• Title/Summary/Keyword: UV laser

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Cerenkov type second harmonic genration in poled polymer waveguide (폴링된 폴리머 광도파로를 이용한 cerenkov형 제2고조파 생성)

  • 김응수;조원주
    • Journal of the Korean Institute of Telematics and Electronics D
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    • v.35D no.8
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    • pp.62-68
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    • 1998
  • Optical broadband second harmonic genration (SHG) in thin film waveguide structure was investigated. The copolymer poly(MMA-co-DR1MA) which was consiste dof PMMA (polymethylmethacrylate) and DR 1 (disperse red 1) was spin coated on the pyrex substrate. The green and near UV SHG were observe dfrom the fundamental beam even though the poled polymer has the absorption in second harmonic wavelength range. It was able to genrate SHG by cerenkov type phase matching. Th epoled polymer film thickness was decided by theoretical analysis. The green (532nm) and near UV SHG (370nm) were observed from the Q-switched Nd-YAG laser (1064nm) and Ti-sapphire laser (740nm). It was in good agreement with the experimental results.

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The beam property simulation for the fabrication of a MLA(Micro Lens Array) (MLA(Micro Lens Array) 제작을 위한 광학 시뮬레이션)

  • Oh, Hae-Kwan;Seo, Hyun-Woo;Kim, Geun-Young;Wei, Chang-Hyun;Song, Yo-Tak;Lee, Kee-Keun;Yang, Sang-Sik
    • Proceedings of the KIEE Conference
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    • 2009.07a
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    • pp.1497_1498
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    • 2009
  • This paper presents the simulation of micro-lens arrays based on dry and wet etching technique. Code V (Optical Research Associates Ltd) simulation was performed to extract optimal design parameters of a Micro-Lens Array(MLA). Thickness of UV adhesive, wavelength of laser source, curvature, and shape of lens surface were chosen for the design parameters. The simulation results showed that focal length of a MLA decreased with the increase of UV adhesive thickness. And the focal length depended on shape of lens surface and length of laser source.

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Micromachining technology using photosensitive glass (감광성유리를 이용한 마이크로머시닝 기술)

  • Cho, Soo-Je
    • Laser Solutions
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    • v.14 no.1
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    • pp.25-29
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    • 2011
  • Micromachining of photosensitive glass by UV exposure, heat treatment, and etching processes is reported. Like photoresist, the photosensitive glass is also classified into positive and negative types by development characteristics. For the positive type, the exposed area is crystallized and etched away during the etching process in HF solution, whereas the unexposed area is crystallized and etched away for the negative type. The crystallized area of the photosensitive glass has an etch rate approximately 30~100 times faster than that of the amorphous area so that it becomes possible to fabricate microstructures in the glass. Based on the unique properties of glass such as high optical transparency, electrical insulation, and chemical/thermal stability, the glass micromachining technique introduced in this work could be widely applied to various devices in the fields of electronics, bio engineering, nanoelectonics and so on.

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Fabrication of micro structure mold using SLS Rapid Prototyping (SLS형 쾌속조형기를 이용한 미세구조 몰드 제작)

  • 유홍진;김동학;장석원;김태완
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.5 no.2
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    • pp.186-190
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    • 2004
  • By this time, a mold with nano size pattern was produced using a fabrication of X-ray lithography method and in a m icro size's case it was produced using fabrication of Deep UV lithography. In this paper, we produced mold with 400 $\mu{m}$depth pattern using a new technology of SLS(Selective Laser Sintering) Rapid Prototyping method. In addition to enhance strength and thermal stability, we produced Ni structure with a thickness of 300 $\mu{m}$ on a surface of mold using electro forming method.

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$^1$Highly-crystalline $sp^3$-bonded 5H-BN prepared by plasma-packets assisted pulsed-laser deposition: a room-temperature UV light-emitter at 225nm

  • Komatsu, Shojiro
    • Proceedings of the Korea Crystallographic Association Conference
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    • 2003.05a
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    • pp.6-6
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    • 2003
  • Highly crystalline 5H-polytypic form of sp3-bonded boron nitride (BN) was grown by pulsed-laser-vaporization of BN, where synchronous reactive-plasma packets assisted the crystal growth in the vapor phase. The structure of the product crystallites (˙5 micrometers) was confirmed by using transmission electron diffraction and electron energy loss spectroscopy. This material proved to have a sharp and dominant band at 225 nm by cathode luminescence at room temperatures and corresponding monochromatic images revealed that they uniformly emitted the ultraviolet light. Considering that cubic BN has already been doped as p- and n- type semiconductors, this material may be applied to the light-emitting devices working at almost the deepest limit of the UV region that is functional without vacuum.

