• JSTS:Journal of Semiconductor Technology and Science
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• v.8 no.2
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• pp.121-127
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• 2008

This paper presents design and fabrication of optimized geometry structure of electrostatic inkjet head. In order to verify effect of geometry shape, we simulate electric field intensity according to the head structure. The electric field strength increases linearly with increasing height of the micro nozzle. As the nozzle diameter decreases, the electric field along the periphery of the meniscus can be more concentrated. We design and fabricate the electrostatic inkjet heads, hole type and pole type, with optimized structure. It was fabricated using thick-thermal oxidation and silicon micromachining technique such as the deep reactive ion etching (DRIE) and chemical wet etching process. It is verified experimentally that the use of the MEMS inkjet head allows a stable and sustainable micro-dripping mode of droplet ejection. A stable micro dripping mode of ejection is observed under the voltages 2.5 kV and droplet diameter is $10\;{\mu}m$.

• Journal of Environmental Science International
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• v.23 no.11
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• pp.1953-1961
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• 2014

Increasing public concerns over odors and air regulations necessitates the remediation of a wide range of odor substances for industrial and indoor purpose. Currently, the wet scrubbing technique by neutralization using oils is being used to treat odor substances such as Ammonia($NH_3$), Methyl Mercaptan($CH_3SH$), Hydrogen Sulfide($H_2S$), Methylamine($CH_3NH_2$), Acetaldehyde($CH_3CHO$). The chemical analysis is performed to analyze the composition of an Arctium Lappa Root extract by VOC analyzer(Phocheck 5000Ex, ION SCIENCE co.) The objectives of the this study are to clarify the possibility of the neutralization of odors sprayed in the fixed bed and determine the removal efficiencies for different input odor concentrations. It is found that Ammonia($NH_3$), Methyl Mercaptan($CH_3SH$), Hydrogen Sulfide($H_2S$), Methylamine($CH_3NH_2$), Acetaldehyde($CH_3CHO$) are significantly removed and their removal efficiencies are higher than 98%. The kitchen detergent with Arctium Lappa Root extract showed excellent removal efficiencies of odor substances and high possibility for the development of kitchen detergent with odor removal.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.18 no.12
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• pp.1075-1079
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• 2005

The Pseudo MOSFET measurements technique has been used for the electrical characterization of the nano SOI wafer. Silicon islands for the Pseudo MOSFET measurements were fabricated by selective etching of surface silicon film with dry or wet etching to examine the effects of the etching process on the device properties. The characteristics of the Pseudo MOSFET were not changed greatly in the case of thick SOI film which was 205 nm. However the characteristics of the device were dependent on etching process in the case of less than 100 nm thick SOI film. The sub 100 nm SOI was obtained by thinning the silicon film of standard thick SOI wafer. The thickness of SOI film was varied from 88 nm to 44 nm by chemical etching. The etching process effects on the properties of pseudo MOSFET characteristics, such as mobility, turn-on voltage, and drain current transient. The etching Process dependency is greater in the thinner SOI wafer.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.07b
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• pp.912-915
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• 2004

Inductors material utilized in the downsizing passive devices and Rf components requires the physical and electrical properties at given area such as inductors thickness reduction, inductance and q-factor increase, low leakage current and thermal stability. In this study, Spiral inductors on the $SiO_2/Si$(100) substrate were fabricated by the magnetron sputtering method. Cu thin film with the thickness of $2{\mu}m$ was deposited on the substrate. Also we fabricated square inductors through the wet chemical etching technique. The inductors are completely specified by the turn width and the spacing between spirals. Both the width and spacing between spirals were varied from 10 to $60{\mu}m$ and from 20 to $70{\mu}m$, respectively. Inductance and Q factor dependent on the RF frequency were investigated to analyze performance of inductor arrays

• Korean Journal of Optics and Photonics
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• v.6 no.2
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• pp.148-155
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• 1995

The low loss single-mode $Al_{0.042}Ga_{0.958}As/GaAs/Al_{0.042}Ga_{0.958}As$ strip-loaded waveguides had been designed using an effective index method and fabricated using a MOCVD technique and chemical wet etching method. The propagation loss and facet reflectivity were measured by the Fabry-Perot resonance method and sequential cleaving experiment at $1.31{\mu}m$ wavelength. As a result, the propagation loss is as low as 0.62 dB/cm and the facet refiectivity(R) equals to 0.299 for straight waveguides with width $ w=4.1{\mu}m$..

