• Title/Summary/Keyword: Vapor phase reaction

Search Result 115, Processing Time 0.024 seconds

Oxidation of Ethanol in the Gas Phase with Alcohol Oxidase and Alcohol Dehydrogenase (Alcohol Oxidase와 Alcohol Dehydrogenase를 이용한 기상에서의 Ethanol의 산화반응)

  • 박현규;장호남김동옥
    • KSBB Journal
    • /
    • v.9 no.3
    • /
    • pp.239-245
    • /
    • 1994
  • The effects of reaction temperature and the level of hydration(water activity) were studied for gas phase reactions of alcohol oxidase and alcohol dehydrogenase immobilized on DEAE-cellulose and controlled pore glass(CPG). Optimum reaction temperature zone of gas phase reaction was similar to that of aqueous phase reaction. The activity of alcohol oxidase increased dramatically and the stability decreased when the water activity was increased from 0.3 to 0.8. The apparent activation energies of the gas phase reaction decreased approaching the values obtained in the aqueous phase reaction as the water activity increased. In the both cases of alcohol oxidase and alcohol dehydrogenase, the rate constants of the gas phase reaction were lower than those of aqueous phase reaction by two orders of magnitude and these results could be correlated to the vapor-liquid equilibrium data of the substrate, ethanol.

  • PDF

Generation of Silver Nanoparticles by Spark Discharge Aerosol Generator Using Air as a Carrier Gas (공기 분위기에서 스파크 방전을 이용한 은 나노입자 생성)

  • Oh, Hyun-Cheol;Jung, Jae-Hee;Park, Hyung-Ho;Ji, Jun-Ho;Kim, Sang-Soo
    • Transactions of the Korean Society of Mechanical Engineers B
    • /
    • v.30 no.2 s.245
    • /
    • pp.170-176
    • /
    • 2006
  • A spark discharge aerosol generator using air as a carrier gas has successfully been applied to silver nanoparticle production. The spark discharge between two silver electrodes, which was periodically obtained by discharging the capacitor, produced sufficient high temperatures to evaporate a small fraction of the silver electrodes. The silver vapor was subsequently supersaturated by rapid cooling and condensed to silver nanoparticles by nucleation and condensation. The morphology of the generated particles observed by transmission electron microscope was spherical. The element composition of the nanoparticles was silver, which was determined by energy dispersive X-ray spectroscopy. The crystal phase of the particles spark-generated under air atmosphere was composed of silver and silver oxides phase, which was determined by Xray diffraction analysis. While the nanoparticles generated under nitrogen atmosphere had only silver phase. This XRD data indicates that some fraction of the evaporated silver vapor could be oxidized in air atmosphere by the reaction with oxygen. A stable operation of the spark discharge generator has been achieved. The size and concentration of the particles can be easily controlled by altering the repetition frequency, capacitance, gap distance and flow rate of the spark discharge system.

Synthesis of Boron-Nitride Film by Plasma Assisted Chemical Vapor Deposition Using $BCl3-NH3-Ar$ Mixed Gas ($BCl3-NH3-Ar$계의 플라즈마화학증착공정을 이용한 질화붕소막의 합성)

  • 박범수;백영준;은광용
    • Journal of the Korean Ceramic Society
    • /
    • v.34 no.3
    • /
    • pp.249-256
    • /
    • 1997
  • The effect of process parameter of plasma assisted chemical vapor deposition (PACVD) on the variation of the ratio between cubic boron nitride (c-BN) and hexagonal boron nitride (h-BN) in the film was in-vestigated. The plasma was generated by electric power with the frequency between 100 and 500 KHz. BCl3 and NH3 were used as a boron and nitrogen source respectively and Ar and hydrogen were added as a car-rier gas. Films were composed of h-BN and c-BN and its ratio varied with the magnitude of process parameters, voltage of the electric power, substrate bias voltage, reaction pressure, gas composition, sub-strate temperature. TEM observation showed that h-BN phase was amorphous while crystalline c-BN par-ticle was imbedded in h-BN matrix in the case of c-BN and h-BN mixed film.

