• Title/Summary/Keyword: Transfer film

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Analysis of An Anomalous Hump Phenomenon in Low-temperature Poly-Si Thin Film Transistors (저온 다결정 실리콘 박막 트랜지스터의 비정상적인 Hump 현상 분석)

  • Kim, Yu-Mi;Jeong, Kwang-Seok;Yun, Ho-Jin;Yang, Seung-Dong;Lee, Sang-Youl;Lee, Hi-Deok;Lee, Ga-Won
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.24 no.11
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    • pp.900-904
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    • 2011
  • In this paper, we investigated an anomalous hump phenomenon under the positive bias stress in p-type LTPS TFTs. The devices with inferior electrical performance also show larger hump phenomenon. which can be explained by the sub-channel induced from trapped electrons under thinner gate oxide region. We can confirm that the devices with larger hump have larger interface trap density ($D_{it}$) and grain boundary trap density ($N_{trap}$) extracted by low-high frequency capacitance method and Levinson-Proano method, respectively. From the C-V with I-V transfer characteristics, the trapped electrons causing hump seem to be generated particularly from the S/D and gate overlapped region. Based on these analysis, the major cause of an anomalous hump phenomenon under the positive bias stress in p-type poly-Si TFTs is explained by the GIDL occurring in the S/D and gate overlapped region and the traps existing in the channel edge region where the gate oxide becomes thinner, which can be inferred by the fact that the magnitude of the hump is dependent on the average trap densities.

Effects of Particle Size on Adsorption of Trihalomethane by Activated Carbon (활성탄입경(活性炭粒徑)이 Trihalomethane의 흡착(吸着)에 미치는 영향(影響))

  • Chung, Tai Hak;Choi, Sang Il
    • KSCE Journal of Civil and Environmental Engineering Research
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    • v.4 no.2
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    • pp.25-33
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    • 1984
  • The effect of particle size on adsorption of trihalomethane have been studied. Using mean particle sizes ranging from 0.73 to 2.03 mm, physical properties of carbon and trihalomethane adsorption characteristics have been investigated experimentally. With increasing particle size specific surface area and pore volume decreased, and the mean pore radius increased significantly. Large pores were dominant in large particles, while small particles were composed of small pores. Isotherm studies were conducted using static bottle point technique and the results were well described by the Freundlich isotherm equations. The adsorption capacity increased significantly with decreased particle size. Additionally micro-column tests were carried out, and the results were compared with the model simulation. From the micro-column studies it was found out that the film transfer coefficient were almost constant, and the differences in the trihalomethane removal efficiency was mainly due to the differences in the adsorption capacity of the particles of different size.

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Thereshold Switching into Conductance Quantized Sttes in V/vamorphous- $V_{2}$ $O_{5}$/V Thin Film Devices (V/비정질- $V_{2}$ $O_{5}$ /lV 박막소자에서의 양자화된 컨덕턴스 상태로의 문턱 스위칭)

  • 윤의중
    • Journal of the Korean Institute of Telematics and Electronics D
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    • v.34D no.12
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    • pp.89-100
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    • 1997
  • This paper investigated a new type of low voltage threshold switch (LVTS). As distinguished from the many other types of electronic threshold switches, the LvTS is ; voltage controlled, occurs at low voltages ($V_{2}$ $O_{5}$lV devices. The average low threshold voltage < $V_{LVT}$>=218 mV (standard deviation =24mV~kT/q, where T=300K), and was independent of the device area (x100) and amorphous oxide occurred in an ~22.angs. thick interphase of the V/amorphous- $V_{2}$ $O_{5}$ contacts. At $V_{LVT}$ there was a transition from an initially low conductance (OFF) state into a succession of quantized states of higher conductance (ON). The OFF state was spatically homogeneous and dominated by tunneling into the interphase. The ON state conductances were consistent with the quantized conductances of ballistic transport through a one dimensional, quantum point contact. The temeprature dependence of $V_{LVT}$, and fit of the material parameters (dielectric function, barrier energy, conductivity) to the data, showed that transport in the OFF and ON states occurred in an interphase with the characteristics of, respectively, semiconducting and metallic V $O_{2}$. The experimental results suggest that the LVTS is likely to be observed in interphases produced by a critical event associated with an inelastic transfer of energy.rgy.y.rgy.

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Development of a Computer Program for Thermal Sizing of a Copper Bonded Steam Generator (구리밀봉 증기발생기의 열적크기 계산을 위한 프로그램 개발)

  • 김의광;김연식;어재혁;김성오;백병준
    • Journal of Energy Engineering
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    • v.12 no.2
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    • pp.84-92
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    • 2003
  • A one-dimensional thermal-hydraulic analysis computer program is developed for thermal sizing of a copper bonded steam generator. It is assumed that the conduction heat transfer of copper region between the hot side and the cold side tube is one-dimensional and its thermal resistance is derived as a function of a tube pitch. The flow regions of the water/steam side are divided into four regions: subcooled, saturated, film boiling, and super-heated. The number of tube selected ranges from 250 to 3500 and the pitch to tube diameter (P/D) ratios are 1.4, 1.6 and 1.8 for the parametric study calculation. The calculation results showed that when the number of tube was 2500, the length of the heating tube was about 12 m and the outside diameter of the steam generator was about 3 m. If the P/D ratio increases, the thermal resistance of copper component also increases, however the length of the heating tube is not so much increased.

