• 한국진공학회:학술대회논문집
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• 한국진공학회 2010년도 제39회 하계학술대회 초록집
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• pp.178-178
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• 2010

With the scaling down of ULSI(Ultra Large Scale Integration) circuit of CMOS(Complementary Metal Oxide Semiconductor)based electronic devices, the electronic devices become more faster and smaller size that are promising field of semiconductor market. However, very narrow line width has some disadvantages. For example, because of narrow line width, deposition of conformal and thin barrier is difficult. Besides, proportion of barrier width is large, thus resistance is high. Conventional PVD(Physical Vapor Deposition) thin films are not able to gain a good quality and conformal layer. Hence, in order to get over these side effects, deposition of thin layer used of ALD(Atomic Layer Deposition) is important factor. Furthermore, it is essential that copper atomic diffusion into dielectric layer such as silicon oxide and hafnium oxide. If copper line is not surrounded by diffusion barrier, it cause the leakage current and devices degradation. There are some possible methods for improving the these secondary effects. In this study, TaNx, is used of Tertiarybutylimido tris (ethylamethlamino) tantalum (TBITEMAT), was deposited on the 24nm sized trench silicon oxide/silicon bi-layer substrate with good step coverage and high quality film using plasma enhanced atomic layer deposition (PEALD). And then copper was deposited on TaNx barrier using same deposition method. The thickness of TaNx was 4~5 nm. TaNx film was deposited the condition of under $300^{\circ}C$ and copper deposition temperature was under $120^{\circ}C$, and feeding time of TaNx and copper were 5 seconds and 5 seconds, relatively. Purge time of TaNx and copper films were 10 seconds and 6 seconds, relatively. XRD, TEM, AFM, I-V measurement(for testing leakage current and stability) were used to analyze this work. With this work, thin barrier layer(4~5nm) with deposited PEALD has good step coverage and good thermal stability. So the barrier properties of PEALD TaNx film are desirable for copper interconnection.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2005년도 하계학술대회 논문집 Vol.6
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• pp.207-210
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• 2005

In order to investigate the influence of the homo buffer layer on the microstructure of the ZnO thin film, undoped ZnO buffer layer were deposited on sapphire (0001) substrates by ultra high vaccum pulsed laser deposition (UHV-PLD) and molecular beam eiptaxy (MBE). After high temperature annealing at $600^{\circ}C$ for 30min, undoped ZnO buffer layer was deposited with various oxygen pressure (35~350mtorr). On the grown layer of undoped ZnO, Arsenic-doped(l, 3wt%) ZnO layers were deposited by UHV-PLD. The optical property of the ZnO was analyzed by the photoluminescence (PL) measurement. From $\Theta-2\Theta$ XRD analysis, all the films showed strong (0002) diffraction peak, and this indicates that the grains grew uniformly with the c-axis perpendicular to the substrate surface. Field emission scanning electron microscope (FE-SEM) revealed that microstructures of the ZnO were varied with oxygen pressure, arsenic doping level, and the deposition method of undoped ZnO buffer layers. The films became denser and smoother in the cases of introducing MBE-buffer layer and lower oxygen pressure during As-doped ZnO deposition. Higher As-doping concentration enhanced the columnar-character of the films.

• 수산해양기술연구
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• 제59권1호
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• pp.35-43
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• 2023

Sensory evaluation of shucking pressure, pressure holding time, seeding method, difference in full shucking rate in the aquaculture area and shucking oyster was performed using an ultra-high pressure oyster shucking machine. The reaching time for each target pressure is 2.2-2.4 MPa/sec in the range of 180 MPa to 240 MPa. had a rate of pressure rise. There was a difference of 0.5-1.7℃ in the range of 24-27℃ in the seawater temperature before and after the pressure treatment inside the pressure vessel, but there was no specific increase or decrease in seawater temperature. When only the shucking pressure is increased without the pressure holding time, the critical shucking pressure at which the oyster shell is opened and the flesh is peeled in the range of 200 to 220 MPa. When the critical shucking pressure is reached, the oyster sample in the closed vessel is expected to be shucked by about 40%. If there is no pressure holding time when judged only by full shucking, an increase in pressure of about 1.5 MPa is required to further shuck 3% of the oyster population. The oyster samples cultivated in the south coast of Korea were subject to full shucking under the conditions of 220 MPa shucking pressure and two minutes (120 seconds) of pressure holding time, and the difference in the pressure of the oysters according to the oyster seeding method and the farming area was minute. Finally, the condition of 220 MPa of shucking pressure and three minutes of pressure holding time was the best at 1.52 when the result of the sensory evaluation performed manually was set to 1.0. Next was 1.4 under the conditions of 220 MPa of shucking pressure and one minute of pressure holding time (60 seconds), and 1.3 under the condition of 220 MPa and two minutes of pressure holding time (120 seconds). Therefore, it is considered that the most desirable shucking conditions, considering the efficiency and sensory evaluation results, are the conditions of 220 MPa shucking pressure and two to three minutes of pressure holding time.

