• Journal of the Korean institute of surface engineering
• /
• v.29 no.1
• /
• pp.3-14
• /
• 1996

High temperature anneal of W-rich silicides, inferior to adherence compared with Si-rich silicides, resulted in the film peeling off from the Si-substrate when WSix thickness reached more than critical thickness. Investigation of the W-rich silicide films peeling off from the substrate revealed that the voids underneath the $WSi_2$ produced through silicide reaction were responsible for the poor adherence of W-rich silicide. In addition, internal stress in the film increased as the silicide thickness increased. In order to promote the adhesion of WSix to Si-substrate, thin Ti-layer was formed between WSi and Si-substrate(WSix/Ti/Si). No voids were observed in $WSi_2$/Ti/Si $N_2$-annealed at $1000^{\circ}C$, thereby leading to an increase of the critical thickness from ～1700$\AA$ to more than 2500$\AA$. However, higher resisiti-vity was obtained in WSix/Ti/Si than in WSix/Si. Finally, different silicide reaction mechanism for the structures(WSix/Si, WSix/Ti/Si) was proposed to explain the formation of voids as well as the role of thin Ti-layer.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.24 no.3
• /
• pp.177-181
• /
• 2011

We have studied structural, optical, and electrical properties of the Al-doped ZnO (AZO) thin films being usable in transparent conducting oxides. The AZO thin films were deposited on the corning 1737 glass plate by the RF magnetron sputtering system. To find optimal properties of AZO for transparent conducting oxides, the RF power in sputtering process was varied as 40 W, 60 W, and 80 W, respectively. As RF power increased, the crystallinity of AZO thin film was decreased, the optical bandgap of AZO thin film increased. The transmittance of the film was over 80% in the visible light range regardless of the changes in RF power. The measurement of Hall effect characterizes the whole thin film as n-type, and the electrical property was improved with increasing RF power. The structural, optical, and electrical properties of the AZO thin films were affected by Al dopant content in AZO thin film.

• Analytical Science and Technology
• /
• v.7 no.4
• /
• pp.471-476
• /
• 1994

The capability of PIXE (Proton Induced X-ray Emission) method for the precision measurement of coating thickness has been tested by measuring several gold coated copper plates. Two different experimental methods are applied and compared. The results are compared with those by the weight measurement and proton RBS (Rutherford Backscattering Spectrometry). The advantage of the method is that it can be also used for the nondestructive thickness measurement of this layers on large-scaled samples or archeological samples which cannot be placed in a vacuum chamber.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2007.11a
• /
• pp.333-334
• /
• 2007

Diamond-like carbon (DLC)박막은 높은 경도, 화학적 안정성, 높은 광 투과성을 가지고 있어, 공구강, 광학렌즈 및 플라스틱의 보호 코팅을 위해 응용되어진다. 본 연구에는 DLC 박막은 Silicon을 기반으로 하는 태양전지 반사 반지막으로 응용을 위해, 13.56 MHz RF 플라즈마 화학기상 증착 (RF-PECVD)법을 통해 합성되었다. DLC 합성 시 RF power는 150 W, 메탄 (CH4)가스의 유량은 6%~10% 조절되었다. 합성되어진 DLC 박막의 광학적 특성은 UV spectrometry, Ellipsometry를 사용하여 분석되었고, 경도는 Nano-indenter를 사용하여 측정되었다. 측정 결과 투과도와 굴절률 등의 광학적 특성은 탄소 조성비가 6%정도에서 가장 좋은 결과 값을 얻었으나, 물리적 특성인 경도는 탄소 조성비가 높을수록 증가하는 경향을 보였으며, Si기판과의 접착력은 32N 이상의 높은 값을 나타내었다. 결과로써, DLC 박막은 합성시 적절한 탄소 조성비를 통해 silicon을 기반으로 하는 태양전지 반사방지막으로 응용할 수 있다.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2011.02a
• /
• pp.56-56
• /
• 2011

