• 한국식품영양학회지
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• 제11권3호
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• pp.267-271
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• 1998

Seyferth 시약인 phenyl(tribromomethyl) mercury 및 diazomethane의 식품보존제인 dehydroacetic acid 및 coumarin과의 발암성과 그 반응기작을 분자 구조적 관점에서 알아보기 위하여 UV/vis 조건과 laser flash photolysis 시켰을 때의 결과는 다음과 같다. 1. Diazomethane과 Phenyl(tribromomethyl) mercury와 dehydroacetic acid와 diazomethane과의 반응은 광화학적 분해 반응에서 생성된 : CBr2와 : CH2 카르벤 중간체의 이탈기 효과에 따라 발암성이 크게 나타났다. 2. laser flash photolysis 상에서 반응시켰을 때 식품보존제의 발암성이 UV/vis 상에서의 photolysis 때보다 크게 나타났다.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1999년도 추계학술대회 논문집 학회본부 C
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• pp.888-890
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• 1999

ZnO thin films on (001) sapphire substrates have been deposited by pulsed laser deposition using a Nd:YAG laser with the wavelength of 355 nm at an oxygen pressure of 350 mTorr. In order to investigate the effect of the substrate temperature on the properties of ZnO thin films, the experiment has been performed at various substrate temperatures in the range of $200^{\circ}C$ to $700^{\circ}C$. According to XRD, (002) textured ZnO films of high crystalline quality have been obtained by pulsed laser deposition technique. However, the intensity of UV emission is mostly depending on the stoichiometry of ZnO films.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1999년도 추계학술대회 논문집
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• pp.95-98
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• 1999

ZnO thin films on (001) sapphire substrates have been deposited by pulsed laser deposition technique using a Nd:YAG laser with the wavelength of 355 nm. In order to investigate the effect of the deposition conditions on the properties of ZnO thin films at an oxygen pressure of 350 mTorr, the experiment has been Performed at various substrate temperatures in the range of 20$0^{\circ}C$ to $700^{\circ}C$. According to XRD, (002) textured ZnO films of high crystalline quality have been obtained and the intensity of UV emission was the highest at 40$0^{\circ}C$ substrate temperature.

• 한국레이저가공학회지
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• 제17권3호
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• pp.19-23
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• 2014

To directly engrave circuit-line patterns as wide as $6{\mu}m$ in a buildup film to be used as an IC substrate, we applied a projection ablation technique in which an 8 inch dielectric ($ZrO_2/SiO_2$) mask, a DPSS 355nm laser instead of an excimer laser, a ${\pi}$-shaper and a galvo scanner are used. With the ${\pi}$-shaper and a square aperture, the Gaussian beam from the laser is shaped into a square flap-top beam. The galvo scanner before the $f-{\theta}$ lens moves the flat-top beam ($115{\mu}m{\times}105{\mu}m$) across the 8 inch dielectric mask whose patterned area is $120mm{\times}120mm$. Based on the results of the previous research by the authors, the projection ratio was set at 3:1. Experiments showed that the average width and depth of the engraved patterns are $5.41{\mu}m$ and $7.30{\mu}m$, respectively.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2008년도 춘계학술대회 논문집
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• pp.329-330
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• 2008

• 한국정보통신학회논문지
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• 제20권1호
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• pp.161-166
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• 2016

본 논문에서는 광섬유 브래그 격자의 공정조건 변화에 따른 $Co^{60}$ 감마방사선 영향을 연구하였다. 광섬유 브래그 격자는 붕소가 첨가된 광민감 광섬유를 이용하여 UV KrF 레이저 세기를 달리하여 제작하였으며, 제작된 광섬유 브래그 격자 센서에 총 선량 33.8 kGy 감마선을 조사하였다. 실험결과를 통하여, 격자 공정을 위한 UV 레이저 세기가 광섬유 브래그 격자의 방사선 민감도에 큰 영향을 줄 수 있다는 것을 확인하였으며, 레이저 공정조건 변화에 따른 방사선에 의한 광섬유 브래그 파장의 변화는 30 % 이상의 차이를 보였다.

