• 제목/요약/키워드: Vapor deposition polymerization

검색결과 51건 처리시간 0.029초

진공증착중합법에 의해 제조된 폴리이미드박막의 절연파괴특성 (A study on the electric breakdown of polyimide thin film fabricated by vapor deposition polymerization)

  • 이붕주;김형권;김종석;한상옥;박강식;김영봉;이덕출
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1997년도 춘계학술대회 논문집
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    • pp.293-296
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    • 1997
  • The experimental system used for vapor deposition polymerization (VDP) from PMDA (Pyromellitic dianhydride) and DDE (4, 4-diaminodiphenyl ether) were changed to PI (polyimide) thin films by thermal curing. The curing temperatures were 20$0^{\circ}C$, 25$0^{\circ}C$, 30$0^{\circ}C$, 35$0^{\circ}C$. When test number was 40, the electric breakdown strengths of PI were 1.21MV/cm, 3.94MV/cm, 4.61MV/cm, 4.55MV/cm according to curing temperatures.

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진공증착중합에 의해 제조된 6FDA/4-4' DDE 폴리이미드 박막의 열처리 특성에 관한 연구 (A Study on the curing characteristics of 6FDA/4-4' DDE Polyimide thin film fabricated by vapor deposition polymerization)

  • 황선양;이붕주;김형권;김종택;김영봉;박강식;이덕출
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1998년도 추계학술대회 논문집 학회본부 C
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    • pp.816-818
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    • 1998
  • In this paper Polyimide(PI) thin film are fabricated by vapor deposition polymerization(VDP) of dry process which are easy to control the film's thickness and hard to pollute due to volatile solvent. The FT-IR spectrum show that PAA thin films fabricated by VDP are changed to PI thin film by thermal curing. From AFM(Atomic Force Microscopy) experimental as the higher curing temperature. the thin film thickness decreases and roughness decresse.

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진공증착중합법으로 제작된 폴리이미드의 분자구조분석 (Moleculer structure analysis of fabricated polyimide by vapor deposion polymerization)

  • 김형권;김종택;이은학;우호환;김종석;이덕출
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1996년도 하계학술대회 논문집 C
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    • pp.1624-1626
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    • 1996
  • PoIyimide thin films fabricated at substrate temperature $20^{\circ}C$, $40^{\circ}C$and $70^{\circ}C$ by vapor deposition polymerization method were confirmed by FT-IR spectra. It is found that deposition rate decreas according as increasing substrate temperature. Defusion depth of evaporation Al at which thin films be used for an insulating films between layers of semiconductor were about $300{\AA}$.

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Electrical Characteristics of Bottom-Contact Organic Thin-Film-Transistors Inserting Adhesion Layer Fabricated by Vapor Deposition Polymerization and Ti Adhesion Metal Layer

  • Park, Il-Houng;Hyung, Gun-Woo;Choi, Hak-Bum;Kim, Young-Kwan
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권1호
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    • pp.958-961
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    • 2007
  • The electrical characteristics of organic thin-filmtransistor (OTFTs) can be improved by inserting adhesion layer on gate dielectrics. Adhesion layer was used as polymeric adhesion layer deposited on inorganic gate insulators such as silicon dioxide $(SiO_2)$ and it was formed by vapor deposition polymerization (VDP) instead of spin-coating process. The OTFTs obtained the on/off ratio $of{\sim}10^4$, threshold voltage of 1.8V, subthreshold slop of 2.9 V/decade and field effect mobility about $0.01\;cm^2/Vs$.

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진공증착중합법을 이용한 6FDA/4-4'DDE 폴리이미드 박막의 제조와 전기적 특성 (Electrical Properties and Preparation of 6FDA/4-4'DDE Polyimide Thin films by Bapor Deposition Polymerization method)

  • 이붕주;김형권;이덕출
    • 한국진공학회지
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    • 제7권3호
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    • pp.229-236
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    • 1998
  • 본 논문에서는 건식중합법에 속하는 진공증착 중합법을 이용하여 내열 절연성 박막 을 제작하고 열경화 온도에 따른 박막의 물성과 전기적 특성에 대해 연구하였다. hexafluoroisopropyliden-2,2-bis[phthalicanhydride](6FDA)와 4,4'-diamino diphenyl ether (DDE) 단량체를 화학량론적으로 최적의 온도인 $214^{\circ}C$, $137^{\circ}C$부분에서 같은 증발율을 보일 때 폴리이미드를 형성하였다. 진공증착 중합된 박막은 열경화에 의해 이미드특성 피이크가 증가되며, 폴리아믹산의 형태에서 폴리이미드 형태로 축중합되어짐을 알 수 있었다. 열경화 온도가 증가함에 따라 박막의 두께는 감소되고 굴절율은 증가된다. 열경화 온도가 $300^{\circ}C$인 경우 최적임을 알았고, 이 온도에서 열경화 시킨 폴리이미드의 전기적 특성에서 100Hz~ 200kHz주파수에서는 3.7의 비유전율을 나타내었고, 유전정접은 0.008의 낮은 값을 보였다. 또한, 30~에서 약1.05$\times$1015$\Omega$cm의 저항율을 보였다.

