• 제목/요약/키워드: Working pressure

검색결과 1,329건 처리시간 0.03초

공정 압력에 따라 스퍼터된 Al 도핑 ZnO 박막의 광학적, 전기적 특성 (Optical and Electrical Properties of Sputtered Al Doped ZnO Thin Films with Various Working Pressure)

  • 김덕규;김홍배
    • 한국진공학회지
    • /
    • 제22권5호
    • /
    • pp.257-261
    • /
    • 2013
  • RF 마그네트론 스퍼터링법을 이용하여 Al 도핑 ZnO 박막을 공정 압력에 따라 증착하고 박막의 구조적, 광학적, 전기적 특성을 연구하였다. 공정 압력 의 최적화를 위해 공정압력을 0.07 Torr, 0.02 Torr, 그리고 0.007 Torr로 변화하였다. 공정압력이 감소하면서, Al 도핑 ZnO 박막의 결정성은 향상되었고 표면 거칠기도 감소하였다. 모든 Al 도핑 ZnO 박막은 가시광선 영역(400~800 nm)에서 80% 이상 투과도를 보였다. 0.007 Torr의 공정 압력에서 가장 좋은 전기적 특성을 보였는데 이는 표면거칠기 감소에 따른 산소 흡착이 감소하여 나타난 현상으로 판단된다.

실리콘 이종 접합 태양 전지 특성에 대한 ZnO:Al과 비정질 실리콘 계면 반응의 영향 (Effect of Interface Reaction between ZnO:Al and Amorphous Silicon on Silicon Heterojunction Solar Cells)

  • 강민구;탁성주;이종한;김찬석;정대영;이정철;윤경훈;김동환
    • 한국재료학회지
    • /
    • 제21권2호
    • /
    • pp.120-124
    • /
    • 2011
  • Silicon heterojunction solar cells have been studied by many research groups. In this work, silicon heterojunction solar cells having a simple structure of Ag/ZnO:Al/n type a-Si:H/p type c-Si/Al were fabricated. Samples were fabricated to investigate the effect of transparent conductive oxide growth conditions on the interface between ZnO:Al layer and a-Si:H layer. One sample was deposited by ZnO:Al at low working pressure. The other sample was deposited by ZnO:Al at alternating high working pressure and low working pressure. Electrical properties and chemical properties were investigated by light I-V characteristics and AES method, respectively. The light I-V characteristics showed better efficiency on sample deposited by ZnO:Al by alternating high working pressure and low working pressure. Atomic concentrations and relative oxidation states of Si, O, and Zn were analyzed by AES method. For poor efficiency samples, Si was diffused into ZnO:Al layer and O was diffused at the interface of ZnO:Al and Si. Differentiated O KLL spectra, Zn LMM spectra, and Si KLL spectra were used for interface reaction and oxidation state. According to AES spectra, sample deposited by high working pressure was effective at reducing the interface reaction and the Si diffusion. Consequently, the efficiency was improved by suppressing the SiOx formation at the interface.

Facing targets sputtering system에서 TbFeCo박막의 산화에 미치는 제조조건의 영향 (The effect of deposition condition on the oxidation of TbFeCo thin films in facing targets sputtering system)

  • 문정탁;김명한
    • E2M - 전기 전자와 첨단 소재
    • /
    • 제7권6호
    • /
    • pp.511-519
    • /
    • 1994
  • The effect of the deposition conditions, such as the base pressure, working pressure, sputtering power, pre-sputtering, and deposition thickness in facing targets sputtering system(FTS), on the oxidation of the TbFeCo thin films was studied by investigating the magneto-optical properties as well as oxygen analysis by the AES depth profiles. The results showed that the base pressure did not affect the magnetic properties so much, probably due to the short flight distance of the sputtered particles. At the higher sputtering power and lower working pressure with pre-sputtering the oxidation of TbFeCo thin films was decreased. As the film thickness increased the TbFeCo thin films showed the perpendicular anisotropy from in-plane anisotropy overcoming the oxidation effect at the beginning of the sputtering.

