• Journal of radiological science and technology
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• v.33 no.3
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• pp.179-184
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• 2010

A hard X-ray microscope system for obtaining images of nano-spatial resolution has been widely studied and requires monochromatic X-ray. A multilayer mirror of 84% reflectivity was designed to acquire tungsten characteristic X-ray of 8.4 keV from the white beam generated from an X-ray tube, and the C/W multilayer mirror of $50{\times}50\;mm$ size and 5.65 nm d-spacing was fabricated by the ion-beam sputtering system. The C/W multilayer had a uniformity of 99.5%, and the structure of the multilayer mirror was verified by a TEM image. The obtainable x-ray reflectivity for the C/W multilayer mirror at 8.4 keV was estimated from measuring the X-ray reflectivity using the copper characteristic X-ray of 8.05 keV. Monochromatic X-ray of 8.4 keV was generated by combining a X-ray tube, and the reflectivity and monochromaticity were 77.1% and 0.21 keV, respectively. Monochromatic X-ray generated from the combination of an X-ray tube and an C/W multilayer mirror has enough potential to use X-ray source for hard X-ray microscope system of laboratory size. If the C/W multilayer mirror of d-spacing of a few nanometers can be fabricated, monochromatic X-ray corresponded to 17.5 keV, molybdenum characteristic X-ray, can be obtained and applied to mammography in the medical application.

• Journal of the Korean Society of Radiology
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• v.5 no.6
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• pp.409-413
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• 2011

An X-ray tube used an X-ray fluorescence analysis system has a low X-ray photon intensity which results in reducing measurement accuracy and increasing exposure time. These shortages can be overcame by using a monocapillary optics. A monocapillary optics was optimally designed for focusing the characteristic X-ray of tungsten (8.4 keV). The monocapillary optics can achieve a gain of 10 at the least. The monocapillary optics was fabricated by using puller and pyrex glass, raw material. In fabrication, a weigh of 45g and a temperature of $650^{\circ}$ was loaded. The total fabrication time was 460 minutes. The fabricated capillary had 87 mm in length and maximum diameter of 300 ${\mu}m$ and minimum diameter of 192 ${\mu}m$. When the fabricated monocapillary optics is applied to an X-ray fluorescence analysis system, the detection accuracy for soft elements, for example sulfur (S), will be improved.

• Proceedings of the Korean Vacuum Society Conference
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• 1999.07a
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• pp.151-151
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• 1999

금속-산화막-반도체(MOS) 소자를 이용하는 집적회로의 발전은 게이트 금속의 규격 감소를 필요로 한다. 규격감소에 따른 저항 증가가 중요한 문제점으로 대두되었으며, 그동안 여러 연구자들에 의하여 금속 게이트에 관련된 연구가 진행되어 왔다. 특히 저항이 낮으며 녹는점이 매우 높은 내화성금속(refractory metal)인 텅스텐(tungsten, W)이 차세대 MOS 소자의 유력한 대체 게이트 금속으로 제안되었다. 텅스텐은 스퍼터링(sputtering)과 화학기상 증착(CVD) 방식을 이용하여 성장시킬 수 있다. 스퍼터링에 의한 텅스텐 증착은 산화막과의 접착성은 우수한 반면에 증착과정 동안에 게이트 산화막(SiO2)에 손상을 주어 게이트 산화막의 특성을 열화시킬 수 있다. 반면, 화학기상 증차에 의한 텅스텐 성장은 스퍼터링보다 증착막의 저항이 상대적으로 낮으나 산화막과의 접착성이 좋지 않은 문제를 해결하여야 한다. 본 연구에서는 감압 화학기상 증착(LPCVD)방식을 이용하여 텅스텐 게이트 금속을 100~150$\AA$ 두께의 게이트 산화막(SiO2 또는 N2O 질화막)위에 증착하여 물리 및 전기적 특성을 분석하였다. 물리적 분석을 위하여 XRD, SEM 및 저항등이 증착 조건에 따라서 측정되었으며, 텅스텐 게이트로 구성된 MOS 캐패시터를 제작하여 절연 파괴 강도, 전하 포획 메커니즘 등과 같은 전기적 특성 분석을 실시하였다. 특히 텅스텐의 접착성을 증착조건의 변화에 따라서 분석하였다. 텅스텐 박막의 SiO2와의 접착성은 스카치 테이프 테스트를 실시하여 조사되었고, 증착시의 기판의 온도에 민감하게 반응하는 것을 알 수 있었다. 또한, 40$0^{\circ}C$ 이상에서 안정한 것을 볼 수 있었다. 텅스텐 박막은 $\alpha$ 및 $\beta$-W 구조를 가질 수 있으나 본 연구에서 성장된 텅스텐은 $\alpha$-W 구조를 가지는 것을 XRD 측정으로 확인하였다. 성장된 텅스텐 박막의 저항은 구조에 따라서 변화되는 것으로 알려져 있다. 증착조건에 따른 저항의 변화는 SiH4 대 WF6의 가스비, 증착온도에 따라서 변화하였다. 특히 온도가 40$0^{\circ}C$ 이상, SiH4/WF6의 비가 0.2일 경우 텅스텐을 증착시킨 후에 열처리를 거치지 않은 경우에도 기존에 발표된 저항률인 10$\mu$$\Omega$.cm 대의 값을 얻을 수 있었다. 본 연구를 통하여 산화막과의 접착성 문제를 해결하고 낮은 저항을 얻을 수 있었으나, 텅스텐 박막의 성장과정에 의한 게이트 산화막의 열화는 심각학 문제를 야기하였다. 즉, LPCVD 과정에서 발생한 불소 또는 불소 화합물이 게이트의 산화막에 결함을 발생시킴을 확인하였다. 향후, 불소에 의한 게이트 산화막의 열화를 최소화시킬 수 있는 공정 조건의 최저고하 또는 대체게이트 산화막이 적용될 경우, 개발된 연구 결과를 산업체로 이전할 수 있는 가능성이 높을 것을 기대된다.

