• Transactions of Materials Processing
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• v.27 no.6
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• pp.370-378
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• 2018

Cold forging, carried out at room temperature, leads to high dimensional accuracy and excellent surface integrity as compared to other forging methods such as warm and hot forgings. In the cold forging process, WC-Co (Tungsten Carbide-Cobalt) alloy is the mainly used material as a core dies because of its superior hardness and strength as compared to other structural materials. For cold forging, die life is the most significant factor because it is directly related to the manufacturing cost due to periodic die replacement in mass production. To investigate die life of WC-Co alloy for cold forging, mechanical properties such as strength and fatigue are essentially necessary. Generally, uniaxial tensile test and fatigue test are the most efficient and simplest testing method. However, uniaxial tension is not efficiently application to WC-Co alloy because of its sensitivity to alignment of the specimen due to its brittleness and difficulty in thread machining. In this study, shape of specimen, tools, and testing methods, which are appropriate for uniaxial tensile test for WC-Co alloy, are proposed. The test results such as Young's modulus, tensile strength and stress-strain curves are compared to those in previous literature to validate the proposed testing methods. Based on the validation of test results it was concluded that the newly developed testing method is applicable to other cemented carbides like Titanium carbides with high strength and brittleness, and also can be utilized to carry out fatigue tests for further investigation on die life of cold forging.

• Proceedings of the KIEE Conference
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• 1999.07d
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• pp.1699-1701
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• 1999

We prepared diamond thin films on WC-Co substrate in $H_2-CH_4-O_2$ gas mixture using 13.56MHz RF PACVD. Scanning electron microscopy, X-ray diffraction and Raman spectroscopy were used to analyze the nature of thin film. and Rockwell test to analyze the adhesion between thin film and substrate. The good diamond quality and adhesion was appeared with cemented tungsten carbide substrate treated with oxygen plasma.

• Proceedings of the Korean Powder Metallurgy Institute Conference
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• 2006.09a
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• pp.529-530
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• 2006

This paper concerned with SPS (spark plasma sintering), hot pressing of sinter nanometer WC-Co powder and discussed the density, hardness, microstructures and grain sizes of the alloys sintered. The results showed that the two sintered techniques could produce high density alloys and play well on the grain growth, but SPS could lower the sintering temperature and shorten sintering time. Besides, the hardness of the sintered cemented alloys that was dependent on the grain size and densification could also be improved.

• Journal of Powder Materials
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• v.1 no.2
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• pp.119-198
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• 1994

The characteristics of various important microstructural factors of WC-base hard- metals (cemented carbides) such as the amount of Co metal binder phase, the carbide grain size, the microstructural defects acting as a fracture source, the solid solubility of tungsten in the binder phase affected by the carbon content, the precipitation of $Co_3W$, the domain size of binder phase, the formation of ${\beta}-free$ layer or Co-rich layer and CVD or PVD coated layer, and the effects of these factors on the flexural strength of the hardmetals are reviewed.

• Proceedings of the Korean Powder Metallurgy Institute Conference
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• 2001.11a
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• pp.22-22
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• 2001