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Improvement of the Electrical Characteristics of a Polysilicon TFT Using Buffered Oxide Etch Cleaning (Buffered Oxide Etch 세정에 의한 다결정 실리콘 TFT의 전기적 특성 개선)

  • 남영묵;배성찬;최시영
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.41 no.8
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    • pp.31-36
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    • 2004
  • we developed a technique to manufacture more reliable polycrystalline silicon TFT-LCDs using UV cleaning and buffered oxide etch(BOE) cleaning which remove the native oxide of the silicon surface before laser annealing. To investigate the effects of pre-treatments on the surface roughness of polycrystalline silicon, we measured atomic force microscopy(AFM). Also the electrical characteristics of polysilicon TFTs, breakdown characteristic and switching Performance, were tested for various pre-treatment conditions and several locations in large glass substrate.

Four Spherical Mirror Stepper Optics for Deep UV Micro-Lithography (Deep UV 마이크로 리소그라피용 Stepper를 위한 4구면 반사경계)

  • 조영민;이상수;박성찬
    • Korean Journal of Optics and Photonics
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    • v.2 no.4
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    • pp.186-192
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    • 1991
  • For the micro-lithography using a excimer laser beam $(\lambda\leq0.248$\mu\textrm{m})$. a mirror system consisting of four spherical surfaces with reductlon magnification 5X is designed. Initially the aplanat, flat field and the distortion free condition of the system are analytically investigated within Seidel 3rd order aberrations. And the computer-aided optimization technique has been employed for the further improved performance of the system. The final system has N.A. of 0.15 and image field diameter 3.3 mm, and has the diffraction-limited performance for KrF eximer laser beam.

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The Design and Test of the Stand-off Surface Chemical Contaminant Detection System based on Raman Spectroscopy (비접촉식 지표면 화학 오염 탐지용 라만 분광시스템 설계 및 성능확인)

  • Koh, Young Jin
    • Journal of the Korea Institute of Military Science and Technology
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    • v.22 no.3
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    • pp.433-440
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    • 2019
  • In order to detect toxic chemical spread on field ground, we developed stand-off Raman spectrometer system which employed a deep UV laser. In this paper, the design and specification of various components in the spectrometer system are described. Some results when the detection system was tested on the outdoor roads are shown, which may help researching stand-off chemical detectors based on Raman spectroscopy.

Effect of Laser Beam on Structural, Optical, and Electrical Properties of BaTiO3 Nanoparticles during Sol-Gel Preparation

  • Mostafa, Massaud;Ebnalwaled, Khaled;Saied, Hussien A.;Roshdy, Reham
    • Journal of the Korean Ceramic Society
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    • v.55 no.6
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    • pp.581-589
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    • 2018
  • This work concentrated on the effect of different laser beams on the microstructure and dielectric properties of $BaTiO_3$ nanoparticles at different calcinations times during the gelling preparation step. The nanoparticles were prepared by the sol-gel method. A green (1000 mW, 532 nm) and red laser beam (500 mW, 808 nm), were applied vertically at the center of stirring raw materials. The samples were sintered at $1000^{\circ}C$ for 2, 4, and 6 h. X-ray diffraction (XRD) analysis showed that samples prepared under the green laser have the highest purity. The FT-IR spectra showed that the stretching and bending vibrations of TiO bond without any other bonds, which are compatible to the X-ray diffraction (XRD) results. Samples were characterized by transmission electron microscopy (TEM), Scan electron microscopy (SEM), and UV-Visible spectrophotometer. Characterization showed the samples prepared under the green laser to have the highest particle size (~ 50 nm) and transparency for all sintering durations. Laser beam effects on electrical characterization were studied. BT nanoparticles prepared under the green laser show the higher dielectric constant, which was found to increase with sintering temperature.