• 열처리공학회지
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• 제10권2호
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• pp.138-149
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• 1997

TiN and AlN are ceramic materials with extensive applications due to its excellent mechanical and chemical properties at elevated temperature. The purpose of this research is to develop the method for the synthesis of ternary nitride powder, titanium-aluminum-nitrogen system, which have an excellent property of both TiN and AlN. The ternary nitride such as $Ti_3AlN$, $Ti_2AlN$ and $Ti_3Al_2N_2$ can be synthesized by the interdiffusion nitriding method in Ar gas, however, the ternary nitride coexist with TiN, AlN, $Ti_3Al$ and ${\alpha}$-Ti. The ternary nitride are stable below $1400^{\circ}C$, but these are gradually decomposed into TiN, $Ti_3Al$ and AlN above $1400^{\circ}C$. The thermal oxidation characteristics of the Ti-Al-N compound synthesized by the interdiffusion nitriding method is superior to that of the TiN+AlN mixed powder, and the oxidation for both materials show the differential behaviors.

• Korean Chemical Engineering Research
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• 제50권1호
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• pp.118-127
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• 2012

고분자전해질 연료전지용 분리판 소재로 스텐레스 강의 내식성과 전기전도성을 향상시키기 위해 표면을 TiN(titanium nitride) 또는 Ti/TiN(titanium/titanium nitride)으로 코팅하여 연료전지 운전환경에서 표면 코팅층의 물성 변화를 조사하였다. 200시간의 연료전지 운전에서 표면 코팅층의 부식, 균열(crack), 박리, 표면 화학조성 변화 등을 분석하여 코팅된 TiN 또는 Ti/TiN 박막의 역할을 규명하고자 하였다. 스텐레스 강 분리판의 전기전도도와 부식저항성은 소재 표면에 질화층 박막을 코팅함으로써 증가하였으나 연료전지 환경하에서 운전시 코팅된 박막의 부식과 박리현상이 SUS316L-Ti/TiN을 제외하고 현저히 발생하였다. TiN 코팅층과 하부 기재 사이에 Ti 중간층을 도입함으로써 TiN 박막의 밀착성이 향상되고 또한 코팅층의 두께 증가로 부식 위험성이 감소하는 것을 관찰하였다.

• 한국표면공학회지
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• 제32권3호
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• pp.265-275
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• 1999

Titanium nitride and related overlayers produced by arc ion plating (AIP) are applied as commercial coatings in world-wide scale since the middle of 80s. Due to the achievements of low temperature deposition (LTD), they begin now to be used as wear and corrosion-resistant coatings for machine parts, besides applications on cemented carbide and high speed steel cutting tools. On the other side, TiN can be now applied successfully to brass, Al-alloy, ZnAl alloy articles as decorative coating through LTD. Various nitrides, carbonitrides, borides and other refractory compounds, such as (Ti, Al)N, TiCN, CrN, are used as the coatings for special heavy-duty working conditions instead of TiN since 90s. More and more multilayer coatings are applied now substituting single layer ones. Duplex processes are under development.

• The Journal of Advanced Prosthodontics
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• 제10권3호
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• pp.197-204
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• 2018

PURPOSE. To determine the extent of treatment traces, the roughness depth, and the quantity of titanium nitride (TiN) removed from the surface of CAD/CAM abutments after treatment with various instruments. MATERIALS AND METHODS. Twelve TiN coated CAD/CAM abutments were investigated for an in vitro study. In the test group (9), each abutment surface was subjected twice (150 g vs. 200 g pressure) to standardized treatment in a simulated prophylaxis measure with the following instruments: acrylic scaler, titanium curette, and ultrasonic scaler with steel tip. Three abutments were used as control group. Average surface roughness (Sa) and developed interfacial area ratio (Sdr) of treated and untreated surfaces were measured with a profilometer. The extent of treatment traces were analyzed by scanning electron microscopy. RESULTS. Manipulation with ultrasonic scalers resulted in a significant increase of average surface roughness (Sa, P<.05) and developed interfacial area ratio (Sdr, P<.018). Variable contact pressure did not yield any statistically significant difference on Sa-values for all instruments (P=.8). Ultrasonic treatment resulted in pronounced surface traces and partially detachment of the TiN coating. While titanium curettes caused predominantly moderate treatment traces, no traces or detectable substance removal has been determined after manipulation with acrylic curettes. CONCLUSION. Inappropriate instruments during regular plaque control may have an adverse effect on the integrity of the TiN coating of CAD/CAM abutments. To prevent defects and an increased surface roughness at the transmucosal zone of TiN abutments, only acrylic scaling instruments can be recommended for regular maintenance care.

