LP-Thermal MOCVD 방법을 이용한 $SnO_2$ 박막의 증착 시간에 따른 특성

The Characteristic of $SnO_2$ Thin Films Grown by LP-Thermal MOCVD

  • 정진 (조선대학교 자연과학대학 물리학과)
  • 투고 : 2008.04.20
  • 심사 : 2008.06.18
  • 발행 : 2008.06.30

초록

This report examines the variation on structural properties of $SnO_2$ thin films. TEM studies shows some of the interfaces to be atomically faceted. Secondary X-ray photoelectron Spectroscopy Analysis(XPS) depth profiles show that films have a uniform composition along the depth.

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