• 한국정보디스플레이학회:학술대회논문집
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• 2006.08a
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• pp.1625-1628
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• 2006

Two different negative-type photosensitive polyimides were synthesized and characterized for an application as an interdielectric layer in TFTLCD array. In the case of photocurable polyimides, the photosensitive moiety, 2-HHSP, was synthesized through 3 step reaction, and then was incorporated into side chains of polyimide precursor by post reaction. Optimum compositions of negative-type photocurable polyimde were also formulated. For photopolymerizable polyimides, two novel UV monomers containing imide linkages were prepared. An aqueous alkaline developable polymer matrix was synthesized by free radical copolymerization. A negative photoresist formulation was developed utilizing synthesized UV monomers containing imide linkage, photoinitiator, UV oligomer, and alkali developable polymer matrix. It was found that viaholes with good resolution, high transmittance and thermal resistance could be obtained by photolithographic process utilizing the negative-type photoresist formulations.

• Journal of Adhesion and Interface
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• v.24 no.1
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• pp.26-35
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• 2023

Generally, solvent-type coatings generate a large amount of volatile organic chemicals(VOC), which are carcinogenic substances, in the manufacturing process, and their use is regulated due to environmental problems. There is also the problem of resource depletion due to limited fossil fuels. Therefore, in this study, UV-curable urethane acrylate oligomers were synthesized with different contents of isosorbide, which is a biomass material, and proceeded to evaluate the physical properties of coatings. As the isosorbide contents increased, the viscosity, glass transition temperature, tensile strength, stain resistance, and pencil hardness increased, but elongation and flexibility decreased, and BOI-3 showed the best adhesion. The isosorbide content of the oligomer fixed at 20%, UV-curable urethane acrylate oligomer was synthesized according to the content ratio of polycaprolactone diol(PCL) and Ecoprol H1000(Ecoprol). As the PCL/Ecoprol content ratio increased, the glass transition temperature, elongation, and flexibility increased, but the tensile strength and pencil hardness decreased. It was confirmed that the adhesion and stain resistance increased by improving the surface bonding strength of PCL. All films of oligomers synthesized were transparent without discoloration.

• Journal of Sensor Science and Technology
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• v.6 no.3
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• pp.207-213
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• 1997

A field effect transistor(FET) type dissolved carbon dioxide($pCO_{2}$) sensor with a double layer structure of hydrogel membrane and $CO_{2}$ gas permeable membrane was fabricated by utilizing a $H^{+}$ ion selective field effect transistor(pH-ISFET) with Ag/AgCl reference electrode as a base chip. Formation of hydrogel membrane with photo-crosslinkable PVA-SbQ or PVP-PVAc/photosensitizer system was not suitable with the photolithographic process. Furthermore, hydrogel membrane on pH-ISFET base chip could be fabricated by photolithographic method with the aid of N,N,N',N'-tetramethyl othylenediarnine(TED) as $O_{2}$ quencher without using polyester film as a $O_{2}$ blanket during UV irradiation process. Photosensitive urethane acrylate type oligomer was used as gas permeable membrane on top of hydrogel layer. The FET type $pCO_{2}$ sensor fabricated by photolithographic method showed good linearity (linear calibration curve) in the range of $10^{-3}{\sim}10^{0}\;mol/{\ell}$ of dissolved $CO_{2}$ in aqueous solution with high sensitivity.

• Journal of Adhesion and Interface
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• v.15 no.3
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• pp.116-122
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• 2014

This work deals with the effects of different oligomers, monomers, photoinitiators, and steel plates on the variation of gloss for UV coated steel plates at $20^{\circ}$ and $60^{\circ}$ (ASTM D523). The gloss value was more significantly varied with $20^{\circ}$ angle as compared with $60^{\circ}$. No substantial change in gloss was observed for the type of single oligomer; however, the gloss varied with the mixing ratios of oligomers, type and mixing ratio of monomers, type and concentration of photoinitiator, and type of steel plate. The maximum gloss value was observed when the mixing ratio of polyurethane acrylate (UA) to epoxy acrylate (EA) was 70 : 30, the mixing ratio of trimethylolpropantriacrylate (TMPTA) to tetrahydrofurfurylacrylate (THFA) was 5 : 5, the content of the mixed oligomer (UA : EA = 70 : 30) was 90 wt%, respectively. Darocur MBF of liquid type showed better gloss property than the solid type of Irgacure 184, and the gloss was decreased as the concentration of Darocur MBF increased from 1 to 4 wt%. Regarding the type of steel plate, GI steel plate showed better gloss property as compared with EG and primer-coated steel plates. The maximum gloss values of 95 GU and 120 GU, respectively, at $20^{\circ}$ and $60^{\circ}$ angles throughout the parametric study in the absence of leveling agents enhancing the gloss.