• The Journal of the Korean dental association
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• v.53 no.9
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• pp.644-655
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• 2015

Purpose: This study was conducted to evaluate the effect of the fixture abutment connection type and diameter on the screw joint stability in external butt joint for 2nd surgery and internal cone connected type implant system for 1st and 2nd surgery using ultimate fracture strength. Materials and Methods: USII system, SSII system and GSII system of Osstem Implant were used. Each system used the fixture with two different diameters and cement-retained abutments, and tungsten carbide / carbon coated abutment screws were used. Disc shaped stainless steel metal tube was attached using resin-based temporary cement. The experimental group was divided into seven subgroups, including the platform switching shaped specimen that uses a regular abutment in the fixture with a wide diameter in USII system. A static load was increased to the metal tube at 5mm deviated point from the implant central axis until it reached the compression bending strength at a rate of 1mm/min. Then the deformations and patterns of fracture in threaded connection were compared. Results and Conclusion: 1. In the comparison between the Regular diameter, compression bending strength of SSII system was higher than USII system and GSII system. There was no significant difference between USII system and GSII system. 2. In the comparison between wide diameter, compression bending strength was increased in the order of GSII system, USII system, and SSII system. 3. In comparison between the implant diameter, compression bending strength of the wide diameter was greater than the regular diameter in any system(P<0.05). 4. There was no significant difference between the platform switching (III group) and the regular diameter (I group) in USII system. 5. In USII system, fracture of abutment screw and deformation of both fixture and abutment were observed in I, II and III subgroups. 6. Failure pattern of SSII system, which was the fracture of abutment screw and deformation of the abutment and fixture, was observed in both IV and V subgroups. Fracture of some fixtures was observed in subgroup V. 7. Failure pattern of GSII system, which was the fracture of the abutment screw and deformation of the fixture and the abutment, was observed in both VI and VII subgroups. Apart from other subgroups, subgroup VII demonstrated no bending neither the fracture at the top of the fixture. The compressive deformation of internal slope in the fixture was the only thing observed in subgroup VII.

• Journal of Radiation Protection and Research
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• v.28 no.4
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• pp.263-270
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• 2003

Monte Carlo simulation has been peformed to induce optimized parameters of the detector head of gamma camera for the diagnosis of breast cancer and to evaluate it under the diagnosis condition of the breast cancer. For the simulation, we used Tungsten collimator, having a lattice structured array with holes of $3mm{\times}3mm$ and septal thickness of 0.25 mm, which are corresponding to the pixellated photosensor. For driving optimum parameters we used Trade-Offs procedure between the geometric efficiency and the spatial resolution, varying the detector head components. In order to pre-evaluate the performance of the optimized detector head, we assumed diagnosis condition that the breast tumor is located in the middle of phantom with various sizes and its location is 25 mm from the collimator surface, considering background count caused by radiation sources from other organs. It was shown that the performance of the optimized detector head can be degraded according to the breast cancer size and the background count under real diagnosis conditions of breast cancer. Therefore, it is concluded that the spatial resolution, which is used as an indicator to distinguish the various sizes of breast cancer and is dependent on the characteristic of the detector head, appears to be meaningless in early diagnosis of the breast cancer.

