• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1997.11a
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• pp.339-342
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• 1997

The optical properties of WO$_3$thin films deposited by RF magnetron reactive sputtering were studied. The substrate was an ITO(indium-tin-oxide) glass(100$\Omega$/ ). The optical properties are examined by different deposition conditions. RF power, substrate temperature, $O_2$concentraction. Ar flow rate, working pressure and thickness are 40~60W, 25~30$0^{\circ}C$, 10%, 54~72sccm, 5~20m7orr and 1200~2400$\AA$, respectively. All these films were colorless, light yellow and found to be amorphous in structure by X-ray diffraction analysis. When RF power, substrate temperature, $O_2$concentraction, Ar flow rate, working pressure and thickness are 40W, $25^{\circ}C$, 10%, 72sccm, 20mTorr and 2400$\AA$, respectively the values of transmittance of the WO$_3$thin films in visible region are about 80%.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1997.11a
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• pp.173-176
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• 1997

The III-V nitride semiconductor InN thin films which have the direct bandgap in visible light wavelength region have been deposited on Si(100) substrates and AIN/Si(100) substrates by rf reactive sputtering. InN thin films have been investigated on the structural, and electrical properties according to the sputtering parameters such as total pressure, rf power, and substrate temperature. It is found that optimal conditions required for fabricating InN thin films with high crystal Quality, low carrier concentration, high Hall mobility are total pressure 5mTorr, rf power 60W, substrate temperature 6$0^{\circ}C$ . InN thin films deposited on the AIN(60min.)/Si(100) substrates arid AIN(120min.)/Si(100) substrates showed remarkably high crystal quality and electrical properties. It is known that AIN buffer layer is to decrease free energy at interface between InN film and Si substrate, and then promoting lateral growth of InN films.

• Journal of Photoscience
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• v.9 no.2
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• pp.55-58
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• 2002

The reaction center Dl protein of photosystem II is the target of photodamage by excess illumination. The Dl protein is damaged by reactive oxygen species generated by photochemical reactions and then degraded by specific proteolytic enzymes. We found that the Dl protein also cross-links with the surrounding polypeptides, such as D2 and CP43 in isolated thylakoids or photosystem II-enriched membranes from spinach under the illumination with strong visible light. The cross-linking was observed in spinach leaf discs as well when they were illuminated at higher temperature (40°C). It was also shown that the cross-linked products are digested efficiently by a protease(s) in the stroma. Thus the cross-linking/digestion processes of the Dl protein seem to comprise a new pathway in the turnover of the photodamaged Dl protein. It should be noted, however, that the cross-linked products of the Dl protein and CP43 induced by endogenous cationic radicals in the donor-side photoinhibition are resistant to proteolytic digestion. Accumulation of these cross-linked products in the thylakoids may lead to the decay of the function of chloroplasts and finally to the death of plant cells. Thus, we suggest that the quality control of photosystem II, especially removal of the cross-linked products of the Dl protein, is crucial for the survival of chloroplasts under the light stress.

• Journal of Environmental Science International
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• v.25 no.3
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• pp.373-383
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• 2016

The aim of this study is to determine the exposure concentration of tetrabromobisphenol A(TBBPA) in southwestern coast and their photodecomposition rate. Also, it is to identify the radical species of the photodecomposition of TBBPA and their reactive byproducts using the electron spin resonance(ESR) method. TBBPA was not detected in any of the sea water samples from Mokpo, Gunsan, or Goheung. The sediment samples from Mokpo contained not detection(N.D)~50.0 ng/g dry wt., while those from Gunsan contained N.D~28.5 ng/g dry wt. and those from Goheung contained N.D~7.3 ng/g dry wt. The photodecomposition rates were $2.56{\times}10^{-6}/hr$ by visible light(400 nm), $7.98{\times}10^{-6}/hr$ by ultraviolet light(300 nm <), and $6.78{\times}10^{-6}/hr$ by sunlight. Also, we confirmed that singlet oxygen and hydroxyl radicals are the key reactive oxygen species at wavelengths greater than 400 and 300 nm, respectively. This study shows that the main byproducts formed during irradiation at wavelengths above 300 nm are 2,6-dibromobenzosemiquinone radical(2,6-$DBSQ{\cdot}^-$) and g-value 2.0048 doublet spectrum.

• Transactions of the Society of Information Storage Systems
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• v.3 no.4
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• pp.173-177
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• 2007

A photo-reactive methacrylate monomer having triazine as a core component was examined for photochromic diffractive image formation. Photochromic photopolymer films as a recording media contained a monomer mixture of triazine difunctional metharylate (DT) and ethylene glycol phenyl ether acrylate, binder polymer, photo initiator, and a photochromic spiro-oxazine dye. The content of photochromic dye was changed to examine the effect of photochromophore on diffraction efficiency and real holographic image formation. Holographic recording was performed on the photopolymer film by the combination of reference and probe beam. The diffraction efficiency of the photopolymer film in real-time measurement reached a maximum of $\sim90%$ within 30s. It was highly dependent on the photochromophore contents. After holographic recording, the color of the recorded area was changed under UV light (365 nm) and reversibly bleached to original color upon exposure to a visible light source. Films containing only photochromophore without monomer mixture were not reactive under the recording beam (491nm). Diffractive image formation and mechanism of the holographic recording in the presence of photochromophore will be presented.

