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4H-SiC MESFET Large Signal Modeling using Modified Materka Model (Modified Materka Model를 이용한 4H-SiC MESFET 대신호 모델링)

  • 이수웅;송남진;범진욱
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • v.12 no.6
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    • pp.890-898
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    • 2001
  • 4H-SiC(silicon carbide) MESFET large signal model was studied using modified Materka-Kacprzak large signal MESFET model. 4H-SiC MESFET device simulation have been conducted by Silvaco\`s 2D device simulator, ATLAS. The result is modeled using modified Materka large signal model. simulation and modeling results are -8 V pinch off voltage, under V$\_$GS/=0 V, V$\_$DS/=25 V conditions, I$\_$DSS/=270 mA/mm, G$\_$m/=52.8 ms/mm were obtained. Through the power simulation 2 GHz, at the bias of V$\_$GS/-4 V md V$\_$DS/=25 V, 10 dB Gain, 34 dBm (1dB compression point)output porter, 7.6 W/mm power density, 37% PAE(power added efficiency) were obtained.7.6 W/mm power density, 37% PAE(power added efficiency) were obtained.d.

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4H-SiC MESFET Large Signal modeling for Power device application (전력소자 응용을 위한 4H-SiC MESFET 대신호 모텔링)

  • Lee, Soo-Woong;Song, Nam-Jin;Burm, Jin-Wook;Ahn, Chul
    • Proceedings of the IEEK Conference
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    • 2001.06b
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    • pp.229-232
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    • 2001
  • 4H-SIC(silicon carbide) MESFET large signal model was studied using modified Materka-Kacprzak large signal MESFET model. 4H-SiC MESFET device simulation have been conducted by Silvaco's 2D device simulator, ATLAS. The result is modeled using modified Materka large signal model. simulation and modeling results are -8V pinch off voltage, under $V_{GS=0V}$, $V_{DS=25V}$ conditions, $I_{DSS=270㎃}$mm, $G_{m=45㎳}$mm were obtained. Through the power simulation 2GHz, at the bias of $V_{GS=-4V}$ and $V_{DS=25V}$, 10dB Gain, 34dBm(1dB compression point)output power, 7.6W/mm power density, 37% PAE(power added efficiency) were obtained.d.d.d.

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Effects of Vth adjustment ion implantation on Switching Characteristics of MCT(MOS Controlled Thyristor) (문턱전압 조절 이온주입에 따른 MCT (MOS Controlled Thyristor)의 스위칭 특성 연구)

  • Park, Kun-Sik;Cho, Doohyung;Won, Jong-Il;Kwak, Changsub
    • Journal of the Institute of Electronics and Information Engineers
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    • v.53 no.5
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    • pp.69-76
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    • 2016
  • Current driving capability of MCT (MOS Controlled Thyristor) is determined by turn-off capability of conducting current, that is off-FET performance of MCT. On the other hand, having a good turn-on characteristics, including high peak anode current ($I_{peak}$) and rate of change of current (di/dt), is essential for pulsed power system which is one of major application field of MCTs. To satisfy above two requirements, careful control of on/off-FET performance is required. However, triple diffusion and several oxidation processes change surface doping profile and make it hard to control threshold voltage ($V_{th}$) of on/off-FET. In this paper, we have demonstrated the effect of $V_{th}$ adjustment ion implantation on the performance of MCT. The fabricated MCTs (active area = $0.465mm^2$) show forward voltage drop ($V_F$) of 1.25 V at $100A/cm^2$ and Ipeak of 290 A and di/dt of $5.8kA/{\mu}s$ at $V_A=800V$. While these characteristics are unaltered by $V_{th}$ adjustment ion implantation, the turn-off gate voltage is reduced from -3.5 V to -1.6 V for conducting current of $100A/cm^2$ when the $V_{th}$ adjustment ion implantation is carried out. This demonstrates that the current driving capability is enhanced without degradation of forward conduction and turn-on switching characteristics.

TOPOLOGICAL CONJUGACY OF DISJOINT FLOWS ON THE CIRCLE

  • Cieplinski, Krzysztof
    • Bulletin of the Korean Mathematical Society
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    • v.39 no.2
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    • pp.333-346
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    • 2002
  • Let $F={F^v:S^1->S^1,v\in\; V$ and $g={G^v:S^1->S^1,v\in\; V$ be disjoint flows defined on the unit circle $S^1$, that is such flows that each their element either is the identity mapping or has no fixed point ((V, +) is a 2-divisible nontrivial abelian group). The aim of this paper is to give a necessary and sufficient codition for topological conjugacy of disjoint flows i.e., the existence of a homeomorphism $\Gamma:S^1->S^1$ satisfying $$\Gamma\circ\ F^v=G^v\circ\Gamma,\; v\in\; V$$ Moreover, under some further restrictions, we determine all such homeomorphisms.