• 생물환경조절학회지
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• 제18권2호
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• pp.148-152
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• 2009

본 연구는 배추 재배시 기후변화에 대비하여 고온과 고농도의 이산화탄소 조건에서 생육반응과 세포조직의 변화를 알아보고자 수행하였다. 처리는 '대기중 온도+대기중 $CO_{2}$ 농도(Control)', '대기중 온도+대기보다 $CO_{2}$ 2배 상승(Elevated $CO_{2}$)' '(대기온도보다 4$^{\circ}C$ 상승+대기중 $CO_{2}$ 농도(Elevated temp.)', '대기온도보다 4$^{\circ}C$ 상승+대기보다 $CO_{2}$ 2배 상승(Elevated temp.+$CO_{2}$)'의 4가지 조건으로 처리하였다. 그 결과, 대기조건보다 온도만 높아지게 되면 배추의 생체중이 현저하게 저하되어 수량이 떨어지는 것으로 나타났고, 온도가 높아지고 $CO_{2}$ 농도가 동시에 올라가게 되면 생육이 어느정도 회복되는 것으로 나타났다. 또한 칼륨과 인산함량은 처리별로 차이가 없었지만 칼슘과 총질소함량은 온도만 높인 처리에서 높았고, 마그네슘 함량은 온도와 $CO_{2}$ 농도를 동시에 높인 처리에서 높게 나타났다. 배추잎의 세포 관찰결과 $CO_{2}$ 농도를 2배 정도 높인 처리에서 잎내의 전분함량이 증가하는 것으로 나타났고, 온도만 높인 처리에서 전분 함량이 가장 낮았다.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2005년도 추계학술대회 논문집 전기물성,응용부문
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• pp.139-141
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• 2005

It is possble to study charge transfer property which is caused by height variation because we can see the organic materials barrier height and STM tip by organic materials energy band gap. Here, we investigated the negative differential resistance(NDR) and charge transfer property of self-assembled 4,4-Di(ethynylphenyl)-2'-nitro-1-(thioacetyl)benzene, which has been well known as a conducting molecule. Self-assembly monolayers(SAMs) were prepared on Au(111), which had been thermally deposited onto pre-treatment($H_{2}SO_{4}:H_{2}O_{2}$=3:1) Si. The Au substrate was exposed to a 1 mM/l solution of 1-dodecanethiol in ethanol for 24 hours to form a monolayer. After thorough rinsing the sample, it was exposed to a $0.1{\mu}M/1$ solution of 4,4-Di(ethynylphenyl)-2'-nitro-1-(thioacetyl)benzene in dimethylformamide(DMF) for 30 min and kept in the dark during immersion to avoid photo-oxidation. After the assembly, the samples were removed from the solutions, rinsed thoroughly with methanol, acetone, and $CH_{2}Cl_{2}$, and finally blown dry with $N_2$. Under these conditions, we measured electrical properties of self-assembly monolayers(SAMs) using ultra high vacuum scanning tunneling microscopy(UHV-STM). The applied voltages were from -1.50 V to -1.20 V with 298 K temperature. The vacuum condition is $6{\times}10^{-8}$ Torr. As a result, we found that NDR and charge transfer property by a little change of height when the voltage is applied between STM tip and electrode.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제55권1호
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• pp.16-19
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• 2006

The characteristic of negative differential resistance(NDR) is decreased current when the applied voltage is increased. The NDR is potentially very useful in molecular electronics device schemes. Here, we investigated the NDR characteristic of self-assembled 4,4'-di(ethynylphenyl)-2'-nitro-1-benzenethiolate, which has been well known as a conducting molecule. Self-assembly monolayers(SAMs) were prepared on Au(111), which had been thermally deposited onto $pre-treatment(H_2SO_4:H_2O_2=3:1)$ Si. The Au substrate was exposed to a 1 mM/1 solution of 1-dodecanethiol in ethanol for 24 hours to form a monolayer. After thorough rinsing the sample, it was exposed to a 0.1 ${\mu}M/l$ solution of 4.4'-di(ethynylphenyl)-2'-nitro-1-(thioacetyl)benzene in dimethylformamide(DMF) for 30 min and kept in the dark during immersion to avoid photo-oxidation. After the assembly, the samples were removed from the solutions, rinsed thoroughly with methanol, acetone, and $CH_2Cl_2,$ and finally blown dry with N_2. Under these conditions, we measured electrical properties of self-assembly monolayers(SAMs) using ultra high vacuum scanning tunneling microscopy(UHV-STM). The applied voltages were from -2 V to +2 V with 298 K temperature. The vacuum condition was $6{\time}10^{-8}$ Torr. As a result, we found the NDR voltage of the 4,4'-di(ethynylphenyl)-2'-nitro-1-benzenethiolate were $-1.61{\pm}0.26$ V(negative region) and $1.84{\pm}0.33$ V(positive region). respectively.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2005년도 제36회 하계학술대회 논문집 C
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• pp.1844-1846
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• 2005

