• 한국신재생에너지학회:학술대회논문집
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• 2010.06a
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• pp.66.1-66.1
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• 2010

Microcrystalline silicon at low temperatures has been developed using plasma enhanced chemical vapor deposition (PECVD). It has been found that energetically positive ion and atomic hydrogen collision on to growing surface have important effects on increasing growth rate, and atomic hydrogen density is necessary for the increasing growth rate correspondingly, while keeping ion bombardment is less level. Since the plasma potential is determined by working pressure, the ion energy can be reduced by increasing the deposition pressure of 700-1200 Pa. Also, correlation of the growth rate and crystallinity with deposition parameters such as working pressure, hydrogen flow rate and input power were investigated. Consequently an efficiency of 7.9% was obtained at a high growth rate of 0.92 nm/s at a high RF power 300W using a plasma-enhanced chemical vapor deposition method (27.12MHz).

• Journal of Welding and Joining
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• v.20 no.2
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• pp.109-115
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• 2002

In the case of using high temperature by coating ceramic/metal, large stress was produced due to difference of thermal expansion coefficient between those. And then lead to delamination. In order to relaxation of the stress A1$_2$O$_3$/SS316 composite powders with $10wt.%Al_2O_3$ compositional gradient and $10wt.%Al_2O_3$ agglomerated powder were made by spray drying method. These powders were sintered to improve the strength and to be plasma sprayed in order to fabricate the FGC(functionally graded coating). The influence of gun power, working distance and Ar pressure on the microstructure of the coating layer was studied in order to optimize the plasma spray conditions. It was proven that the optimum conditions were 40kw gun power, 5cm working distance and $100ft^3/h$ Ar flow for both powders. FGC with 10 compositional steps was fabricated and the total thickness was 1.3mm. FGC was heat treated at $1100^{\circ}C$for 10hours to evaluate the heat resisting characteristics.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.30 no.8
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• pp.514-519
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• 2017

TiN (titanium nitride) films were prepared using the RF magnetron sputtering technique. The films were deposited by pure $N_2$ plasma sputtering. Their mechanical properties, such as nano-indentation hardness, friction coefficient, and surface wettability, have been investigated. X-ray diffraction (XRD) studies revealed that the orientation of $TiN_X$ films changed towards the (111) orientation with decreasing working pressure due to a strong compressive stress during deposition. The strongest TiN (111) orientation was found when the film was deposited at a working pressure of 1 Pa. This film showed the largest hardness (16 GPa) and smallest friction coefficient (0.17) among the studied samples. Moreover, this film was found to be accompanied by a water-repellent surface with water contact angle more than $100^{\circ}$.

• Tribology and Lubricants
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• v.39 no.1
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• pp.13-20
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• 2023

Large drill bits may face high hardness ore and high working pressure when working. To optimize the use effect of large drill bits and prolong the use time, it is necessary to add a layer of pressure-resistant, wear-resistant, and low-friction coating on the surface of the drill bit. In this study, CoCrNiAlTi high-entropy alloy coatings and CoCrNiAlTi (70 wt%)-TiC (30 wt%) composite coatings are successfully prepared on Q235 steel by plasma spraying. The CoCrNiAlTi (70 wt%)-TiC (30 wt%) coating consists of FCC solid solution and a small amount of TiC phase. The effect of TiC on the composition phase, microhardness, and elastic modulus of HEA coating is studied by X-ray diffractometer (XRD) and microhardness tester. The effect of TiC on the friction and wear properties of HEA coatings is investigated using a wear tester. By improving the process parameters, the metallurgical bonding between the coating and the substrate is well combined, and a coating without pores and cracks is obtained. The experimental results confirm that the microhardness, elastic modulus, and wear resistance of CoCrNiAlTi-TiC composite coating are better, and the friction coefficient is lower.

• Journal of Welding and Joining
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• v.8 no.3
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• pp.60-69
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• 1990

Plasma arc cutting is a fusion cutting process in which a gas-constricted arc is employed to produce a high-temperature, high-velocity plasma jet on the workpiece. This process provides some advantages such as increased cutting velocity, excellent working accuracy and the ability to cut special materials (widely used stainless steels and Al-alloys, for example), when compared with iconventional oxyfuel gas cutting. From the view point of price and reliability of the power source, plasma arc cutting has also some distinct advantages over laser beam cutting. High-speed machines with NC or CNC systems are needed for the plasma arc or laser beam cutting process, while for oxyfuel gas cutting, low-speed machines with copying templates or optical-shape tracking sensors can be applied. The low price and high flexibility of the microprocessor arc contributing more and more the application of CNC system in the plasma arc cutting process, as in other manufacturing fields. From these points of view, a microprocessor-based plasma arc cutting system was developed by using a reference-pulse system, and its performance was tested. The interpolating routines were programmed in the assembly language for saving the memory volume and improving the compouting speed, which has an intimate relationship with the available cutting velocity.