• Journal of the Korean Society of Safety
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• v.32 no.2
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• pp.34-37
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• 2017

In recent emerging industry, Display field becomes bigger and bigger, and also semiconductor technology becomes high density integration. In Flat Panel Display, there is an issue that electrostatic phenomenon results in fine dust adsorption as electrostatic capacity increases due to bigger size. Destruction of high integrated circuit and pattern deterioration occur in semiconductor and this causes the problem of weakening of thermal resistance. In order to solve this sort of electrostatic failure in this process, Soft X-ray ionizer is mainly used. Soft X-ray Ionizer does not only generate electrical noise and minute particle but also is efficient to remove electrostatic as it has a wide range of ionization. X-ray Generating efficiency has an effect on soft X-ray Ionizer affects neutralizing performance. There exist variable factors such as type of anode, thickness, tube voltage etc., and it takes a lot of time and financial resource to find optimal performance by manufacturing with actual X-ray tube source. MCNPX (Monte Carlo N-Particle Extended) is used for simulation to solve this kind of problem, and optimum efficiency of X-ray generation is anticipated. In this study, X-ray generation efficiency was measured according to target material thickness using MCNPX under the conditions that tube voltage is 5 keV, 10 keV, 15 keV and the target Material is Tungsten(W), Gold(Au), Silver(Ag). At the result, Gold(Au) shows optimum efficiency. In Tube voltage 5 keV, optimal target thickness is $0.05{\mu}m$ and Largest energy of Light flux appears $2.22{\times}10^8$ x-ray flux. In Tube voltage 10 keV, optimal target Thickness is $0.18{\mu}m$ and Largest energy of Light flux appears $1.97{\times}10^9$ x-ray flux. In Tube voltage 15 keV, optimal target Thickness is $0.29{\mu}m$ and Largest energy of Light flux appears $4.59{\times}10^9$ x-ray flux.

• Applied Science and Convergence Technology
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• v.26 no.5
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• pp.118-128
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• 2017

The scope of this work is to determine and compare the effect of electron temperature ($T_e$) and number density ($N_e$) on the yield rate and concentration of reactive chemical species ($^{\bullet}OH$, $H_2O_2$ and $O_3$) in an argon, air and oxygen injected negative DC (0-4 kV) capillary discharge with water flow(0.1 L/min). The discharge was created between tungsten pin-to pin electrodes (${\Phi}=0.5mm$) separated by a variable distance (1-2 mm) in a quartz capillary tube (2 mm inner diameter, 4 mm outer diameter), with various gas injection rates (100-800 sccm). Optical emission spectroscopy (OES) of the hydrogen Balmer lines was carried out to investigate the line shapes and intensities as functions of the discharge parameters such as the type of gas, gas injection rate and inter electrode gap distances. The intensity ratio method was used to calculate $T_e$ and Stark broadening of Balmer ${\beta}$ lines was adopted to determine $N_e$. The effects of $T_e$ and $N_e$ on the reactive chemical species formation were evaluated and presented. The enhancement in yield rate of reactive chemical species was revealed at the higher electron temperature, higher gas injection rates, higher discharge power and larger inter-electrode gap. The discharge with oxygen injection was the most effective one for increasing the reactive chemical species concentration. The formation of reactive chemical species was shown more directly related to $T_e$ than $N_e$ in a flowing water gas injected negative DC capillary discharge.

• Korean Journal of Materials Research
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• v.11 no.1
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• pp.27-33
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• 2001

The growth characteristics of 4-fold grain which was appeared in KLN deposition on $Pt/Ti/SiO_2/Si(100)$ substrate was studied by varying process variables. Substrate temperature, sputtering pressure, rf power were selected as process variables, and experiment was carried out near optimum fabrication condition. When using K and Li enriched target, the optimum fabrication conditions were substrate temperature of $600^{\circ}C$, sputtering pressure of 150mTorr, rf power of 100 W and its surface morphology is sensitively varied by small deposition condition changes. KLN is composed of elements which have large difference of boiling point. And it is difficult to fabricate thin film at high temperature and high vacuum deposition condition. Furthermore the phenomenon during deposition process can not be explained by using Thorton's model which explains the relation between thin film structure and melting point of thin film materials. These phenomenon can be explained using boiling point of elements which consist of thin film material.

