• 한국재료학회지
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• 제17권10호
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• pp.516-520
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• 2007

Indium tin oxide, which is used as transparent conducting layer in flexible device, is deposited on PET film by a magnetron sputtering in 300 mm wide roll-to-roll process (vacuum web coating). Sheet resistance, specific resistance and transmittance is differed by sputtering parameters such as working pressures, oxygen partial pressure, and thickness of ITO layer. ITO layer is deposited about 90 nm at roll speed of 0.24 m/min and its sputtering power is 3 kW. From the XRD spectrum deposited ITO layer is verified as amorphous. Under working pressure varied from $3{\times}10^{-4}\;Torr$ to $2{\times}10^{-3}\;Torr$, sheet resistance is lowest at the working pressure of $1{\times}10^{-3}\;Torr$ and its value is from $110\;{\Omega}/{\square}$ to $260\;{\Omega}/{\square}$ at the thickness of 90 nm. Oxygen partial pressure also varies sheet resistance and is optimized at the regime from 0.2% ($1.8{\times}10^{-6}\;Torr$) to 0.6% ($6{\times}10^{-6}\;Torr$). In this oxygen partial pressure sheet resistance is lower than $150\;{\Omega}/{\square}$. As ITO layer thickness increases, sheet resistance decreases down to $21\;{\Omega}/{\square}$ and specific resistance is about $7.5{\times}10.4{\Omega}cm$ in 340 nm thickness ITO layer. Transmittance is measured at the wavelength of 550 nm and is about 90% for 180 nm thickness ITO/PET.

• 한국표면공학회지
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• 제47권5호
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• pp.239-243
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• 2014

The electrical and optical properties of amorphous In-Tin-Zinc-Oxide(ITZO) deposited at room temperature using rf-magnetron sputtering were investigated. The amorphous ITZO thin films were obtained at the composition of In:Sn:Zn = 6:2:2, 4:3:3, and 2:4:4, but the ITZO (8:1:1) showed a crystalline phase of bixbyite structure of In2O3. The resistivity of ITZO could be controlled by oxygen pressure in the sputtering ambient. The resistivity of post-annealed ITZO thin films exhibited the dependence on the amount of Indium. Optical energy band gap and transmittance increased as the amount of indium in ITZO increased. For the device application with ITZO, the bottom-gated thin-film transistor using ITZO as a active channel layer was fabricated. It showed a threshold voltage of 1.42V and an on/off ratio of $5.63{\times}10^7$ operated with saturation field-effect mobility of $14.2cm^2/V{\cdot}s$.

• 한국컴퓨터그래픽스학회논문지
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• 제25권3호
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• pp.31-41
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• 2019

포그 스크린은 미세한 물방울들로 구성된 스크린으로 관찰자는 포그 스크린을 투과한 영상을 관찰하게 된다. 일반 스크린과는 달리 관찰자는 무대 위에서 연기자가 포그 스크린에 표시된 이미지를 뚫고 들어가는 모습을 볼 수 있다. 본 논문에서는 상부에서 생성된 포그 입자 집단이 중력에 의하여 아래로 떨어질 때 평평한 수직 스크린을 이루도록 하는 하향식 포그 스크린 생성 장치 구현 방법을 기술한다. 본 기법은 수조안에 배치된 초음파 진동자에 의해 수조 표면에서 포그 입자가 발생되는 원리를 이용한다. 생성된 포그 집단이 하나의 평면을 유지할 수 있도록 포그가 나오는 통로 출구 양옆에 가이드 바람을 형성하는 기법과 포그 스크린 생성 장치의 설계와 제작 방법을 기술한다.

• 한국정보통신학회논문지
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• 제26권6호
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• pp.897-906
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• 2022

본 논문에서는 LoRa 네트워크의 신뢰성과 처리율을 향상시킬 수 있는 다중 게이트웨이의 수신 응답 조화 전송 기법 HAT-LoRa를 제안한다. LoRa 네트워크는 알로하류의 매체 접근 제어를 사용하여 충돌에 매우 취약한데, 데이터 패킷은 여러 게이트웨이가 수신하여 전달률을 일정 부분 보장할 수 있지만 수신응답 패킷은 단일 게이트웨이를 통해서만 이루어진다. HAT-LoRa는 LoRaWAN의 여러 확산 인자로 동시에 패킷을 수신할 수 있는 특성을 이용하여 다중 게이트웨이가 다른 논리채널을 이용해 수신응답을 동시에 전송하여 증가된 수신 기회를 제공한다. 제안 기법은 단일 게이트웨이와 이중 게이트웨이 환경에서 수신 응답의 기대 전송 시간이 각각 최대 55%와 60%, 평균 35%와 40% 줄어드는 결과를 보인다. 특히, 단말과 여러 게이트웨이와의 거리가 비슷한 환경에서 높은 성능을 나타낸다.