• The Transactions of The Korean Institute of Electrical Engineers
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• v.64 no.9
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• pp.1323-1329
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• 2015

The WO₃/Ag/WO₃ transparent thin films are fabricated by the RF magnetron sputtering. This has a transmittance of front and rear about 90% in the visible light range and surface resistance of 6.41Ω/□. In this paper, we analyzed the surface characteristics caused by the working pressure and O₂ plasma surface treatment to apply a transparent electrode that was prepared to the laminated structure with other materials. The working pressure was changed in the WO₃ film to 10mTorr, 7mTorr, and 5mTorr, it showed a lower than roughness of conventional ITO. In addition, by 55.5774 J/m² at 5mTorr, it shows the hydrophobic property with lower process pressure. O₂ plasma surface treatment was changed at the condisions of the RF power to 150W, 100W, and 50W and the process time to 240s, 180s, 120s, and 60s. The surface roughness are the maximum roughness(Rmax) 6.437nm and the average roughness(Rq) 0.827nm at RF power 150W, and the maximum roughness (Rmax) 6.880nm and the average roughness (Rq) 0.839nm at process time 240sec. It showed a lower value than the surface treatment. also about working pressure and process time is increased, it showed the hydrophobic.

• Proceedings of the KIEE Conference
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• 2002.11a
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• pp.209-211
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• 2002

A simple-structured thermal plasma generator for waste gas treatment has been studied. The thermal plasma technology applied to waste treatment has undoubtedly gained high importance owing to its outstanding properties such as flexibility, compact reactor, and clean treatment. Moreover, the thermal plasma generated by ac power has some additional advantages such as simple electrode system and easy maintenance. A prototype 200kW class plasma generator with specifications of 10-30m/sec gas velocity and 3000-5000K temperature on the center just outside of the nozzle has been designed and tested. Case studies on heat transfer, heat flow, velocity distribution, and temperature distribution using a commercial simulation package show lots of flexibility in design. The experimental results from theprototype generator show that the ac thermal plasma is easily controlled by working gas flow once it is ignited. A stabilization condition is discussed with the data from monitoring arc voltage drops with respect to gas flow rate during the test.

• The Korean Journal of Nuclear Medicine
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• v.5 no.2
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• pp.1-6
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• 1971

The correlation between the plasma insulin, and glucose concentration was studied in healthy Korean adults consisting of 20 males and 22 females of 16 to 38 years of age. The blood samples of above subjects were obtained through cubital vein at arbitrary times, during their usual working hours. Plasma insulin was assayed by means of double antibody system of radioimnmunoassy technics, and blood glucose was determined by means of Van Slyke-Folch method. Results were as follows: 1. There were no differences in the blood sugar levels in relation to the plasma insulin concentration either by sex or age. 2. In the case, when the plasma insulin concentration was within $200m{\mu}D/ml$, the correlation between the insulin, and glucose concentration existed, the ratio of which was expressed as; Plasma glucose concentration(mg/dI)=$91.9+0.08{\times}Insulin$ concentration r=0.62 3. Insulinogenic index was 12.4%, which was somewhat higher than other reports. 4. It is suggested that the correlation between plasma insulin and glucose concentration could be determined at arbitrary times instead of fasting times.

• Journal of Surface Science and Engineering
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• v.54 no.6
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• pp.348-356
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• 2021

In this study, optical diagnosis of plasma was performed for nitrogen doping in graphene using a horizontal inductively coupled plasma (ICP) system. Graphene was prepared by mechanical exfoliation and the ICP system using nitrogen gas was ignited for plasma-induced and defect-suppressed nitrogen doping. In order to derive the optimum condition for the doping, plasma power, working pressure, and treatment time were changed. Optical emission spectroscopy (OES) was used as plasma diagnosis method. The Boltzmann plot method was adopted to estimate the electron excitation temperature using obtained OES spectra. Ar ion peaks were interpreted as a reference peak. As a result, the change in the concentration of nitrogen active species and electron excitation temperature depending on process parameters were confirmed. Doping characteristics of graphene were quantitatively evaluated by comparison of intensity ratio of graphite (G)-band to 2-D band, peak position, and shape of G-band in Raman profiles. X-ray photoelectron spectroscopy also revealed the nitrogen doping in graphene.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.179-179
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• 2016

A radio-frequency (RF) Inductively Coupled Plasma (ICP) torch system was used for boron-nitride nano-tube (BNNT) synthesis. Because of electrodeless plasma generation, no electrode pollution and effective heating transfer during nano-material synthesis can be realized. For stable plasma generation, argon and nitrogen gases were injected with 60 kW grid power in the difference pressure from 200 Torr to 630 Torr. Varying hydrogen gas flow rate from 0 to 20 slpm, the electrical and optical plasma properties were investigated. Through the spectroscopic analysis of atomic argon line, hydrogen line and nitrogen molecular band, we investigated the plasma electron excitation temperature, gas temperature and electron density. Based on the plasma characterization, we performed the synthesis of BNNT by inserting 0.5~1 um hexagonal-boron nitride (h-BN) powder into the plasma. We analysis the structure characterization of BNNT by SEM (Scanning Electron Microscopy) and TEM (Transmission Electron Microscopy), also grasp the ingredient of BNNT by EELS (Electron Energy Loss Spectroscopy) and Raman spectroscopy. We treated bundles of BNNT with the atmospheric pressure plasma, so that we grow the surface morphology in the water attachment of BNNT. We reduce the advancing contact angle to purity bundles of BNNT.