• Title/Summary/Keyword: Vapor phase

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Wet Synthesis of Hydroxylammonium Nitrate (HAN) and Solid Phase Extraction Using Dual Organic Solvents (수산화암모늄나이트레이트(HAN)의 습식합성 및 이중 유기용매를 이용한 고체상 추출)

  • Kim, Sohee;Kwon, Younja;Jeon, Jong-Ki;Jo, Youngmin
    • Applied Chemistry for Engineering
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    • v.31 no.3
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    • pp.317-322
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    • 2020
  • Hydroxylammonium nitrate (HAN; NH3OHNO3) is an ionic energy material having a low melting temperature and vapor pressure with a high oxygen balance. To utilize it as an oxidizer for a high content liquid mono-propellant, a dual solvent was used to obtain HAN in a solid particulate form. The dehydrated crystal from an aqueous HAN was washed with dual organic solvents including acetone and ethanol, finally resulting in the moisture content of 13.8 wt%. When acetone was applied as a single solvent, the maximum synthesis yield of 88%, the HAN content evaluated by TGA of 86.2%, and the decomposition temperature ranged 160℃ to 205℃ were achieved.

Improvement of HgCdTe Qualities grown by MOVPE using MBE grown CdTe/Si as Substrate (MBE법으로 성장된 CdTe(211)/Si 기판을 이용한 MOVPE HgCdTe 박막의 특성 향상)

  • Kim, Jin-Sang;Suh, Sang-Hee;Sivananthan, S.
    • Journal of Sensor Science and Technology
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    • v.12 no.6
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    • pp.282-288
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    • 2003
  • We report the growth of HgCdTe by metal organic vapor phase epitaxy (MOVPE), using (211)B CdTe/Si substrates grown by molecular beam epitaxy (MBE). The surface morphology of these films is very smooth with hillock free. The etch pit densities (EPD) and full widths at half maximum (FWHM) of x-ray rocking curves exhibited that the crystalline quality of HgCdTe epilayer on MBE grown CdTe/Si was improved compare to HgCdTe on GaAs substrate. The Hall parameters of undoped HgCdTe layers on CdTe/Si showed n-type behavior with carrier concentration of $8{\times}10^{14}/cm^3$ at 77K. But HgCdTe on GaAs showed p-type conductivity due to in corporation of p-type impurities during GaAs substrate preparation. It is thought that these results are applicable for large area HgCdTe forcal plane arrays of $1024{\times}1024$ format and beyound.

Effective Diffusion Coefficient in the Porous Media (다공성 미디아에 있어서 유효확산계수)

  • Jeehyeong Khim
    • Journal of Korea Soil Environment Society
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    • v.1 no.2
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    • pp.83-90
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    • 1996
  • A diffusion process is often the main mechanism of soil gas/vapor movement in the vadose zone. The diffusion coefficients in the porous soil media are different from those in the free air phase by the reduction of available area for diffusion, tortuous diffusion path and variable cross section area along the diffusion path. To take account those effects of the diffusion process in the porous media, usually the terms of effective diffusion coefficient and tortuosity are have been used. However, as there are many differents definitions for the tortuosity, when the term of tortuosity is used, it is necessary to examine it throughly. Moreover, there are many different equations for the effective diffusion coefficient according to the investigators and the differences in the values of effective diffusion coefficients between the equations are not insignificant, the selection of the equation should be done with caution. In this paper, the different definitions of effective diffusion coefficient are examined and discussed. As well as definitions, the lots of availabe models for the diffusion coefficient in terms of porosities are compared. Also, the constrictiviy which explains the effect of cross sectional area change over the diffusion path was discussed.

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Characterization of thermally driven polysilicon micro actuator (폴리실리콘 마이크로 액츄에이터의 열구동 특성분석)

  • Lee, Chang-Seung;Lee, Jae-Youl;Chung, Hoi-Hwan;Lee, Jong-Hyun;Yoo, Hyung-Joun
    • Proceedings of the KIEE Conference
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    • 1996.07c
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    • pp.2004-2006
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    • 1996
  • A thermally driven polysilicon micro actuator has been fabricated using surface micromachining techniques. It consists of P-doped polysilicon as a structural layer and TEOS (tetracthylorthosilicate) as a sacrificial layer. The polysilicon was annealed for the relaxation of residual stress which is the main cause to its deformation such as bending and buckling. And the newly developed HF VPE (vapor phase etching) process was also used as an effective release method for the elimination of sacrificial TEOS layer. The thickneas of polysilicon is $2{\mu}m$ and the lengths of active and passive polysilicon cantilevers are $500{\mu}m$ and $260{\mu}m$, respectively. The actuation is incurred by die thermal expansion due to the current flow in the active polysilicon cantilever, which motion is amplified by lever mechanism. The moving distance of polysilicon micro actuator was experimentally conformed as large as $21{\mu}m$ at the input voltage level of 10V and 50Hz square wave. The actuating characteristics are investigated by simulating the phenomena of heat transfer and thermal expansion in the polysilicon layer. The displacement of actuator is analyzed to be proportional to the square of input voltage. These micro actuator technology can be utilized for the fabrication of MEMS (microelectromechanical system) such as micro relay, which requires large displacement or contact force but relatively slow response.