Fabrication of Tungsten Nano Dot by Using Block Copolymer Thin Film (블록 공중합체 박막을 이용한 텅스텐 나노점의 형성)

  • Kang, Gil-Bum;Kim, Seong-Il;Kim, Yeung-Hwan;Park, Min-Chul;Kim, Yong-Tae;Lee, Chang-Woo
    • Journal of the Microelectronics and Packaging Society
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    • v.13 no.3 s.40
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    • pp.13-17
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    • 2006
  • Dense and periodic arrays of holes and tungsten none dots were fabricated on silicon oxide and silicon. The holes were approximately 25 nm wide, 40 nm deep, and 60 nm apart. To obtain nano-size patterns, self-assembling resists were used to produce layer of hexagonally ordered parallel cylinders of polymethylmethacrylate(PMMA) in polystyrene(PS) matrix. The PMMA cylinders were degraded and removed with acetic acid rinse to produce a PS mask for pattern transfer. The silicon oxide was removed by fluorine-based reactive ion etching(RIE). Selectively deposited tungsten nano dots were formed inside nano-sized trench by using a low pressure chemical vapor deposition(LPCVD) method. Tungsten nano dot and trenched silicon sizes were 26 nm and 30 nm, respectively.

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Synthesis and Characterization of Large-Area and Highly Crystalline Tungsten Disulphide (WS2) Atomic Layer by Chemical Vapor Deposition

  • Kim, Ji Sun;Kim, Yooseok;Park, Seung-Ho;Ko, Yong Hun;Park, Chong-Yun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.361.2-361.2
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    • 2014
  • Transition metal dichalcogenides (MoS2, WS2, WSe2, MoSe2, NbS2, NbSe2, etc.) are layered materials that can exhibit semiconducting, metallic and even superconducting behavior. In the bulk form, the semiconducting phases (MoS2, WS2, WSe2, MoSe2) have an indirect band gap. Recently, these layered systems have attracted a great deal of attention mainly due to their complementary electronic properties when compared to other two-dimensional materials, such as graphene (a semimetal) and boron nitride (an insulator). However, these bulk properties could be significantly modified when the system becomes mono-layered; the indirect band gap becomes direct. Such changes in the band structure when reducing the thickness of a WS2 film have important implications for the development of novel applications, such as valleytronics. In this work, we report for the controlled synthesis of large-area (~cm2) single-, bi-, and few-layer WS2 using a two-step process. WOx thin films were deposited onto a Si/SiO2 substrate, and these films were then sulfurized under vacuum in a second step occurring at high temperatures ($750^{\circ}C$). Furthermore, we have developed an efficient route to transfer these WS2 films onto different substrates, using concentrated HF. WS2 films of different thicknesses have been analyzed by optical microscopy, Raman spectroscopy, and high-resolution transmission electron microscopy.

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The electronic structure of the ion-beam-mixed Pt-Cu alloys by XPS and XANES

  • Lim, K.Y.;Lee, Y.S.;Chung, Y.D.;Lee, K.M.;Jeon, Y.;Whang, C.N.
    • Proceedings of the Korean Vacuum Society Conference
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    • 1998.02a
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    • pp.133-133
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    • 1998
  • In the thin film alloy formation of the transition metals ion-beam-mixing technique forms a metastable structure which cannot be found in the arc-melted metal alloys. Sppecifically it is well known that the studies about the electronic structure of ion-beam-mixed alloys pprovide the useful information in understanding the metastable structures in the metal alloy. We studied the electronic change in the ion-beam-mixed ppt-Ct alloys by XppS and XANES. These analysis tools pprovide us information about the charge transfer in the valence band of intermetallic bonding. The multi-layered films were depposited on the SiO2 substrate by the sequential electron beam evapporation at a ppressure of less than 5$\times$10-7 Torr. These compprise of 4 ppairs of ppt and Cu layers where thicknesses of each layer were varied in order to change the alloy compposition. Ion-beam-mixing pprocess was carried out with 80 keV Ae+ ions with a dose of $1.5\times$ 1016 Ar+/cm2 at room tempperature. The core and valence level energy shift in these system were investigated by x-ray pphotoelectron sppectroscoppy(XppS) pphotoelectrons were excited by monochromatized Al K a(1486.6 eV) The ppass energy of the hemisppherical analyzer was 23.5 eV. Core-level binding energies were calibrated with the Fermi level edge. ppt L3-edge and Cu K-edge XANES sppectra were measured with the flourescence mode detector at the 3C1 beam line of the ppLS (ppohang light source). By using the change of White line(WL) area of the each metal sites and the core level shift we can obtain the information about the electrons pparticippating in the intermetallic bonding of the ion-beam-mixed alloys.

