• 한국재료학회:학술대회논문집
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• 한국재료학회 2012년도 춘계학술발표대회
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• pp.70.1-70.1
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• 2012

In-situ X-ray photoelectron spectroscopy (XPS) and infrared (IR) spectroscopy studies of SOFC cathode materials will be discussed in this presentation. The mixed conducting perovskites (ABO3) containing rare and alkaline earth metals on the A-site and a transition metal on the B-site are commonly used as cathodes for solid oxide fuel cells (SOFC). However, the details of the oxygen reduction reaction are still not clearly understood. The information about the type of adsorbed oxygen species and their concentration is important for a mechanistic understanding of the oxygen incorporation into these cathode materials. XPS has been widely used for the analysis of adsorbed species and surface structure. However, the conventional XPS experiments have the severe drawback to operate at room temperature and with the sample under ultrahigh vacuum (UHV) conditions, which is far from the relevant conditions of SOFC operation. The disadvantages of conventional XPS can be overcome to a large extent with a "high pressure" XPS setup installed at the BESSY II synchrotron. It allows sample depth profiling over 2 nm without sputtering by variation of the excitation energy, and most importantly measurements under a residual gas pressure in the mbar range. It is also well known that the catalytic activity for the oxygen reduction is very sensitive to their electrical conductivity and oxygen nonstoichiometry. Although the electrical conductivity of perovskite oxides has been intensively studied as a function of temperature or oxygen partial pressure (Po2), in-situ measurements of the conductivity of these materials in contact with the electrolyte as a SOFC configuration have little been reported. In order to measure the in-plane conductivity of an electrode film on the electrolyte, a substrate with high resistance is required for excluding the leakage current of the substrate. It is also hardly possible to measure the conductivity of cracked thin film by electrical methods. In this study, we report the electrical conductivity of perovskite $La_{0.6}Sr_{0.4}CoO_{3-{\delta}}$ (LSC) thin films on yttria-stabilized zirconia (YSZ) electrolyte quantitatively obtained by in-situ IR spectroscopy. This method enables a reliable measurement of the electronic conductivity of the electrodes as part of the SOFC configuration regardless of leakage current to the substrate and cracks in the film.

• 한국결정학회:학술대회논문집
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• 한국결정학회 2002년도 정기총회 및 추계학술연구발표회
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• pp.40-41
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• 2002

차세대 반도체 및 나노소자 산업에 대한 국제적 기술은 고밀도 직접화의 추세에 따라서 .게이트 산화막의 두께가 급속히 작아지는 추세이다. 지금까지 이산화규소(A1₂O₃)가 게이트 산화막으로 주로 사용되어 왔으나 점차 SiON 혹은 high k 박막으로 바뀌고 있다. 본 연구에서는 차세대 반도체 소자에 사용될 게이트 산화막 물질인 SiON 박막과 Al₂O₃박막에 대한 SE(Spectroscopic Ellipsometry)분석 모델을 확립하였고, SE 측정결과를 TEM, MEIS, XRR의 결과들과 비교하였다. SiON 박막의 굴절률 값은 Si₃N₄와 SiO₂가 물리적으로 혼합되어 있다고 가정하여 Bruggeman effective medium approximation을 사용하여 구하였다. 동일한 시료를 절단하여 TEM, MEIS, 그리고 XRR에 의하여 SiON 박막의 두께를 측정하였으며, 그 결과 SE와 XRR에 의해 얻어진 박막두께가 TEM과 MEIS의 결과 값보다 약 0.5 nm 크게 주어짐을 알 수 있었다(Table 1 참조). 본 연구결과는 비파괴적이며 비접촉식 측정방법인 SE가 2～4nm 두께의 초미세 SiON 박막의 두께와 N 농도의 상대적 값을 빠르고 쉽게 구할 수 있는 유용한 측정방법 임을 보여주었다. 기존의 게이트 산화물인 SiO₂를 대체할 후보 물질들 중의 하나인 A1₂O₃의 유전함수를 구하기 위하여 8 inch, p-type 실리콘 기판 위에 성장된 5 nm, 10 nm, 및 20 nm 두께의 A1₂O₃ 박막의 유전함수와 두께를 측정하였다. 이 시료들에 대한 SE data는 vacuum-UV spectroscopic ellipsometer를 사용하여 세 개의 입사각에서 0.75 eV에서 8.75 eV까지 0.05 eV 간격으로 측정되었다. A1₂O₃ 박막의 유전함수와 두께를 얻기 위하여 공기층/A1₂O₃ 박막/Si 기판으로 구성된 3상계 모델을 사용하였다. Si 기판에 대한 복소 유전함수는 문헌상의 값(1)을 사용하였고, A1₂O₃ 박막의 유전함수는 5개의 미지상수를 갖는 Tauc- Lorentz(TL) 분산함수(2)를 사용하였다. A1₂O₃ 박막의 경우 두께가 증가함에 따라서 굴절률이 커짐을 알 수 있었다.

