• 제목/요약/키워드: UV pattern

검색결과 329건 처리시간 0.031초

UV Optical Solutions for Thin Film Processing and Annealing Research

  • Delmdahl, Ralph;Shimizu, Hiroshi;Dittmar, Mirko;Fechner, Burkhard
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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    • pp.246-249
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    • 2009
  • A compact, flexible family of UV laser material processing systems has been developed to drive advancements in both large area processing and annealing of semiconductor surfaces. UV photons can either be applied via demagnifying a mask pattern image or by scanning a homogenized excimer beam across the substrate area. 193nm, 248nm and 308nm wavelength applications are supported.

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고 형상비 UV LIGA 공정을 위한 낮은 내부응력의 SU-8 도금틀 제작 (SU-8 Mold Fabrication with Low Internal Stress and High Aspect Ratio for UV LIGA Process)

  • 장현기;김용권
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제48권8호
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    • pp.598-604
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    • 1999
  • This paper describes the research to minimize the film stress and maximize the aspect ratio of photoresist structure, especially about SU-8 for electroplating mold. UV LIGA process using SU-8 allows fabricating high aspect ratio polymer structures. However, it is hard to get fine patterns in the high aspect ratio structures because of high internal stress and difficulty of removing SU-8. The purpose of this paper is to setup the process condition for the obtainment of both low film stress and high aspect ratio and to find design rules that make the pattern be less dependent on stress problem. Firstly, the process of heat treatment and exposure of SU-8 are proposed. These two conditions control the amount of cross-linkage in polymer structure, which is the most important parameter of both pattern generation and remaining stress. Heat treatment is dealed with soft bake and post-exposure-bake. Temperature and time duration of each step are varied with heat treatment condition. Some test patterns are fabricated to evaluate the proposed process. Nickel electroplating is performed with the mold fabricated through the proposed process to confirm the SU-8 as a good electroplating mold.

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UV 임프린팅을 통한 프레넬 렌즈 제작 시 미세 복제 특성에 관한 연구 (Micro replication quality of Fresnel lens using UV imprinting process)

  • 임지석;김병욱;강신일
    • 정보저장시스템학회논문집
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    • 제6권1호
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    • pp.37-40
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    • 2010
  • Fresnel lens is a kind of refractive optical lens with various advantages. It has nearly flat shaped optical lens that has small mass. Fresnel lens has number of applications in the compact optical systems. Recently, demands of high quality Fresnel lens for small size optical systems such as illumination units, compact imaging systems, display units, information storage systems, optical detecting units had increased rapidly. Conventional manufacturing process of high quality Fresnel lens is direct machining. However, it is not suitable for mass production because of high cost and long cycle time. Replication method can provide cost effective mass production process. However, there are various issues about replication of Fresnel lens. Fresnel lens has number of sharp blade shape prism. In the replication process, this blade shape causes defects that can affect optical efficiency. In this study, replication processes; injection molding process and UV imprinting process, were developed and evaluated using Fresnel lens that has maximum pattern height of $250\;{\mu}m$ and aspect ratio of 1.5.

UV 임프린팅법에 의한 필름형 광도광판의 제조 및 특성 연구 (Fabrication and Characterization of Film Type Light Guide Plates by UV Imprint Lithography)

  • 김형관;김소원;이희철
    • 한국표면공학회지
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    • 제49권2호
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    • pp.178-185
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    • 2016
  • In this study, we have fabricated light guide plates (LGPs) in thin film form for edge type back light unit (BLU) by using UV imprint lithography. In the LGPs, the pattern of functional resins on PC and PMMA substrates were successfully transferred from original master mold through PVC stamp. Optimized pattern arrays with slowly-sloped density were designed to obtain high brightness and uniformity. We could obtain a relatively improved brightness of $950cd/m^2$ and a uniformity of 87.3% by using the NP-S20 functional resins at an input power of 1.3 W because NP-S20 resin could show high formability after UV hardening process. The LGP prepared on polymethylmethacrylate (PMMA) substrate exhibited higher brightness than that on polycarbonate (PC) substrate because PMMA has lower refractive index resulting in more refraction toward the vertical direction.