  • PDF

초고층건축물에 사용되는 분기배관의 사용압력에 관한 연구 (A Study on the Working Pressure of TBP used in Tall Building)

  • 이성호;김희송
    • 설비공학논문집
    • /
    • 제20권5호
    • /
    • pp.351-356
    • /
    • 2008
  • In this study, we had the stress analyses of TBP used in Tall Building and determined the working pressure of TBP. We knew the four fact. First, the place acted maximum stress is axial direction of branched part. Second, working pressure is more than 2.0 MPa. Third, stress in branched part is less than yielding strength at hydrostatic test pressure. Fourth, the ratio(stress/yielding stress at hydrostatic test pressure) is $0.4{\sim}0.6$(KS D 3562 Sch 40), $0.3{\sim}0.4$(KS D 3576 20S).

미립잠열슬러리의 유체역학적 특성연구 (Fluid dynamical characteristics of microencapsulated phase change material slurries)

  • 이효진;이승우;이재구
    • 설비공학논문집
    • /
    • 제11권4호
    • /
    • pp.549-559
    • /
    • 1999
  • An experimental study was peformed to measure the viscosity of microencapsulated PCM slurries as the functions of its concentration and temperature, and also influence to its fluid dynamics. For the viscosity measurement, a rotary type viscometer, which was equipped with temperature control system, was adopted. The slurry was mixed with water and Sodium Lauryl Sulphate as a surfactant by which its suspended particles were dispersed well without the segregation of particles during the experiment. The viscosity was increased as the concentration of MicroPCM particle added. The surfactant increased 5% of the viscosity over the working fluid without particles. Experiments were proceeded by changing parameters such as PCM particles'concentration as well as the temperature of working fluid. As a result, a model to the functions of temperature for the working fluid and its particle concentration is proposed. The proposed model, for which its standard deviation shows 0.8068, is agreed well with the reference's data. The pressure drop was measured by U-tube manometer, and then the friction factor was obtained. It was noted that the pressure drop was not influenced by the state of PCM phase, that is solid or liquid in its core materials at their same concentration. On the other hand, it was described that the pressure drop of the slurry was much increased over the working fluid without particles. A friction factor was placed on a straight line in all working fluids of the laminar flow regardless of existing particles as we expected.

  • PDF

Influence of Temporal and Permanent Image Sticking Characteristics Under Variable Panel Working Gas Pressure in 42-in. AC-PDPs

  • Park, Choon-Sang;Jang, Soo-Kwan;Kim, Jae-Hyun;Tae, Heung-Sik;Jung, Eun-Young;Ahn, Jung-Chull;Heo, Eun-Gi
    • 한국정보디스플레이학회:학술대회논문집
    • /
    • 한국정보디스플레이학회 2008년도 International Meeting on Information Display
    • /
    • pp.1617-1620
    • /
    • 2008
  • The effects of the temporal and permanent bright image stickings were examined under variable panel working gas pressure in the 42-in. ac-PDP with a high Xe (11 %) content. In the cells with and without temporal and permanent bright image stickings, the display luminance, firing voltage, and Vt closed curve were measured relative to the working gas pressure. With a decrease in the working gas pressure, the temporal bright image sticking was observed to be reduced, whereas the permanent bright image sticking was observed to be deteriorated.