• 한국산학기술학회논문지
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• 제10권11호
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• pp.3043-3047
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• 2009

액상의 304스테인레스강중의 질소용해도와 질화물 형성관계를 시료채취법을 이용하여 측정하였으며, 이를 열역학적 함수로 규명하였다. 용융 304스테인레스강의 온도가 높을수록 질소용해도는 증가하였으며, 스테인레스강은 1기압의 질소 분위기하에서 0.3wt.% 이상의 Ti 첨가시 Ti계 질화물이 형성되었다. 또한 스테인레스강중에 Ti 첨가로 형성된 질화물은 TiN으로 판명되었다.

• 한국표면공학회지
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• 제44권5호
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• pp.179-184
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• 2011

This work investigated the effect of duty cycle and pulse frequency on the microstructures and properties of titanium nitride thin films deposited by asymmetric bipolar pulsed DC sputtering system. Oscilloscope traces of the I-V waveforms indicate high power and high current density outputs during the asymmetric bipolar pulsed mode. The grain size decreases with decreasing duty cycle. The duty cycle has a strong influence not only on the microstructural properties but also on the mechanical properties of titanium nitride films. Comparing with the continuous DC sputtering, the titanium nitride films prepared by pulsed DC asymmetric bipolar process exhibit better properties.

• 한국표면공학회지
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• 제25권6호
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• pp.299-308
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• 1992

Titanium nitride(TiN) has been synthesized by nitrogen ion irradiation onto the Ti thin film deposited on STD11 and SKH9 tool materials. The effect of irradiation flux and substrate temperature on the formation behavior and mechanical properaties of TiN were investigated through X-ray diffraction analysis, hardness and pin-on-disc wear testings. Nitrogen ion irradiation onto arc evaporated Ti thin film produced TiN of < 200> orientation at elevated temperature and thereby enhancing surface microhardness by 50% at maximum. Wear resistance was also improved by nitrogen irradiation at most process conditions. The enhancement of wear resistance appeared to be more effective for the nitrogen irradiated conditions at room temperature than at elevated temperature.

• 한국표면공학회지
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• 제53권6호
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• pp.280-284
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• 2020

Electron beam irradiation is widely used as a type of surface modification technology to advance surface properties. In this study, the effect of electron beam irradiation on properties, such as surface hardness, wear resistance, roughness, and critical load of Titanium Aluminium nitride (TiAlN) films was investigated. TiAlN films were deposited on the SKD-61 substrate by using cathode arc ion plating. After deposition, the films were bombarded with intense electron beam for 10 minutes. The surface hardness was increased up to 4520 HV at electron irradiation energy of 1500 eV. In addition, surface root mean square (RMS) roughness of the films irradiated at 1500 eV shows the lowest roughness of 484 nm in this study.

• 한국세라믹학회지
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• 제34권5호
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• pp.443-448
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• 1997

Titanium carbonitride (Ti(CxN1-x)) ceramics were prepared by hot pressing of the mixture of TiN and graphite. Hot pressing was performed in a graphite mold at 198$0^{\circ}C$ for 40 min under 44 MPa in N2 atmosphere. The effect of graphite addition on sinterability and the mechanical properties of titanium carbonitride were investigated. In this study, the solubility limit of graphite in Ti(CxN1-x) was slightly below 10 wt% based on the results of XRD analysis. Within the solubility limit, graphite dissolved completely into titanium nitride and formed the single phase Ti(CxN1-x) solid solution. Peak relative density of 99% and hardness of 16 GPa were observed for Ti(CxN1-x) ceramics with 7 wt% graphite while maximum flexural strength of 500 MPa and fracture toughness of 4.0 MPa.m1/2 were observed for Ti(CxN1-x) ceramics with 10 wt% graphite. The electrical resistivities of the ceramics with 7 wt% and 10 wt% graphite were observed 40 {{{{ mu OMEGA }}cm and 50 {{{{ mu OMEGA }}cm respectively.

• 한국세라믹학회지
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• 제34권5호
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• pp.512-518
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• 1997

The high temperature oxidation behaviors of titanium nitride films prepared by PACVD technique were studied in the temperature range of from 50$0^{\circ}C$ to 80$0^{\circ}C$ under air atmosphere. Ti0.88Al0.12N film, which showed the excellent microhardness from the previous work, was investigated on its oxidation resistance compared with pure TiN film. Ti-Al-N film showed superior oxidation resistance up to $700^{\circ}C$, whereas TiN film was fast oxidized into rutile TiO2 crystallites from at 50$0^{\circ}C$. It was found that an amorphous layer having AlxTiyOz formula was formed on the surface region due to outward diffusion of Al ions at the initial stage of oxidation. The amorphous oxide layer played a role as a barrier against oxygen diffusion, protected the remained nitride layer from further oxidation, and thus, resulted in the high oxidation resistive characteristics of Ti-Al-N film.