살리실산이 오이 잎의 산화적 스트레스와 UV-B 내성에 미치는 영향 (Effects of Salicylic Acid on Oxidative Stress and UV-B Tolerance in Cucumber Leaves)

  • 홍정희;김태윤
    • 한국환경과학회지
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    • 제16권12호
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    • pp.1345-1353
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    • 2007
  • The effect of salicylic acid(SA) on antioxidant system and protective mechanisms against UV-B induced oxidative stress was investigated in cucumber(Cucumis sativus L.) leaves. UV-B radiation and SA were applied separately or in combination to first leaves of cucumber seedlings, and dry matter accumulation, lipid peroxidation and activities of antioxidant enzymes were measured in both dose and time-dependant manner. UV-B exposure showed reduced levels of fresh weight and dry matter production, whereas SA treatment significantly increased them. SA noticeably recovered the UV-B induced inhibition of biomass production. UV-B stress also affected lipid peroxidation and antioxidant enzyme defense system. Malondialdehyde(MDA), a product of lipid peroxidation, was greatly increased under UV-B stress, showing a significant enhancement of a secondary metabolites, which may have antioxidative properties in cucumber leaves exposed to UV-B radiation. Combined application of UV-B and SA caused a moderate increase in lipid peroxidation. These results suggest that SA may mediate protection against oxidative stress. UV-B exposure significantly increased SOD, APX, and GR activity compared with untreated control plants. Those plants treated with 1.0 mM SA showed a similar pattern of changes in activities of antioxidant enzymes. SA-mediated induction of antioxidant enzyme activity may involve a protective accumulation of $H_2O_2$ against UV-B stress. Moreover, their activities were stimulated with a greater increase by UV-B+SA treatment. The UV-B+SA plants always presented higher values than UV-B and SA plants, considering the adverse effects of UV-B on the antioxidant cell system. ABA and JA, second messengers in signaling in response to stresses, showed similar mode of action in UV-B stress, supporting that they may be important in acquired stress tolerance. Based on these results, it can be suggested that SA may participates in the induction of protective mechanisms involved in tolerance to UV-B induced oxidative stress.

광경화성 단분자를 이용한 pattern free vertical alignment 모드의 전기 광학 특성 연구 (Study on electro optic characteristic of pattern free vertical alignment (PFVA) mode using the uv curable reactive mesogen (RM))

  • 조인영;황성진;김성민;황지혜;이승희
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 춘계학술대회 및 기술 세미나 논문집 디스플레이 광소자
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    • pp.45-46
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    • 2008
  • The conventional biased vertical alignment (BVA) mode has several advantages such as rubbing- and protrusion-free, wide-viewing angle and stable LC dynamics against external pressure. However manufacturing process of BVA mode is difficult task because the pixel and bias electrode signal are different in each frame. To solve this problem, we investigated the pattern free vertical alignment (PFVA) by using the UV-curable reactive mesogen (RM), in which the LC molecules were made to be pre-tilted. Eventually transmittance and response time in PFVA mode were found to be improved as compared to BVA mode.

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가시오가피(Acanthopanax senticosus)에서 polyacetylene계 화합물인 falcarinol의 동정 (Separating of Falcarinol from Acanthopanax senticosus)

  • 김성주;장규섭
    • 한국식품과학회지
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    • 제37권3호
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    • pp.360-363
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    • 2005
  • 가시오가피에서 Polyacetylene 성분 중 falcarinol을 탐색하기 위해 TLC, HPLC/PDA, GC, GC/MS를 이용하여 falcarinol 표준품과 소분획물 사이의 비교 분석을 통하여 가시오가피에서 falcarinol을 동정하였다. 가시오가피 추출물을 silica gel column상에서 용매의 극성차이에 의해 6개의 분획물을 얻었고, 6개의 분획물과 falcarinol 표준품과의 TLC 상에서 전개시킨 결과 fraction 6 분획물에서 falcarinol과 동일 band의 물질을 분리하였다. Fraction 6의 분획물과 falcarinol 표준품을 HPLC/PDA로 분석한 결과 falcarinol 표준품의 peak와 동일 retention time의 peak를 fraction 6에서 분리하여 200-340nm 상에서 UV spectrum을 관찰한 결과 동일한 UV spectrum pattern을 보이는 것을 확인하였다. 이는 전형적인 polyacetylene 화합물의 UV spectrum pattern이었으며, 기존에 보고된 falcarinol의 UV spectrum과도 동일하였다. GC로 TMS 유도체화 전,후의 retention time을 확인한 결과 표준품과 fraction 6에서 동일한 결과를 보였다. TMS 유도체화 후에는 7.5분에서 8.5분으로 약 1분 정도 retention time이 증가하였고, detection 감도 또한 증가하였다. Falcarinol 표준품과 fiaction 6 분획물을 TMS 유도체화 후에 GC/MS로 mass fragment ion을 분석한 결과 표준품과 동일한 경향을 보였고 이는 기존의 보고와도 일치하였다(16). 본 실험결과들로 미루어 가시오가피에도 polyacetylene 성분인 falcarinol 존재하는 것으로 확인되었다.

