films in the Presence of Water : An Electrochemical Quartz Crystal Microbalance Study

  • 서경자;신명순;전일철
    • Bulletin of the Korean Chemical Society
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    • 제17권9호
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    • pp.781-786
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    • 1996
  • Mass transport behavior of C60 films on electrodes with different thicknesses has been studied by an Electrochemical Quartz Crystal Microbalance (EQCM) during electrochemical reduction-oxidation processes in the presence of water. C60 films were found to be reduced in the presence of water and they remains quite stable. In thin films, the mass on electrode decreased after a complete cycle while X-ray Photoelectron Spectroscopy (XPS) study does not support the existence or formation of C60-epoxides during electrochemical reduction processes in the presence of water or oxygen.

전기장 광화학 증착법에 의한 직접패턴 비정질 FeOx 박막의 제조 및 저항변화 특성 (Electric-field Assisted Photochemical Metal Organic Deposition for Forming-less Resistive Switching Device)

  • 김수민;이홍섭
    • 마이크로전자및패키징학회지
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    • 제27권4호
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    • pp.77-81
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    • 2020
  • Resistive RAM (ReRAM)은 전이금속 산화물의 저항변화 특성을 이용하는 차세대 비휘발 메모리로 전이금속산화물 내의 산소공공의 재분포를 통한 저항변화 특성을 이용한다. 따라서 저항변화 특성을 위해 전이금속산화물 내에는 일정량 이상의 산소공공이 요구되며 이를 위해서는 박막 형성 공정에서 산화 수를 조절할 수 있는 공정이 필요하다. 본 연구에서는 직접패턴이 가능한 photochemical metal organic deposition (PMOD) 공정을 사용하여 UV 노출에 의해 photochemical metal organic precursor의 ligand가 분해되는 과정에서 전기장을 인가하여 박막내의 산화 수를 조절하는 실험을 진행하였다. Electric field assisted PMOD (EFAPMOD) 법을 이용하여 FeOx 박막의 산화 수 조절이 가능함을 x-ray photoelectron spectroscopy (XPS) 분석과 I-V 측정을 통하여 확인하였으며, EFAPMOD 공정 중 인가하는 전압의 크기를 조절하여 박막의 산화 수를 조절할 수 있음을 확인하였다. 따라서 EFAPMOD 공정 중 인가전압의 크기를 이용하여 저항변화 특성에 적합한 적정한 산화수를 가지는 금속산화물 박막을 얻고 그 저항변화 특성을 조정할 수 있음을 확인하였다.