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Manufacturing and Characterization of N-doped TiO2 Photocatalytic Thin Film

N 도핑된 TiO2 광촉매 박막의 제조 및 특성분석

  • Park, Sang-Won (Department of Energy.Environmental Science & Engineering, Keimyung University) ;
  • Nam, Soo-Kyung (Department of Energy.Environmental Science & Engineering, Keimyung University) ;
  • Heo, Jae-Eun (Department of Energy.Environmental Science & Engineering, Keimyung University)
  • 박상원 (계명대학교 에너지환경과학과) ;
  • 남수경 (계명대학교 에너지환경과학과) ;
  • 허재은 (계명대학교 에너지환경과학과)
  • Published : 2007.06.30

Abstract

In this study, N doped $TiO_2$ (TiO-N) thin film was prepared by DC magnetron sputtering method to show the photocatalytic activity in a visible range. Various gases (Ar, $O_2\;and\;N_2$) were used and Ti target was impressed by 1.2 kW -5.8 kW power range. The hysteresis of TiO-N thin film as a function of discharge voltage wasn't observed in 1.2 and 2.9kW of applied power. Cross sections and surfaces of thin films by FE-SEM were tiny and dense particle sizes of both films with normal cylindrical structures. XRD pattern of $TiO_2$ and TiO-N thin films was appeared by only anatase peak. Red shift in UV-Vis adsorption spectra was investigated TiO-N thin film. Photoactivity was evaluated by removal rate measurement of suncion yellow among reactive dyes. The photodegradation rate of $TiO_2$ thin film on visible radiation was shown little efficiency but TiO-N was about 18%.

Keywords

References

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