Studies on- Electrocardiogram of the Normal Korean Native Goat 1. Standard Limb Leads and Unipolar Limb Leads (정상적인 한국 흑염소의 심전도에 관한 연구 1. 표전지유도와 단극지유도)

  • 최인혁;김선기;김추철;최인방;김남수
    • Journal of Veterinary Clinics
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    • v.14 no.2
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    • pp.319-337
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    • 1997
  • The electrocardiographic (ECG) parameters in the normal Korean black goat have been measured with a 3-channel Electrocardiograph and computed, analyzed. ECG in 243 black goats were made with the limb leads (I, II, III, aVR, aVL, aVF), that were recorded conduction parameters of wave and interval, and were analyzed as to shape and amplitude of the P and T waves and the components of the QRS complex. Heart rate were recorded by the ECG which were a mean of 106.1$\pm $21.8 beats/min. Average conduction times in the PR, the QRS complex and the QTc interval were recorded 103.9$\pm $34.9 msec., 58.3$\pm $23.2 msec. and 302.6$\pm $67.8 msec., in the P and T wave duration recorded 24.8$\pm $6.4 msec. and 51.7$\pm $10.8 msec. respectively. The shape of wave in each leads were observed various types, and any spacial wave type appeared the highest frequency in each lead that ware shown less than 60%, and these frequent rate and average amplitudes as fallow: 1. In P waver the frequent rate and average amplitudes of the positive type showed in leads I, II and aVL that were 54.8% (93.0$\pm $ 33.2 $\mu $V), 50.5% (90.1$\pm $30.5 $\mu $V) and 41.7% (58.5$\pm $ 31.1 $\mu $V). Average amplitude of the negative type showed the frequent rate of 49.8% in lead aVE which was -77.6$\pm$ 25.2 $\mu $V. Biphasic type in leads III and aVF were 46.1% (108.4 $\mu $V, -90.2 $\mu $V.) and 45.7% (137.4 $\mu $V, -105.4 $\mu $V.), and amplitudes between positive and negative of it were significant difference. 2. The highest amplitudes of the QRS complex in all leads were 534.8$\pm $ 232.3 $\mu $V of lead II. The frequent rate and amplitudes of the R wave type in the I, II, III and aVF were 30.2% (277.8 $\pm $131.3 $\mu $V), 45.1% (393.1$\pm $114.2 $\mu $V), 48.5% (349.3$\pm $178.3 $\mu $V) and 54.9% (334.4$\pm $129.7 $\mu $V), and QS ways type in the lead aVL was 49.5% (359.2$\pm $195.5$\mu $V), and RS and QS wave types in the lead a VR were 43.3% (312.4 $\mu $V, -212.7 $\mu $V.) and 41.1% (399.2$\pm $92.2 $\mu $V), respectively. 3. In T wave, the frequent rata and amplitudes of the positive type in the leads I, II, III and aVF were 44.6% (207.9$\pm $ 97.1 $\mu $V), 41.6% (245.1$\pm $92.1 $\mu $V), 46.9% (189.8$\pm $ 82.7 $\mu $V) and 53.0% (195.4197.8 $\mu $V), and the negative in the lead aVR was 41.2% (-230.7$\pm$ 103.1 $\mu $V), respectively. The positive and negative types in the lead aVe appeared with same frequent rate of 43.2%.4. Frontal plane vectors for P, QRS, and T were found to lie at 38.1$\pm $ 21.5, 142.0$\pm $ 57.2, and 117.2$\pm $ 63.9 degrees, respectively. These results in ECG of goats may be served to the limited purposes as to conduction parameters, arrhythmias except abnormal ECG because of waveforms, amplitudes and electrical axis of it were variability.

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Optical Properties of Photoferroelectric Semiconductors II (Optical Properties of BiSI, BiSI : Co, BiSeI and BiSeI : Co Single Crystals) (Photoferroelectric 반도체의 광학적 특성연구 II : (BiSI, BiSeI, BiSI : Co 및 BiSeI : Co 단결정의 광학적 특성에 관한 연구))

  • 고재모;윤상현;김화택;최성휴;김형곤;김창대;권숙일
    • Journal of the Korean Vacuum Society
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    • v.1 no.2
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    • pp.244-253
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    • 1992
  • BiSI, BiSI : Co, BiSeI 및 BiSeI : Co 단결정을 고순도의 성분원소와 8.6mole% 과잉의 Iodine를 투명석영관내에 넣고 진공봉입하여 합성한 ingot를 사용하여 수직 Bridgman 방법으로 성장시켰다. 성장된 단결정은 orthorhombic 구조였고, energy band 구 조는 간접전이형으로 293K에서 광학적 energy gap은 각각 1.590eV, 1.412eV, 1.282eV 및 1.249eV로 주어지며, energy gap의 온도의존성은 Varshni 방정식으로 잘 표현된다. Cobalt 를 첨가할 때 나타나는 불순물 광흡수 peak는 Td symmetry점에 위치한 Co2+, Co3+ ion의 energy 준위들 사이의 전자전이에 의해서 나타난다.