투명 메모리 소자는 향후 투명 디스플레이 등 투명 전자기기와 집적화해 통합형 투명 전자시스템을 구현을 위해 지속적으로 연구가 진행 되고 있으며, 산학계에서는 다양한 메모리 소자중 큰 밴드-갭(>3 eV) 특성을 가지는 저항 변화 메모리(Resistive Random Access Memory, ReRAM)를 이용한 투명 메모리 구현 가능성을 지속적으로 보고하고 있다. 현재까지의 저항 변화 메모리 연구는 물질 최적화를 위해 다양한 금속-산화물계(Metal-Oxide) 저항 변화 물질에 대한 연구가 활발하게 진행 되고 있지만, 금속-산화물계 물질의 경우 근본 적으로 그 제조 공정상 산소에 의한 다수의 산소 디펙트 형성과 제작 시 쉽게 발생할 수 있는 표면 오염의 문제점을 안고 있으며, 또한 Endurance 및 Retention 등의 신뢰성에 문제를 보이고 있다. 따라서, 이러한 문제점을 근본 적으로 해결하기 위해 새로운 저항 변화 물질에 관한 물질 최적화 연구가 요구 되며, 본 연구진은 다양한 금속-질화물계(Metal-Nitride) 물질을 저항변화 물질로 제안해 연구를 진행 하고 있다. 이전 연구에서, 물질 고유의 우수한 열전도(285 W/($m{\cdot}K$)) 및 절연 특성, 큰 밴드-갭(6.2 eV), 높은 유전율(9)을 가지고 있는 금속-질화물계 박막인 AlN를 저항변화 물질로 이용하여 저항변화 메모리 소자 연구를 진행하였으며, 저전압 고속 동작 특성을 보이는 신뢰성 있는 저항 변화 메모리를 구현하였다. 본 연구에서는 AlN의 큰 밴드-갭 특성을 이용하여 투명 메모리 소자를 구현하기 위한 연구를 진행 하였다. 투과도 실험 결과, 가시광 영역 (380-700 nm)에서 80% 이상의 투과도를 보였으며, 이는 투명 메모리 소자로써의 충분한 가능성을 보여 준다. 또한, I-V 실험에서 전형적인 bipolar 스위칭 특성을 보이며, 스위칭 전압 및 속도는 VSET=3 V/Time=10 ns, VRESET=-2 V/Time=10ns에서 가능하였다. 신뢰성 실험에서, 108번의 endurance 특성 및 105 초의 retention 특성을 보였다.

• Journal of the Microelectronics and Packaging Society
• /
• v.14 no.2 s.43
• /
• pp.49-57
• /
• 2007

Au-Sn solder alloy were deposited in multilayer and co-sputtered film by rf-magnetron sputter and the composition control and analysis were studied. For the alloy deposition condition, each components of Au or Sn were deposited separately. On the basis of pure Sn and Au deposition, the deposition condition for Au-Sn solder alloy were set up. As variables, the substrate temperature, the rf-power, and the thickness ratio were used for the optimum composition. For multilayer solder alloy, the roughness and the composition of solder alloy were controlled more accurately at the higher substrate temperature. In contrast, for co-sputtered solder, the substrate temperature influenced little to the composition, but the composition could be controlled easily by rf-power. In addition, the co-sputtered solder film mostly consisted of intermetallic compound, which formed during deposition. The compound were confirmed by XRD. Without flux during bonding of solder alloy film on leadframe, the adhesion strength were measured. The maximum shear stress was $330(N/mm^2)$ for multilayer solder with Au 10wt% and $460(N/mm^2)$ for co-sputtered solder with Au 5wt%.

• Korean Journal of Materials Research
• /
• v.23 no.3
• /
• pp.161-167
• /
• 2013

The ZnO thin films were grown on GaN template substrates by RF magnetron sputtering at different RF powers and n-ZnO/p-GaN heterojunction LEDs were fabricated to investigate the effect of the RF power on the characteristics of the n-ZnO/p-GaN LEDs. For the growth of the ZnO thin films, the substrate temperature was kept constant at $200^{\circ}C$ and the RF power was varied within the range of 200 to 500W at different growth times to deposit films of 100 nm thick. The electrical, optical and structural properties of ZnO thin films were investigated by ellipsometry, X-ray diffraction (XRD), atomic force microscopy (AFM), photoluminescence (PL) and by assessing the Hall effect. The characteristics of the n-ZnO/p-GaN LEDs were evaluated by current-voltage (I-V) and electroluminescence (EL) measurements. ZnO thin films were grown with a preferred c-axis orientation along the (0002) plane. The XRD peaks shifted to low angles and the surface roughness became non-uniform with an increase in the RF power. Also, the PL emission peak was red-shifted. The carrier density and the mobility decreased with the RF power. For the n-ZnO/p-GaN LED, the forward current at 20 V decreased and the threshold voltage increased with the RF power. The EL emission peak was observed at approximately 435 nm and the luminescence intensity decreased. Consequently, the crystallinity of the ZnO thin films grown with RF sputtering powers were improved. However, excess Zn affected the structural, electrical and optical properties of the ZnO thin films when the optimal RF power was exceeded. This excess RF power will degrade the characteristics of light emitting devices.