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.16 no.8
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• pp.700-704
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• 2003

This paper describes on characteristics of 2" 3C-SiC wafer bonding using PECVD (plasma enhanced chemical vapor deposition) oxide and HF (hydrofluoride acid) for SiCOI (SiC-on-Insulator) structures and MEMS (micro-electro-mechanical system) applications. In this work, insulator layers were formed on a heteroepitaxial 3C-SiC film grown on a Si (001) wafer by thermal wet oxidation and PECVD process, successively. The pre-bonding of two polished PECVD oxide layers made the surface activation in HF and bonded under applied pressure. The bonding characteristics were evaluated by the effect of HF concentration used in the surface treatment on the roughness of the oxide and pre-bonding strength. Hydrophilic character of the oxidized 3C-SiC film surface was investigated by ATR-FTIR (attenuated total reflection Fourier transformed infrared spectroscopy). The root-mean-square suface roughness of the oxidized SiC layers was measured by AFM (atomic force microscope). The strength of the bond was measured by tensile strength meter. The bonded interface was also analyzed by IR camera and SEM (scanning electron microscope), and there are no bubbles or cavities in the bonding interface. The bonding strength initially increases with increasing HF concentration and reaches the maximum value at 2.0 ％ and then decreases. These results indicate that the 3C-SiC wafer direct bonding technique will offers significant advantages in the harsh MEMS applications.ions.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2005.07a
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• pp.3-4
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• 2005

The Pseudo-MOSFET measurements technique has been used for the electrical characterization of the nano SOL Silicon islands for the Pseudo-MOS measurements were fabricated by selective etching of surface silicon film with dry or wet etching to examine the effects of the etching process on the device properties. The characteristics of the Pseudo-MOS was not changed greatly in the case of thick SOI film which was 205 nm. However the characteristics of the device was dependent on etching process in the case of less than 100 nm thick SOI film. The sub 100nm SOI was obtained by thinning the silicon film of standard thick SOI. The thickness of SOI film was varied from 88 nm to 44 nm by chemical etching. The etching process effects on the properties of pseudo-MOSFET characteristics, such as mobility, turn-on voltage, and drain current transient. The etching process dependency is greater in the thinner SOI and related to original SOI wafer quality.

• Advances in nano research
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• v.12 no.4
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• pp.415-426
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• 2022

Nickel substituted cobalt-zinc ferrite nanoparticles with composition Co_0.5Zn_0.5Ni_xFe_2-xO₄ (x = 0.25, 0.5, 0.75, 1.0) were synthesized using a wet chemical method named citrate precursor method. Various characterizations of the prepared nanoferrites were done using X-ray powder diffractometry (XRD), Scanning electron microscopy (SEM), UV visible spectroscopy and Fourier transform spectroscopy technique (FT-IR). XRD confirmed the formation of cubic spinel structure of the samples with single phase having one characteristic peak at (311). The value of optical band gap (E_g) was found to decrease with Ni substitution and have values in the range 2.30eV to 1.69eV. A Fenton-type system was created by photocatalytic activity using source of visible light for removal of methylene blue dye. Observations revealed increase in the degradation of methylene blue dye with increasing nickel content in the samples. The degradation percentage was increased from 77.32% for x = 0.25 to 90.16% for x = 1.0 in one hour under the irradiation of visible light. Also, the degradation process was found to have pseudo first order kinetics model. Hence, it can be observed that synthesized nickel doped cobalt-zinc ferrites have good capability for water purification and its degradation efficiency enhanced with increase in nickel concentration.

• Journal of Wetlands Research
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• v.25 no.4
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• pp.221-229
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• 2023

Extracted from the metropolitan area, the Paldang Lake, which supplies approximately 8 million tons of water, has achieved a BOD (Biochemical Oxygen Demand) of 1.1 mg/L as a result of water quality preservation policies. However, concerning the COD (Chemical Oxygen Demand) component that encompasses refractory organic matter, there has been an observable upward trend in concentration. The introduction of refractory organic matter into the water source of Paldang Lake brings potential increments in BOD, generates off-putting tastes and odors in tap water, increases THM (Trihalomethane) formation, and triggers algae proliferation. Moreover, if residual hazardous refractory pollutants persist in aquatic environments, they may induce endocrine disruption and phenomena such as antibiotic resistance. In this study, a monitoring campaign was executed to discern the concentration of refractory organic matter emissions from point and non-point sources within Paldang Lake and its upstream region, with the aim of managing refractory organic matter in Paldang Lake. By comparing refractory organic matter emission concentrations across monitored areas, the elimination efficiency at wastewater treatment plants was assessed. Additionally, employing the Pearson correlation correlation analysis technique, correlations among refractory organic matter indices, antecedent wet days, and antecedent dry days were explored. The concentrations of refractory organic matter in rivers and Paldang Lake exhibited a similar pattern. Wastewater treatment plant effluents exhibited higher concentrations compared to rivers and Paldang Lake. The assessment of refractory organic matter removal at wastewater treatment plants indicated a removal efficiency of 65.73%. However, no significant correlation emerged between refractory organic matter emission concentration and antecedent wet days or priory antecedent dry days. This absence of correlation is attributed to data scarcity, underscoring the need for long-term monitoring and data accumulation.