전통적으로 초경합금은 무라까미 용액에서 에칭하거나 묽은 염산에 넣고 끓이는 방법에 의해 그 밋구조를 관찰하였다. 그러나 carbide 입자가 suvmicron 크기인 초경합금에서는 전통적인 에칭 방법으 에칭 후에도 입자/기지상, 입자/입자 입계를 동시에 구분시킬 수 있는 SEM 사진을 얻을 수 없다. 본 연구에서는 submicron 크기 초경합금의 고배율 SEM 사진을 얻을 수있는 90H2O2 - 10HNO3 (vol%)의 새로운 에칭 용액을 개발하였다. 경명의 submicron 크기 WC-Co 시편을 샐운 에칭 용액인 90H2O2 - 10HNO3 (vol%)에 넣고 약 6$0^{\circ}C$에서 약 12분 동안 에칭하였다. 에칭에 의해 Co 기지상은 빠르게 제기(dissolution)되었고, 동시에 표면의 WC 입자들은 각각의 결정학적 방향에 따라 천천히(slowly) 다른 속도로 부식(sissolution)되었다. 고배율 SEM을 관찰한 결과 WC/기지상 계면과 WC/WC 입계가 명화갛게 관찰되었다. WC 입자의 성장을 억제시키는입자성장 억제제(Cr3C2, TaC,VC)가 첨가된 WC Co 초경합금을 새로운 에칭 용액인 90H2O2 - 10HNO3 (vol%)에 넣고 약 6$0^{\circ}C$에서 약 12분동안 에칭하였다. 매우 작은 입자를 갖는 미세구조임에도 불구하고 고배율 SEM에서 WC/기지상 계면과 WC/WC 입계가 명확하게 관찰되었다. 90H2O2 - 10HNO3 (vol%)에서 Co 기지상이 빠르게 제거되는 것은 산 (acid)인 HNO3)에서 금속인 Co가 쉽게 녹기 때문이다. 동시에 WC 입자들이 각각 다른 속도로 에칭 된 것은 강력한 산화제인 H2O2가 각각의 WC입자 표면에 얇은 텅스텐 산화물 층을 형성시켰고 이들이 산인 HNO3에서 녹았기 때문이다. 본 연구에서 개발된 새로운 에칭 용액인 90H2O2 - 10HNO3 (vol%)의 에칭 원리가 똑같이 적용 가능한 다른 종류의 초경 합금에서도 사용이 가능할 것으로 판단된다.로 판단된다.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1999.11a
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• pp.398-401
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• 1999

We prepared diamond thin films on WC-Co substrate in a mixtured $H_2-CH_4-O_2$, gas, using 13.%MHz RF PACVD. Scanning electron microscopy, X-ray diffraction and Rarnan spectroscopy were used to analyze the characteristics of thin film, and tribometer of ball-on-disk type were used to test the wear resistance between thin film and substrate. The good diamond quality and wear resistance was appeared with cemented tungsten carbide substrate treated with oxygen plasma.

• Proceedings of the Korean Powder Metallurgy Institute Conference
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• 2006.09a
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• pp.109-110
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• 2006

We have studied the effect of C/Ti atomic ratio of TiCx (x=0.5, 0.75 and 1.0) raw powder on the properties of the Ti-Mo-WTiC sintered hard alloy. The decrease of C/Ti atomic ratio accelerated the densification in the sintering process. The hardness was remarkably improved up to 1350HV with decreasing the C/Ti atomic ratio because of increase of TiCx phase volume content and its fine dispersion. From the results of electro-chemical tests in acid and 3% NaCl solutions, it was obvious that every alloy had excellent corrosion resistance, which meant about 200 times better than that of WC-Co cemented carbide.

• Journal of Powder Materials
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• v.28 no.4
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• pp.342-351
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• 2021

Because of its unique properties, tungsten is a strategic and rare metal used in various industrial applications. However, the world's annual production of tungsten is only 84000 t. Ammonium paratungstate (APT), which is used as the main intermediate in industrial tungsten production, is usually obtained from tungsten concentrates of wolframite and scheelite by hydrometallurgical treatment. Intermediates such as tungsten trioxide, tungsten blue oxide, tungstic acid, and ammonium metatungstate can be derived from APT by thermal decomposition or chemical attack. Tungsten metal powder is produced through the hydrogen reduction of high-purity tungsten oxides, and tungsten carbide powder is produced by the reaction of tungsten powder and carbon black powder at 1300-1700℃ in a hydrogen atmosphere. Tungsten scrap can be divided into hard and soft scrap based on shape (bulk or powder). It can also be divided into new scrap generated during the production of tungsten-bearing goods and old scrap collected at the end of life. Recycling technologies for tungsten can be divided into four main groups: direct, chemical, and semi-direct recycling, and melting metallurgy. In this review, the current status of tungsten smelting and recycling technologies is discussed.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2017.05a
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• pp.93-93
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• 2017

