• Journal of the Korean Society of Systems Engineering
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• v.1 no.1
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• pp.14-19
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• 2005

High temperature vacuum furnaces or high standard electric furnaces demand high technology level and high production cost. Therefore, an iterative design process and the optimization approach under integrated computing environment are required to reduce the development risk. Moreover, it also required to develop an integrated design software that can manage the centralized database system between factory and design department, and the automated furnace design and analysis. The developed software is dedicated to the development of the vacuum (electric) furnaces. Based on the distribute middleware system, the GUI module, the CAD module, the thermal analysis module and the optimization module are integrated. For the DBMS, Microsoft Access is employed, the GUI is developed using Visual Basic language, and AutoCAD is utilized for the configuration design. By investigating the analysis code interface, the analysis and optimization process, and the data communication method, the overall system architecture, the method to integrate the optimizer and ana lysis codes, and the method to manage the data flow are proposed and verified through the optimal furnace design.

• Environmental Engineering Research
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• v.12 no.3
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• pp.109-117
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• 2007

The characteristics of carbonaceous particles collected from the combustion of Vacuum Residue (VR) in a test furnace have been investigated. The physical and chemical characterization includes particle size, scanning electron microscopy of the surface structure, measurement of porosity, surface area and density, EDX/XRD analyses and measurement of chemical composition. The studies show that the carbonaceous VR particles are very porous and spheroidal, and have many blow-holes on the surface. The particles become smaller and more sponge-like as the reaction proceeds. The present porosity of VR particles is similar to that of cenospheres from the combustion of heavy oil, and the majority of pores are distributed in macro-pores above $0.03\;{\mu}m$ in diameter. Measurements of pore distribution and surface area showed that the macro-pores contributed most to total pore volume, whereas the micro-pores contributed to total surface area.

• 한국연소학회:학술대회논문집
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• 2006.04a
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• pp.121-127
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• 2006

It has become inevitable to search for alternative fuels due to severe energy crisis these days. Use of alternative fuels, which are typically of lower quality, tends to increase environmental pollution, including formation of nitrogen oxides (NOx). In this paper performance of vacuum residue has been investigated experimentally as well as numerically in typical operating conditions of a furnace. Heat release reaction is modeled as sequential steps of devolatilization, simplified gas phase reaction and char oxidation as that for pulverized coal. Thermal and fuel NOx are predicted by conditional estimation of elementary reaction rates and are compared against measured experimental data. On the overall reasonable agreement is achieved for spatial distributions of major species, temperature and NOx for all test cases.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2006.06a
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• pp.10-11
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• 2006

In this study, the Ni/Co/TiN (6/2/25 nm) structure was deposited for thermal stability estimation. Vacuum (30 mTorrs) annealing was carried out to compare with furnace annealing in nitrogen ambient. The proposed Ni/Co/TiN structure exhibited low temperature silicidation and wide range of rapid thermal process (RTP) windows. The sheet resistance was too high to measure after furnace annealing at $600^{\circ}C$ due to the thin thickness (15 nm) of the nickel silicide. However, the sheet resistance maintained stable characteristics up to $600^{\circ}C$ for 30 min after vacuum annealing. Therefore, the low resistance of thin film nickel silicide was obtained by vacuum annealing at $600^{\circ}C$.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.322-322
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• 2010

For boron doping on n-type silicon wafer, around $1,000^{\circ}C$ doping temperature is required, because of the relatively low solubility of boron in a crystalline silicon comparing to the phosphorus case. Boron doping by fiber laser annealing and lamp furnace heat treatment were carried out for the uniformly deposited p-a-Si:H layer. Since the uniformly deposited p-a-Si:H layer by cluster is highly needed to be doped with high temperature heat treatment. Amorphous silicon layer absorption range for fiber laser did not match well to be directly annealed. To improve the annealing effect, we introduce additional lamp furnace heat treatment. For p-a-Si:H layer with the ratio of $SiH_4:B_2H_6:H_2$=30:30:120, at $200^{\circ}C$, 50 W power, 0.2 Torr for 30 min. $20\;mm\;{\times}\;20\;mm$ size fiber laser cut wafers were activated by Q-switched fiber laser (1,064 nm) with different sets of power levels and periods, and for the lamp furnace annealing, $980^{\circ}C$ for 30 min heat treatment were implemented. To make the sheet resistance expectable and uniform as important processes for the $p^+$ layer on a polished n-type silicon wafer of (100) plane, the Q-switched fiber laser used. In consequence of comparing the results of lifetime measurement and sheet resistance relation, the fiber laser treatment showed the trade-offs between the lifetime and the sheet resistance as $100\;{\omega}/sq.$ and $11.8\;{\mu}s$ vs. $17\;{\omega}/sq.$ and $8.2\;{\mu}s$. Diode level device was made to confirm the electrical properties of these experimental results by measuring C-V(-F), I-V(-T) characteristics. Uniform and expectable boron heavy doped layers by fiber laser and lamp furnace are not only basic and essential conditions for the n-type crystalline silicon solar cell fabrication processes, but also the controllable doping concentration and depth can be established according to the deposition conditions of layers.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.242.1-242.1
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• 2013

