• Title/Summary/Keyword: Wide bandgap semiconductor

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Solution-Processed Indium-Gallium Oxide Thin-Film Transistors for Power Electronic Applications (전력반도체 응용을 위한 용액 공정 인듐-갈륨 산화물 반도체 박막 트랜지스터의 성능과 안정성 향상 연구)

  • Se-Hyun Kim;Jeong Min Lee;Daniel Kofi Azati;Min-Kyu Kim;Yujin Jung;Kang-Jun Baeg
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.37 no.4
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    • pp.400-406
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    • 2024
  • Next-generation wide-bandgap semiconductors such as SiC, GaN, and Ga2O3 are being considered as potential replacements for current silicon-based power devices due to their high mobility, larger size, and production of high-quality wafers at a moderate cost. In this study, we investigate the gradual modulation of chemical composition in multi-stacked metal oxide semiconductor thin films to enhance the performance and bias stability of thin-film transistors (TFTs). It demonstrates that adjusting the Ga ratio in the indium gallium oxide (IGO) semiconductor allows for precise control over the threshold voltage and enhances device stability. Moreover, employing multiple deposition techniques addresses the inherent limitations of solution-processed amorphous oxide semiconductor TFTs by mitigating porosity induced by solvent evaporation. It is anticipated that solution-processed indium gallium oxide (IGO) semiconductors, with a Ga ratio exceeding 50%, can be utilized in the production of oxide semiconductors with wide band gaps. These materials hold promise for power electronic applications necessitating high voltage and current capabilities.

NiO-transparent Metal-oxide Semiconductor Photoelectric Devices (NiO 기반의 투명 금속 산화물 반도체 광전소자)

  • Ban, Dong-Kyun;Park, Wang-Hee;Eun, Seong Wan;Kim, Joondong
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.29 no.6
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    • pp.359-364
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    • 2016
  • NiO serves as a window layer for Si photoelectric devices. Due to the wide energy bandgap of NiO, high optical transparency (over 80%) was achieved and applied for Si photoelectric devices. Due to the high the high mobility, the heterojunction device (Al/n-Si/$SiO_2$/p-NiO/ITO) provide ultimately fast photoresponses of rising time of $38.33{\mu}s$ and falling time of $39.25{\mu}s$, respectively. This functional NiO layer would provide benefits for high-performing photoelectric devices, including photodetectors and solar cells.

UV emission characterization of ZnO thin films depending on the variation of oxygen pressure (분위기 산소압변화에 따른 ZnO박막의 UV발광 특성분석)

  • Bae, Sang-Hyuck;Lee, Sang-Yeol
    • Proceedings of the KIEE Conference
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    • 1999.07d
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    • pp.1523-1525
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    • 1999
  • ZnO is a wide-bandgap II-VI semiconductor and has a variety of potential application. ZnO exhibits good piezoelectric, photoelectric and optic properties, and is good for a electroluminescence device. ZnO films have been deposited at (0001) shappire by PLD technique. Chamber was evacuated by turbomolecular pump to a base pressure of $1{\times}10^{-6}$ Torr Nd:YAG pulsed laser was operated at ${\lambda}=355nm$. The ZnO films were deposited at oxygen pressures from base to 500 mTorr. The substrate temperatures was increased from $200^{\circ}C$ to $700^{\circ}C$. At aleady works, UV emission and green-yellow PL was observed. In this work, ZnO films showed UV, violet, green and yellow emissions. UV emission was enhanced by increasing partial oxygen pressure. We investigated relationship between partial oxygen pressure and UV emission.

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Radiation Hardness Evaluation of GaN-based Transistors by Particle-beam Irradiation (방사선빔 조사를 이용한 질화갈륨 기반 트랜지스터의 내방사선 특성 연구)

  • Keum, Dongmin;Kim, Hyungtak
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.66 no.9
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    • pp.1351-1358
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    • 2017
  • In this work, we investigated radiation hardness of GaN-based transistors which are strong candidates for next-generation power electronics. Field effect transistors with three types of gate structures including metal Schottky gate, recessed gate, and p-AlGaN layer gate were fabricated on AlGaN/GaN heterostructure on Si substrate. The devices were irradiated with energetic protons and alpha-particles. The irradiated transistors exhibited the reduction of on-current and the shift of threshold voltage which were attributed to displacement damage by incident energetic particles at high fluence. However, FET operation was still maintained and leakage characteristics were not degraded, suggesting that GaN-based FETs possess high potential for radiation-hardened electronics.

UV Emission Characterization of ZnO Thin Films Depending on the Variation of Oxygen Pressure (분위기 산소압변화에 따른 ZnO박막의 UV발광 특성분석)

  • Baek, Sang-Hyeok;Lee, Sang-Yeol;Jin, Beom-Jun;Im, Seong-Il
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.49 no.2
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    • pp.103-106
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    • 2000
  • ZnO is a wide-bandgap II-IV semiconductor and has a variety of potnetial applications. ZnO exhibits good piezoelectric, photoelectric and optical properties, and is a good candidate for an electroluminescence device. ZnO films have been deposited on (001) sapphire by PLD technique. Nd:YAG pulsed laser was operated at a wavelength of $\lambda=355nm$. The ZnO films were deposited at oxygen pressures from base to 500 mTorr. The substrate temperatures was increased from $200^{\circ}C\; to\;700^{\circ}C$ films showed strong UV emission by increasing the partial oxygen pressure. We have investigated the relationship between partial oxygen pressure and the intensity of UV emission.

