• Title/Summary/Keyword: Ultra Light metal Structure

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The Compressive Characteristics of The Convex Type Wire-woven Bulk Kagome Truss PCM (볼록형 와이어 직조 카고메 트러스 PCM의 압축특성평가)

  • Li, Ming-Zhen;Kang, Ki-Ju
    • Proceedings of the KSME Conference
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    • 2008.11a
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    • pp.138-143
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    • 2008
  • Recently, a new periodic cellular metal(PCM) named as Wire wove Bulk Kagome(WBK) was introduced. Based on the shape of tetrahedra composing a WBK, WBKs are classified into two types, namely, concave and convex type. They are easily differentiated by changing the assembling sequence. The effect of geometrical parameters such as the wire diameter, strut length and number of layers on the compressive behavior of concave type WBK has already been investigated. In this work, the similar works were performed with the convex type WBKs. It was shown that the compressive strength of the convex type WBK was quite similar to that of the concave type. The compressive strengths of convex type specimens also depend on the slenderness ratio, but a little different from those of concave type specimens in the detailed behavior. And densification occurs earlier than the concave type WBK.

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Optical Behavior and Electrical Properties of Functional Dendrimer Thin Films (기능성 덴드리머 박막의 광학적 거동 및 전기적 특성)

  • 박재철;정상범;권영수
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.52 no.5
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    • pp.201-205
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    • 2003
  • We synthesized dendrimers containing light switchable units, azobenzene group. And the dendrimer containing 48 pyridinepropanol functional end group, which could form a complex structure with metal ions was synthesized. To apply to the molecular level devices or data storage system using Langmuir-Blodgett(LB) film, we firstly investigated the monolayer behavior using the surface pressure-area($\pi$-A) isotherms at air-water interface. And then the surface pressure shift of monolayer by light irradiation was also measured to the dendrimer with azobezene group. As a result, the monolayer of dendrimer with azobenzene group showed the reversible photo-switching behavior by the isomerization of azobenzene group in their periphery. The samples for electrical measurement were fabricated to two types which were pure dendrimer with pyridinepropanol group and its complexes with $Pt^4+$ ions by LB method. We have studied the electrical properties of the ultra thin dendrimer LB films investigated by the current-voltage(I-V) characteristics of Metal/Dendrimer LB films/Metal(MIM) structure. And we have investigated different results in the surface activity at the air-water interface as well as the electrical properties for the monolayers of pure dendrimer with pyridinevopanol group and its complex with $Pt^4+$ ions. In conclusion, it is demonstrated that the metal ion around dendrimer with pyri야nepropanol group can contribute to make formation of network structure among dendrimers and it result from the change of electrical properties. This results suggest that the dendrimers with azobenzene group and pvridinedropanol group can be applied to high efficient nano-device of molecular level.

Optical Behavior and Electrical Properties of Functional Dendrimer Thin Films (기능성 덴드리머 박막의 광학적 거동 및 전기적 특성)

  • 박재철;정상범;권영수
    • The Transactions of the Korean Institute of Electrical Engineers D
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    • v.52 no.5
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    • pp.201-201
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    • 2003
  • We synthesized dendrimers containing light switchable units, azobenzene group. And the dendrimer containing 48 pyridinepropanol functional end group, which could form a complex structure with metal ions was synthesized. To apply to the molecular level devices or data storage system using Langmuir-Blodgett(LB) film, we firstly investigated the monolayer behavior using the surface pressure-area($\pi$-A) isotherms at air-water interface. And then the surface pressure shift of monolayer by light irradiation was also measured to the dendrimer with azobezene group. As a result, the monolayer of dendrimer with azobenzene group showed the reversible photo-switching behavior by the isomerization of azobenzene group in their periphery. The samples for electrical measurement were fabricated to two types which were pure dendrimer with pyridinepropanol group and its complexes with $Pt^4+$ ions by LB method. We have studied the electrical properties of the ultra thin dendrimer LB films investigated by the current-voltage(I-V) characteristics of Metal/Dendrimer LB films/Metal(MIM) structure. And we have investigated different results in the surface activity at the air-water interface as well as the electrical properties for the monolayers of pure dendrimer with pyridinevopanol group and its complex with $Pt^4+$ ions. In conclusion, it is demonstrated that the metal ion around dendrimer with pyri야nepropanol group can contribute to make formation of network structure among dendrimers and it result from the change of electrical properties. This results suggest that the dendrimers with azobenzene group and pvridinedropanol group can be applied to high efficient nano-device of molecular level.