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Synthesis and Characterization of Large-Area and Highly Crystalline Molybdenum Disulphide Atomic Layer by Chemical Vapor Deposition

  • Park, Seung-Ho;Kim, Yooseok;Kim, Ji Sun;Lee, Su-Il;Cha, Myoung-Jun;Park, Chong-Yun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.356.1-356.1
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    • 2014
  • The Isolation of few-layered transition metal dichalcogenides has mainly been performed by mechanical and chemical exfoliation with very low yields. in particular, the two-dimensional layer of molybdenum disulfide (MoS2) has recently attracted much interest due to its direct-gap property and potential application in optoelectronics and energy harvesting. However, the synthetic approach to obtain high-quality and large-area MoS2 atomic thin layers is still rare. In this account, a controlled thermal reduction-sulfurization method is used to synthesize large-MoOx thin films are first deposited on Si/SiO2 substrates, which are then sulfurized (under vacuum) at high temperatures. Samples with different thicknesses have been analyzed by Raman spectroscopy and TEM, and their photoluminescence properties have been evaluated. We demonstrated the presence of mono-, bi-, and few-layered MoS2 on as-grown samples. It is well known that the electronic structure of these materials is very sensitive to the number of layer, ranging from indirect band gap semiconductor in the bulk phase to direct band gap semiconductor in monolayers. This synthetic approach is simple, scalable, and applicable to other transition metal dichalcogenides. Meanwhile, the obtained MoS2 films are transferable to arbitrary substrates, providing great opportunities to make layered composites by stacking various atomically thin layers.

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Fabrication of Vertically Aligned GaN Nanostructures and Their Field Emission Property

  • Jo, Jong-Hoe;Kim, Je-Hyeong;Jo, Yong-Hun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.281-281
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    • 2014
  • The field emission properties of GaN are reported in the present study. To be a good field emitter, it requires a low work function, high aspect ratio, and strong mechanical stability. In the case of GaN, it has a quite low work function (4.1eV) and strong chemical/mechanical/thermal stabilities. However, so far, it was difficult to fabricate vertical GaN nanostructures with a high aspect ratio. In this study, we successfully achieved vertically well aligned GaN nanostructures with chemical vapor-phase etching methods [1] (Fig. 1). In this method, we chemically etched the GaN film using hydrogen chloride and ammonia gases at high temperature around $900^{\circ}C$. This process effectively forms vertical nanostructures without patterning procedure. This favorable shape of GaN nanostructures for electron emitting results in excellent field emission properties such as a low turn-on field and long term stability. In addition, we observed a uniform fluorescence image from a phosphor film attached at the anode part. The turn-on field for the GaN nanostructures is found to be about $0.8V/{\mu}m$ at current density of $20{\mu}A$/cm^2. This value is even lower than that of typical carbon nanotubes ($1V/{\mu}m$). Moreover, threshold field is $1.8V/{\mu}m$ at current density of $1mA$/cm^2. The GaN nanostructures achieved a high current density within a small applied field range. We believe that our chemically etched vertical nanostructures are the promising structures for various field emitting devices.

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Formation of Optical Fiber Preform Using Octamethylcyclotetrasiloxane (Octamethylcyclotetrasiloxane를 이용한 광섬유 클래드 프리폼 형성)

  • Choi, Jinseok;Lee, Tae Kyun;Park, Seong Gyu;Lee, Ga Hyoung;Jun, Gu Sik;An, Sung Jin
    • Korean Journal of Materials Research
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    • v.28 no.1
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    • pp.6-11
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    • 2018
  • There are various manufacturing processes for pure $SiO_2$ that is used as abrasives, chemicals, filters, and glasses, and in metallurgy and optical industries. In the optical fiber industry, to produce $SiO_2$ preform, $SiCl_4$ is utilized as a raw material. However, the combustion reaction of $SiCl_4$ has caused critical environmental issues, such as ozone deficiency by chlorine compounds, the greenhouse effect by carbon dioxide and corrosive gas such as hydrochloric acid. Thus, finding an alternative source that does not have those environmental issues is important for the future. Octamethylcyclotetrasiloxane (OMCTS or D4) as a chlorine free source is recently promising candidate for the $SiO_2$ preform formation. In this study, we first conducted a vaporizer design to vaporize the OMCTS. The vaporizer for the OMCTS vaporization was produced on the basis of the results of the vaporizer design. The size of the primary particle of the $SiO_2$ formed by OMCTS was less than 100 nm. X-ray diffraction patterns of the $SiO_2$ indicated an amorphous phase. Fourier-transform infrared spectroscopy analysis revealed the Si-O-Si bond without the -OH group.

