• Korean Journal of Chemical Engineering
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• v.35 no.12
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• pp.2365-2378
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• 2018

We investigated the correlation between vanadium surface density and VOx structure species in the selective catalytic reduction of NOx by $NH_3$. The properties of the $VOx/TiO_2$ catalysts were investigated using physicochemical measurements, including BET, XRD, Raman spectroscopy, FE-TEM, UV-visible DRS, $NH_3-TPD$, $H_2-TPR$, $O_2-On/Off$. Catalysts were prepared using the wet impregnation method by supporting 1.0-3.0 wt% vanadium on $TiO_2$ thermally treated at various calcination temperatures. Through the above analysis, we found that VOx surface density was $3.4VOx/nm^2$, and the optimal V loading amounts were 2.0-2.5 wt% and the specific surface area was $65-80m^2/g$. In addition, it was confirmed that the optimal VOx surface density and formation of vanadium structure species correlated with the reaction activity depending on the V loading amounts and the specific surface area size.

• Korean Journal of Materials Research
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• v.30 no.12
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• pp.660-665
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• 2020

Silicon heterojunction solar cells can achieve high conversion efficiency with a simple structure. In this study, we investigate the passivation characteristics of VOx thin films as a hole-selective contact layer using ALD (atomic layer deposition). Passivation characteristics improve with iVoc (implied open-circuit voltage) of 662 mV and minority carrier lifetime of 73.9 µs after post-deposition annealing (PDA) at 100 ℃. The improved values are mainly attributed to a decrease in carbon during the VOx thin film process after PDA. However, once it is annealed at temperatures above 250 ℃ the properties are rapidly degraded. X-ray photoelectron spectroscopy is used to analyze the chemical states of the VOx thin film. As the annealing temperature increases, it shows more formation of SiOx at the interface increases. The ratio of V5+ to V4+, which is the oxidation states of vanadium oxide thin films, are 6:4 for both as-deposition and annealing at 100 ℃, and 5:5 for annealing at 300 ℃. The lower the carbon content of the ALD VOx film and the higher the V5+ ratio, the better the passivation characteristics.

• Applied Chemistry for Engineering
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• v.28 no.2
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• pp.158-164
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• 2017

In this study, the reaction activity and XRD, BET, and Raman analysis were performed to verify $NH_3$-SCR reaction characteristics of various commercial SCR catalysts. It can be seen that the reaction rate of each commercial SCR catalyst increased linearly with increasing the vanadium content (1.3-5.4 wt%). In addition, through the above analysis, it was possible to confirm that the addition of WOx in the catalyst increased the Turn over frequency (TOF) within the range where the VOx surface density was more than 8.1 and the crystalloid VOx was not formed through the surface structure analysis. $SO_2$ durability tended to decrease with increasing the vanadium content, and the durability increased the most when W and Si were added.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.190.2-190.2
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• 2013

Vanadium dioxide ($VO_2$) has been widely attracted for academic research and industrial applications due to its metal-insulator transition (MIT) temperature close to room temperature. We synthesized VOx film on (0001) sapphire substrate with vanadium target (purity: 99.9%) using DC magnetron sputtering in Ar ambience at a pressure of $10^{-3}$ Torr at $400{\sim}700^{\circ}C$. The VOx film subsequently was annealed at difference temperatures in ambience of Ar and $O_2$ gas mixture at $60{\sim}800^{\circ}C$. The structural properties of the films were investigated using scanning electron microscopic (SEM), x-ray diffraction (XRD) and x-ray absorption fine structure (XAFS) measurements. SEM reveal that small grains formed on the substrates with a roughness surface. XRD shows oriented $VO_2$(020) crystals was deposited on the $Al_2O_3$(006) substrate. From I-V measurements, the electric resistance near its MIT temperature were dramatically changed by ${\sim}10^4$ during heating and cooling the films. We will also discuss the temperature-dependent local structural changes around vanadium atoms using XAFS measurements.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.55 no.10
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• pp.475-480
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• 2006

Vanadium oxide thin films (VOx) have been deposited by RF magnetron sputtering from $V_2O_5$ target under different oxygen partial pressure ratios(0%, 10%) and substrate temperatures$(27^{\circ}C,\;400^{\circ}C)$. Crystallographic structure and morphology of the films are studied by XRD and SEM. Humidity-sensing properties of resistive sensors having interdigitated electrode structure are characterized through electrical conduction measurements. The films deposited at room temperature are amorphous whereas the ones deposited above foot are polycrystalline. The sensors show good response to humidity over 20%RH to 80%RH. Vanadium oxide thin films deposited with $0%O_2$ partial pressure at $400^{\circ}C$ exhibit greater sensitivity to humidity change than others.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.11a
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• pp.448-451
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• 2004

