• 제목/요약/키워드: Trichlorosilane

검색결과 23건 처리시간 0.018초

Internal Energy Distributions of OH Products in the Reaction of O(3PJ) with HSiCl3

  • Kwak, Hyon-Tae;Ha, Seung-Chul;Jang, Sung-Woo;Kim, Hong-Lae;Park, Chan-Ryang
    • Bulletin of the Korean Chemical Society
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    • 제30권2호
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    • pp.429-434
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    • 2009
  • The OH($X^2{\Pi},\;{\nu}$"=0, 1) internal state distributions from the reaction of electronically ground state oxygen atoms with HSi$Cl_3$ were measured using laser-induced fluorescence. The ground-state O$(^3P_J)$ atoms with kinetic energies above the reaction barrier were produced by photolysis of N$O_2$ at 355 nm. The OH product revealed strong vibrational population inversion, P(${\nu}$"=1)/P(${\nu}$"=0) = 4.0 ${\pm}$ 0.6, and rotational distributions in both vibrational states exhibit substantial rotational excitations to the limit of total available energy. However, no preferential populations in either of the two $\Lambda$ doublet states were observed from the micropopulations, which supports a mechanism involving a direct abstraction of hydrogen by the atomic oxygen. It was also found that the collision energy between O and HSi$Cl_3$ is effectively coupled into the excitation of the internal degrees of freedom of the OH product ($$ = 0.62, and $<\;f_{rot}>$ = 0.20). The dynamics appear consistent with expectations for the kinematically constrained reaction which supports the reaction type, heavy + light-heavy $\rightarrow$ heavy-light + heavy (H + LH′ $\rightarrow$ HL + H′). The dynamics of oxygen atom collision with HSi$Cl_3$ are discussed in comparison to those with Si$H_4$.

나노임프린트를 이용한 바이오칩용 나노 패턴 제작 (Fabrication of Nanopatterns for Biochip by Nanoimprint Lithography)

  • 최호길;김순중;오병근;최정우
    • KSBB Journal
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    • 제22권6호
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    • pp.433-437
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    • 2007
  • 본 연구에서는 나노임프린트 리소그래피를 이용하여 500 nm line, 600 nm pore, $1{\mu}m$ pore, $2.5{\mu}m$ pore의 마이크로 수준에서 나노 수준에 이르는 다양한 크기와 모양의 nanopore 형태 패턴을 제작하였다. Thermal imprint 방식과 달리 상온, 저압에서 임프린팅이 가능하며 사용되는 스탬프의 수명을 늘리고 보다 미세하고 복잡한 형태의 패턴을 제작할 수 있는 UV-assisted imprint 방식을 사용하였다. E-beam lithography로 패턴을 각인한 quartz소재의 스탬프를 사용하였으며 스탬프의 재질이 투명하여 UV 조사시 UV curable resin이 경화될 수 있도록 하였다. 또한 스탬프의 표면을 (heptadecafluoro-1,1,2,2-tetrahydrodecyl) trichlorosilane의 monolayer 층으로 미리 코팅하여 임프린트 후 스탬프와 기판과의 releasing을 쉽게함과 동시에 패턴의 일부가 스탬프에 묻어 나와 전사된 패턴에 defect가 없도록 하였다. 또한, gold를 미리 증착하여 임프린팅함으로써 lift-off 시에 필요한 hi-layer 층이 필요 없게 되어 산소 플라즈마를 이용한 에칭이 더욱 쉽고 lift-off 공정이 생략될 수 있도록 하였다. 나노임프린트 공정에 있어 가장 큰 문제점은 잔여층의 생성이며 이러한 잔여층을 제거하고자 산소 플라즈마 에칭을 하였다. 에칭공정을 통해 gold의 표면이 완전히 드러났으며 산소 플라즈마를 통해 gold의 표면이 친수성으로 바뀌어 추후 단백질 고정화를 더욱 쉽게 하였다. 그리하여 나노임프린트 기술을 이용해 나노크기의 바이오소자 제작을 가능하게 하였다.

열 나노임프린트 리소그래피에서의 몰드와 열가소성 폴리머 필름 사이의 응착 특성 (Adhesion Characteristics between Mold and Thermoplastic Polymer Film in Thermal Nanoimprint Lithography)

  • 김광섭;강지훈;김경웅
    • Tribology and Lubricants
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    • 제24권5호
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    • pp.255-263
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    • 2008
  • Adhesion tests were conducted to investigate the adhesion characteristics between mold and thermoplastic polymer film. Coating of anti-sticking layer (ASL), a kind of polymer material, imprint pressure, and separation velocity were considered as the process conditions. A piece of fused silica without patterns on its surface was used as a mold and the thermoplastic polymer films were made on Si substrate by spin-coating the commercial polymer solution such as mr-I PMMA and mr-I 7020. The ASL was derived from (1H, 1H, 2H, 2H - perfluorooctyl) trichlorosilane($F_{13}$-OTS) and coated on the fused silica mold in vapor phase. The pull-off force was measured in various process conditions and the surfaces of the mold and the polymer film were observed after separation. It was found that the adhesion characteristics between the mold and the thermoplastic polymer film and the release performance of ASL were changed according to the process conditions. The ASL was effective to reduce the pull-off force and the damage of polymer film. In cases of the mold coated with ASL, the pull-off force did not depend on imprint pressure and separation velocity.