Passivation Properties of SiNx Thin Film for OLEO Device (SiNx 박막에 의한 OLED 소자의 보호막 특성)

  • Ju Sung-Hoo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.19 no.8
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    • pp.758-763
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    • 2006
  • We has been studied the thin film encapsulation effect for organic light-emitting diodes (OLED). To evaluate the passivation properties of the passivation layer materials, we have carried out the fabrication of green light emitting diodes with ultra violet(UV) light absorbing polymer resin, $SiO_2,\;and\;SiN_x$, respectively. From the measurement results of shrinkage properties according to the exposure time to the atmosphere, we found that $SiN_x$ thin film is the best material for passivation layer. We have investigated the emission efficiency and life time of OLED device using the package structure of $OLED/SiN_x/polymer$ resin/Al/polymer resin. The emission efficiency of this OLED device was 13 lm/W and life time was about 2,000 hours, which reach 95 % of the performance for the OLED encapsulated with metal.

3.5-Inch QCIF AMOLED Panels with Ultra-low-Temperature Polycrystalline Silicon Thin Film Transistor on Plastic Substrate

  • Kim, Yong-Hae;Chung, Choong-Heui;Moon, Jae-Hyun;Lee, Su-Jae;Kim, Gi-Heon;Song, Yoon-Ho
    • ETRI Journal
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    • v.30 no.2
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    • pp.308-314
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    • 2008
  • In this paper, we describe the fabrication of 3.5-inch QCIF active matrix organic light emitting display (AMOLED) panels driven by thin film transistors, which are produced by an ultra-low-temperature polycrystalline silicon process on plastic substrates. The over all processing scheme and technical details are discussed from the viewpoint of mechanical stability and display performance. New ideas, such as a new triple-layered metal gate structure to lower leakage current and organic layers for electrical passivation and stress reduction are highlighted. The operation of a 3.5-inch QCIF AMOLED is also demonstrated.

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Ultra Broadband Absorption of SPPs Enhanced Dual Grating Thin Film CIGS Solar Cell Enabled by Particle Swarm Optimization

  • Le, DuyKhanh;Tran, QuyetThang;Lee, Sangjun;Kim, Sangin
    • Journal of the Optical Society of Korea
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    • v.18 no.5
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    • pp.429-435
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    • 2014
  • We examined the effective utilization of Particle Swarm Optimization (PSO) to enhance the light absorption performance in thin CuIn1-xGaxSe2 (CIGS) solar cells with dual (top and bottom) gratings. The PSO tuned structure was demonstrated to be capable of achieving high and ultra broadband absorption spectra due to well-spaced and well-defined absorption peaks, which were SPPs and photonic modes induced by the metal and dielectric gratings. For only TM polarization and both polarizations, the fully optimized net absorptions exhibit 85.6% and 78.1%, which correspond to ~35.4% and ~23.5% improvement compared to optimized flat structures, respectively.

Optimal design of an Wire-woven Bulk Kagome using taguchi method (다구찌법을 이용한 WBK(Wire-woven Bulk Kagome)의 최적설계)

  • Choi, Ji-Eun;Kang, Ki-Ju
    • Proceedings of the KSME Conference
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    • 2008.11a
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    • pp.13-19
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    • 2008
  • A Wire-woven Bulk Kagome (WBK) is the new truss type cellular metal fabricated by assembling the helical wires in six directions. The WBK seems to be promising with respect to morphology, fabrication cost, and raw materials. In this paper, first, the geometric and material properties are defined as the main design parameters of the WBK considering the fact that the failure of WBK is caused by buckling of truss elements. Taguchi approach was used as statistical design of experiment(DOE) technique for optimizing the design parameters in terms of maximizing the compressive strength. Normalized specific strength is constant regardless of slenderness ratio even if material properties changed, while it increases gradually as the strainhardening coefficient decreases. Compressive strength of WBK dominantly depends on the slenderness ratio rather than one of the wire diameter, the strut length. Specifically the failure of WBK under compression by elastic buckling of struts mainly depended on the slenderness ratio and elastic modulus. However the failure of WBK by plastic failed marginally depended on the slenderness ratio, yield stress, hardening and filler metal area.