Vanadium oxides have been widely used in a variety of technological applications such electrochromic devices as infrared detectors and are expected as a material suitable for gas sensing applications. Thin films of Vanadium oxide (VOx) have been deposited by r.f magnetron sputtering under different oxygen partial pressure ratios and substrate temperatures. Humidity-sensitive properties of resistive sensors having interdigitated electrode structure are characterized. Our sensors show good response to humidity over 20%RH to 80%RH. Vanadium oxide films deposited with 0% $O_2$ partial pressure at foot exhibit greater sensitivity to humidity change than others.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.13 no.12
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• pp.1003-1010
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• 2000

Thin films of vanadium oxide(VOx) have been deposited by r.f. magnetron sputtering from V$_2$O$\_$5/ target in gas mixture of argon and oxygen. Crystal structure, surface morphology, chemical composition, molecular structure and optical properites of films in-situ annealed in O$_2$ambient with various heat-treatment conditions are characterized through XRD, SEM, AES, RBS, RTIR and optical absorption measurements. The films annealed below 200$\^{C}$ are amorphous, and those annealed above 300$\^{C}$ are polycrystalline. The growth of grains and the transition of vanadium oxide into the higher oxide have been observed with increasing the annealing temperature and time. The increase of O/V ratio with increasing the annealing temperature and time is attributed to the diffusion of oxygen and the partial filling of oxygen vacancies. It is observed that the oxygen atoms located on the V-O plane of V$_2$O$\_$5/ layer participate more readily in the oxidation process. Also indirect and direct optical band gaps were increased with increasing the annealing temperature and time.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.07b
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• pp.783-786
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• 2003

Thin films of vanadium oxide(VOx) have been deposited by r.f. magnetron sputtering from $V_2O_5$ target in gas mixture of argon and oxygen. The oxygen/(oxygen+argon) partial pressure ratio of 0% and 8% is adopted. Crystal structure and optical properties of films sputter-deposited under different oxygen gas pressures and in situ annealed in vacuum at $400^{\circ}C$ for 1h and 4h are characterized through XRD and optical absorption measurements. The films as-deposited are amorphous, but $0%O_2$ films annealed for time longer than 4h and $8%O_2$ films annealed for time longer than 1h are polycrystalline. The optical transmission of the films annealed in vacuum decreases considerably than the as-deposited films and the optical absorption of all the films increases rapidly at wavelength shorter than about 550nm. Indirect and direct optical band gaps were decreased with increasing the annealing time.

• Proceedings of the Materials Research Society of Korea Conference
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• 2003.03a
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• pp.131-131
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• 2003

Surface micromachined uncooled IR detector with the optimized VOx bolometric layer was fabricated based on sandwich structure of the V$_2$O$_{5}$V/V$_2$O$_{5}$. In order to improve the detectivity of the IR detector, we optimized a few factors in the viewpoint of bolometric material. Vanadium oxide thin film is a promising material for uncooled microbolometers due to its high temperature coefficient of resistance at room temperature. It is, however, very difficult to deposit vanadium oxide thin films having high temperature coefficient of resistance and low resistance because of process limits in microbolometer fabrication. In order to increase the responsivity and decrease noise, we increase TCR of bolometric material and decrease room temperature resistance based on the sandwich structure of the V$_2$O$_{5}$V/V$_2$O$_{5}$ by conventional sputter. By oxygen diffusion through low temperature annealing of V$_2$O$_{5}$V/V$_2$O$_{5}$ in oxygen ambient, various mixed phase vanadium oxide was formed and we obtained TCR in range of-1.2 ~-2.6%/$^{\circ}C$ at room temperature resistance of 5~100k$\Omega$.mega$.

• Proceedings of the KIEE Conference
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• 2006.10a
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• pp.109-110
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• 2006

In bio applications, high temperature coefficient of resistance (TCR) at $30^{\circ}C{\sim}40^{\circ}C$ is especially important for a temperature sensor. In this work, single phase-vanadium dioxide ($VO_2$) thin films for temperature sensor were fabricated by reactive DC magnetron sputtering and post-annealing method. VOx thin films deposited by reactive sputtering in a controlled $Ar/O_2$ atmosphere can be transformed into single phase-$VO_2$ films by post-annealing in $N_2$ atmosphere. The grown $VO_2$ thin films have a moderate resistance at room temperature and very high TCR at room temperature and transition temperature, respectively 2.88%/K and 15.8%/K. A detailed structural characterization is performed by SEM, XRD and RBS. SEM morphology image indicates that grains of fabricated $VO_2$films are homogeneous and ball-like in shape. A fact that the films contain only single phase-$VO_2$ is obtained by XRD and RBS analysis. After deposition, the sensors were fabricated by micromachining technology. Silicon nitride membrane and black nickel were used for a thermal isolation structure and absorption layer. In the vicinity of room temperature, the TCR of sensors was enough high to apply for bio sensors.