• 한국자기학회지
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• 제16권3호
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• pp.182-185
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• 2006

본 연구에서는 인공위성의 자세제어용으로 사용될 3-축 flux-gate 마그네토 미터를 개발 제작하였다. 제작된 3-축의 flux-gate 마그네토 미터는 소비전력이 1W 미만에서 정확도는 ${\pm}1%$ 이내였으며 noise는 1Hz에서 $0.2nT/\sqrt{Hz}$이였다. 또한 제작된 마그네토미터를 인공위성에 적용하기 위한 환경시험을 수행하였다. 환경시험으로 가속도시험은 진동주파수의 범위가 $10Hz{\sim}1000Hz$에서 15g(g : 지구의 중력가속도)의 가속도에서 수행하였고, themal cycle 시험은 $1x10^{-6}$ Torr의 진공에서 $-55^{\circ}C{\sim}80^{\circ}C$의 온도 사이에서 24시간 동안 4회의 thermal cycle 시험을 한 결과 모두 정상 작동 되었다.

• 한국분말야금학회:학술대회논문집
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• 한국분말야금학회 2006년도 Extended Abstracts of 2006 POWDER METALLURGY World Congress Part2
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• pp.1104-1105
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• 2006

Several boride sintered bodies such as $TiB_2$, $ZrB_2$, and $SiB_6$ were previously reported. In the present study, the sinterability and physical properties of chromium boride $(CrB_2)$ containing chromium carbide $(Cr_3C_2)$ sintered bodies were investigated in order to determine its new advanced material. The samples were sintered at desired temperature for 1 hour in vacuum under a pressure by hot pressing. The relative density of sintered bodies was measured by Archimedes' method. The relative densities of $CrB_2$ addition of 0, 5, 10, 15 and 20 mass% $Cr_3C_2$ composites were 92 to 95%. The Vickers hardness of the $CrB_2$ with 10 and 15 mass% $Cr_3C_2$ composites were about 14 and 15 GPa at room temperature, respectively. The Vickers hardness at high temperature of the $CrB_2$ addition of 10 mass% $Cr_3C_2$ composite decreased with increasing measurement temperature. The Vickers hardness at 1273 K of the sample was 6 GPa. The Vickers hardness of $CrB_2$ addition of $Cr_3C_2$ composites was higher than monolithic $CrB_2$ sintered body. The powder X-ray diffraction analysis detected CrB and $B_4C$ phases in $CrB_2$ containing $Cr_3C_2$ composites.