• 한국기계가공학회지
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• 제21권1호
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• pp.95-101
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• 2022

This paper proposes a method to process the shape of an optical transmission road and attempts to determine the most suitable single processing method for an acrylic plate optical transmission road. In addition, by manufacturing an automatic pattern processing device to generate certain shapes on the acrylic plate at regular intervals, and measuring the illuminance of the patterned acrylic plate optical transmission road, the measured illuminance was confirmed to fall under the KS illuminance values presented in Table 1. In conclusion, when an incident light of approximately 20,000 lx is applied, the transmission illumination is approximately 200 lx, which represents a transmission rate of approximately 1% for incident light and corresponds to the KS illumination criterion F. Additionally, the right-angle triangular pyramid base size (A) processed at a temperature of 350 ℃ for one second was 2 mm, exhibiting the largest transmission illumination of 280 lx. When the transparent acrylic plate was set to a constant size of 1.6 mm at the bottom of the right-angle triangular pyramid, the fastest response occurred at a processing tip temperature of 350 ℃ (0.04 s). On the other hand, it took 10 s to process the size of the bottom of the right-angled triangular pyramid at a temperature of 200 ℃ to 1.6 mm, and it was confirmed that the optical transmission efficiency was significantly reduced because of the burr that occurred at this time.

• 한국전기전자재료학회논문지
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• 제36권2호
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• pp.191-196
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• 2023

In this paper, for the application of ultrasonic cleaners for cleaning dentures and transparent braces, Pb(Mn_1/3Nb_2/3)O₃-Pb(Ni_1/3 Nb_2/3)O₃-Pb(Zr,Ti)O₃ [PMN-PNN-PZT] system ceramics were manufactured and their dielectric and piezoelectric properties were investigated. Overall the best properties suitable for the device applications such as ultrasonic cleaner were obtained from the ceramics sintered at 920℃: bulk density of 7.8 g/cm³, the dielectric constant (ε_r) of 1,689, piezoelectric charge constant (d₃₃) of 433 pC/N, planar electromechanical coupling factor (k_p) of 0.64, mechanical quality factor (Qm) of 835, S₁₁^E of 13.37 (10^-12 N/m²), and Curie temperature of 315℃ By using the physical properties of this composition, the ultrasonic cleaner was designed and simulated using the commercial ATILA software. For the three-layered ceramics with the dimension of 25 mm × 25 mm × 2.5mm, an excellent displacement of 8.998 10^-3 m) and the sound pressure of 147.68 dB were recorded.

• 한국전자통신학회논문지
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• 제19권1호
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• pp.39-46
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• 2024

본 연구에서는 고주파 마그네트론 스퍼터링 법으로 공정압력을 1에서 7mTorr 로 변화시켜 가며 GTZO (Ga-Ti-Zn-O)박막을 제작하여, 구조적 특성과 전기적 및 광학적 특성을 조사하였다. XRD측정을 통해 공정압력에 무관하게 모든 GTZO박막이 c-축으로 우선 성장함을 확인할 수 있었고, 1mTorr 에서 제작한 GTZO 박막이 반가폭 0.38˚ 로 가장 우수한 결정성을 나타내었다. 가시광 영역(400~800 nm)에서의 평균 투과도는 공정압력에 상관없이 80% 이상의 값을 나타내었고, 공정압력이 증가함에 따라 캐리어 농도가 감소하고 이로 인해 에너지 밴드갭이 좁아지는 Burstein - Moss 효과도 관찰할 수 있었다. 공정압력 1mTorr 에서 증착한 GTZO박막의 재료 평가 지수는 9.08 × 10³ Ω^-1·cm^-1 로 가장 우수한 값을 나타내었고 이때 비저항과 가시광 영역에서의 평균 투과도는 각각 5.12 × 10^-4 Ω·cm 과 80.64 % 이었다.