• Applied Chemistry for Engineering
• /
• v.24 no.5
• /
• pp.537-543
• /
• 2013

In this study, the push-pull structure polymer for organic photo voHaics (OPVs) was synthesized and characterized. The poly{4,8-didodecyloxybenzo[1,2-b;3,4-b]dithiophene-alt-5,6-bis(octyloxy)-4,7-di(thiophen-2-yl)benzo[c][1,2,5]-thiadiazole} (PDBDT-TBTD) was synthesized by Stille coupling reaction using the benzothiadiazole (BTD) derivative as an electron acceptor and benzodithiophene (BDT) derivative as an electron donor. The structure of monomers and polymers was identified by $^1H-NMR$ and GC-MS. The optical, physical and electrochemical properties of the conjugated polymer were identified by GPC, TGA, UV-Vis and cyclic voltammetry. The number average molecular weight ($M_n$) and initial decomposition temperature (5% weight loss temperature, $T_d$) of PDBDT-TBTD were 6200 and $323^{\circ}C$, respectively. The absorption maxima on the film was about 599 nm and the optical band gap was about 1.70 eV. The structure of device was ITO/PEDOT : PSS/PDBDT-TBTD : $PC_{71}BM/BaF_2/Ba/Al$. PDBDT-TBTD and $PC_{71}BM$ were blended with the weight ratio of 1:2 which were then used as an optical active layer. The power conversion efficiency (PCE) of fabricated device was measured by solar simulator and the best PCE was 2.1%.

• Journal of the Korean Vacuum Society
• /
• v.7 no.4
• /
• pp.368-373
• /
• 1998

As device dimensions approach submicrometer size in ULSI, the demand for interlayer dielectric materials with very low dielectric constant is increased to solve problems of RC delay caused by increase in parasitic resistance and capacitance in multilevel interconnectins. Fluorinated amorphous carbon in one of the promising materials in ULSI for the interlayer dielectric films with low dielectric constant. However, poor thermal stability and adhesion with Si substrates have inhibited its use. Recently, amorphous hydrogenated carbon (a-C:H) film as a buffer layer between the Si substrate and a-C:F has been introduced because it improves the adhesion with Si substrate. In this study, therfore, a-C:F/a-C:H films were deposited on p-type Si(100) by ECRCVD from $C_2F_6, CH_4$and $H_2$gas source and investigated the effect of forward power and composition on the thickness, chemical bonding state, dielectric constant, surface morphology and roughness of a-C:F films as an interlayer dielectric for ULSI. SEM, FT-IR, XPS, C-V meter and AFM were used for determination of each properties. The dielectric constant in the a-C:F/a-C:H films were found to decrease with increasing fluorine content. However, the dielectric constant increased after furnace annealing in $N_2$atomosphere at $400^{\circ}C$ for 1hour due to decreasing of flurorine content. However, the dielectric constant increased after furnace annealing in $N_2$atmosphere at $400^{\circ}C$ for 1hour due to decreasing of fluorine concentration.

• Journal of the Institute of Electronics Engineers of Korea SD
• /
• v.38 no.10
• /
• pp.671-677
• /
• 2001

A RuO$_2$ Schottky photo-detector was designed and fabricated with GaN layers on the sapphire substrate. For good absorption of UV light, an epitaxial structure with undoped GaN(0.5 ${\mu}{\textrm}{m}$)/n￣-GaN(0.1${\mu}{\textrm}{m}$)/n＋-GaN(1.5${\mu}{\textrm}{m}$) was grown by MOCVD. The structure had the carrier concentrations of 3.8$\times$10$^{18}$ cm￣$^3$, the mobility of 283$\textrm{cm}^2$/V.s. After ECR etching process for mesa structure with the diameter of about 500${\mu}{\textrm}{m}$, Al ohmic contact was formed on GaN layer. After proper passivation between the contacts with Si$_3$/N$_4$, was formed on undoped GaN layer. The fabricated Schottky diode had a specific contact resistance of 1.15$\times$10$^{-5}$ ［$\Omega$.$\textrm{cm}^2$］. It has a low leakage current of 305 pA at -5 V, which was attributed by stable characteristics of RuO$_2$ Schottky contact. In optical measurement, it showed the high UV to visible extinction ratio of 10$^{5}$ and very high responsivity of 0.23 A/W at the wavelength of 365nm.