• 제목/요약/키워드: UV laser

검색결과 423건 처리시간 0.038초

폴링된 폴리머 광도파로를 이용한 cerenkov형 제2고조파 생성 (Cerenkov type second harmonic genration in poled polymer waveguide)

  • 김응수;조원주
    • 전자공학회논문지D
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    • 제35D권8호
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    • pp.62-68
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    • 1998
  • Optical broadband second harmonic genration (SHG) in thin film waveguide structure was investigated. The copolymer poly(MMA-co-DR1MA) which was consiste dof PMMA (polymethylmethacrylate) and DR 1 (disperse red 1) was spin coated on the pyrex substrate. The green and near UV SHG were observe dfrom the fundamental beam even though the poled polymer has the absorption in second harmonic wavelength range. It was able to genrate SHG by cerenkov type phase matching. Th epoled polymer film thickness was decided by theoretical analysis. The green (532nm) and near UV SHG (370nm) were observed from the Q-switched Nd-YAG laser (1064nm) and Ti-sapphire laser (740nm). It was in good agreement with the experimental results.

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MLA(Micro Lens Array) 제작을 위한 광학 시뮬레이션 (The beam property simulation for the fabrication of a MLA(Micro Lens Array))

  • 오해관;서현우;김근영;위창현;송요탁;이기근;양상식
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2009년도 제40회 하계학술대회
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    • pp.1497_1498
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    • 2009
  • This paper presents the simulation of micro-lens arrays based on dry and wet etching technique. Code V (Optical Research Associates Ltd) simulation was performed to extract optimal design parameters of a Micro-Lens Array(MLA). Thickness of UV adhesive, wavelength of laser source, curvature, and shape of lens surface were chosen for the design parameters. The simulation results showed that focal length of a MLA decreased with the increase of UV adhesive thickness. And the focal length depended on shape of lens surface and length of laser source.

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감광성유리를 이용한 마이크로머시닝 기술 (Micromachining technology using photosensitive glass)

  • 조수제
    • 한국레이저가공학회지
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    • 제14권1호
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    • pp.25-29
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    • 2011
  • Micromachining of photosensitive glass by UV exposure, heat treatment, and etching processes is reported. Like photoresist, the photosensitive glass is also classified into positive and negative types by development characteristics. For the positive type, the exposed area is crystallized and etched away during the etching process in HF solution, whereas the unexposed area is crystallized and etched away for the negative type. The crystallized area of the photosensitive glass has an etch rate approximately 30~100 times faster than that of the amorphous area so that it becomes possible to fabricate microstructures in the glass. Based on the unique properties of glass such as high optical transparency, electrical insulation, and chemical/thermal stability, the glass micromachining technique introduced in this work could be widely applied to various devices in the fields of electronics, bio engineering, nanoelectonics and so on.

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SLS형 쾌속조형기를 이용한 미세구조 몰드 제작 (Fabrication of micro structure mold using SLS Rapid Prototyping)

  • 유홍진;김동학;장석원;김태완
    • 한국산학기술학회논문지
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    • 제5권2호
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    • pp.186-190
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    • 2004
  • Nano size 몰드의 제작은 X-ray lithography 방법을 이용하여 몰드를 제작하고, micro size의 경우 Deep UV lithography 방법을 이용하여 몰드를 제작하고 있다. 본 연구에서는 SLS(Selective Laser Sintering)형 RP(Rapid Prototyping System)을 이용하여 미세구조 몰드를 제작하였으며, 패턴의 깊이는 400 ㎛까지 구현하였다. 제작된 몰드의 강도와 내열성을 높이기 위하여 전해도금을 이용하여 몰드의 표면에 Ni를 300 ㎛생성 시켰다.

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$^1$Highly-crystalline $sp^3$-bonded 5H-BN prepared by plasma-packets assisted pulsed-laser deposition: a room-temperature UV light-emitter at 225nm

  • Komatsu, Shojiro
    • 한국결정학회:학술대회논문집
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    • 한국결정학회 2003년도 춘계학술연구발표회
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    • pp.6-6
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    • 2003
  • Highly crystalline 5H-polytypic form of sp3-bonded boron nitride (BN) was grown by pulsed-laser-vaporization of BN, where synchronous reactive-plasma packets assisted the crystal growth in the vapor phase. The structure of the product crystallites (˙5 micrometers) was confirmed by using transmission electron diffraction and electron energy loss spectroscopy. This material proved to have a sharp and dominant band at 225 nm by cathode luminescence at room temperatures and corresponding monochromatic images revealed that they uniformly emitted the ultraviolet light. Considering that cubic BN has already been doped as p- and n- type semiconductors, this material may be applied to the light-emitting devices working at almost the deepest limit of the UV region that is functional without vacuum.