Formation of the Diamond Thin Film as the SOD Sturcture (SOD 구조 형성에 따른 다이아몬드 박막 형성)

  • Ko, Jeong-Dae;Lee, You-Seong;Kang, Min-Sung;Lee, Kwang-Man;Lee, Kae-Myoung;Kim, Duk-Soo;Choi, Chi-Kyu
    • Korean Journal of Materials Research
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    • v.8 no.11
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    • pp.1067-1073
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    • 1998
  • High quality diamond films of the silicon on diamond (SOD) structure are deposited using CO and $H_2$ gas mixture in microwave plasma chemical vapor deposition (CVD), a SOD structure is fabricated using low pressure CVD polysilicon on diamond/ Si(100) substrate. The crystalline structure of the diamond films which composed of { 111} and {100} planes. were changed from octahedral one to cubo-octahedron one as the CO/$H_2$ ratios are increased. The high quality diamond films without amorphous carbon and non-diamond elements were deposited at the CO/$H_2$ flow rate of 0.18. and the main phase of the diamond films shows (111) plane. The diamond/Si(lOO) structure shows that the interface is flat without voids. The measured dielectric constant. leakage current and breakdown field were $5.31\times10^{-9}A/cm^2$ and $9\times{10^7}{\Omega}cm$ respectively.

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Low Temperature Deposition of Microcrystalline Silicon Thin Films for Solar Cells (태양전지용 미세결정 실리콘 박막의 저온 증착)

  • Lee, J.C.;Yoo, J.S.;Kang, K.H.;Kim, S.K.;Yoon, K.H.;Song, J.;Park, I.J.
    • Proceedings of the KIEE Conference
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    • 2002.07c
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    • pp.1555-1558
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    • 2002
  • This paper presents deposition and characterizations of microcrystalline silicon(${\mu}c$-Si:H) films prepared by hot wire chemical vapor deposition at substrate temperature below $300^{\circ}C$. The $SiH_4$ Concentration$[F(SiH_4)/F(SiH_4)+F(H_2)]$ is critical parameter for the formation of Si films with microcrystalline phase. At 6% of silane concentration, deposited intrinsic ${\mu}c$-Si:H films shows sufficiently low dark conductivity and high photo sensitivity for solar cell applications. P-type ${\mu}c$-S:H films deposited by Hot-Wire CVD also shows good electrical properties by varying the rate of $B_2H_6$ to $SiH_4$ gas. The solar cells with structure of Al/nip ${\mu}c$-Si:H/TCO/glass was fabricated with sing1e chamber Hot-Wire CVD. About 3% solar efficiency was obtained and applicability of HWCVD for thin film solar cells was proven in this research.

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Sustained Release of Anthocyanin from Porous Poly(lactic-co-glycolide) Microsparticles Developed for the Treatment of Chronic Obstructive Pulmonary Disease

  • Yoo, Na-Young;Baik, Hye-Jung;Lee, Bo-Reum;Youn, Yu-Seok;Oh, Kyung-Taek;Lee, Eun-Seong
    • Journal of Pharmaceutical Investigation
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    • v.40 no.4
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    • pp.231-236
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    • 2010
  • This study was to fabricate the porous poly(lactide-co-glycolide) (PLGA) microparticles with anthocyanin (as a model antioxidant) for pulmonary drug delivery. The highly porous PLGA microparticles were prepared by the waterin-oil-in-water ($W_1/O/W_2$) multi-emulsion method, followed by the decomposition of ammonium bicarbonate (AB) in $W_1$ phase to the base of ammonia, carbon dioxide and water vapor at $50^{\circ}C$, making a porous structure in PLGA microparticles. Herein, hyaluronate (HA), a viscous polysaccharide, was incorporated in the porous microparticles for sustained anthocyanin release. In in vitro release studies, the anthocyanin release from the porous microparticles with HA continued up to 24 hours, while the porous microparticles without HA released 80 wt.% of encapsulated anthocyanin within 2 hours. In addition, these microparticle are expected to be effectively deposited at a lung epithelium due to its high porosity (low density) and avoid alveolar macrophage's uptake in the lung due to its large particle size. We believe that this system has a great pharmaceutical potential as a long acting antioxidant for relieving the oxidative stress in chronic obstructive pulmonary disease (COPD).