• Journal of Information Display
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• 제2권2호
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• pp.52-60
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• 2001

The electrical and mechanical properties in indium-tin-oxide films deposited on polymer substrate were examined. The materials of substrates were polyethersulfone (PES) which have gas barrier layer and anti-glare coating for plastic-based devices. The experiments were performed by rf-magnetron sputtering using a special instrument and buffer layers. Therefore, we obtained a very flat polymer substrate deposited ITO film and investigated the effects of buffer layers, and the instrument. Moreover, the influences of an oxygen partial pressure and post-deposition annealing in ITO films deposited on polymer substrates were clarified. X-ray diffraction observation, measurement of electrical property, and optical microscope observation were performed for the investigation of micro-structure and electro-mechanical properties, and they indicated that as-deposited ITO thin films are amorphous and become quasi-crystalline after adjusting oxygen partial pressure and thermal annealing above $180^{\circ}C$. As a result, we obtained 20-25 ${\Omega}/sq$ of ITO films with good transmittance (above 80 %) of oxygen contents with under 0.2 % and vacuum annealing. Furthermore, using organic buffer layer, we obtained ITO films which have a rather high electrical resistance (40-45 ${\Omega}/sq$) but have improved optical (more than 85 %) and mechanical characteristics compared to the counterparts. Consequently, a prototype reflective color plastic film LCD was fabricated using the PES polymer substrates to confirm whether the ITO films could be realized in accordance with our experimental results.

• Applied Science and Convergence Technology
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• 제26권2호
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• pp.34-41
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• 2017

A 2.45 GHz microwave plasma with linear antenna has been prepared for hydrophobic and wear-resistible surface coating of carbon steel. Wear-resistible properties are required for the surface protection of cutting tools and achieved by depositing a hydrogenated amorphous carbon film on steel surface through linear microwave plasma source that has $TE_{10}-TEM$ waveguide. Compared to the existing RF plasma source driven by 13.56 MHz, linear microwave plasma source can easily generate high density plasma and provide faster deposition rate and wider process windows. In this study, $Ar/CH_4$ gas mixtures are used for hydrogenated amorphous carbon film deposition. When microwave power of 1000 W is applied, 40 cm long uniform $Ar/CH_4$ plasma could be obtained in gas pressure of 200~400 mTorr. The Vickers hardness measurement of hydrogenated amorphous carbon film on steel surface was evaluated. It was found the optimized deposition condition at $Ar:CH_4=25:25$ sccm, 300 mTorr with microwave power of 1000W and RF bias power of 100W. By deposition of hydrogenated amorphous carbon film, contact angle on steel surfaces increases from $43.9^{\circ}$ to $93.2^{\circ}$.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.1
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• pp.56-59
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• 2004

HgTe and HgTe/CdTe core-shell structured nanocrystals(NCs) were synthesized in aqueous solution by colloidal method. HgTe and HgTe/CdTe NCs structure showed very similar XRD patterns because of the same lattice constant and crystal structure of both samples. The absorption and photoluminescence(PL) spectrum of the synthesized HgTe NCs revealed the strong exitonic peak in the IR region. The PL spectrum of HgTe/CdTe NCs have the intense peak in about 700nm shorter than that of HgTe by 400nm. The photocurrent measurement of colloidal NCs are performed using He-Ne laser for light source. The photocurrent of HgTe NCs shows the instant increased current response to light, but HgTe/CdTe NCs revealed a decreased current when lighted to the sample. In the vacuum condition, it shows reverse result that current increased under the illumination of light and it is thought that the molecules like the hydro-oxygen gas in the air give an important effect on the current mechanism.

• 한국전기전자재료학회논문지
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• 제20권7호
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• pp.594-599
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• 2007