고전력 펄스 전원공급장치를 이용한 마그네트론 스퍼터링(high-power impulse magnetron sputtering; HiPIMS)과 직류(direct current; DC) 전원공급장치를 이용한 마그네트론 스퍼터링(DC 스퍼터링)을 이용하여 제조한 티타늄 질화물(titanium nitride; TiN) 박막의 특성을 비교하였다. HiPIMS와 DC 스퍼터링 공정 중에 빗각증착을 적용하여 TiN 박막의 미세구조와 기계적 특성의 변화를 확인하였다. TiN 박막을 코팅하기 위한 기판으로 스테인리스 강판(SUS304)과 초경(cemented carbide; WC-10wt.%Co)을 사용하였다. 기판은 알코올과 아세톤으로 초음파 처리를 실시하여 기판 표면의 불순물을 제거하였다. 기판 청정 후 진공용기 내부의 기판홀더에 기판을 장착하고 $2.0{\times}10^{-5}torr$의 기본 압력까지 진공배기를 실시하였다. 진공 용기의 압력이 기본 압력에 도달하면 아르곤(Ar) 가스를 진공용기 내부로 ${\sim}10^{-2}torr$의 압력으로 주입하고 기판홀더에 라디오 주파수(radio frequency; rf) 전원공급장치를 이용하여 - 800 V의 전압을 인가하여 글로우 방전을 발생시켜 30 분간 기판 표면의 산화막을 제거하는 기판청정을 실시하였다. 기판청정이 완료되면 기본 압력까지 진공배기를 실시하고 Ar과 질소($N_2$)의 혼합 가스를 진공용기 내부로 ${\sim}10^{-3}torr$의 압력으로 주입하여 HiPIMS와 DC 스퍼터링으로 TiN 박막 제조를 실시하였다. 빗각의 크기는 $45^{\circ}$와 $-45^{\circ}$이었다. 제조된 TiN 박막은 주사전자 현미경, 비커스 경도 측정기 그리고 X-선 회절 분석기를 이용하여 특성을 분석하였다. HiPIMS로 제조한 TiN 박막은 기판 전압을 인가하지 않아도 색상이 노란색을 보이지만, DC 스퍼터링으로 제조한 TiN 박막은 기판 전압을 인가하지 않으면 노란색을 보이지 않고 어두운 갈색에 가까운 색을 보였다. TiN 박막의 경도는 HiPIMS로 제조한 TiN 박막이 DC 스퍼터링으로 제조한 TiN 박막보다 높았다. 이러한 TiN 박막의 특성 차이는 DC 스퍼터링과 비교하여 높은 HiPIMS의 이온화율에 의한 결과로 판단된다. 빗각을 적용한 TiN 박막은 미세구조 변화를 보였으며 이러한 미세구조 변화는 TiN 박막의 특성에 영향을 미치는 것을 확인하였다.

• Journal of the Korean Society of Industry Convergence
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• v.23 no.1
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• pp.25-32
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• 2020

Generally, high-temperature, high-pressure, high-priced sintering equipment is used for diamond sintering, and conductivity is a problem for improving the surface modification of the sintered body. In this study, to improve the efficiency of diamond sintering, we identified a new process and material that can be sintered at low temperature, and attempted to develop a composite thin film that can be discharged by doping boron gas to improve the surface modification of the sintered body. Sintered bodies were sintered by mixing Si and two diamonds in different particle sizes based on CIP molding and HIP molding. In CVD deposition, CVD was performed using WC-Co cemented carbide using CH₄ and H₂ gas, and the specimen was made conductive using boron gas. According to the experimental results of the sintered body, as the Si content is increased, the Vickers hardness decreases drastically, and the values of tensile strength, Young's modulus and fracture toughness greatly increase. Conductive CVD deposited diamond was boron deposited and discharged. As the amount of boron added increased, the strength of diamond peaks decreased and crystallinity improved. In addition, considering the release processability, tool life and adhesion of the deposition surface according to the amount of boron added, the appropriate amount of boron can be confirmed. Therefore, by solving the method of low temperature sintering and conductivity problem, the possibility of solving the existing sintering and deposition problem is presented.