  • PDF

Characteristics of Optimized Analytical Method of Hydrogen Cyanide in Cigarette Mainstream Smoke by Using Continuous Flow Analyzer(CFA) (Continuous Flow Analyzer(CFA)를 이용한 담배 주류연 중 Hydrogen Cyanide(HCN)의 최적 분석방법 구명)

  • Na, Seung-Ju;Eo, Sung-Je;Kim, Do-Yeon;Bock, Jin-Young;Hwang, Keon-Joong
    • Journal of the Korean Society of Tobacco Science
    • /
    • v.31 no.1
    • /
    • pp.39-44
    • /
    • 2009
  • Hydrogen cyanide (HCN) is present in both the particulate and vapor phase of cigarette mainstream smoke. It is one of the 44 harmful substances on Hoffmann's list and is known to be a major ciliatoxic agent in cigarette mainstream smoke. Typically the determination of HCN in cigarette mainstream smoke has been done through colorimetric and electrochemical techniques, such as UV-spectrophotometry (UV), continuous flow analyzer (CFA), ion chromatography (IC) and capillary GC-ECD. In particular, CFA commonly has been using analysis hydrogen cyanide in cigarette smoke and the basic principle is pyridine-pyrazolone reaction. In this study, the more optimized analytical method is suggested isonicotinic acid-pyrazolone reaction method than previous pyridine-pyrazolone reaction method, a commonly used method for the determination of cyanide in water and air, by CFA. Sample collection was optimized by trapping particulate and vapor phase of smoke separately. The optimum NaOH concentration of the trapping solution was shown to be 0.2 M. HCN was stable up to 6 hours in this concentration but only 3 hours in 0.1 M solution. The sensitivity of this method was fairly good and it might be used in analysis of HCN in cigarette mainstream smoke.

Effect of Gallium Addition to HZSM-5 on Catalytic Pyrolysis of an LDPE-LLDPE-EVA Copolymer Mixture (HZSM-5를 이용한 LDPE-LLDPE-EVA공중합체 혼합물의 접촉 열분해 반응에 미치는 Gallium 첨가 효과)

  • Jeon, Jong-Ki;Kim, Hyunjin;Kim, Min Ji;Kang, Tae-Won;Park, Young-Kwon
    • Applied Chemistry for Engineering
    • /
    • v.18 no.1
    • /
    • pp.58-63
    • /
    • 2007
  • The aim of the present work is to study the effect of gallium addition to HZSM-5 on recovery rates of gaseous and liquid products and carbon number distribution in the catalytic cracking of a polymer mixture, LDPE, LLDPE, and EVA copolymer, with a composition similar to that found in real agricultural film wastes. Ga/HZSM-5 system produced a larger amount of aromatic hydrocarbons than HZSM-5. The yield of aromatic compound in vapor phase contact was higher than that in liquid phase contact. The yield of aromatic compound increased with the amount of catalyst and with the reaction temperature of catalyst bed. The effect of gallium addition on the carbon number distribution was not great.

Epitaxial Growth of Polyurea Film by Molecular Layer Deposition

  • Choe, Seong-Eun;Gang, Eun-Ji;Lee, Jin-Seok
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2013.08a
    • /
    • pp.264.2-264.2
    • /
    • 2013
  • Molecular layer deposition (MLD) is sequential, self-limiting surface reaction to form conformal and ultrathin polymer film. This technique generally uses bifunctional precursors for stepwise sequential surface reaction and entirely organic polymer films. Also, in comparison with solution-based technique, because MLD is vapor-phase deposition based on ALD, it allows epitaxial growth of molecular layer on substrate and is especially good for surface reaction or coating of nanostructure such as nanopore, nanochannel, nanwire array and so on. In this study, polyurea film that consisted of phenylenediisocyanate and phenylenediamine was formed by MLD technique. In situ Fourier Transform Infrared (FTIR) measurement on high surface area SiO2 substrate was used to monitor the growth of polyurethane and polyurea film. Also, to investigate orientation of chemical bonding formed polymer film, plan-polarized grazing angle FTIR spectroscopy was used and it showed epitaxial growth and uniform orientation of chemical bones of polyurea films.

  • PDF

Preparation of Large Area $TiO_2$ Thin Films by Low Pressure Chemical Vapor Deposition

  • Jeon, Byeong-Su;Lee, Jung-Gi;Park, Dal-Geun;Sin, Se-Hui
    • Korean Journal of Materials Research
    • /
    • v.4 no.8
    • /
    • pp.861-869
    • /
    • 1994
  • Chemical vapor deposition using titanium tetra isopropoxide(TTIP) was employed to investigate effects of process parameters on the uniformity of $TiO_{2}$this films deposited on Indium Tin Oxide (ITO)coated glass. Deposition experiments were carried out at temperatures ranging from $300^{\circ}C$ to $400^{\circ}C$ under the pressure of 0.5~2 torrin a cold wall reactor which can handle 200mm substrate. It was found that the growth rate of $TiO_{2}$was closely related to the reaction temperature and the ractant gas compositions. Apparent activation energy for the deposition rate was 62.7lkJ/mol in the absence of $O_{2}$ and 100.4kj/mol in the presence of $O_{2}$, respectively. Homogeneous reactions in the gas phase were promoted when the total pressure of the reactor was increased. Variance in the film thickness was less than a few percent, but at high deposition rates film thickness was less uniform. Effects of reaction temperature on $TiO_{2}$ thin film characteristic was investigated with SEM, XRD and AES.