• 한국세라믹학회지
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• 제39권12호
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• pp.1158-1163
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• 2002

2차 비선형 광특성을 유도하기 위한 UV 폴링용 Ge와 B가 첨가된 광민감성 광섬유를 제조하였다. 248 nm KrF 엑시머 레이저 조사에 의하여 수소처리 없이 장주기 격자를 형성할 수 있었다. 116 mJ/$cm^2$의 펄스 에너지와 10 Hz의 조사 빈도로 1분간 광민감성 광섬유에 레이저를 조사할 경우 -4 dB의 큰 band rejection 특성을 얻을 수 있었다. 제조된 광섬유의 광민감성은 장주기 격자쌍 방법을 이용하여 측정하였으며, 8.67 kJ/$cm^2$의 fluence로 KrF 엑시머 레이저를 조사할 경우 3.3${\times}10^{-3}$의 큰 코어 굴절률 변화를 얻었다. 또한 UV 폴링 시에 광섬유 코어에 고전압을 쉽게 인가할 수 있는 H자 형상의 광섬유를 인출조건의 최적호를 통하여 제조하였다.

• 청정기술
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• 제22권3호
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• pp.203-207
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• 2016

Here, we report a novel fabrication technique for patchable organic lasing sheet based on non-volatile liquid organic semiconductors and freestanding polymeric film with high flexibility and patchability. For this work, we have fabricated the second-order DFB grating structure, which leads to surface emission, embedded in the freestanding polymeric film. Using an ultra-violet (UV) curable polyurethaneacrylate (PUA) mixture, the periodic DFB grating structure can be easily prepared on the freestanding polymeric film via a simple UV curing process. Due to unsaturated acrylate remained in the PUA mixture after UV curing, the freestanding PUA film provides adhesive properties, which enable mounting of the patchable organic lasing sheet onto non-flat surfaces with conformal contact. To achieve laser actions in the freestanding resonator structure, a composite material of liquid 9-(2-ethylhexyl)carbazole (EHCz) and organic laser dyes was used as the laser medium. Since the degraded active materials can be easily refreshed by a simple injection of the liquid composite, such a non-volatile liquid organic semiconducting medium has degradation-free and recyclable characteristics in addition to other strong advantages including tunable optoelectronic responses, solvent-free processing, and ultimate mechanical flexibility and uniformity. Lasing properties of the patchable organic lasing sheet were also investigated after mounting onto non-flat surfaces, showing a mechanical tunability of laser emission under variable surface curvature. It is anticipated that these results will be applied to the development of various patchable optoelectronic applications for light-emitting displays, sensors and data communications.

• 한국결정성장학회지
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• 제9권5호
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• pp.459-462
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• 1999

Recent advances in NLO Borate Crystals for UV Generation are reviewed with the particular emphasis on the technique to improve the life time of UV optics. The laser-damage resistance of CLBO and fused silica surfaces was successfully improved after removing polishing compound by ion beam etching. The polishing compound embedded in the CLBO and fused silica surfaces were to a depth of less than 100nm. We were able to remove polishing compound without degrading the surface condition when the applied ion beam voltage was less than 200 V. The laser-induced surface damage threshold of CLBO was improved up to 15J/$\textrm{cm}^2$(wavelength: 355 nm, pulse width: 0.85 ns)as compared with that of the as-polished surface (11 J/$\textrm{cm}^2$). The laser-induced surface damage of fused silica also increased from 7.5J/$\textrm{cm}^2$ to 15J/$\textrm{cm}^2$. For the irradiation of a 266 nm high-intensity and high-repetition laser light, the surface lifetime of CLBO and fused silica could be more doubled compared with that of the as-polished surface.

• 세라미스트
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• 제20권4호
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• pp.55-73
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• 2017

As one of the most versatile semiconductors, zinc oxide (ZnO) with one-dimensional (1-D) nanostructures has been significantly developed for the application of ultraviolet (UV) lasers, photochemical sensors, photocatalysts, and so on. Such 1-D nanowires could be easily achieved due to the anisotropic growth rate along the [0001] direction. However, such typical growth habit leads to decrease the surface area of the (0001) plane, which plays a central role in not only UV lasing action but also photocatalytic reaction. This fact lead us to develop ZnO crystal with enhanced polar surface area through crystal growth control. The purpose of this review is to provide readers a simple route to plate-type ZnO crystal with highly enhanced polar surfaces and their applications for UV-laser, photocatalyst, and antibacterial agents. In addition, we will highlight the recent study on pilot-scale synthesis of plate-type ZnO crystal for industrial applications.