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Photoelectrochamical characteristics of $WO_3$ on metal substrate for hydrogen production (텅스텐산화물/금속기판의 광전극 특성)

  • Go, GeunHo;Shinde, Pravin S.;Seo, SeonHee;Lee, Dongyoon;Lee, Wonjae
    • 한국신재생에너지학회:학술대회논문집
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    • 2011.11a
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    • pp.99.2-99.2
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    • 2011
  • Transparent conducting oxides (TCOs) supported on glass are widely used as substrates in PEC studies for photovoltaic hydrogen generation applications However, high sheet resistane ($10{\sim}15{\Omega}/cm^2$) and fragileness of glass-supported TCO substrates are the obstacles to produce the large area PEC cells. Such internal sheet resistance is detrimental to efficient collection of photogenerated majority charge carriers at the photoactive material and electrolyte interface. Moreover, these TCO substrates are very expensive and consume about 40~60% cost of the devices. Hence, a low sheet resistance of the substrate is a key point in improving the performance of PEC devices. Metallic substrates coated with a photoactive material would be a good choice for efficient charge collection. Such metal substrates based photanodes are best candidate for large-scale phtoelectrochemical water splitting for hydrogen generation. In this study, we report the enhanced PEC performance of $WO_3$ film on metal(chemical etched, bare) substrate. It is proposed that interface between $WO_3$ and the metal substrate is responsible for efficient charge transfer and demonstrated significant improvement in the photoelectrochmical performance. X-ray diffration and FESEM suduies reveled that $WO_3$ films are monoclinic, porous, polycrystalline with average grain size of ~50nm. Photocurrent of $WO_3$ prepared on metal substrates was measured in 0.5M $H_2SO_4$ electroyte under simulated $100mW/cm^2$ illumination.

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Finite element study on composite slab-beam systems under various fire exposures

  • Cirpici, Burak K.;Orhan, Suleyman N.;Kotan, Turkay
    • Steel and Composite Structures
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    • v.37 no.5
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    • pp.589-603
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    • 2020
  • This paper presents an investigation of the thermal performance of composite floor slabs with profiled steel decking exposed to fire effects from floor. A detailed finite-element model has been developed by representing the concrete slab with steel decking under of it and steel beam both steel parts protected by intumescent coating. Although this type of floor systems offers a better fire resistance, passive fire protection materials should be applied when a higher fire resistance is desired. Moreover, fire exposed side is so crucial for composite slab systems as the total fire behaviour of the floor system changes dramatically. When the fire attack from steel parts, the temperature rises rapidly resulting in a sudden decrease on the strength of the beam and decking. Herein this paper, the fire attack side is assumed from the face of the concrete floor (top of the concrete assembly). Therefore, the heat is transferred through concrete to the steel decking and reaching finally to the steel beam both protected by intumescent coating. In this work, the numerical model has been established to predict the heat transfer performance including material properties such as thermal conductivity, specific heat and dry film thickness of intumescent coating. The developed numerical model has been divided into different layers to understand the sensitivity of steel temperature to the number of layers of intumescent coating. Results show that the protected composite floors offer a higher fire resistance as the temperature of the steel section remains below 60℃ even after 60-minute Standard (ISO) fire and Fast fire exposure. Obtaining lower temperatures in steel due to the great fire performance of the concrete itself results in lesser reductions of strength and stiffness hence, lesser deflections.

Improved Electrical Properties of Graphene Transparent Conducting Films Via Gold Doping

  • Kim, Yoo-Seok;Song, Woo-Seok;Kim, Sung-Hwan;Jeon, Cheol-Ho;Lee, Seung-Youb;Park, Chong-Yun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.08a
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    • pp.388-388
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    • 2011
  • Graphene, with its unique physical and structural properties, has recently become a proving ground for various physical phenomena, and is a promising candidate for a variety of electronic device and flexible display applications. The physical properties of graphene depend directly on the thickness. These properties lead to the possibility of its application in high-performance transparent conducting films (TCFs). Compared to indium tin oxide (ITO) electrodes, which have a typical sheet resistance of ~60 ${\Omega}/sq$ and ~85% transmittance in the visible range, the chemical vapor deposition (CVD) synthesized graphene electrodes have a higher transmittance in the visible to IR region and are more robust under bending. Nevertheless, the lowest sheet resistance of the currently available CVD graphene electrodes is higher than that of ITO. Here, we report an ingenious strategy, irradiation of MeV electron beam (e-beam) at room temperature under ambient condition,for obtaining size-homogeneous gold nanoparticle decorated on graphene. The nano-particlization promoted by MeV e-beam irradiation was investigated by transmission electron microscopy, electron energy loss spectroscopy elemental mapping, and energy dispersive X-ray spectroscopy. These results clearly revealed that gold nanoparticle with 10~15 nm in mean size were decorated along the surface of the graphene after 1.0 MeV-e-beam irradiation. The fabrication high-performance TCF with optimized doping condition showed a sheet resistance of ~150 ${\Omega}/sq$ at 94% transmittance. A chemical transformation and charge transfer for the metal gold nanoparticle were systematically explored by X-ray photoelectron spectroscopy and Raman spectroscopy. This approach advances the numerous applications of graphene films as transparent conducting electrodes.

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