  • PDF

Fabrication of Organic-Inorganic Superlattice Films Toward Potential Use For Gas Diffusion Barrier

  • Yun, Gwan-Hyeok;Muduli, Subas Kumar;Seong, Myeong-Mo
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2012.08a
    • /
    • pp.394-394
    • /
    • 2012
  • We fabricated organic-inorganic superlattice films using molecular layer deposition (MLD) and atomic layer deposition (ALD). The MLD is a gas phase process in the vacuum like to atomic layer deposition (ALD) and also relies on a self-terminating surface reaction of organic precursor which results in the formation of a monolayer in each sequence. In the MLD process, 'Alucone' is very famous organic thin film fabricated using MLD. Alucone layers were grown by repeated sequential surface reactions of trimethylaluminum and ethylene glycol at substrate temperature of $80^{\circ}C$. In addition, we developed UV-assisted $Al_2O_3$ with gas diffusion barrier property better than typical $Al_2O_3$. The UV light was very effective to obtain defect-free, high quality $Al_2O_3$ thin film which is determined by water vapor transmission rate (WVTR). Ellipsometry analysis showed a self-limiting surface reaction process and linear growth of each organic, inorganic film. Composition of the organic films was confirmed by infrared (IR) spectroscopy. Ultra-violet (UV) spectroscopy was employed to measure transparency of the organic-inorganic superlattice films. WVTR is calculated by Ca test. Organic-inorganic superlattice films using UV-assisted $Al_2O_3$ and alucone have possible use in gas diffusion barrier for OLED.

  • PDF

Photocatalytic Degradation of Gaseous Acetaldehyde through TiO2-Coated Fly Ash Composites (TiO2 코팅 석탄회 복합체의 기상 Acetaldehyde 광분해 특성)

  • Shin, Dae-Yong;Kim, Kyung-Nam
    • Journal of the Korean Ceramic Society
    • /
    • v.45 no.1
    • /
    • pp.43-47
    • /
    • 2008
  • The photocatalyst of $TiO_2$ coated on a fly ash composites (TCF) was prepared from precipitant dropping method to remove the acetaldehyde by photocatalytic reaction. The TCF were characterized by crystal aize, crystal structure and specific surface area. The photodegradation of acetaldehyde has been investigated using a UV-illuminated fixed photocatalytic reactor with TCF catalyst and P-25 catalyst in gas phase. The effect of photodegradation reaction conditions, such as initial concentration of acetaldehyde, concentration of oxidant in mixed gas and the light intensity on the photodegradation of acetaldehyde were investigated. P-25 catalyst showed the highest photodegradation of acetaldehyde and anatase $TiO_2$ coated TCF showed higher decomposition rate than rutile coated TCF. The photodegradation rate of acetaldehyde increased with the decrease of flow rate, initial concentration of acetaldehyde ($C_i$) and water vapor, however, it was increased with the increas of UV light intensity. The optimum conditions were weight of TCF=10 g, flow rate=50 ml/min $C_i$=100 ppm, concentration of oxygen=20%, concentration of water vapor=100 ppm.

Low Pressure Chemical Vapor Deposition of Silicon Carbide (탄화규소의 저압 화학증착)

  • 송진수;김영욱;김동주;최두진;이준근
    • Journal of the Korean Ceramic Society
    • /
    • v.31 no.3
    • /
    • pp.257-264
    • /
    • 1994
  • The objectives of this study were to develop the low pressure chemical vapor deposition(LPCVD) process of SiC and to fabricate pure and dense SiC layer onto graphite substrate at low temperature. The deposition experiments were performed using the MTS-H2 system (30 torr) in the deposition temperature ranging from 100$0^{\circ}C$ to 120$0^{\circ}C$. The deposition rate of SiC was increased with the temperature. The rate controlling step can be classified from calculated results of the apparent thermal activation energy as follows; surface reaction below 110$0^{\circ}C$ and gas phase diffusion through a stagnant layer over 110$0^{\circ}C$. The deposited layer was $\beta$-SiC with a preferred orientation of (111) and the strongly faceted SiC deposits were observed over 115$0^{\circ}C$.

  • PDF