• Title/Summary/Keyword: Trichlorosilane

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Internal Energy Distributions of OH Products in the Reaction of O(3PJ) with HSiCl3

  • Kwak, Hyon-Tae;Ha, Seung-Chul;Jang, Sung-Woo;Kim, Hong-Lae;Park, Chan-Ryang
    • Bulletin of the Korean Chemical Society
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    • v.30 no.2
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    • pp.429-434
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    • 2009
  • The OH($X^2{\Pi},\;{\nu}$"=0, 1) internal state distributions from the reaction of electronically ground state oxygen atoms with HSi$Cl_3$ were measured using laser-induced fluorescence. The ground-state O$(^3P_J)$ atoms with kinetic energies above the reaction barrier were produced by photolysis of N$O_2$ at 355 nm. The OH product revealed strong vibrational population inversion, P(${\nu}$"=1)/P(${\nu}$"=0) = 4.0 ${\pm}$ 0.6, and rotational distributions in both vibrational states exhibit substantial rotational excitations to the limit of total available energy. However, no preferential populations in either of the two $\Lambda$ doublet states were observed from the micropopulations, which supports a mechanism involving a direct abstraction of hydrogen by the atomic oxygen. It was also found that the collision energy between O and HSi$Cl_3$ is effectively coupled into the excitation of the internal degrees of freedom of the OH product ($$ = 0.62, and $<\;f_{rot}>$ = 0.20). The dynamics appear consistent with expectations for the kinematically constrained reaction which supports the reaction type, heavy + light-heavy $\rightarrow$ heavy-light + heavy (H + LH′ $\rightarrow$ HL + H′). The dynamics of oxygen atom collision with HSi$Cl_3$ are discussed in comparison to those with Si$H_4$.

Fabrication of Nanopatterns for Biochip by Nanoimprint Lithography (나노임프린트를 이용한 바이오칩용 나노 패턴 제작)

  • Choi, Ho-Gil;Kim, Soon-Joong;Oh, Byung-Ken;Choi, Jeong-Woo
    • KSBB Journal
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    • v.22 no.6
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    • pp.433-437
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    • 2007
  • A constant desire has been to fabricate nanopatterns for biochip and the Ultraviolet-nano imprint lithography (UV-NIL) is promising technology especially compared with thermal type in view of cost effectiveness. By using this method, nano-scale to micro-scale structures also called nanopore structures can be fabricated on large scale gold plate at normal conditions such as room temperature or low pressure which is not possible in thermal type lithography. One of the most important methods in fabricating biochips, immobilizing, was processed successfully by using this technology. That means immobilizing proteins only on the nanopore structures based on gold, not on hardened resin by UV is now possible by utilizing this method. So this selective nano-patterning process of protein can be useful method fabricating nanoscale protein chip.

Adhesion Characteristics between Mold and Thermoplastic Polymer Film in Thermal Nanoimprint Lithography (열 나노임프린트 리소그래피에서의 몰드와 열가소성 폴리머 필름 사이의 응착 특성)

  • Kim, Kwang-Seop;Kang, Ji-Hoon;Kim, Kyung-Woong
    • Tribology and Lubricants
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    • v.24 no.5
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    • pp.255-263
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    • 2008
  • Adhesion tests were conducted to investigate the adhesion characteristics between mold and thermoplastic polymer film. Coating of anti-sticking layer (ASL), a kind of polymer material, imprint pressure, and separation velocity were considered as the process conditions. A piece of fused silica without patterns on its surface was used as a mold and the thermoplastic polymer films were made on Si substrate by spin-coating the commercial polymer solution such as mr-I PMMA and mr-I 7020. The ASL was derived from (1H, 1H, 2H, 2H - perfluorooctyl) trichlorosilane($F_{13}$-OTS) and coated on the fused silica mold in vapor phase. The pull-off force was measured in various process conditions and the surfaces of the mold and the polymer film were observed after separation. It was found that the adhesion characteristics between the mold and the thermoplastic polymer film and the release performance of ASL were changed according to the process conditions. The ASL was effective to reduce the pull-off force and the damage of polymer film. In cases of the mold coated with ASL, the pull-off force did not depend on imprint pressure and separation velocity.