3D CAD, 3D 프린터 활용과 광경화수지 주물 결함 (Utilization of 3D CAD and 3D Printer and UV Curavle resin Casting Defect)

  • 유기현;서진환
    • 한국융합학회논문지
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    • 제8권3호
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    • pp.169-176
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    • 2017
  • 주조의 공정으로는 왁스패턴(wax pattern), 매몰(Investment), 탈왁스(Dewaxing)와 소성(Curing), 주물(Casting)등으로 나눌 수 있으며, 이러한 공정이 하나라도 소홀하게 되면 좋은 결과를 얻을 수 없게 된다. 2000년 이후, 3D 프린터가 발전되고 사용 횟수가 증가하였으나, 왁스 방식보다 광경화수지 방식의 프린터를 선호함으로 그의 따른 주물 결함이 더 심해지고 있다. 이러한 결함을 해결하기 위해 기존 왁스방식의 주조 결함을 선행논문을 통해 제시하였고, 특히 광경화수지 방식의 결함은 매몰과 탈왁스, 탈수지와 소성에서 기존과 다른 차이를 보였다. 이에 주조 실험을 통해 결과를 제시 하였으며, 특히 기존 방식의 승온곡선이 아닌 광경화수지만의 승온곡선을 제시하였다. 마지막으로 다이렉트 주조가 되지 못하는 것을 분류하고 형틀(Mold)제작에 대하여 제시하였다. 이에 본 연구를 통해 3D 프린터를 사용하는 사용자 또는 광경화수지를 다이렉트로 주조하려는 이들에게 조금이나마 도움이 되고자 한다.

메타버스를 위한 가상 휴먼의 3차원 의상 모델링 (3D Clothes Modeling of Virtual Human for Metaverse)

  • 김현우;김동언;김유진;박인규
    • 방송공학회논문지
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    • 제27권5호
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    • pp.638-653
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    • 2022
  • 본 논문은 고화질 2차원 전신 영상을 입력으로 받아 영상 속 인물이 입고 있는 의상 패턴과 체형 정보를 추정한 후, 이를 반영한 3차원 가상 휴먼의 생성 기법을 제안한다. 의상의 패턴을 얻기 위해서 Cascade Mask R-CNN을 이용하여 의상 분할을 진행한다. 이후 Pix2Pix로 경계를 블러 및 배경색을 추정하고, UV-Map 기반으로 변환하여 3차원 의상 메쉬의 UV-Map을 얻을 수 있다. 또한, SMPL-X를 이용하여 체형 정보를 얻고 이를 기반으로 의상과 신체의 기본 메쉬를 변형한다. 앞서 얻은 의상 UV-Map, 체형이 반영된 의상과 신체의 메쉬를 이용해 최근 각광받고 있는 게임 엔진인 언리얼 엔진에서 렌더링하여 최종적으로 사용자가 그의 외형이 반영된 3차원 가상 휴먼의 애니메이션을 볼 수 있도록 한다.

UV임프린트 공정에서 임프린팅 가압력 및 가압시간에 따른 레진 잔막 두께형성에 대한 실험연구 (Study on the Formation of Residual Layer Thickness by Changing Magnitude and Period of UV Imprinting Pressure)

  • 신동혁;장시열
    • Tribology and Lubricants
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    • 제26권5호
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    • pp.297-302
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    • 2010
  • This study is focused on the resin layer formation of UV imprinting process by changing imprinting pressure and period. The mold shape is made for the process of window open over the pattern transfer area and the imprinting period is assigned as the time just before the UV light curing. The residual layer is measured by changing the imprinting period and pressure magnitude, and the measured data of residual layer provides useful information for the design of the process conditions of imprinting processes.