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Differences in Design Considerations between InGaN and Conventional High-Brightness Light-Emitting Diodes

  • Lee, Song-Jae
    • Journal of the Optical Society of Korea
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    • v.2 no.1
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    • pp.13-21
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    • 1998
  • Based on the escape cone concepts, high-brightness light-emitting diodes (LEDs) have been analyzed. In AlGaAs or InGaAlP LEDs, photon absorption in the ohmic region under the electrode is known to be significant. Thus, ins general, a thick window layer (WL) and a transparent substrate (TS) would minimize photon shielding by the electrodes and considerably improve photon output coupling efficiency. However, the schemes do not seem to be necessary in InGaN system. Photon absorption in ohmic contact to a wide bandgap semiconductor such as GaN may be negligible and, as a result, the significant photon shielding by the electrodes will not degrade the photon output coupling efficiency so much. The photon output coupling efficiency estimated in InGaN LEDs is about 2.5 - 2.8 times that of the conventional high-brightness LED structures based on both WL and TS schemes. As a result, the extenal quantum efficiency in InGaN LEDs is as high as 9% despite the presumably very low internal quantum efficiency.

Review on Gallium Nitride HEMT Device Technology for High Frequency Converter Applications

  • Yahaya, Nor Zaihar;Raethar, Mumtaj Begam Kassim;Awan, Mohammad
    • Journal of Power Electronics
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    • v.9 no.1
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    • pp.36-42
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    • 2009
  • This paper presents a review of an improved high power-high frequency III-V wide bandgap (WBG) semiconductor device, Gallium Nitride (GaN). The device offers better efficiency and thermal management with higher switching frequency. By having higher blocking voltage, GaN can be used for high voltage applications. In addition, the weight and size of passive components on the printed circuit board can be reduced substantially when operating at high frequency. With proper management of thermal and gate drive design, the GaN power converter is expected to generate higher power density with lower stress compared to its counterparts, Silicon (Si) devices. The main contribution of this work is to provide additional information to young researchers in exploring new approaches based on the device's capability and characteristics in applications using the GaN power converter design.

Interfaces of Stacking $TiO_2$ Thin Layers Affected on Photocatalytic Activities

  • Ju, Dong-U;Bu, Jin-Hyo
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.189.1-189.1
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    • 2013
  • Titanium dioxide (TiO2) is a wide bandgap semiconductor possessing photochemical stability and thus widely used for photocatalysis. However, enhancing photocatalytic efficiency is still a challenging issue. In general, the efficiency is affected by physio-chemical properties such as crystalline phase, crystallinity, exposed crystal facets, crystallite size, porosity, and surface/bulk defects. Here we propose an alternative approach to enhance the efficiency by studying interfaces between thin TiO2 layers to be stacked; that is, the interfacial phenomena influencing on the formation of porous structures, controlling crystallite sizes and crystallinity. To do so, multi-layered TiO2 thin films were fabricated by using a sol-gel method. Specifically, a single TiO2 thin layer with a thickness range of 20~40 nm was deposited on a silicon wafer and annealed at $600^{\circ}C$. The processing step was repeated up to 6 times. The resulting structures were characterized by conventional electron microscopes, and followed by carrying out photocatalytic performances. The multi-layered TiO2 thin films with enhancing photocatalytic efficiency can be readily applied for bio- and gas sensing devices.

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SiC Motor Drive for Elevator System (엘리베이터 시스템을 위한 SiC 권상기 드라이브)

  • Gwon, Jin-Su;Moon, Seok-Hwan;Kim, Ju-Chan;Lee, Joon-Min
    • The Transactions of the Korean Institute of Power Electronics
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    • v.24 no.3
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    • pp.147-152
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    • 2019
  • With the recent emphasis on the importance of energy conservation, studies on high-efficiency elevator systems are being continuously conducted. Therefore, pulse width modulation converters are commonly used in traction drives on elevator systems. Wide bandgap devices have been increasingly commercialized, and their application to power conversion systems, such as renewable and energy storage system, has been gradually increasing. In this study, a SiC inverter for an elevator traction drive is investigated. In particular, an inverter is designed to minimize stray and parasitic inductance. Input and output filters are designed by considering switching frequency. The designed SiC inverter reduces volume by approximately 32% compared with that of a Si inverter, and power converter efficiency is over 98.8%.

Thermal Design of High Power Semiconductor Using Insulated Metal Substrate (Insulated Metal Substrate를 사용한 고출력 전력 반도체 방열설계)

  • Bongmin Jeong;Aesun Oh;Sunae Kim;Gawon Lee;Hyuncheol Bae
    • Journal of the Microelectronics and Packaging Society
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    • v.30 no.1
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    • pp.63-70
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    • 2023
  • Today, the importance of power semiconductors continues to increase due to serious environmental pollution and the importance of energy. Particularly, SiC-MOSFET, which is one of the wide bandgap (WBG) devices, has excellent high voltage characteristics and is very important. However, since the electrical properties of SiC-MOSFET are heatsensitive, thermal management through a package is necessary. In this paper, we propose an insulated metal substrate (IMS) method rather than a direct bonded copper (DBC) substrate method used in conventional power semiconductors. IMS is easier to process than DBC and has a high coefficient of thermal expansion (CTE), which is excellent in terms of cost and reliability. Although the thermal conductivity of the dielectric film, which is an insulating layer of IMS, is low, the low thermal conductivity can be sufficiently overcome by allowing a process to be very thin. Electric-thermal co-simulation was carried out in this study to confirm this, and DBC substrate and IMS were manufactured and experimented for verification.