최근, 저항변화 메모리 (resistance random access memory, ReRAM)는 단순한 구조, 고집적성, 낮은 소비 전력, 우수한 retention 특성 CMOS 기술과의 공정호환성 등의 장점으로 인하여 현재 사용되는 메모리의 물리적 한계를 극복할 수 있는 차세대 메모리로써 주목을 받고 있다. 더욱이 용액공정은 높은 균일성, 공정 시간 및 비율 감소 그리고 대면적화가 가능한 장점을 가진 이유로 TiOx, ZrOx ZnO 같은 high-k 물질들을 이용한 연구가 보고되고 있다. 기존의 ReRAM 용액공정에서 결함, 즉 oxygen vacancies 그리고 불순물들을 제어하기 위해 일반적으로 사용되는 furnace 열처리는 낮은 열효율과 고비용등의 문제점을 가지고 있다. 특히 glass 또는 flexble 기판의 경우 열처리 온도에 제약이 있다. 이러한 문제를 해결하기 위한 방법으로 열 균일성, 짧은 공정시간 의 장점을 가진 microwave 열처리 방법이 보고되고 있다. 따라서 본 연구에서는 용액공정을 이용하여 증착한 HfOx 기반의 저항변화 메모리를 제작하여 저온에서 microwave 열처리 와 furnace 열처리의 특성을 비교평가 하였다. 그 결과 microwave 열처리 방법이 furnace 열처리 방법보다 넓은 메모리 마진, 향상된 uniformity 를 가지는 것을 확인 하였다. 이로써 저온공정이 필요한 ReRAM 의 열처리 대안책 으로 사용될 수 있을 것으로 기대된다.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.266.1-266.1
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• 2016

최근 태양전지에 대한 연구가 활발하기 이루어지고 있다. 그 중 본 연구에선 태양전지에 사용될 광흡수층에 대한 연구로 광흡수층은 광흡수계수와 밴드갭의 영향을 받고 SnS가 적합한 특성을 지니고 있다고 판단하여 이에 대한 합성과 특성에 대한 연구를 진행 하였다. SnxSy 박막은 Electrochemical deposition, Spray pyrolysis deposition, Furnace를 이용하는 등 다양한 방법이 있다. 이러한 방법들은 대부분 막질이 좋지 않다고 알려져 있는데 그 중 Furnace를 이용하는 방법은 간단하며 넓은 면적에 쉽게 증착이 가능하다는 장점이 있지만 S의 양과 온도에 민감하다. 본 연구에서는 Sn과 SnO 박막을 전구체로 사용하였으며 S의 양과 온도를 조절하여 로를 이용하여 합성하였다. 이에 대한 조성 및 구조적 특성을 분석하기 위해 XRD를 전기적 특성을 확인하기 위하여 Hall effect measurement를 통하여 측정하였다.

• Proceedings of the Korean Operations and Management Science Society Conference
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• 2004.05a
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• pp.273-276
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• 2004

Multidisciplinary Design Optimization (MDO) is an individual and parallel design framework applied in designing large and complex systems. for successful implementation of MDO framework it is essential to manage data in efficient and integrated manner. In this study, we present a case study to implement database to support designing super high temperature vacuum furnace with MDO technology. For that purpose we first extract required data based on the analysis of design process and then data flows between different programs are analyzed. Finally an E-R diagram is presented to design database schema.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.08a
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• pp.405-405
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• 2011

실리콘 질화막(SiNx : H)는 결정질 실리콘 태양전지 제작 공정에서 ARC (Anti Reflection Coating)과 표면 패시베이션의 역할로써 많이 사용되었지만, layer 자체의 quality가 좋지 않기 때문에 최근에는 SiNx/SiO2 이중 layer로 passivation layer를 형성하고 있다. SiO2 layer는 Si substrate를 소스로 하여 성장시키기 때문에 막의 질이 우수하기는 하지만, 막 성장을 위해서 Furnace를 이용해야 하기 때문에, 공정 시간과 공정 비용을 증가시키는 단점이 있다. 본 연구에서는 SiO2 layer를 Furnace가 아닌, 질산(HNO3)을 이용하여SiNx/Thin SiO2 passivation layer 제작하였다. 실험에서는 SiO2 성장을 위해서 질산 용액에 p-type wafer를 dipping하여 시간대 별, SiO2 막의 두께를 관찰하였고, passivation의 효과를 확인하기 위해 lifetime을 측정하였다. 그 결과 SiNx/SiO2 이중 passivation layer는 SiNx 단일 막으로 passivation을 하였을 때보다, lifetime이 10 us 상승했고, 셀 제작시 효율은 약 1.1%, Fill Factor는 약 4% 정도 증가한 것을 확인할 수 있었다.

• Journal of the Korean Vacuum Society
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• v.1 no.1
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• pp.198-205
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• 1992

Abstract-Planarieation technology, which is essential to VLSI, has been developed using non-etch back Spin- On-Glass (SOG). Process factors for 1.5 micron double metal technology are optimized by the statistical design of experiments. Optimum conditions are found to be a process with twice SOG coating, sufficiently long hot plate baking at 300t, and furnace curing for 40 minutes below 400$^{\circ}$C.