The characteristic of negative differential resistance(NDR) is decreased current when the applied voltage is increased. The NDR is potentially very useful in molecular electronics device schemes. Here, we investigated the NDR property of self-assembled 4,4- Di(ethynylphenyl)-2'-nitro-1-(thioacetyl)benzene, which has been well known as a conducting molecule. Self-assembly monolayers(SAMs) were prepared on Au(111), which had been thermally deposited onto pre-treatment$(H_2SO_4:H_2O_2=3:1)$ Si. The Au substrate was exposed to a 1mM/l solution of 1-dodecanethiol in ethanol for 24 hours to form a monolayer. After thorough rinsing the sample, it was exposed to a $0.1{\mu}M/l$ solution of 4,4-Di(ethynylphenyl)-2'-nitro-1-(thioacetyl)benzene in dimethylformamide(DMF) for 30 min and kept in the dark during immersion to avoid photo-oxidation. After the assembly, the samples were removed from the solutions, rinsed thoroughly with methanol, acetone, and $CH_2Cl_2$, and finally blown dry with $N_2$. Under these conditions, we measured electrical properties of self-assembly monolayers(SAMs) using ultra high vacuum scanning tunneling microscopy(UHV-STM). The applied voltages were from -2V to +2V with 299K temperature. The vacuum condition is $6{\times}10^{-8}$ Torr. As a result, we found the NDR voltage of the nitro-benzene is $-1.61{\pm}0.26$ V(negative region) and $1.84{\pm}0.33$ (positive region), respectively.

• 한국유가공학회:학술대회논문집
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• 한국유가공기술과학회 2002년도 정기총회 및 제55회 추계심포지움 - 전환기 유가공 산업의 생존전략
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• pp.23-40
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• 2002

This study was conducted to investigate the quality changes of the UHT(ultra-high temperature), LTLT(law temperature long time) and HTST(high temperature short time) treated milk samples by storage conditions for 6 months from August 2000 to February 2001. The UHT treated milk samples collected from 3 plants(A, B and C) were stored at l0$^{\circ}$C and room temperature(dark and light exposure) for 6 months, and the LTLT and HTST treated milk samples(D and E) were also stored for 30 days. The UHT pasteurized milk of A, B and C plant was treated at 130$^{\circ}$C for 2-3s, 133$^{\circ}$C for 2-3s and 135$^{\circ}$C for 4s, respectively. The UHT sterilized milk of A and B plant was treated at 140$^{\circ}$C for 2-3s and 145$^{\circ}$C for 3-4s, respectively. The LTLT milk of D plant was treated at 63$^{\circ}$C for 30 mins, and the HTST milk of E plant was treated at 72$^{\circ}$C for 15s. All of the raw milk samples collected from storage tank in 5 milk plants were showed less than 4.0 X 10$^5$cfu/ml in standard plate count, and normal level in acidity, specific gravity, and component of milk. Preservatives, antibiotics, sulfonamides and available chloride were not detected in both raw and heat treated milk samples obtained from 5 plants. One(10%) of 10 UHT pasteurized milk samples obtained from B plant and 2 (20%) of 10 from C were not detected in bacterial count after storage at 37$^{\circ}$C for 14 days, but all of the 10 milk samples from A were detected. No coliforms were detected in all samples tested. No bacteria were also detected in carton, polyethylene and tetra packs collected from the milk plants. A total of 300 UHT pasteurized milk samples collected from 3 plants were stored at room(3$^{\circ}$C ${\sim}$ 30$^{\circ}$C) for 3 and 6 months, 11.3%(34/300) were kept normal in sensory test, and 10.7%(32/300)were negative in bacterial count. The UHT pasteurized milk from A deteriorated faster than the UHT pasteurized milk from B and C. The bacterial counts in the UHT pasteurized milk samples stored at 10$^{\circ}$C were kept less than standard limit(2 ${\times}$ 10$^4$ cfu/ml) of bacteria for 5 days, and bacterial counts in some milk samples were a slightly increased more than the standard limit as time elapsed for 6 months. When the milk samples were stored at room(3$^{\circ}$C ${\sim}$ 30$^{\circ}$C), the bacterial counts in most of the milk samples from A plant were more than the standard limit after 3 days of storage, but in the 20%${\sim}$30%(4${\sim}$6/20) of the milk samples from B and C were less than the standard limit after 6 months of storage. The bacterial counts in the LTLT and HTST pasteurized milk samples were about 4.0 ${\times}$ 10$^3$ and 1.5 ${\times}$ 101CFU/ml at the production day, respectively. The bacterial counts in the samples were rapidly increased to more than 10$^7$ CFU/ml at room temperature(12$^{\circ}$C ${\sim}$ 30$^{\circ}$C) for 3 days, but were kept less than 2 ${\times}$ 10$^3$ CFU/ml at refrigerator(l0$^{\circ}$C) for 7 days of storage. The sensory quality and acidity of pasteurized milk were gradually changed in proportion to bacterial counts during storage at room temperature and 10$^{\circ}$C for 30 days or 6 months. The standard limit of bacteria in whole market milk was more sensitive than those of sensory and chemical test as standards to determine the unaccepted milk. No significant correlation was found in keeping quality of the milk samples between dark and light exposure at room for 30 days or 6 months. The compositions of fat, solids not fat, protein and lactose in milk samples were not significantly changed according to the storage conditions and time for 30 days or 6 months. The UHT sterilized milk samples(A plant ; 20 samples, B plant ; 110 samples) collected from 2 plants were not changed sensory, chemical and microbiological quality by storage conditions for 6 months, but only one sample from B was detected the bacteria after 60 days of storage. The shelflife of UHT pasteurized milk in this study was a little longer than that reported by previous surveys. Although the shelflife of UHT pasteurized milk made a significant difference among three milk plants, the results indicated that some UHT pasteurized milk in polyethylene coated carton pack could be stored at room temperature for 6 months. The LTLT and HTST pasteurized milk should be sanitarily handled, kept and transported under refrigerated condition(below 7$^{\circ}$C) in order to supply wholesome milk to consumers.