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Buffered Oxide Etch 세정에 의한 다결정 실리콘 TFT의 전기적 특성 개선 (Improvement of the Electrical Characteristics of a Polysilicon TFT Using Buffered Oxide Etch Cleaning)

  • 남영묵;배성찬;최시영
    • 대한전자공학회논문지SD
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    • 제41권8호
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    • pp.31-36
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    • 2004
  • 본 논문에서는 UV 처리와 BOE 세정을 이용하여 레이저 어닐링 전의 실리콘 표면에 자연 산화막을 제거하여 다결정 실리콘 TFT의 신뢰성을 향상시키는 방법을 제안하였다. 전처리 공정이 다결정 실리콘의 표면 거칠기에 미치는 영향을 AFM으로 측정하였으며, 다결정 실리콘 TFT의 전기적 특성인 스위칭 특성과 항복특성을 대형 유리기판의 위치와 전처리의 유무에 대해서 조사하였다.

Deep UV 마이크로 리소그라피용 Stepper를 위한 4구면 반사경계 (Four Spherical Mirror Stepper Optics for Deep UV Micro-Lithography)

  • 조영민;이상수;박성찬
    • 한국광학회지
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    • 제2권4호
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    • pp.186-192
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    • 1991
  • 엑시머 레이저빔($\lambda$ 0.248$\mu\textrm{m}$)을 사용하여 micro-lithography를 위해 축소배율 $5\times$를 갖는 4개의 구면으로 구성된 반사경계를 설계하였다. 먼저 초기광학계로서 Seidel 3차 수차 내에서 구면수차, 코마, 상면만곡, 왜곡수차가 제거된 4구면경계를 해석적으로 구하였다. 이 초기광학계의 성능 향상을 위해 컴퓨터를 이용한 최적화 기법을 사용하였고 그 결과 KrF 엑시머 레이저 광에 대해 N.A. 0.15와 image field diameter 3.3 mm 이내에서 회절 한계까지 제거된 수차 성능을 얻었다.

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비접촉식 지표면 화학 오염 탐지용 라만 분광시스템 설계 및 성능확인 (The Design and Test of the Stand-off Surface Chemical Contaminant Detection System based on Raman Spectroscopy)

  • 고영진
    • 한국군사과학기술학회지
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    • 제22권3호
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    • pp.433-440
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    • 2019
  • In order to detect toxic chemical spread on field ground, we developed stand-off Raman spectrometer system which employed a deep UV laser. In this paper, the design and specification of various components in the spectrometer system are described. Some results when the detection system was tested on the outdoor roads are shown, which may help researching stand-off chemical detectors based on Raman spectroscopy.

Effect of Laser Beam on Structural, Optical, and Electrical Properties of BaTiO3 Nanoparticles during Sol-Gel Preparation

  • Mostafa, Massaud;Ebnalwaled, Khaled;Saied, Hussien A.;Roshdy, Reham
    • 한국세라믹학회지
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    • 제55권6호
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    • pp.581-589
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    • 2018
  • This work concentrated on the effect of different laser beams on the microstructure and dielectric properties of $BaTiO_3$ nanoparticles at different calcinations times during the gelling preparation step. The nanoparticles were prepared by the sol-gel method. A green (1000 mW, 532 nm) and red laser beam (500 mW, 808 nm), were applied vertically at the center of stirring raw materials. The samples were sintered at $1000^{\circ}C$ for 2, 4, and 6 h. X-ray diffraction (XRD) analysis showed that samples prepared under the green laser have the highest purity. The FT-IR spectra showed that the stretching and bending vibrations of TiO bond without any other bonds, which are compatible to the X-ray diffraction (XRD) results. Samples were characterized by transmission electron microscopy (TEM), Scan electron microscopy (SEM), and UV-Visible spectrophotometer. Characterization showed the samples prepared under the green laser to have the highest particle size (~ 50 nm) and transparency for all sintering durations. Laser beam effects on electrical characterization were studied. BT nanoparticles prepared under the green laser show the higher dielectric constant, which was found to increase with sintering temperature.