• Journal of the Korean Wood Science and Technology
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• v.36 no.6
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• pp.121-129
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• 2008

Environmental friendly UV-curable coatings, having excellent hardness, gloss, mar and chemical resistance, are commonly used for the wooden flooring coatings. Especially epoxy acrylate oligomers are chosen for the wooden flooring coatings, due to their thermal stability and fast curing. In this study, we investigated the effect of the acrylate functionality on the thermal stability and surface hardness. The thermal degradations of monomers, oligomer, photoinitiator and formulated coatings with different acrylate functionality were measured using a thermogravimetric analysis (TGA). And the surface hardness was also measured with a pendulum hardness tester to compare relationship between the thermal stability and the physical property. The cured coatings became thermally stable by crosslinking during UV-curing. Both the thermal stability and surface hardness of cured coatings were improved with increasing acrylate functionality.

• Analytical Science and Technology
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• v.17 no.3
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• pp.225-229
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• 2004

The effect of the silicon acrylate as a reactive additive on the UV-curing photopolymerization reaction was studied by micro raman technique. For the study, acrylate systems and Darocur 1173 were used as oligomer and monomers, and a photo initiator, respectively. The content of silicon acrylate was within the range of 0-3 wt%. The extent of photo-polymerization reaction as a function of depth from the air interface was obtained from the conversion ratio of acrylate double bond calculated from the intensities of measured bands at $1410cm^{-1}$ and at $1635cm^{-1}$. Micro raman spectroscopic technique can be an useful tool for the investigation of the factors, which can affect the reaction progress, such as oxygen inhibition, composition of the formulations, depth, etc.

• Macromolecular Research
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• v.14 no.5
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• pp.517-523
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• 2006

The effects of particle content, size and shape on the thermal conductivity (k) and adhesion properties of thermally conductive, pressure-sensitive adhesives (PSAs) were investigated. The matrix resins were thermally crosslinkable, 2-ethylhexyl acrylic polyol and ultraviolet (UV)-curable, random copolymer consisting of acrylic oligomer and various acrylates. We found that k increased with increasing diameter and particle aspect ratio, and was further enhanced due to the reduction of the interfacial thermal barrier when the coupling agent, which increases the adhesion between particles and the matrix resin, was used. On the other hand, adhesion properties such as peel strength and tack of the thermally crosslinkable resin decreased sharply with increasing particle content. However, for UV curable resin, increased particle addition inhibited the decrease in adhesion properties.

• Journal of the Korean Magnetic Resonance Society
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• v.5 no.2
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• pp.118-129
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• 2001

Binding interactions of cationic porphyrins, T4MPyP and TMAP with DNA oligomer d(CGCGAATTCGCG), were studied with NMR spectroscopy, W and CD spectroscopic method. Two porphyrins showed significant differences in NMR, UV and CD data upon binding to DNA. T4MPyP was considered to position more closely to DNA bases through partial intercalation as well as ionic intercalation between the positive charges of porphyrin and phosphate group of DNA at 5’-GC-3’steps. Contrast to this, TMAP was thought to bind to phosphate of DNA more or less outside of the groove.

• Applied Chemistry for Engineering
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• v.9 no.1
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• pp.6-12
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• 1998

A FET(Field Effect Transistor) type dissolved $CO_2$ sensor based on Severinghaus type $CO_2$ sensor was fabricated by the photolithographic process. The sensor consists of Ag/AgCl reference electrode and membranes (hydrogel membrane and $CO_2$ gas permeable membrane) on the pH-ISFET base chip. Ag/AgCl reference electrode was fabricated as follows. Ag layer was thermally evaporated and then its upper surface was chemically chloridized into the AgCl. The hydrogel used as an internal electrolyte solution was fabricated by a photolithographic method using 2-hydroxyethyl methacrylate(HEMA) and acrylamide. $CO_2$ permeable membrane on the top of the hydrogel layer was formed by photolithographic process with UV-oligomer. The FET type $pCO_2$ sensor fabricated by photolithographic method showed good linearity within the concentration range of $10^{-3}{\sim}10^0mole/{\ell}$ of dissolved $CO_2$ in aqueous solution with high sensitivity.

• Applied Chemistry for Engineering
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• v.23 no.2
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• pp.157-163
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• 2012

Using six kinds of epoxy acrylates and a conductive carbon black, photosensitive resistor pastes were fabricated and then their developability in alkaline aqueous solution and the resistance values after thermal curing were evaluated. In order to impart the photocurability by UV exposure and the developability on alkaline solution, epoxy acrylate oligomers with carboxyl group, acrylate monomers, a photoinitiator and so forth were used. In addition, an organic peroxide was added into the paste to get a thermally curable composition. As a result, some of the pastes were not developed depending on the kinds of oligomers and, in the developed pastes, the measured resistance showed the different values depending on their compositions, even though they contain the same amount of carbon black. Finally, the optimum oligomer was selected and then, by adjusting the amount of carbon black, the kind of monomer and the curing temperature, the photosensitive resistor paste composition which showed the sheet resistance of about 0.5 $k{\Omega}/sq.$ could be obtained.