• Journal of the Korean institute of surface engineering
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• v.46 no.4
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• pp.145-152
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• 2013

The growth behavior of nanocrystalline diamond (NCD) film has been studied for three different substrates, i.e. bare Si wafer, 1 ${\mu}m$ thick W and Ti films deposited on Si wafer by DC sputter. The surface roughness values of the substrates measured by AFM were Si < W < Ti. After ultrasonic seeding treatment using nanometer sized diamond powder, surface roughness remained as Si < W < Ti. The contact angles of the substrates were Si ($56^{\circ}$) > W ($31^{\circ}$) > Ti ($0^{\circ}$). During deposition in the microwave plasma CVD system, NCD particles were formed and evolved to film. For the first 0.5h, the values of NCD particle density were measured as Si < W < Ti. Since the energy barrier for heterogeneous nucleation is proportional to the contact angle of the substrate, the initial nucleus or particle densities are believed to be Si < W < Ti. Meanwhile, the NCD growth rate up to 2 h was W > Si > Ti. In the case of W substrate, NCD particles were coalesced and evolved to the film in the short time of 0.5 h, which could be attributed to the fact that the diffusion of carbon species on W substrate was fast. The slower diffusion of carbon on Si substrate is believed to be the reason for slower film growth than on W substrate. The surface of Ti substrate was observed as a vertically aligned needle shape. The NCD particle formed on the top of a Ti needle should be coalesced with the particle on the nearby needle by carbon diffusion. In this case, the diffusion length is longer than that of Si or W substrate which shows a relatively flat surface. This results in a slow growth rate of NCD on Ti substrate. As deposition time is prolonged, NCD particles grow with carbon species attached from the plasma and coalesce with nearby particles, leaving many voids in NCD/Ti interface. The low adhesion of NCD films on Ti substrate is related to the void structure of NCD/Ti interface.

• Restorative Dentistry and Endodontics
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• v.27 no.5
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• pp.488-492
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• 2002

The purpose of this study was to evaluate the effectiveness of plasma arc curing (PAC) unit for composite and compomer curing. To compare its effectiveness with conventional quartz tungsten halogen (QTH) light curing unit, the polymerization shrinkage rates and amounts of three composites (Z100, Z250, Synergy Duo Shade) and one compomer, that had been light cured by PAC unit or QTH unit, was compared using a custome made linometer. The measurement of polymerization shrinkage was peformed after polymerization with either QTH unit or PAC unit. In case of curing with the PAC unit, the composite was light cured with Apollo 95E for 6s, the power density of which was recorded as 1350 mW/$\textrm{cm}^2$ by Coltolux Light Meter. For light curing with QTH unit, the composite was light cured for 30s with the XL2500, the power density of which was recorded as 800 mW/$\textrm{cm}^2$ by Coltolux Light Meter. The amount of linear polymerization shrinkage was recorded in the computer every 0.5s for 60s. Ten measurements were made for each material. The amount of linear polymerization shrinkage for each material in 10s and 60s which were cured with PAC or QTH unit were compared with t test. The amount of polymerization shrinkage in the tested materials were compared with 1way ANOVA with Duncan's multiple range test. As for the amounts of polymerization shrinkage in 60s, there was no difference between PAC unit and QTH unit in Z250 and Synergy Duo Shade. In Z100 and Dyract AP, it was lower when it was cured with PAC unit than when it was cured with QTH unit (p<0.05). As for the amounts of polymerization shrinkage in 10s, there was no difference between PAC unit and QTH unit in Z100 and Dyract AP. The amounts of polymerization shrinkage was significantly higher when it was cured with PAC unit in Z250 and Synergy Duo Shade (p<0.05). The amounts of polymerization shrinkage in the tested materials when they were cured with QTH unit were Z250 (6.6um) < Z100 (9.3um), Dyract AP (9.7um) < Synergy Duo Shade (11.2um) (p<0.05). The amount of polymerization shrinkage when the materials were cured with PAC unit were Dyract AP (5.6um) < Z100 (8.1um), Z250(7.0um) < Synergy Duo Shade (11.2um) (p<0.05).