  • PDF

음압격리병실이 있는 부서에서 근무하는 간호사의 코로나19 감염관리 수행에 영향을 미치는 요인 (The Effect on COVID-19 Infection Control Practice of Nurses who Work in Working Sites with Negative Pressure Isolation Rooms)

  • 박민지;이윤미
    • 중환자간호학회지
    • /
    • 제15권1호
    • /
    • pp.35-46
    • /
    • 2022
  • Purpose : This study aimed to identify the factors affecting coronavirus disease 2019 (COVID-19) infection control practices of nurses in negative pressure isolation rooms. Methods : The participants were 150 nurses working in three hospitals with negative pressure isolation rooms. Data were collected using structured questionnaires and analyzed using an independent t-test, one-way ANOVA, Scheffé test, Pearson correlation coefficients, and multiple regression analysis using the SPSS/WIN 26.0 program. Results : Factors significantly influencing the subject's COVID-19 infection control practice include Being married (𝛽=.18, p =.016), working in a ward with negative pressure isolation rooms (𝛽=.44, p <.001), working in an ICU with negative pressure isolation rooms (𝛽=.27, p =.010), COVID-19 infection control attitude (𝛽=.28, p =.001), anxiety for COVID-19 (𝛽=.30, p <.001). The explanatory power of these variables for COVID-19 infection control practice was 24.6% (F=8.67, p <.001). Conclusion : It is expected that strategies that utilize positive attitudes which believe that COVID-19 disease may be overcome by COVID-19 infection control practice will help improve emerging infectious diseases infection control practice.

RF스퍼터 공정압력의 변화에 따른 $TiO_2$ 박막의 특성 (The Characteristics of $TiO_2$ thin films on Working pressure of RF sputter)

  • 진영삼;김경환;최명규;최형욱
    • 한국전기전자재료학회:학술대회논문집
    • /
    • 한국전기전자재료학회 2009년도 하계학술대회 논문집
    • /
    • pp.218-219
    • /
    • 2009
  • $TiO_2$ thin films were deposited on si wafer and glass substrates by rf magnetron sputtering. The films were coated under argon atmosphere at different working pressures: 3mTorr, 5mTorr, 7mTorr, 10mTorr. The films were annealed at $550^{\circ}C$ for 5h after deposition. Film structures were analyzed with XRD, As the increase of working pressure, $TiO_2$ films have been good crystallinity. At 3mTorr and 5mTorr, the films were observed in rutile phase and anatase phase.

  • PDF

유기랭킨사이클과 암모니아-물 랭킨사이클의 열역학적 성능의 비교 해석 (Comparative Thermodynamic Analysis of Organic Rankine Cycle and Ammonia-Water Rankine Cycle)

  • 김경훈;김만회
    • 한국수소및신에너지학회논문집
    • /
    • 제27권5호
    • /
    • pp.597-603
    • /
    • 2016
  • In this paper a comparative thermodynamics analysis is carried out for organic Rankine cycle (ORC) and ammonia-water Rankine cycle (AWRC) utilizing low-grade heat sources. Effects of the working fluid, ammonia concentration, and turbine inlet pressure are systematically investigated on the system performance such as mass flow rate, pressure ratio, turbine-exit volume flow, and net power production as well as the thermal efficiency. Results show that ORC with a proper working fluid shows higher thermal efficiency than AWRC, however, AWRC shows lower mass flow rate of working fluid and lower pressure ratio of expander than ORC.

플라즈마 포커스를 이용한 크롬 산화물 박막 성장의 분위기 기체 압력 의존성 연구 (Dependence of Gas Pressure on Cr Oxide Thin Film Growth Using a Plasma Focus Device)

  • 정규호;이재갑;임현식;;;이전국
    • 한국재료학회지
    • /
    • 제17권6호
    • /
    • pp.308-312
    • /
    • 2007
  • Chromium oxide thin films have been deposited on silicon substrates using a tabletop 9kJ mathertyped plasma focus (PF) device. Before deposition, pinch behavior with gas pressure was observed. Strength of pinches was increased with increasing working pressure. Deposition was performed at room temperature as a function of working pressure between 50 and 1000 mTorr. Composition and surface morphology of the films were analyzed by Auger Electron Spectroscopy and Scanning Electron Microscope, respectively. Growth rates of the films were decreased with pressure. The oxide films were polycrystalline containing some impurities, Cu, Fe, C and revealed finer grain structure at lower pressure.