• Journal of Environmental Science International
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• v.16 no.6
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• pp.683-688
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• 2007

In this study, N doped $TiO_2$ (TiO-N) thin film was prepared by DC magnetron sputtering method to show the photocatalytic activity in a visible range. Various gases (Ar, $O_2\;and\;N_2$) were used and Ti target was impressed by 1.2 kW -5.8 kW power range. The hysteresis of TiO-N thin film as a function of discharge voltage wasn't observed in 1.2 and 2.9kW of applied power. Cross sections and surfaces of thin films by FE-SEM were tiny and dense particle sizes of both films with normal cylindrical structures. XRD pattern of $TiO_2$ and TiO-N thin films was appeared by only anatase peak. Red shift in UV-Vis adsorption spectra was investigated TiO-N thin film. Photoactivity was evaluated by removal rate measurement of suncion yellow among reactive dyes. The photodegradation rate of $TiO_2$ thin film on visible radiation was shown little efficiency but TiO-N was about 18%.

• Journal of Industrial Technology
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• v.39 no.1
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• pp.33-39
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• 2019

This paper addresses effects of nanoscale structures on structural colors of micropatterned transparent substrate by light diffraction. Structural colors is widely investigated because they present colors without any chemical pigments. Typically structural colors is presented by diffraction of light on a micropatterned surface or by multiple interference of light on a surface containing a periodic or quasi-periodic nano-structures. In this paper, each structural colors induced by quasi-periodic nano-structures, periodic micro-structures, and nano/micro dual structures is measured in order to investigate effects of nanoscale and microscale structures on structural colors in the transparent substrate. Using pre-fabricated pattern mold and hot-embossing process, nanoscale and microscale structures are replicated on the transparent PMMA(Poly methyl methacrylate) substrate. Nanoscale and microscale pattern molds are prepared by anodic oxidation process of aluminum sheet and by reactive ion etching process of silicon wafer, respectively. Structural colors are captured by digital camera, and their optical transmittance spectrum are measured by UV/visible spectrometer. From experimental results, we found that nano-structures provide monotonic colors by multiple interference, and micro-structures induce iridescent colors by diffraction of light. Structural colors is permanent and unchangeable, thus it can be used in various application field such as security, color filter and so on.

• Proceedings of the Korean Society of Dyers and Finishers Conference
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• 2012.03a
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• pp.26-26
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• 2012

The hydrophobic nature of the wool surface give rise to difficult penetration of dye molecules. Among all the methods of modification, graft polymerization is an attractive method to impart a variety of functional groups to a polymer. Grafting has been made by irradiating the light on the polymer in the presence of a solvent containing monomer. The energy source commonly used are high-energy electrons, X-rays, UV and visible light. UV irradiation is a relatively low-energy radiation in comparison with others since it has the least possibility to change bulk properties. In the present paper, a photo-reactive dye was synthesized from quinizarin by the reaction with methacryloyl chloride. The synthesized dye was continuously grafted onto wool fabric at room temperature by UV irradiation. Several key parameters including UV energy, dye concentration and pH have been examined to understand their influence on the photoreactive coloration.

• The Transactions of The Korean Institute of Electrical Engineers
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• v.67 no.6
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• pp.789-793
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• 2018

All transparent metal oxide photoelectric device based on $V_2O_5$ was fabricated with structure of $V_2O_5/ZnO/ITO$ by magnetron sputtering system. $V_2O_5$ was deposited by reactive sputtering system with 4 inch vanadium target (purity 99.99%). In order to achieve p-n junction, p-type $V_2O_5$ was deposited onto the n-type ZnO layer. The ITO (indium tin oxide) was applied as the electron transporting layer for effective collection of the photo-induced electrons. Electrical and optical properties were analyzed. The Mott-Schottky analysis was applied to investigate the energy band diagram through the metal oxide layers. The $V_2O_5/ZnO/ITO$ photoelectric device has a rectifying ratio of 99.25 and photoresponse ratios of 1.6, 4.88 and 2.68 under different wavelength light illumination of 455 nm, 560 nm and 740 nm. Superior optical properties were realized with the high transmittance of average 70 % for visible light range. Transparent $V_2O_5$ layer absorbs the short wavelength light efficiently while passing the visible light. This research may provide a route for all-transparent photoelectric devices based on the adoption of the emerging p-type $V_2O_5$ metal oxide layer.

• Journal of the Korean Ceramic Society
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• v.41 no.5
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• pp.364-369
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• 2004

The barrier and optical properties of AlO$_{x}$ thin films on polycarbonate deposited by Reactive Ion Beam Sputtering (RIBS) were investigated at different oxygen partial pressure. We measured the deposition rate of AlO$_{x}$ thin films. As the oxygen partial pres-sure increased, the deposition rate increased then decreased. The changes of deposition rate are associated with the properties of deposited films. The properties of deposited AlO$_{x}$ thin films were studied using X-ray Photoelectron Spectroscopy (XPS), Scan-ning Electron Microscopy (SEM), and Atomic Force Microscopy (AFM). Optimum deposition parameters were found for fabricat-ing aluminum oxide thin films with high optical transparency for visible light and low Oxygen Transmission Rate (OTR). The optical transmittance of AlO$_{x}$ thin film deposited on polycarbonate (PC) showed the same value of bare PC.bare PC.