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초경량 내부구조 접합판재 제작을 위한 금속내부구조의 설계 변수 분석

  • 정창균;윤석준;성대용;양동열;안동규
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2004.05a
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    • pp.64-64
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    • 2004
  • 최근 복합재료, 신소재 등 다양한 방법을 통해 빔(beam), 바(bar), 패널(panel) 등 초경량 구조재료가 개발되고 있다. 이중 금속 내부구조재를 가진 접합판재(Inner Structured and Bonded panel, ISB panel)은 3차원 형상의 내부구조재가 강성 및 강도를 증가시키는 반면, 부피의 대부분이 비어있어 비강도 및 비강성을 크게 개선시킨다 일반적으로 다양한 트러스 형태의 금속 내부구조물은 허니컴 형상의 내부구조와 유사한 정도로 기계적 특성이 우수하다.(중략)

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Poly-Si TFT on Metal Foil for 5.6-inch UTL (ultra-thin and light) AMOLED

  • Jeong, Jae-Kyeong;Lee, Hun-Jung;Kim, Min-Kyu;Hwang, In-Chan;Kim, Tae-Jin;Shin, Hyun-Soo;Ahn, Tae-Kyung;Lee, Jae-Seob;Kwack, Jin-Ho;Jin, Dong-Un;Mo, Yeon-Gon;Chung, Ho-Kyun
    • 한국정보디스플레이학회:학술대회논문집
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    • 2006.08a
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    • pp.198-201
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    • 2006
  • The optimization of poly-Si TFT process on metal foil for UTL AMOLED was systematically investigated. The improvement in device performance of poly-Si TFT on metal foil was achieved by optimizing the dopant activation condition and gate dielectric structure. Hence, the world first flexible full color 5.6-inch AMOLED with top emission mode on poly-Si TFT stainless steel foil is demonstrated.

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A study on the high transparent and antistatic thin films on sodalime glass by reactive pulsed DC magnetron sputtering (Pulsed DC 마그네트론 스퍼터링으로 제조한 소다라임 유리의 고투과 및 대전방지 박막특성 연구)

  • Jung, Jong-Gook;Lim, Sil-Mook
    • Journal of the Korean institute of surface engineering
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    • v.55 no.6
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    • pp.353-362
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    • 2022
  • Recently, transmittance of photomasks for ultra-violet (UV) region is getting more important, as the light source wavelength of an exposure process is shortened due to the demand for technologies about high integration and miniaturization of devices. Meanwhile, such problems can occur as damages or the reduction of yield of photomask as electrostatic damage (ESD) occurs in the weak parts due to the accumulation of static electricity and the electric charge on chromium metal layers which are light shielding layers, caused by the repeated contacts and the peeling off between the photomask and the substrate during the exposure process. Accordingly, there have been studies to improve transmittance and antistatic performance through various functional coatings on the photomask surface. In the present study, we manufactured antireflection films of Nb2O5, | SiO2 structure and antistatic films of ITO designed on 100 × 100 × 3 mmt sodalime glass by DC magnetron sputtering system so that photomask can maintain high transmittance at I-line (365 nm). ITO thin film deposited using In/Sn (10 wt.%) on sodalime glass was optimized to be 10 nm-thick, 3.0 × 103 𝛺/☐ sheet resistance, and about 80% transmittance, which was relatively low transmittance because of the absorption properties of ITO thin film. High average transmittance of 91.45% was obtained from a double side antireflection and antistatic thin films structure of Nb2O5 64 nm | SiO2 41 nm | sodalime glass | ITO 10 nm | Nb2O5 64 nm | SiO2 41 nm.