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Structural and electrical characterizations of $HfO_{2}/HfSi_{x}O_{y}$ as alternative gate dielectrics in MOS devices (MOS 소자의 대체 게이트 산화막으로써 $HfO_{2}/HfSi_{x}O_{y}$ 의 구조 및 전기적 특성 분석)

  • 강혁수;노용한
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.07a
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    • pp.45-49
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    • 2001
  • We have investigated physical and electrical properties of the Hf $O_2$/HfS $i_{x}$/ $O_{y}$ thin film for alternative gate dielectrics in the metal-oxide-semiconductor device. The oxidation of Hf deposited directly on the Si substrate results in the H $f_{x}$/ $O_{y}$ interfacial layer and the high-k Hf $O_2$film simultaneously. Interestingly, the post-oxidation N2 annealing of the H102/H1Si70y thin films reduces(increases) the thickness of an amorphous HfS $i_{x}$/ $O_{y}$ layer(Hf $O_2$ layer). This phenomenon causes the increase of the effective dielectric constant, while maintaining the excellent interfacial properties. The hysteresis window in C-V curves and the midgap interface state density( $D_{itm}$) of Hf $O_2$/HfS $i_{x}$/ $O_{y}$ thin films less than 10 mV and ~3$\times$10$^{11}$ c $m^{-2}$ -eV without post-metallization annealing, respectively. The leakage current was also low (1$\times$10-s A/c $m^2$ at $V_{g}$ = +2 V). It is believed that these excellent results were obtained due to existence of the amorphous HfS $i_{x}$/ $O_{y}$ buffer layer. We also investigated the charge trapping characteristics using Fowler-Nordheim electron injection: We found that the degradation of Hf $O_2$/HfS $i_{x}$/ $O_{y}$ gate oxides is more severe when electrons were injected from the gate electrode.e electrode.e.e electrode.e.

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A Study for Evaluating of Voltage Stability Margin Considering Shunt Capacitor (조상설비를 고려한 전압안정성 여유전력의 평가에 관한 연구)

  • 김세영
    • Journal of Energy Engineering
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    • v.7 no.1
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    • pp.65-72
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    • 1998
  • This paper presents a fast calculation method for evaluating of voltage stability margin (MW) using the line flow equation in polar form. Here, Line flow equations $(P_{ij},\;Q_{ij}$ are comprised of state variable, $V_i,\;{\Delta}_i,\;V_j$ and ${Delta}_j$, and line parameter, r and x. using the feature of polar coordinate, these becomes one equation with two variables, $V_j,;V_j$. Moreover, if bus j is slack or generator bus, which is specified voltage magnitude in load flow calculation, it becomes one equation with one variable $V_ i $ that is, may be formulated with the second-order equation for $V^2_i$. Therefore, multiple load flow solutions may be obtained with simple computation. The obtained load flow multiple solutions are used for evaluating of voltage stability through sensitivity analysis or its closeness. Also, the method is proposed to calculate for voltage stability margin considering shunt capacitor, which is important element for evaluating of voltage stability. The proposed method was validated to sample systems.

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V-I Properties of Silicone Gel (실리콘 젤의 전압-전류 특성)

  • 송병기;최성오;신종열;이태훈;홍진웅
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1997.11a
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    • pp.377-380
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    • 1997
  • In order to investigate the electrical characteristics due to the curing condition of silicone gel for Power Semiconductor, the V-I characteristics is studied. For experiment, We have made up several samples of different curing temperature and time such as 1[H],2[H] at 150[$^{\circ}C$], 160[$^{\circ}C$], 170[$^{\circ}C$]. As a result of the V-I characteristics, it is confirmed that the properties of specimen cured at 170[$^{\circ}C$], 2[H] is stable.

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Photoconductivity spectra of undoped and co-doped $Cd_4GeSe_6$ single crystals ($Cd_4GeSe_6$$Cd_4GeSe_6:Co^{2+}$ 단결정의 광전도도 특성)

  • 김덕태
    • Electrical & Electronic Materials
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    • v.9 no.2
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    • pp.152-158
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    • 1996
  • Optical absorption and photoconductivity spectra of undoped and Co-doped Cd$_{4}$GeSe$_{6}$ single crystals, grown by the chemical transport reaction using iodine as a transporting agent, were investigated. At 20K, the optical energy gaps of the single crystals are 1.934eV for Cd$_{4}$GeSe$_{6}$ and 1.815eV for Cd$_{4}$GeSe$_{6}$ :Co$^{2+}$. The photoconductivity spectra of these single crystals were closely investigated over the temperature range 20-290K. At 20K, the photoconductivity peaks were located at 1.797eV, 1.347eV for Cd$_{4}$GeSe$_{6}$ and 1.815eV, I,.57eV, 1.46eV and 1.38eV for Cd$_{4}$GeSe$_{6}$ :Co$^{2+}$, respectively.ely.

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