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Electrical Effects in Organic Thin-Film Transistors Using Polymerized Gate Insulators by Vapor Deposition Polymerization (VDP)

  • Lee, Dong-Hyun;Pyo, Sang-Woo;Koo, Ja-Ryong;Kim, Jun-Ho;Shim, Jae-Hoon;Kim, Young-Kwan
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
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    • pp.661-664
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    • 2004
  • In this paper, it was demonstrated that the organic thin film transistors with the organic gate insulators were fabricated by vapor deposition polymerization (VDP) processing. The configuration of OTFTs was a staggered-inverted top-contact structure and gate dielectric layer was deposited with 0.45 ${\mu}m$ thickness. In order to form polyimide as a gate insulator, VDP process was also introduced instead of spin-coating process. Polyimide film was respectively co-deposited with different materials. One was from a 4,4'-oxydiphthalic anhydride (ODPA) and 4, 4'-oxydianiline (ODA) and the other was from 2,2-bis(3,4-dicarboxyphenyl) hexafluoropropane dianhydride (6FDA) and ODA. And it was also cured at 150 $^{\circ}C$ for 1 hour followed by 200 $^{\circ}C$ for 1 hour. Electrical characteristics of the organic thin-film transistors were detailed comparisons between the ODPA-ODA and the 6FDA-ODA which were used as gate insulator.

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건식법에 의해 제조된 내열성 폴리이미드박막의 열적특성 및 습도감지특성 (Thermal and Humidity Sensing Properties of Heat Resistant Polyimide Thin Film Manufactured by Dry Process)

  • 임경범;김기환;황선양;김종윤;황명환
    • 전기학회논문지
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    • 제56권6호
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    • pp.1080-1086
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    • 2007
  • The aim of this paper is to establish the optimum fabrication condition of specimens, using the Vapor Deposition Polymerization Method(VDPM), which is one of modesto prepare functional organic thin films using a dry process, and to develop a thin film type humidity sensor which has good humidity sensitive characteristics. The inner part of the film became denser and roughness of the film surface eased as curing temperature increased so that thickness of the film could be made uniform. This also shows the appropriate curing temperature was $250^{\circ}C$. The basic structure of the humidity sensor is a parallel capacitor which consists of three layers of Aluminum/Polyimide/Aluminum. The result of SEM and AFM measurement shows that the thickness of PI thin films decreased and the refraction increased as curing temperature increased, which indicates that a capacitance-type humidity sensor utilizing polyimide thin film is fabricated on a glass substrate. The characteristics of fabricated samples were measured under various conditions, and the samples had linear characteristics in the range of 20-80 %RH, independent of temperature change, and low hysteresis characteristic.

게이트 절연막에 사용된 점착층에 대한 영향 (Effect of Adhesion Layer on Gate Insulator)

  • 이동현;형건우;표상우;김영관
    • 한국전기전자재료학회논문지
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    • 제19권4호
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    • pp.357-361
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    • 2006
  • The electrical performances of organic thin-film transistors (OTFTs) have been improved for the last decade. In this paper, it was demonstrated that the electrical characteristics of the organic thin film transistors (OTFTs) were improved by using polymeric material as adhesion layer on gate insulator. We have investigated OTFTs with polyimide adhesion layer which was fabricated by vapor deposition polymerization (VDP) processing and formed by co-deposition of 2,2-bis (3,4-dicarboxyphenyl) hexafluoropropane dianhydride and 4,4'-oxydianiline. It was found that the OTFTs with adhesion layer showed better electrical characteristics than with bare layer because of good matching between semiconductor and gate insulator. Our devices of performance are field effect mobility of $0.4cm^2/Vs$, threshold voltage of -0.8 V and on-off current ratio of $10^6$. In addition, to improve the electrical characteristics of OTFT, we have reduced the thickness of adhesion layer up to a few nanometrs.

OTFT의 게이트 절연막에 사용된 점착층에 대한 영향 (The Effect of Adhesion layer on Gate Insulator for OTFTs)

  • 이동현;형건우;표상우;김정수;김영관
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2005년도 하계학술대회 논문집 Vol.6
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    • pp.70-71
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    • 2005
  • The electrical performances of organic thin-film transistors (OTFTs) have been improved for the last decade. In this paper, it was demonstrated that the electrical characteristics of the organic thin film transistors (OTFTs) were improved by using polymeric material as adhesion layer on gate insulator. We have investigated OTFTs with polyimide adhesion layer which was fabricated by vapor deposition polymerization (VDP) processing and formed by co-deposition of 6FDA and ODA. It was found that the OTFTs with adhesion layer showed better electrical characteristics than with bare layer because of good matching between semiconductor and gate insulator. Our devices of performance are field effect mobility of $0.4cm^2$/Vs, threshold voltage of -0.8 V and on-of current ratio of $10^6$. In addition, to improve the electrical characteristics of OTFT, we have reduced the thickness of adhesion layer up to a few nanometrs.

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