• 공업화학
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• 제25권5호
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• pp.447-454
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• 2014

유기태양전지는 제조비용이 저렴하고 플렉서블 전자소자에 적용이 가능하다는 장점들로 인해 최근 많은 연구가 진행되고 있다. 일반적인 정구조의 태양전지(conventional structured solar cell)의 경우 10%대의 향상된 발전 효율을 보이고 있으나, 여전히 기타 Si 및 CIGS 등과 같은 태양전지에 비해 낮은 효율과 짧은 수명은 상용화의 걸림돌로 작용하고 있다. 일반적으로 유기태양전지의 짧은 수명은 유기물의 광산화뿐만 아니라 수분 및 산소에 의한 음극, 양극 소재의 부식으로 인한 소재/소자 열화 문제로 설명되어지고 있다. 한편 이와 같은 문제점을 해결하기 위해 새로운 소자 구조(역구조 태양 전지; Inverted structured solar cell)가 제안되었으며 전자 수송층 및 기능성 계면 소재 연구를 통한 발전 효율 및 수명 향상에 관한 연구가 꾸준히 되고 있다. 그 결과 최근 2D/3D 산화 아연(ZnO) 소재를 역구조 태양전지의 전자 수송층으로 적용하고 건,습식 표면 후처리를 통해 약 9% 수준의 발전효율을 달성하였다. 본 총설에서는 ZnO를 기반으로 하는 전자 수송층 소재의 연구 동향 및 역구조 태양전지의 효율 향상 기술에 관한 최신 연구 동향을 소개하고자 한다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 추계학술대회 논문집
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• pp.5-5
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• 2009

Thin-film-transistors (TFTs) that can be prepared at low temperatures have attracted much attention because of the great potential for transparent and flexible electronics. One of the mainstreams in this field is the use of organic semiconductors such as pentacene. But device performance of the organic TFTs is still limited due to low field-effect mobility and rapid degradation after exposing to air. Alternative approach is the use of amorphous oxide semiconductors as a channel. Amorphous oxide semiconductors (AOSs) based TFTs showed the fast technological development, because AOS films can be fabricated at room temperature and exhibit the possibility in application like flexible display, electronic paper, and larges solar cells. Among the various AOSs, a-IGZO has lots of advantages because it has high channel mobility, uniform surface roughness and good transparency. [1] The high mobility is attributed to the overlap of spherical s-orbital of the heavy post-transition metal cations. This study demonstrated the effect of the variation in channel thickness from 30nm to 200nm on the TFT device performance. When the thickness was increased, turn-on voltage and subthreshold swing was decreased. The a-IGZO channels and source/drain metals were deposited with shadow mask. The a-IGZO channel layer was deposited on $SiO_2$/p-Si substrates by RF magnetron sputtering, where RF power is 150W. And working pressure is 3m Torr, at $O_2/Ar$ (2/28 sccm) atmosphere. The electrodes were formed with electron-beam evaporated Ti (30 nm) and Au (70 nm) bilayer. Finally, Al (150nm) as a gate metal was thermal-evaporated. TFT devices were heat-treated in a furnace at 250 $^{\circ}C$ and nitrogen atmosphere for 1hour. The electrical properties of the TFTs were measured using a probe-station. The TFT with channel thickness of 150nm exhibits a good subthreshold swing (SS) of 0.72 V/decade and on-off ratio of $1{\times}10^8$. The field effect mobility and threshold voltage were evaluated as 7.2 and 8 V, respectively.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 하계학술대회 논문집
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• pp.137-137
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• 2009

Thin-film transistors (TFTs) that can be prepared at low temperatures have attracted much attention due to the great potential for flexible electronics. One of the mainstreams in this field is the use of organic semiconductors such as pentacene. But device performance of the organic TFTs is still limited by low field effect mobility or rapidly degraded after exposing to air in many cases. Another approach is amorphous oxide semiconductors. Amorphous oxide semiconductors (AOSs) have exactly attracted considerable attention because AOSs were fabricated at room temperature and used lots of application such as flexible display, electronic paper, large solar cells. Among the various AOSs, a-IGZO was considerable material because it has high mobility and uniform surface and good transparent. The high mobility is attributed to the result of the overlap of spherical s-orbital of the heavy pest-transition metal cations. This study is demonstrated the effect of thickness channel layer from 30nm to 200nm. when the thickness was increased, turn on voltage and subthreshold swing were decreased. a-IGZO TFTs have used a shadow mask to deposit channel and source/drain(S/D). a-IGZO were deposited on SiO2 wafer by rf magnetron sputtering. using power is 150W, working pressure is 3m Torr, and an O2/Ar(2/28 SCCM) atmosphere at room temperature. The electrodes were formed with Electron-beam evaporated Ti(30nm) and Au(70nm) structure. Finally, Al(150nm) as a gate metal was evaporated. TFT devices were heat treated in a furnace at $250^{\circ}C$ in nitrogen atmosphere for an hour. The electrical properties of the TFTs were measured using a probe-station to measure I-V characteristic. TFT whose thickness was 150nm exhibits a good subthreshold swing(S) of 0.72 V/decade and high on-off ratio of 1E+08. Field effect mobility, saturation effect mobility, and threshold voltage were evaluated 7.2, 5.8, 8V respectively.