• 한국터널지하공간학회 논문집
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• 제24권6호
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• pp.451-464
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• 2022

고준위방사성폐기물 처분장은 심지층 처분시스템으로 사용후핵연료를 취급하는 특성상 고온, 방사선 및 지하수 등의 복합적인 환경조건에 노출되어 있다. 지속적인 노출에 의해 시간이 지남에 따라 구조물의 균열 및 열화가 발생할 수 있다. 한편 고준위방사성폐기물 처분장은 초장기 기대수명이 요구되며 이에 따른 장기적인 구조물 건전성 모니터링이 필수적이다. 구조물 건전성 모니터링에는 가속도계, 토압계, 변위계 등 다양한 센서들이 활용될 수 있으며, 이 중 일반적으로 피에조센서가 사용된다. 따라서 피에조센서의 내구성 평가를 바탕으로 고내구성 센서를 개발할 필요가 있다. 본 연구에서는 피에조센서의 내구성 평가 및 수명예측을 위한 가속수명시험을 설계하였다. 문헌연구를 바탕으로 단일 스트레스 인자에 대한 가속 스트레스 수준 수 및 각 수준 별 시료 수를 선정하였다. 또한 고준위방사성폐기물 처분장 환경조건에서 발생할 수 있는 피에조센서의 고장모드 및 고장메커니즘을 분석하였다. 온도 스트레스 인자에 대한 최대 가혹조건 탐색 실험을 두 가지 방법으로 제안하였으며 피에조센서의 신뢰도 높은 동작한계를 도출하였다. 이를 이용하여 가속수명시험의 합리적인 가속 스트레스 수준을 설정하였다. 본 연구에서 제시된 최대 가혹조건 탐색 실험방법은 경제적이며 실용적인 아이디어를 담고 있으며, 추후 피에조센서의 가속수명시험 설계에 널리 활용될 수 있을 것으로 판단된다.

• 대한기계학회논문집B
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• 제39권9호
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• pp.727-734
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• 2015

세계적으로 유가 상승에 따른 내연기관의 에너지 변환 효율을 높이고자 하는 연구가 활발히 진행되고 있다. 가솔린엔진에서 높은 열효율을 실현하기 위해서는 희박연소에 의한 비열비의 증가 및 단열화염온도의 저감에 의한 열효율 향상이 필수적이다. 직접분사식 가솔린 엔진은 연료를 직접 연소실에 공급하고 정밀한 연소제어를 통해 희박 연소가 가능하게 하지만 희박연소 한계의 확대와 안정된 희박연소제어가 요구된다. 희박연소 엔진에 대한 삼원촉매의 배출가스 저감특성은 높은 공기과잉률 및 낮은 배기가스 온도로 인해 매우 제한적이다. 이에 효과적인 삼원촉매의 개발을 위해 승용 차량용 엔진의 주요 연비시험 운전조건인 2000 rpm BMEP 2bar 조건에서 공기과잉률의 변화에 따른 배출가스 반응 및 생성 특성을 비교하였다. 희박연소 조건에서 $NO_2$가 생성되었으며, $NO_2$의 비율은 공기과잉률이 증가할수록 증가하고 $N_2O$는 감소하였다.