[ $CulnS_2$ ] thin films were synthesized by sulfurization of Cu/In Stacked elemental layer deposited onto glass Substrates by vacuum furnace annealing at temperature $200^{\circ}C$. And structural and electrical properties were measured in order to certify optimum conditions for growth of the ternary compound semiconductor $CuInS_2$ thin films with non-stoichiometry composition. $CuInS_2$ thin film was well made at the annealed $200^{\circ}C$ of SLG/Cu/In/S stacked elemental layer which was prepared by thermal evaporator, and chemical composition of the thin film was analyzed nearly as the proportion of 1 : 1 : 2. Physical properties of the thin film were investigated at various fabrication conditions substrate temperature, annealing and temperature, annealing time by XRD, FE-SEM and Hall measurement system. The compositional deviations from the ideal chemical formula for $200^{\circ}C$ material can be conveniently described by non-molecularity$({\Delta}x=[Cu/In]-1)$ and non-stoichiometry $({\Delta}y=[{2S/(Cu+3In)}-1])$. The variation of ${\Delta}x$ would lead to the formation of equal number of donor and accepters and the films would behave like a compensated material. The ${\Delta}y$ parameter is related to the electronic defects and would determine the type of the majority charge carriers. Films with ${\Delta}y>0$ would behave as p-type material while ${\Delta}y<0$ would show n-type conductivity. At the sane time, carrier concentration, hall mobility and resistivity of the thin films was $9.10568{\times}10^{17}cm^{-3},\;312.502cm^2/V{\cdot}s\;and\;2.36{\times}10^{-2}\;{\Omega}{\cdot}cm$, respectively.

• Journal of Welding and Joining
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• 제27권6호
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• pp.74-79
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• 2009

Titanium and titanium alloy can be reproduced immediately even if oxide films($TiO_2$) break apart in sea water. Therefore, since titanium demonstrates large specific strength and outstanding resistance to stress corrosion cracking, crevice corrosion, pitting and microbiologically influenced corrosion in sea water environment, it has been widely applied to heat exchanger for ships. In particular, with excellent elongation, pure titanium may be deemed as optimal material for production of heat exchanger plate which is used with wrinkles formed for efficient heat exchange. Conventional plate type heat exchanger prevented leakage of liquid through insertion of gasket between plates and mechanical tightening by bolts and nuts, but in high temperature and high pressure environment, gasket deterioration and leakage occur, so heat exchanger for LPG re-liquefaction device etc do not use gasket but weld heat exchanger plate for use. On the other hand, since welded plate cannot be separated, it is important to obtain high quality reliable welds. In addition, for better workability and production performance, lasers that can obtain weldment with large aspect ratio and demonstrate fast welding speed even in atmospheric condition not in vacuum condition are used in producing products. So far, 1st report and 2nd report compared and analyzed embrittlement degrees by bead colors of weldment through quantitative analysis of oxygen and nitrogen and measurement of hardness as fundamental experiment for the evaluation of titanium laser welding, and evaluated the welding performance and mechanical properties of butt welding. This study welded specimens in various conditions by using laser and GTA welding machine to apply edge welding to heat exchanger, and evaluated the mechanical strength through tensile stress test. As a result of tensile test, laser weldment demonstrated tensile strength 4 times higher than GTA welds, and porosity could be controlled by increasing and decreasing slope of laser power at overlap area.

• 한국표면공학회지
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• 제54권6호
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• pp.365-370
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• 2021

In this research, we proceeded with research on plasma resistance of the cleaning process of APS(Atmospheric Plasma Spray)-Y₂O₃ coated parts used for semiconductor and display plasma process equipment. CF₄, O₂, and Ar mixed gas were used for the plasma environment, and respective alconox, surfactant, and piranha solution was used for the cleaning process. After APS-Y₂O₃ was exposed to CF₄ plasma, the surface changed from Y₂O₃ to YF₃ and a large amount of carbon was deposited. For this reason, the plasma corrosion resistance was lowered and contamination particles were generated. We performed a cleaning process to remove the defect-inducing surface YF₃ layer and carbon layer. Among three cleaning solutions, the piranha cleaning process had the highest detergency and the alconox cleaning process had the lowest detergency. Such results could be confirmed through the etching amount, morphology, composition, and accumulated contamination particle analysis results. Piranha cleaning process showed the highest detergency, but due to the very large thickness reduction, the base metal was exposed and a large number of contaminated particles were generated. In contrast, the surfactant cleaning process exhibit excellent properties in terms of surface detergency, etching amount, and accumulated contamination particle analysis.